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1. 发明申请

WO2006128613A1 MICROLITHOGRAPHY PROJECTION OBJECTIVE 审中-公开
标题翻译：微观投影目标
公开(公告)号：WO2006128613A1
公开(公告)日：2006-12-07
申请号：PCT/EP2006/004876
申请日：2006-05-23
申请人： CARL ZEISS SMT AG , KALLER, Julian , DODOC, Aurelian , FELDMANN, Heiko , KAMENOV, Vladimir , EPPLE, Alexander
发明人： KALLER, Julian , DODOC, Aurelian , FELDMANN, Heiko , KAMENOV, Vladimir , EPPLE, Alexander
IPC分类号： G03F7/20
CPC分类号： G03F7/70225 , G02B17/08 , G03F7/702 , G03F7/70283 , G03F7/70941
摘要： Microlithography projection objectives for imaging into an image plane a pattern arranged in an object plane are described with respect to suppressing false light in such projection objectives.
摘要翻译：关于在这样的投影物镜中抑制假光，描述用于成像到平面中的布置在物体平面中的图案的微光刻投影物镜。

2. 发明申请

WO2007031544A1 OPTICAL SYSTEM OF A MICROLITHOGRAPHIC EXPOSURE SYSTEM 审中-公开
标题翻译：微波曝光系统的光学系统
公开(公告)号：WO2007031544A1
公开(公告)日：2007-03-22
申请号：PCT/EP2006/066332
申请日：2006-09-13
申请人： CARL ZEISS SMT AG , TOTZECK, Michael , BEDER, Susanne , CLAUSS, Wilfried , FELDMANN, Heiko , KRÄHMER, Daniel , DODOC, Aurelian
发明人： TOTZECK, Michael , BEDER, Susanne , CLAUSS, Wilfried , FELDMANN, Heiko , KRÄHMER, Daniel , DODOC, Aurelian
IPC分类号： G03F7/20
CPC分类号： G02B5/3083 , G02B27/286 , G03F7/70566 , G03F7/70966
摘要： An optical system, in particular an illumination system or a projection lens of a microlithographic exposure system, according to one aspect of the present invention has an optical system axis (OA) and at least one element group (200) consisting of three birefringent elements (211 ,212,213) each of which being made of optically uniaxial material and having an aspheric surface, wherein a first birefringent element (211 ) of said group has a first orientation of its optical crystal axis, a second birefringent element (212) of said group has a second orientation of its optical crystal axis, wherein said second orientation can be described as emerging from a rotation of said first orientation, said rotation not corresponding to a rotation around the optical system axis by an angle of 90° or an integer multiple thereof, and a third birefringent element (213) of said group has a third orientation of its optical crystal axis, wherein said third orientation can be described as emerging from a rotation of said second orientation said rotation not corresponding to a rotation around the optical system axis by an angle of 90° or an integer multiple thereof.
摘要翻译：根据本发明的一个方面的光学系统，特别是微光刻曝光系统的照明系统或投影透镜，具有光学系统轴（OA）和由三个双折射元件（200）组成的至少一个元件组（200） 211,212,213），其由光学单轴材料制成并具有非球面，其中所述组的第一双折射元件（211）具有其光学晶轴的第一取向，所述组的第二双折射元件（212）具有其光学晶轴的第二取向，其中所述第二取向可以被描述为从所述第一取向的旋转出来，所述旋转不对应于围绕光学系统轴的旋转90°的角度或其整数倍，并且所述组的第三双折射元件（213）具有其光学晶轴的第三取向，其中所述第三取向可以被描述为从所述第二方向的旋转，所述旋转不对应于围绕光学系统轴的旋转90°的角度或其整数倍。

