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1. 发明专利

JP2011181935A Collector for euv light source 有权
标题翻译： EUV光源收集器
公开(公告)号：JP2011181935A
公开(公告)日：2011-09-15
申请号：JP2011062167
申请日：2011-03-22
申请人： Cymer Inc , サイマーインコーポレイテッド
发明人： PARTLO WILLIAM N , ALGOTS J MARTIN , BLUMENSTOCK GERRY M , BOWERING NORBERT , ERSHOV ALEXANDER I , FOMENKOV IGOR V , PAN XIAOJIANG J
IPC分类号： H01L21/027 , G02B5/10 , G03F7/20 , G21K1/06 , H01L21/304 , H05G2/00
摘要： PROBLEM TO BE SOLVED: To provide a method and an apparatus for removing debris from a reflecting surface of an EUV (Extreme ultraviolet) collector in an EUV light source. SOLUTION: A current source (DC voltage source) 220 may be connected to a collector mirror 150, a metallic backing material (aluminum or nickel) for the mirror 150. The mirror 150 may be heated to a temperature higher than the temperature of ambient gas (helium gas) filling the inside of a chamber 26. In another aspect of debris cleaning, introduction of RF from an antenna schematically shown by an RF frequency voltage 230 and 232 in the chamber 26 may be incorporated. The RF may be connected to the mirror 150 or the metallic backing material, and in this case, a dark shield made of an appropriate conductive material and connected to the earth potential may be formed by covering the back face of the collector mirror 150, and is separated from the mirror by an insulator (air gap) and a voltage (DC from the DC power source 220 connected to the mirror 150 as well). COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供一种在EUV光源中从EUV（极紫外）捕集器的反射表面去除碎屑的方法和装置。解决方案：电流源（DC电压源）220可以连接到收集器反射镜150，用于反射镜150的金属背衬材料（铝或镍）。反射镜150可以被加热到高于温度环境气体（氦气）填充在室26的内部。在碎片清洁的另一方面，可以并入从RF 26电压230和232中示意性地示出的天线引入RF。 RF可以连接到反射镜150或金属背衬材料，并且在这种情况下，可以通过覆盖收集镜150的背面形成由适当的导电材料制成并连接到地电位的暗屏蔽，通过绝缘体（气隙）和电压（也连接到反射镜150的直流电源220的DC）与反射镜分离。版权所有（C）2011，JPO＆INPIT

2. 发明专利

JP2007298980A Collector for euv light source 审中-公开
标题翻译： EUV光源收集器
公开(公告)号：JP2007298980A
公开(公告)日：2007-11-15
申请号：JP2007101959
申请日：2007-04-09
申请人： Cymer Inc , サイマーインコーポレイテッド
发明人： PARTLO WILLIAM N , ALGOTS J MARTIN , BLUMENSTOCK GERRY M , BOWERING NORBERT , ERSHOV ALEXANDER I , FOMENKOV IGOR V , PAN XIAOJIANG J
IPC分类号： G02B5/10 , G02B5/00 , G03F7/20 , G21C11/00 , G21K1/06 , H01J1/50 , H01L21/027
CPC分类号： H05G2/001 , B82Y10/00 , G03F7/70033 , G03F7/70175 , G03F7/70916 , G21K1/062
摘要： PROBLEM TO BE SOLVED: To provide a method for removing debris from the reflecting surface of an EUV collector, in an EUV light source. SOLUTION: The method and a system comprise the reflecting surface containing a first material and the debris comprising a second material and/or compounds of the second material, and the system and method comprise a controlled sputtering ion source (containing a gas containing the atoms of the sputtering ion material); and a stimulating mechanism exciting the atoms of the sputtering ion material into an ionized state, with the ionized state being selected to have a distribution about a selected energy peak that has high probability of sputtering the second material and very low probability of sputtering the first material. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种在EUV光源中从EUV收集器的反射表面去除碎屑的方法。解决方案：该方法和系统包括含有第一材料的反射表面和包含第二材料和/或第二材料的化合物的碎屑，并且该系统和方法包括受控的溅射离子源（含有含有溅射离子材料的原子）; 以及将溅射离子材料的原子激发成离子化状态的刺激机构，其中选择离子化状态以具有围绕第二材料溅射的可能性高的选定能量峰的分布，并且溅射第一材料的可能性非常低。版权所有（C）2008，JPO＆INPIT

