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    • 2. 发明授权
    • Semiconductor package having a heat sink with an exposed surface
    • 具有具有暴露表面的散热器的半导体封装
    • US06246115B1
    • 2001-06-12
    • US09425145
    • 1999-10-21
    • Tom TangChien Ping HuangKevin ChiangJeng-Yuan LaiCandy TienVicky Liu
    • Tom TangChien Ping HuangKevin ChiangJeng-Yuan LaiCandy TienVicky Liu
    • H01L2310
    • H01L21/565H01L23/3128H01L23/4334H01L24/45H01L24/48H01L24/73H01L2224/32225H01L2224/45144H01L2224/48091H01L2224/48227H01L2224/73265H01L2924/01079H01L2924/14H01L2924/15311H01L2924/181H01L2924/19041H01L2924/00014H01L2924/00012H01L2924/00
    • An integrated circuit package with a fully-exposed heat sink is provided. The integrated circuit package includes a substrate having a first side being formed with first conductive traces and a second side being formed with second conductive traces. At least one chip is mounted on the substrate and electrically connected to the first conductive traces. A plurality of solder balls are provided at the terminal ends of the second conductive traces to allow external connection of the chip. The fully-exposed heat sink is mounted on the substrate. The heat sink is formed with a plurality of supportive legs arranged in such a manner as to allow a bottom surface of the heat sink to be separated from the chip and a top surface of the heat sink to be tightly attached to a cavity in a mold used to form an encapsulant for enclosing the chip. A plurality of positioning tongues are formed on the heat sink for securing the heat sink in position when performing a molding process for forming the encapsulant. With this integrated circuit package, no jig is required in the assembly of the integrated circuit package. Moreover, since there is no need to use adhesives to adhere the supportive legs onto the substrate, the integrated circuit package would not suffer from delamination as in the case of the prior art. The fully-exposed heat sink allows an increased heat-dissipating efficient as compared to the prior art.
    • 提供了一个具有完全暴露的散热器的集成电路封装。 集成电路封装包括具有形成有第一导电迹线的第一侧的基板,和形成有第二导电迹线的第二侧。 至少一个芯片安装在基板上并电连接到第一导电迹线。 多个焊球设置在第二导电迹线的末端,以允许芯片的外部连接。 完全曝光的散热器安装在基板上。 散热器形成有多个支撑腿,其布置成允许散热器的底表面与芯片分离,并且散热器的顶表面紧密地附接到模具中的空腔中 用于形成封装芯片的密封剂。 多个定位舌片形成在散热器上,用于在执行用于形成密封剂的成型工艺时将散热器固定就位。 使用该集成电路封装,集成电路封装的组装中不需要夹具。 此外,由于不需要使用粘合剂将支撑腿粘附到基板上,所以与现有技术的情况相同,集成电路封装不会遭受分层。 与现有技术相比,完全暴露的散热器允许增加散热效率。
    • 6. 发明授权
    • Estimation of device temperature
    • 器件温度估计
    • US06438503B1
    • 2002-08-20
    • US09307619
    • 1999-05-07
    • Kevin Chiang
    • Kevin Chiang
    • G01K108
    • G01K7/42
    • Method and system for estimating processing time delay &Dgr;td of a selected signal processing device and temperature T of the device. A selected input signal is received by a first sub-system that includes the selected device and by a second sub-system having a controllable time delay, producing first and second sub-system output signals. The first and second sub-system output signals are compared to estimate the time delay of the selected device. A known relationship T=f(&Dgr;td) is used to estimate temperature of the selected device and to determine whether this temperature is higher than a permitted or threshold device operating temperature. First and second signals, having the same or different shape parameters, may be processed by the system, and a statistical average of estimated device time delay can be computed to estimate device temperature.
