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1. 发明申请

WO2005040890A2 CATADIOPTRIC PROJECTION OBJECTIVE 审中-公开
标题翻译：目标投标
公开(公告)号：WO2005040890A2
公开(公告)日：2005-05-06
申请号：PCT/EP2004/011587
申请日：2004-10-15
申请人： CARL ZEISS SMT AG , SHAFER, David , DODOC, Aurelian , EPPLE, Alexander , ULRICH, Wilhelm , SCHUSTER, Karl-Heinz
发明人： SHAFER, David , DODOC, Aurelian , EPPLE, Alexander , ULRICH, Wilhelm , SCHUSTER, Karl-Heinz
IPC分类号： G02B17/08
CPC分类号： G02B17/0892 , G02B17/0812 , G03F7/70225 , G03F7/70275
摘要： A catadioptric projection objective for projecting a pattern arranged in the object plane of the projection objective into the image plane of the projection objective, having: a first objective part for projecting an object field lying in the object plane into a first real intermediate image; a second objective part for generating a second real intermediate image with the radiation coming from the first objective part; a third objective part for generating a third real intermediate image with the radiation coming from the second objective part; and a fourth objective part for projecting the third real intermediate image into the image plane.
摘要翻译：一种反折射投射物镜，用于将布置在投影物镜的物平面中的图案投影到投影物镜的像平面中，具有：第一物镜部分，用于将物平面中的物场投射到第一实际中间像中; 第二目标部分，用于利用来自第一目标部分的辐射产生第二实际中间图像; 第三目标部分，用于利用来自第二目标部分的辐射产生第三实际中间图像; 以及用于将第三实际中间图像投影到图像平面中的第四目标部分。

2. 发明申请

WO2006005547A1 CATADIOPTRIC PROJECTION OBJECTIVE 审中-公开
标题翻译：目标投影目标
公开(公告)号：WO2006005547A1
公开(公告)日：2006-01-19
申请号：PCT/EP2005/007431
申请日：2005-07-08
申请人： CARL ZEISS SMT AG , SHAFER, David , ULRICH, Wilhelm , DODOC, Aurelian , VON BÜNAU, Rudolf , MANN, Hans-Jürgen , EPPLE, Alexander , BEDER, Susanne , SINGER, Wolfgang
发明人： SHAFER, David , ULRICH, Wilhelm , DODOC, Aurelian , VON BÜNAU, Rudolf , MANN, Hans-Jürgen , EPPLE, Alexander , BEDER, Susanne , SINGER, Wolfgang
IPC分类号： G03F7/00 , G02B17/00 , G02B17/08
CPC分类号： G02B17/0892 , G02B17/0828 , G03F7/70225 , G03F7/70275 , G03F7/70341
摘要： A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective has a first, refractive objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part including at least one concave mirror for imaging the first intermediate imaging into a second intermediate image; and a third, refractive objective part for imaging the second intermediate imaging onto the image plane; wherein the projection objective has a maximum lens diameter D max , a maximum image field height Y', and an image side numerical aperture NA; wherein COMP1 = D max / (Y' • NA 2 ) and wherein the condition COMP1
摘要翻译：用于将设置在投影物镜的物平面中的图案成像到投影物镜的像平面上的折反射投射物镜具有用于将设置在物平面中的图案成像为第一中间图像的第一折射目标部分; 第二目标部分，其包括用于将第一中间成像成像成第二中间图像的至少一个凹面镜; 以及第三折射物镜部分，用于将所述第二中间成像成像到所述图像平面上; 其中所述投影物镜具有最大透镜直径D