3. 发明申请

WO2006060359A3 HIGH POWER HIGH PULSE REPETITION RATE GAS DISCHARGE LASER SYSTEM BANDWIDTH MANAGEMENT 审中-公开
标题翻译：高功率高脉冲重复率气体放电激光系统带宽管理
公开(公告)号：WO2006060359A3
公开(公告)日：2009-04-16
申请号：PCT/US2005043055
申请日：2005-11-28
申请人： CYMER INC , SANDSTROM RICHARD L , PARTLO WILLIAM N , BROWN DANIEL J W , ALGOTS J MARTIN , TRINTCHOUK FEDOR
发明人： SANDSTROM RICHARD L , PARTLO WILLIAM N , BROWN DANIEL J W , ALGOTS J MARTIN , TRINTCHOUK FEDOR
IPC分类号： G02B5/04 , H01S3/08
CPC分类号： H01S3/08009 , H01S3/08031 , H01S3/08059 , H01S3/097 , H01S3/1055
摘要： A line narrowing apparatus and method for a narrow band DUV high power high repetition rate gas discharge laser producing output laser light pulse beam pulses in bursts of pulses is disclosed, which may comprise a dispersive center wavelength selection optic contained within a line narrowing module, selecting at least one center wavelength for each pulse determined at least in part by the angle of incidence of the laser light pulse beam containing the respective pulse on a dispersive wavelength selection optic dispersive surface; a first dispersive optic bending mechanism operatively connected to the dispersive center wavelength selection optic and operative to change the curvature of the dispersive surface in a first manner; and, a second dispersive optic bending mechanism operatively connected to the dispersive center wavelength selection optic and operative to change the curvature of the dispersive surface in a second manner. The first manner may modify a first measure of bandwidth and the second manner may modify a second measure of bandwidth such that the ratio of the first measure to the second measure substantially changes. The first measure may be a spectrum width at a selected percentage of the spectrum peak value (FWX%M) and the second measure may be width within which some selected percentage of the spectral intensity is contained (EX%). The first dispersive optic bending mechanism may change the curvature of the dispersive surface in a first dimension and the second in a second dimension generally orthogonal to the first dimension. The laser system may comprise a beam path insert comprising a material having an different index of refraction and an index of refraction thermal gradient opposite from that of a neighboring optical element. The first dispersive optic bending mechanism may change the curvature of the dispersive surface in a first dimension and the second a second dimension generally parallel to the first dimension. An optical beam twisting element in the lasing cavity may optically twist the laser light pulse beam to present a twisted wavefront to the dispersive center wavelength selection optic. Bending may change the curvature and wavelength selection, e.g., in a burst may create two center wavelength peaks to select FWX%M and EX% independently.
摘要翻译：公开了一种用于窄带DUV大功率高重复率气体放电激光器的脉冲串产生输出激光脉冲束脉冲的线窄化装置和方法，其可以包括包含在线窄模块内的分散中心波长选择光学器件，选择用于每个脉冲的至少一个中心波长至少部分地由包含分散波长选择光学色散表面上的各个脉冲的激光束的入射角确定; 第一分散光学弯曲机构，其可操作地连接到所述分散中心波长选择光学器件并且以第一方式改变所述分散表面的曲率; 以及第二分散光学弯曲机构，其可操作地连接到所述分散中心波长选择光学器件并且以第二方式改变所述色散表面的曲率。第一种方式可以修改第一带宽度量，并且第二种方式可以修改第二带宽度量，使得第一测量与第二测量的比率基本上改变。第一测量可以是频谱峰值（FWX％M）的选定百分比处的频谱宽度，第二测量可以是包含光谱强度的某些选定百分比（EX％）的宽度。第一分散光学弯曲机构可以在第一维度上改变分散表面的曲率，而第二维度可以大致垂直于第一维度改变。激光系统可以包括光束路径插入件，其包括具有不同折射率的材料和与相邻光学元件的折射率相反的折射热梯度。第一分散光学弯曲机构可以改变分散表面在第一尺寸中的曲率，而第二分散光学弯曲机构的第二尺寸大体上平行于第一尺寸。激光腔中的光束加捻元件可以光学地扭转激光脉冲光束，以将扭曲的波前呈现到分散中心波长选择光学器件。弯曲可以改变曲率和波长选择，例如，在脉冲串中可以产生两个中心波长峰值，以独立地选择FWX％M和EX％。