3. 发明申请

WO2005111689A2 CATADIOPTRIC PROJECTION OBJECTIVE WITH INTERMEDIATE IMAGES 审中-公开
标题翻译：具有中间图像的目标投影
公开(公告)号：WO2005111689A2
公开(公告)日：2005-11-24
申请号：PCT/EP2005/005250
申请日：2005-05-13
申请人： CARL ZEISS SMT AG , DODOC, Aurelian , ULRICH, Wilhelm , EPPLE, Alexander
发明人： DODOC, Aurelian , ULRICH, Wilhelm , EPPLE, Alexander
IPC分类号： G02B17/08
CPC分类号： G03F7/70058 , G02B17/06 , G02B17/08 , G02B17/0804 , G02B17/0892 , G03F7/7015 , G03F7/70225 , G03F7/70275
摘要： A catadioptric projection objective for imaging of a pattern, which is arranged on the object plane of the projection objective, on the image plane of the projection objective has a first objective part for imaging of an object field to form a first real intermediate image, a second objective part for production of a second real intermediate image using the radiation coming from the first objective part; and a third objective part for imaging of the second real intermediate image on the image plane. The second objective part is a catadioptric objective part with a concave mirror. A first folding mirror for deflection of the radiation coming from the object plane in the direction of the concave mirror and a second folding mirror for deflection of the radiation coming from the concave mirror in the direction of the image plane are provided. A field lens with a positive refractive power is arranged between the first intermediate image and/or the first folding mirror and the concave mirror, in an area close to the field of the first intermediate image.
摘要翻译：用于对投影物镜的物平面上配置的图案进行成像的反折射投射物镜具有用于对物场进行成像以形成第一实际中间图像的第一物镜部分，使用来自第一目标部分的辐射来生成第二实际中间图像的第二目标部分; 以及用于在图像平面上成像第二实际中间图像的第三目标部分。第二个目标部分是具有凹面镜的反射折射物镜部分。提供了用于使来自物体平面的辐射在凹面镜的方向上偏转的第一折叠镜和用于在像面方向偏转来自凹面镜的辐射的第二折叠镜。在第一中间图像和/或第一折叠镜和凹面镜之间，在靠近第一中间图像的场的区域内布置具有正屈光力的场透镜。

4. 发明申请

WO2005096098A2 PROJECTION OBJECTIVE, PROJECTION EXPOSURE APPARATUS AND REFLECTIVE RETICLE FOR MICROLITHOGRAPHY 审中-公开
标题翻译：投影目标，投影曝光装置和反射镜
公开(公告)号：WO2005096098A2
公开(公告)日：2005-10-13
申请号：PCT/EP2005/002898
申请日：2005-03-18
申请人： CARL ZEISS SMT AG , DODOC, Aurelian , ULRICH, Wilhelm , BADER, Dieter , EPPLE, Alexander
发明人： DODOC, Aurelian , ULRICH, Wilhelm , BADER, Dieter , EPPLE, Alexander
IPC分类号： G03F
CPC分类号： G03F7/70291 , G03F7/70225 , G03F7/70283
摘要： A projection objective for microlithography serves for imaging a pattern of a mask arranged in its object surface into an image field arranged in its image surface with a demagnifying imaging scale. It has a multiplicity of optical elements arranged along the optical axis of the projection objective, the optical elements being designed and arranged in such a way that the projection objective has an imageside numerical aperture NA > 0.85 and a demagnifying imaging scale where |b|
摘要翻译：用于微光刻的投影物镜用于将布置在其物体表面中的掩模的图案成像成具有缩小的成像刻度的布置在其图像表面中的图像场。它具有沿着投影物镜的光轴布置的多个光学元件，光学元件被设计和布置成使得投影物镜具有图像数值孔径NA> 0.85和缩小成像刻度，其中|| b | | <0.05，并且具有适合于大于1mm的微光刻的最小图像场直径的平面图像场。

5. 发明申请

WO2005040890A2 CATADIOPTRIC PROJECTION OBJECTIVE 审中-公开
标题翻译：目标投标
公开(公告)号：WO2005040890A2
公开(公告)日：2005-05-06
申请号：PCT/EP2004/011587
申请日：2004-10-15
申请人： CARL ZEISS SMT AG , SHAFER, David , DODOC, Aurelian , EPPLE, Alexander , ULRICH, Wilhelm , SCHUSTER, Karl-Heinz
发明人： SHAFER, David , DODOC, Aurelian , EPPLE, Alexander , ULRICH, Wilhelm , SCHUSTER, Karl-Heinz
IPC分类号： G02B17/08
CPC分类号： G02B17/0892 , G02B17/0812 , G03F7/70225 , G03F7/70275
摘要： A catadioptric projection objective for projecting a pattern arranged in the object plane of the projection objective into the image plane of the projection objective, having: a first objective part for projecting an object field lying in the object plane into a first real intermediate image; a second objective part for generating a second real intermediate image with the radiation coming from the first objective part; a third objective part for generating a third real intermediate image with the radiation coming from the second objective part; and a fourth objective part for projecting the third real intermediate image into the image plane.
摘要翻译：一种反折射投射物镜，用于将布置在投影物镜的物平面中的图案投影到投影物镜的像平面中，具有：第一物镜部分，用于将物平面中的物场投射到第一实际中间像中; 第二目标部分，用于利用来自第一目标部分的辐射产生第二实际中间图像; 第三目标部分，用于利用来自第二目标部分的辐射产生第三实际中间图像; 以及用于将第三实际中间图像投影到图像平面中的第四目标部分。