3. 发明申请

WO2005069055A2 CATADIOPTRIC PROJECTION OBJECTIVE 审中-公开
标题翻译：目标投影目标
公开(公告)号：WO2005069055A2
公开(公告)日：2005-07-28
申请号：PCT/EP2005/000262
申请日：2005-01-13
申请人： CARL ZEISS SMT AG , SHAFER, David , ULRICH, Wilhelm , DODOC, Aurelian , VON BÜNAU, Rudolf , MANN, Hans-Jürgen , EPPLE, Alexander
发明人： SHAFER, David , ULRICH, Wilhelm , DODOC, Aurelian , VON BÜNAU, Rudolf , MANN, Hans-Jürgen , EPPLE, Alexander
IPC分类号： G02B17/00
CPC分类号： G03F7/70958 , G02B13/22 , G02B17/0812 , G02B17/0892 , G03F7/70225 , G03F7/70275 , G03F7/70341 , G03F7/70966
摘要： A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective comprises: a first objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part for imaging the first intermediate imaging into a second intermediate image; a third objective part for imaging the second intermediate imaging directly onto the image plane; wherein a first concave mirror having a first continuous mirror surface and at least one second concave mirror having a second continuous mirror surface are arranged upstream of the second intermediate image; pupil surfaces are formed between the object plane and the first intermediate image, between the first and the second intermediate image and between the second intermediate image and the image plane; and all concave mirrors are arranged optically remote from a pupil surface. The system has potential for very high numerical apertures at moderate lens material mass consumption.
摘要翻译：用于将设置在投影物镜的物平面中的图案成像到投影物镜的像平面上的反射折射投射物镜包括：用于将设置在物平面中的图案成像为第一中间图像的第一物镜部分; 第二目标部分，用于将第一中间成像成像成第二中间图像; 用于将第二中间成像直接成像到图像平面上的第三目标部分; 其中具有第一连续镜面的第一凹面镜和具有第二连续镜面的至少一个第二凹面镜布置在所述第二中间图像的上游; 瞳孔表面形成在物平面与第一中间图像之间，第一和第二中间图像之间以及第二中间图像与图像平面之间; 并且所有凹面反射镜光学地远离光瞳表面布置。该系统具有中等透镜材料质量消耗的非常高的数值孔径的潜力。

4. 发明申请

WO2004107048A2 MIKROLITHOGRAPHISCHE PROJEKTIONSBELICHTUNGSANLAGE 审中-公开
标题翻译：微光刻投射曝光设备
公开(公告)号：WO2004107048A2
公开(公告)日：2004-12-09
申请号：PCT/EP2004/005816
申请日：2004-05-28
申请人： CARL ZEISS SMT AG , DODOC, Aurelian , SCHUSTER, Karl, Heinz , MALLMANN, Jörg , ULRICH, Wilhelm , ROSTALKSI, Hans-Jürgen
发明人： DODOC, Aurelian , SCHUSTER, Karl, Heinz , MALLMANN, Jörg , ULRICH, Wilhelm , ROSTALKSI, Hans-Jürgen
IPC分类号： G03F7/00
CPC分类号： G03F7/7015 , G03F7/70241 , G03F7/70341 , G03F7/70833 , G03F7/70916 , G03F7/70975 , G03F7/70983
摘要： Eine mikrolithographische Projektionsbelichtungsanlage enthält eine Beleuchtungseinrichtung (12) zur Erzeugung von Projektionslicht (13) und ein Projektionsobjektiv (20; 220; 320; 420; 520; 620; 720; 820; 920; 1020; 1120), mit dem ein in einer Objektebene (22) des Projektionsobjektivs anordenbares Retikel (24) auf eine in einer Bildebene (28) des Projektionsobjektivs anordenbare lichtempfindliche Schicht (26) abbildbar ist. Das Projektionsobjektiv ist für einen Immersionsbetrieb ausgelegt, bei dem eine bildseitig letzte Linse (L5; L205; L605; L705; L805; L905; L1005; L1105) des Projektionsobjektivs in eine Immersionsflüssigkeit (34; 334a; 434a; 534a) eintaucht. Ein für das Projektionslicht (13) durchlässiges Abschlusselement (44; 244; 444; 544; 644; 744; 844; 944; 1044; 1144) ist zwischen der bildseitig letzten Linse und der lichtempfindlichen Schicht derart befestigt.
摘要翻译：的微光刻投射曝光设备包括用于产生投射光（13）和投射物镜的照明装置（12）（20; 220; 320; 420; 520; 620; 720; 820; 920; 1020; 1120），与（在物平面 22），其可以在一个被布置光罩（24），投影透镜（在投射物镜的像平面28）可以布置光敏层（26）可以被成像。投影物镜设计用于浸没操作，其中的像侧最后透镜（L5，L205; L605，L705，L805; L905，L1005，L1105）中的浸没液体投影透镜（34; 334A; 434A; 534A）浸入。一种用于投影（13）透过的封闭元件的光（44; 244; 444; 544; 644; 744; 844; 944; 1044; 1144）被固定的像侧最后透镜和以这样的方式在光敏感层之间。