4. 发明申请

WO2004092693A3 COLLECTOR FOR EUV LIGHT SOURCE 审中-公开
标题翻译： EUV光源收集器
公开(公告)号：WO2004092693A3
公开(公告)日：2005-05-19
申请号：PCT/US2004010972
申请日：2004-04-07
申请人： CYMER INC , PARTLO WILLIAM N , ALGOTS J MARTIN , BLUMENSTOCK GERRY M , BOWERING NORBERT , ERSHOV ALEXANDER I , FOMENKOV IGOR V , PAN XIAOJIANG J
发明人： PARTLO WILLIAM N , ALGOTS J MARTIN , BLUMENSTOCK GERRY M , BOWERING NORBERT , ERSHOV ALEXANDER I , FOMENKOV IGOR V , PAN XIAOJIANG J
IPC分类号： G02B5/00 , G03F7/20 , G21C11/00 , G21K1/06 , H01J1/50 , A61N5/00
CPC分类号： H05G2/001 , B82Y10/00 , G03F7/70033 , G03F7/70175 , G03F7/70916 , G21K1/062
摘要： A debris removable system (20) for removing a plasma produced residue debris on a reflecting surface (360) of an EUV source (26), which includes a stimulating mechanism (72) for exciting and ionizing the atoms to clean the reflecting surface (360): a collecting mirror (370); a filter (150); and a debris shield (202).
摘要翻译：一种用于去除在EUV源（26）的反射表面（360）上产生的残余物碎屑的碎片可移除系统（20），其包括用于激发和电离原子以清洁反射表面的刺激机构（360））：收集镜（370）; 过滤器（150）; 和碎片护罩（202）。

5. 发明申请

WO2006105119A3 6 KHz AND ABOVE GAS DISCHARGE LASER SYSTEM 审中-公开
标题翻译： 6 KHz和以上气体放电激光系统
公开(公告)号：WO2006105119A3
公开(公告)日：2008-10-16
申请号：PCT/US2006011339
申请日：2006-03-27
申请人： CYMER INC , UJAZDOWSKI RICHARD C , NESS RICHARD M , ALGOTS J MARTIN , FLEUROV VLADIMIR B , PALENSCHAT FREDERICK A , GILLESPIE WALTER D , MOOSMAN BRYAN G , STEIGER THOMAS D , SMITH BRETT D , MCKELVY THOMAS E
发明人： UJAZDOWSKI RICHARD C , NESS RICHARD M , ALGOTS J MARTIN , FLEUROV VLADIMIR B , PALENSCHAT FREDERICK A , GILLESPIE WALTER D , MOOSMAN BRYAN G , STEIGER THOMAS D , SMITH BRETT D , MCKELVY THOMAS E
IPC分类号： H01F27/08 , H01S3/03 , H01S3/08 , H01S3/22
CPC分类号： H01S3/036 , H01F3/10 , H01F27/22 , H01F27/266 , H01F38/10 , H01S3/0404 , H01S3/041 , H01S3/097 , H01S3/09702 , H01S3/225 , H01S3/2308
摘要： A high pulse repetition rate gas discharge laser system pulse power system magnetic reactor may comprise a housing comprising a core containing compartment between an inner wall of the housing, an outer wall and a bottom wall of the housing; a cooling mechanism operative to withdraw heat from the at least one of the inner wall, outer wall and bottom of the housing; at least one two magnetic cores contained within the core containing compartment; a cooling fin disposed between each of the at least two magnetic cores; and a thermal conductivity enhancement mechanism intermediate at least one of each respective cooling fin and each respective core and a respective one of the inner wall, the outer wall or the bottom wall, the thermal conductivity enhancement mechanism comprising a band comprising a plurality of torsion spring or leaf spring elements.
摘要翻译：高脉冲重复率气体放电激光系统脉冲功率系统磁反应器可以包括壳体，该壳体包括在壳体的内壁，外壁和壳体的底壁之间的容纳核心的隔间; 冷却机构，用于从壳体的内壁，外壁和底部中的至少一个中提取热量; 至少一个两个磁芯包含在所述芯容纳室内; 设置在所述至少两个磁芯中的每一个之间的冷却翅片; 以及在每个相应的冷却翅片和每个相应的芯部以及内壁，外壁或底壁中的相应的一个中的至少一个的热导率增强机构，所述热导率增强机构包括包括多个扭转弹簧或板簧元件。