    • 用于估计所选信号处理装置的处理时间延迟DELTAtd和装置的温度T的方法和系统。 选择的输入信号由包括所选设备的第一子系统和具有可控时延的第二子系统接收,产生第一和第二子系统输出信号。 将第一和第二子系统输出信号进行比较以估计所选设备的时间延迟。 已知关系T = f(DELTAtd)用于估计所选设备的温度并确定该温度是否高于许可或阈值设备工作温度。 具有相同或不同形状参数的第一和第二信号可以被系统处理,并且可以计算估计的装置时间延迟的统计平均值以估计装置温度。
    • 8. 发明授权
    • Reed-Solomon multiplication method
    • 里德 - 所罗门乘法
    • US06378105B1
    • 2002-04-23
    • US09317810
    • 1999-05-24
    • Kevin Chiang
    • Kevin Chiang
    • H03M1300
    • H03M13/6502H03M13/1515
    • A method for computing Reed-Solomon error control checkbytes in reduced time and with reduced gate count. Two syndromes, s0 and s1, are computed for a sequence of data elements, using a selected primitive a that satisfies a selected primitive polynomial relation p(&agr;)=0. Each of two checkbytes, c0 and c1, is expressed as a linear combination of the syndromes s0 and s1, where each coefficient of each linear combination is expressed as a single power of the primitive &agr;, which is stored at the checkbyte generator for multiple use. This approach reduces gate count and associated time delay in formation of the usual Reed-Solomon multiplier coefficients.
    • 一种减少时间和减少门数的Reed-Solomon错误控制码字的计算方法。 使用满足所选择的原始多项式关系p(α)= 0的所选择的原语a对于数据元素序列计算两个综合征s0和s1。 两个校验码c0和c1中的每一个被表示为校正子s0和s1的线性组合,其中每个线性组合的每个系数被表示为原始α的单个功率,其存储在多个使用的校验字生成器 。 这种方法减少了形成通常的里德 - 所罗门乘数系数时的门数和相关的时间延迟。
    • 9. 发明授权
    • Common gate and salicide word line process for low cost embedded DRAM devices
    • 用于低成本嵌入式DRAM器件的普通门和自杀字线工艺
    • US06207492B1
    • 2001-03-27
    • US09587466
    • 2000-06-05
    • Kuo-Chyuan TzengTse-Liang YingChen-Jong WangKevin Chiang
    • Kuo-Chyuan TzengTse-Liang YingChen-Jong WangKevin Chiang
    • H01L218242
    • H01L27/10894H01L27/10873
    • A process for forming logic devices with salicide shapes on gate structures, as well as on heavily doped source/drain regions, while simultaneously forming embedded DRAM devices with salicide shapes only on gate structures, has been developed. The process features silicon oxide blocking shapes, formed in the spaces between gate structures, in the embedded DRAM device region. The silicon oxide blocking shapes are formed using a high density plasma deposition procedure which deposits a thick silicon oxide layer in the narrow spaces between gate structures in the embedded DRAM device region, and a thin silicon oxide layer in the wider spaces between gate structures in the logic device region, and on the top surface of all gate structures. A blanket, dry etch procedure is then employed to remove the thin silicon oxide layers from the top surface of all gate structures, as well as from the spaces between gate structures in the logic device region, while forming the desired silicon oxide blocking shapes between gate structures in the embedded DRAM device region, therefore allowing subsequent salicide shapes to be formed only on the top surface of gate structures, and on heavily doped source/drain regions in the logic device region.
    • 已经开发了用于在栅极结构上以及重掺杂的源极/漏极区域上形成具有硅化物形状的逻辑器件的过程,同时仅在栅极结构上形成具有硅化物形状的嵌入式DRAM器件。 该工艺在嵌入式DRAM器件区域中具有形成在栅极结构之间的空间中的氧化硅阻挡形状。 使用高密度等离子体沉积方法形成氧化硅阻挡形状,该方法在嵌入式DRAM器件区域中的栅极结构之间的狭窄空间中沉积厚的氧化硅层,并且在栅极结构中的较宽空间中沉积薄的氧化硅层 逻辑器件区域,并在所有栅极结构的顶表面上。 然后采用全面的干蚀刻方法从所有栅极结构的顶表面以及逻辑器件区域中的栅极结构之间的空间中移除薄氧化硅层,同时在栅极之间形成期望的氧化硅阻挡形状 结构,因此允许仅在栅极结构的顶表面上以及在逻辑器件区域中的重掺杂的源/漏区上形成随后的自对准硅化物形状。