5. 发明申请

WO2005111689A2 CATADIOPTRIC PROJECTION OBJECTIVE WITH INTERMEDIATE IMAGES 审中-公开
标题翻译：具有中间图像的目标投影
公开(公告)号：WO2005111689A2
公开(公告)日：2005-11-24
申请号：PCT/EP2005/005250
申请日：2005-05-13
申请人： CARL ZEISS SMT AG , DODOC, Aurelian , ULRICH, Wilhelm , EPPLE, Alexander
发明人： DODOC, Aurelian , ULRICH, Wilhelm , EPPLE, Alexander
IPC分类号： G02B17/08
CPC分类号： G03F7/70058 , G02B17/06 , G02B17/08 , G02B17/0804 , G02B17/0892 , G03F7/7015 , G03F7/70225 , G03F7/70275
摘要： A catadioptric projection objective for imaging of a pattern, which is arranged on the object plane of the projection objective, on the image plane of the projection objective has a first objective part for imaging of an object field to form a first real intermediate image, a second objective part for production of a second real intermediate image using the radiation coming from the first objective part; and a third objective part for imaging of the second real intermediate image on the image plane. The second objective part is a catadioptric objective part with a concave mirror. A first folding mirror for deflection of the radiation coming from the object plane in the direction of the concave mirror and a second folding mirror for deflection of the radiation coming from the concave mirror in the direction of the image plane are provided. A field lens with a positive refractive power is arranged between the first intermediate image and/or the first folding mirror and the concave mirror, in an area close to the field of the first intermediate image.
摘要翻译：用于对投影物镜的物平面上配置的图案进行成像的反折射投射物镜具有用于对物场进行成像以形成第一实际中间图像的第一物镜部分，使用来自第一目标部分的辐射来生成第二实际中间图像的第二目标部分; 以及用于在图像平面上成像第二实际中间图像的第三目标部分。第二个目标部分是具有凹面镜的反射折射物镜部分。提供了用于使来自物体平面的辐射在凹面镜的方向上偏转的第一折叠镜和用于在像面方向偏转来自凹面镜的辐射的第二折叠镜。在第一中间图像和/或第一折叠镜和凹面镜之间，在靠近第一中间图像的场的区域内布置具有正屈光力的场透镜。

6. 发明申请

WO2005096098A2 PROJECTION OBJECTIVE, PROJECTION EXPOSURE APPARATUS AND REFLECTIVE RETICLE FOR MICROLITHOGRAPHY 审中-公开
标题翻译：投影目标，投影曝光装置和反射镜
公开(公告)号：WO2005096098A2
公开(公告)日：2005-10-13
申请号：PCT/EP2005/002898
申请日：2005-03-18
申请人： CARL ZEISS SMT AG , DODOC, Aurelian , ULRICH, Wilhelm , BADER, Dieter , EPPLE, Alexander
发明人： DODOC, Aurelian , ULRICH, Wilhelm , BADER, Dieter , EPPLE, Alexander
IPC分类号： G03F
CPC分类号： G03F7/70291 , G03F7/70225 , G03F7/70283
摘要： A projection objective for microlithography serves for imaging a pattern of a mask arranged in its object surface into an image field arranged in its image surface with a demagnifying imaging scale. It has a multiplicity of optical elements arranged along the optical axis of the projection objective, the optical elements being designed and arranged in such a way that the projection objective has an imageside numerical aperture NA > 0.85 and a demagnifying imaging scale where |b|
摘要翻译：用于微光刻的投影物镜用于将布置在其物体表面中的掩模的图案成像成具有缩小的成像刻度的布置在其图像表面中的图像场。它具有沿着投影物镜的光轴布置的多个光学元件，光学元件被设计和布置成使得投影物镜具有图像数值孔径NA> 0.85和缩小成像刻度，其中|| b | | <0.05，并且具有适合于大于1mm的微光刻的最小图像场直径的平面图像场。