6. 发明申请

WO2007131161A3 SYMMETRICAL OBJECTIVE HAVING FOUR LENS GROUPS FOR MICROLITHOGRAPHY 审中-公开
公开(公告)号：WO2007131161A3
公开(公告)日：2007-11-15
申请号：PCT/US2007/068227
申请日：2007-05-04
申请人： CARL ZEISS SMT AG , SHAFER, David , DODOC, Aurelian , FELDMANN,, Heiko , ZELLNER, Johannes , ULRICH, Wilhelm , WALTER, Holger , LOERING, Ulrich , KRAEHMER, Daniel , FUERTER, Gerhard
发明人： SHAFER, David , DODOC, Aurelian , FELDMANN,, Heiko , ZELLNER, Johannes , ULRICH, Wilhelm , WALTER, Holger , LOERING, Ulrich , KRAEHMER, Daniel , FUERTER, Gerhard
IPC分类号： G02B13/14 , G02B13/26 , G03F7/20
摘要： The invention features a system for microlithography that includes a mercury light source configured to emit radiation at multiple mercury emission lines, a projection objective positioned to receive radiation emitted by the mercury light source, and a stage configured to position a wafer relative to the projection objective. During operation, the projection objective directs radiation from the light source to the wafer, where the radiation at the wafer includes energy from more than one of the emission lines. Optical lens systems for use in said projection objective comprise four lens groups, each having two lenses comprising silica, the first and second lens groups on one hand and the third and fourth lens groups on the other hand are positioned symmetrically with respect to a plane perpendicular to the optical axis of said lens system.

7. 发明申请

WO2007003563A1 PROJEKTIONSBELICHTUNGSANLAGE MIT EINER MEHRZAHL VON PROJEKTIONSOBJEKTIVEN 审中-公开
标题翻译：与投射物镜的NUMBER投射曝光系统，
公开(公告)号：WO2007003563A1
公开(公告)日：2007-01-11
申请号：PCT/EP2006/063663
申请日：2006-06-28
申请人： CARL ZEISS SMT AG , DODOC, Aurelian , ULRICH, Wilhelm , FELDMANN, Heiko
发明人： DODOC, Aurelian , ULRICH, Wilhelm , FELDMANN, Heiko
IPC分类号： G03F7/20
CPC分类号： G03F7/70275 , G03F7/70791
摘要： Die Erfindung betrifft eine Projektionsbelichtungsanlage (1) mit einer Mehrzahl von Projektionsobjektiven (10) , von denen jedes ein Objektfeld (50) in ein Bildfeld (60) abbildet. Die Bildfelder (60) sind in einem Substratbereich (40) in einer Substratebene angeordnet, wobei der Substratbereich (40) in einer vorbestimmten Scanrichtung (5) relativ zu der Mehrzahl von Projektionsobjektiven bewegbar ist, wobei wenigstens eines dieser Projektionsobjektive einen Teilabschnitt seiner optischen Achse aufweist, welcher nicht senkrecht zu der Substratebene verläuft und wobei die Projektion dieses Teilabschnitts in die Substratebene nicht parallel zur Scanrichtung (5) verläuft .
摘要翻译：本发明涉及的投射曝光设备（1），具有多个投影透镜（10），其中的每一个都是一个对象字段（50）映射到像场（60）。画面（60）被布置在基板平面的衬底区（40），其中，在预定的扫描方向（5）的衬底区（40）是相对于所述多个投影透镜可动，具有其光轴的一部分这些投影透镜，其中至少一个这是不垂直于基片平面和该部分段的突出部不平行于基板平面的扫描方向（5）。