6. 发明申请

WO2005104311A3 DUV LIGHT SOURCE OPTICAL ELEMENT IMPROVEMENTS 审中-公开
标题翻译： DUV光源光学元件的改进
公开(公告)号：WO2005104311A3
公开(公告)日：2007-03-22
申请号：PCT/US2005006932
申请日：2005-03-04
申请人： CYMER INC , SANDSTROM RICHARD L , ALGOTS J MARTIN , BROWN JOSHUA C , CYBULSKY RAYMOND F , DUNLOP JOHN , HOWEY JAMES K , MORTON RICHARD G , PAN XIAOJIANG J , PARTLO WILLIAM N , PUTRIS FIRAS F , WATSON TOM A , YAGER THOMAS A
发明人： SANDSTROM RICHARD L , ALGOTS J MARTIN , BROWN JOSHUA C , CYBULSKY RAYMOND F , DUNLOP JOHN , HOWEY JAMES K , MORTON RICHARD G , PAN XIAOJIANG J , PARTLO WILLIAM N , PUTRIS FIRAS F , WATSON TOM A , YAGER THOMAS A
IPC分类号： H01S3/22 , G01B9/02 , G01J1/42 , G01J9/02 , G03F7/20 , H01S3/00 , H01S3/036 , H01S3/038 , H01S3/04 , H01S3/041 , H01S3/08 , H01S3/081 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/10 , H01S3/102 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/11 , H01S3/13 , H01S3/134 , H01S3/139 , H01S3/223 , H01S3/225 , H01S3/23
CPC分类号： H01S3/02 , G01J1/429 , G01J9/02 , G03F7/70025 , G03F7/70575 , G03F7/70933 , H01S3/0057 , H01S3/0071 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0401 , H01S3/041 , H01S3/08009 , H01S3/08036 , H01S3/0812 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/1024 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333 , H01S3/2366
摘要： A high power narrow band, high repetition rate laser light source optical improvement apparatus and methods are disclosed with a fast angularly positionable mirror having a mirror mounting frame, a reflective optic with a coefficient different from that of the mounting frame, at least one flexure mount framed in the mounting frame that is flexible having flexure arm attached the flexture to the mounting frame. The apparatus may include a flexure force mechanism having an elongated rod. The force mechanism may prestress the flexure. The mirror maybe a grating which includes a substrate with metallic layer formed on the substrate, and a protective coating made of silica formed on the reflective metallic layer. The grating maybe actively tuned using an electro- or magneto- sensitive element. Oxides of the metal in the reflective layer may be removed by a hydrogen purge system exposed to deep ultraviolet radiation.
摘要翻译：公开了一种高功率窄带，高重复率激光光源光学改进装置和方法，其具有快速可角度定位的反射镜，其具有镜安装框架，具有与安装框架系数不同的系数的反射光学元件，至少一个弯曲安装座框架在柔性的安装框架中，挠性臂将挠性件连接到安装框架。该装置可以包括具有细长杆的挠曲力机构。力机构可以预应力挠曲。镜子可以是包括在基板上形成有金属层的基板的光栅，以及形成在反射金属层上的由二氧化硅形成的保护涂层。光栅可能会使用电磁感应元件或磁敏元件进行主动调谐。可以通过暴露于深紫外线辐射的氢气清除系统来去除反射层中金属的氧化物。

7. 发明公开

EP1615695A4 COLLECTOR FOR EUV LIGHT SOURCE 审中-公开
标题翻译：收集器EUV光源
公开(公告)号：EP1615695A4
公开(公告)日：2010-04-07
申请号：EP04759330
申请日：2004-04-07
申请人： CYMER INC
发明人： PARTLO WILLIAM N , ALGOTS J MARTIN , BLUMENSTOCK GERRY M , BOWERING NORBERT , ERSHOV ALEXANDER I , FOMENKOV IGOR V , PAN XIAOJIANG J
IPC分类号： A61N5/00 , G02B5/00 , G03F7/20 , G21C11/00 , G21K1/06 , H01J1/50
CPC分类号： H05G2/001 , B82Y10/00 , G03F7/70033 , G03F7/70175 , G03F7/70916 , G21K1/062

8. 发明公开

EP1867015A4 6 KHz AND ABOVE GAS DISCHARGE LASER SYSTEM 有权
标题翻译：与6 kHz和更多的气体放电激光器系统
公开(公告)号：EP1867015A4
公开(公告)日：2010-11-03
申请号：EP06748829
申请日：2006-03-27
申请人： CYMER INC
发明人： UJAZDOWSKI RICHARD C , NESS RICHARD M , ALGOTS J MARTIN , FLEUROV VLADIMIR B , PALENSCHAT FREDERICK A , GILLESPIE WALTER D , MOOSMAN BRYAN G , STEIGER THOMAS D , SMITH BRETT D , MCKELVY THOMAS E
IPC分类号： H01F27/08 , H01F27/22 , H01F38/02 , H01S3/03 , H01S3/04 , H01S3/08 , H01S3/22 , H01S3/225 , H01S3/23 , H05K7/20
CPC分类号： H01S3/036 , H01F3/10 , H01F27/22 , H01F27/266 , H01F38/10 , H01S3/0404 , H01S3/041 , H01S3/097 , H01S3/09702 , H01S3/225 , H01S3/2308

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