7. 发明申请

WO2005098505A1 CATADIOPTRIC PROJECTION OBJECTIVE WITH MIRROR GROUP 审中-公开
标题翻译：目标与镜子集团的目标投影
公开(公告)号：WO2005098505A1
公开(公告)日：2005-10-20
申请号：PCT/EP2005/003645
申请日：2005-04-07
申请人： CARL ZEISS SMT AG , EPPLE, Alexander , ULRICH, Wilhelm , DODOC, Aurelian
发明人： EPPLE, Alexander , ULRICH, Wilhelm , DODOC, Aurelian
IPC分类号： G02B17/08
CPC分类号： G02B17/0804 , G02B17/0808 , G02B17/0812 , G02B17/0816 , G02B17/0836 , G02B17/0844 , G02B17/0848 , G02B17/086 , G02B17/0892 , G03F7/70058 , G03F7/70225 , G03F7/70275 , G03F7/70341
摘要： A catadioptric projection objective for imaging an off-axis object field arranged in an object surface of the projection objective onto an off-axis image field arranged in an image surface of the projection objective has a front lens group, a mirror group comprising four mirrors and having an object side mirror group entry, an image side mirror group exit, and a mirror group plane aligned transversely to the optical axis and arranged geometrically between the mirror group entry and the mirror group exit; and a rear lens group. The mirrors of the mirror group are arranged such that at least one intermediate image is positioned inside the mirror group between mirror group entry and mirror group exit, and that radiation coming from the mirror group entry passes at least four times through the mirror group plane and is reflected at least twice on a concave mirror surface of the mirror group prior to exiting the mirror group at the mirror group exit. The mirror group entry is positioned in a region where radiation exiting the front lens group has an entry chief ray height. A second reflecting area is positioned in a region where radiation impinging on the second mirror has a second chief ray height deviating from the entry chief ray height in a first direction; and a fourth reflecting area is positioned in a region where radiation impinging on the fourth mirror has a fourth chief ray height deviating from the entry chief ray height in a second direction opposite to the first direction.
摘要翻译：用于将布置在投影物镜的物体表面中的离轴物体场成像到布置在投影物镜的图像表面中的离轴图像场的反射折射投影物镜具有前透镜组，包括四个反射镜的镜组和具有物体侧反射镜组入口，图像侧反射镜组出口和反射镜组平面，其横向于光轴对准并且几何地布置在反射镜组入口和反射镜组出口之间; 和后透镜组。反射镜组的镜子被布置成使得至少一个中间图像位于反射镜组入口和反射镜组出口之间的反射镜组内，并且来自镜组入口的辐射至少穿过镜组平面四次，在镜组出口处离开镜组之前，在镜组的凹面镜面上反射至少两次。反射镜组入口位于离开前透镜组的辐射具有入射主光线高度的区域中。第二反射区域位于辐射入射在第二反射镜上的第一主光线高度偏离第一方向上的入射光线高度的区域中; 并且第四反射区域位于与第一反射镜相反的第二方向上具有偏离入射光线高度的第四主光线高度的入射在第四反射镜上的辐射区域。