8. 发明申请

WO2006131242A1 MULTIPLE-USE PROJECTION SYSTEM 审中-公开
标题翻译：多用途投影系统
公开(公告)号：WO2006131242A1
公开(公告)日：2006-12-14
申请号：PCT/EP2006/005168
申请日：2006-05-31
申请人： CARL ZEISS SMT AG , KAISER, Winfried , ULRICH, Wilhelm , FELDMANN, Heiko , DODOC, Aurelian
发明人： KAISER, Winfried , ULRICH, Wilhelm , FELDMANN, Heiko , DODOC, Aurelian
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03F7/70066 , G03F7/7025
摘要： In the case of a projection exposure method for exposing substrates, arranged in the region of an image plane of a projection objective, with at least one image of a pattern, arranged in the region of an object plane of the projection objective, of a mask, a first exposure configuration is optionally set for exposing a substrate given a first image-side numerical aperture NA1 in a first image field with a first image field size IFS1, or a second exposure configuration is optionally set for exposing substrates given a second image-side numerical aperture NA2, differing from the first image-side numerical aperture NA1, in a second image field with a second image field size IFS2 differing from the first image field size.
摘要翻译：在曝光基板的投影曝光方法的情况下，其布置在投影物镜的像面的区域中，具有布置在投影物镜的物平面的区域中的图案的至少一个图像的掩模可选地，第一曝光配置被设置用于在具有第一图像场尺寸IFS1的第一图像场中暴露给定第一图像侧数值孔径NA1的基板，或者可选地设置第二曝光配置以曝光给定第二图像 - 在与第一图像场尺寸不同的第二图像场尺寸IFS2的第二图像场中，与第一图像侧数值孔径NA1不同的边侧数值孔径NA2。

9. 发明申请

WO2006114294A3 ILLUMINATION SYSTEM FOR A MICROLITHGRAPHIC EXPOSURE APPARATUS 审中-公开
公开(公告)号：WO2006114294A3
公开(公告)日：2006-11-02
申请号：PCT/EP2006/003864
申请日：2006-04-26
申请人： CARL ZEISS SMT AG , SOHMER, Alexander , DODOC, Aurelian , FELDMANN, Heiko , ULRICH, Wilhelm , FÜRTER, Gerhard , EGGER, Rafael , MÖGELE, Artur , RAUM, Michael
发明人： SOHMER, Alexander , DODOC, Aurelian , FELDMANN, Heiko , ULRICH, Wilhelm , FÜRTER, Gerhard , EGGER, Rafael , MÖGELE, Artur , RAUM, Michael
IPC分类号： G02B19/00 , G02B13/14 , G03F7/20
摘要： An illumination system (12) of a microlithographic exposure apparatus (10) comprises a condenser (601; 602; 603; 604; 605; 606) for transforming a pupil plane (54) into a field plane (62) . The condenser has a lens group (L14, L15, L16, L17; L24, L25, L26, L27, L28; L34, L35, L36, L37; L44, L45, L46; L53, L54, L55) that contains a plurality of consecutive lenses. These lenses are arranged such that a light bundle (70) focused by the condenser (601; 602; 603; 604; 605) on an on-axis field point (72) converges within each lens of the lens group. At least one lens (L15, L16, L17; L25, L26; L34, L44, L45; L54) of the lens group has a concave surface. The illumination system may further comprise a field stop objective (66; 666, 666') that at least partly corrects a residual pupil aberration of the condenser (601; 602; 603; 604; 605; 606).

10. 发明申请

WO2006005547A1 CATADIOPTRIC PROJECTION OBJECTIVE 审中-公开
标题翻译：目标投影目标
公开(公告)号：WO2006005547A1
公开(公告)日：2006-01-19
申请号：PCT/EP2005/007431
申请日：2005-07-08
申请人： CARL ZEISS SMT AG , SHAFER, David , ULRICH, Wilhelm , DODOC, Aurelian , VON BÜNAU, Rudolf , MANN, Hans-Jürgen , EPPLE, Alexander , BEDER, Susanne , SINGER, Wolfgang
发明人： SHAFER, David , ULRICH, Wilhelm , DODOC, Aurelian , VON BÜNAU, Rudolf , MANN, Hans-Jürgen , EPPLE, Alexander , BEDER, Susanne , SINGER, Wolfgang
IPC分类号： G03F7/00 , G02B17/00 , G02B17/08
CPC分类号： G02B17/0892 , G02B17/0828 , G03F7/70225 , G03F7/70275 , G03F7/70341
摘要： A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective has a first, refractive objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part including at least one concave mirror for imaging the first intermediate imaging into a second intermediate image; and a third, refractive objective part for imaging the second intermediate imaging onto the image plane; wherein the projection objective has a maximum lens diameter D max , a maximum image field height Y', and an image side numerical aperture NA; wherein COMP1 = D max / (Y' • NA 2 ) and wherein the condition COMP1
摘要翻译：用于将设置在投影物镜的物平面中的图案成像到投影物镜的像平面上的折反射投射物镜具有用于将设置在物平面中的图案成像为第一中间图像的第一折射目标部分; 第二目标部分，其包括用于将第一中间成像成像成第二中间图像的至少一个凹面镜; 以及第三折射物镜部分，用于将所述第二中间成像成像到所述图像平面上; 其中所述投影物镜具有最大透镜直径D

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