8. 发明申请

WO2005054956A3 PROJECTION OPTICAL SYSTEM 审中-公开
公开(公告)号：WO2005054956A3
公开(公告)日：2005-06-16
申请号：PCT/EP2004/013519
申请日：2004-11-25
申请人： CARL ZEISS SMT AG , ROSTALSKI, Hans-Jürgen , DODOC, Aurelian , ULRICH, Wilhelm , EPPLE, Alexander
发明人： ROSTALSKI, Hans-Jürgen , DODOC, Aurelian , ULRICH, Wilhelm , EPPLE, Alexander
IPC分类号： G03F7/20
摘要： A projection optical system comprises a plurality of lenses disposed along an optical axis of the projection optical system; wherein the plurality of lenses is dividable into four non-overlapping groups of lenses of positive and negative refractive powers, wherein the following relation (1) is fulfilled: (1) wherein: y is half a diameter in mm of a maximum image field imaged by the projection optical system, NA is a maximum numerical aperture on a side of the second object, φ i is a refractive power in mm -1 of the i th lens, k is a total number of lenses of the projection optical system, and wherein V 1 is greater than 0.045.

9. 发明申请

WO2007131161A3 SYMMETRICAL OBJECTIVE HAVING FOUR LENS GROUPS FOR MICROLITHOGRAPHY 审中-公开
公开(公告)号：WO2007131161A3
公开(公告)日：2007-11-15
申请号：PCT/US2007/068227
申请日：2007-05-04
申请人： CARL ZEISS SMT AG , SHAFER, David , DODOC, Aurelian , FELDMANN,, Heiko , ZELLNER, Johannes , ULRICH, Wilhelm , WALTER, Holger , LOERING, Ulrich , KRAEHMER, Daniel , FUERTER, Gerhard
发明人： SHAFER, David , DODOC, Aurelian , FELDMANN,, Heiko , ZELLNER, Johannes , ULRICH, Wilhelm , WALTER, Holger , LOERING, Ulrich , KRAEHMER, Daniel , FUERTER, Gerhard
IPC分类号： G02B13/14 , G02B13/26 , G03F7/20
摘要： The invention features a system for microlithography that includes a mercury light source configured to emit radiation at multiple mercury emission lines, a projection objective positioned to receive radiation emitted by the mercury light source, and a stage configured to position a wafer relative to the projection objective. During operation, the projection objective directs radiation from the light source to the wafer, where the radiation at the wafer includes energy from more than one of the emission lines. Optical lens systems for use in said projection objective comprise four lens groups, each having two lenses comprising silica, the first and second lens groups on one hand and the third and fourth lens groups on the other hand are positioned symmetrically with respect to a plane perpendicular to the optical axis of said lens system.

10. 发明申请

WO2005015316A3 PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY 审中-公开
公开(公告)号：WO2005015316A3
公开(公告)日：2005-02-17
申请号：PCT/EP2004/008220
申请日：2004-07-23
申请人： CARL ZEISS SMT AG , BEIERL, Helmut , SHAFER, David , EPPLE, Alexander , ULRICH, Wilhelm
发明人： SHAFER, David , EPPLE, Alexander , ULRICH, Wilhelm
IPC分类号： G03F7/20
摘要： A projection objective for projecting a pattern of a mask arranged in an object plane of the projection objective into an image plane of the projection objective has a pupil surface (11) near the image plane, a radiance transformation group (100) that is arranged at a distance upstream of the image plane (4); and an aperture-generating group (200) arranged downstream of the radiance transformation group. The radiance transformation group is designed to transform an input radiance distribution with a uniform angular radiance that is substantially independent of beam height into an output radiance distribution with a nonuniform angular radiance that is dependent on beam height, wherein the angular radiance decreases with increasing beam height, at least in a region near a maximum beam height. The output radiance distribution is adapted to beam guidance properties of the aperture-generating group in such a way that the sine condition is substantially fulfilled in the image plane for all beams of the input light distribution.

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