专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

WO2009132756A1 ILLUMINATION OPTICS FOR EUV MICROLITHOGRAPHY AND ILLUMINATION SYSTEM AND PROJECTION EXPOSURE APPARATUS COMPRISING AN ILLUMINATION OPTICS OF THIS TYPE 审中-公开
标题翻译：用于EUV微结构和照明系统的照明光学和包含这种类型的照明光学的投影曝光装置
公开(公告)号：WO2009132756A1
公开(公告)日：2009-11-05
申请号：PCT/EP2009/002584
申请日：2009-04-08
申请人： CARL ZEISS SMT AG , FIOLKA, Damian , WARM, Berndt , STEIGERWALD, Christian , ENDRES, Martin , STÜTZLE, Ralf , OSSMANN, Jens , SCHARNWEBER, Ralf , HAUF, Markus , DINGER, Udo , WALDIS, Severin , KIRCH, Marc , HARTJES, Joachim
发明人： FIOLKA, Damian , WARM, Berndt , STEIGERWALD, Christian , ENDRES, Martin , STÜTZLE, Ralf , OSSMANN, Jens , SCHARNWEBER, Ralf , HAUF, Markus , DINGER, Udo , WALDIS, Severin , KIRCH, Marc , HARTJES, Joachim
IPC分类号： G03F7/20
CPC分类号： G03F7/70191 , G03F7/70083
摘要： An illumination optics for EUV microlithography serves for guiding an illumination light bundle from a radiation source to an object field with an extension ratio between a longer field dimension (x) and a shorter field dimension (y), the ratio being considerably greater than 1. A field facet mirror (13) has a plurality of field facets (19) for setting defined illumination conditions in the object field. A following optics downstream of the field facet mirror (13) serves for transmitting the illumination light into the object field (5). The following optics comprises a pupil facet mirror (14) with a plurality of pupil facets (27). The field facets (19) are in each case individually allocated to the pupil facets (27) so that portions of the illumination light bundle (10) impinging upon in each case one of the field facets (19) are guided on to the object field (5) via the associated pupil facet (27). The field facet mirror (13) not only comprises a plurality of basic illumination field facets (19 G ) which provide a basic illumination of the object field (5) via associated basic illumination pupil facets (27 G ) but also a plurality of correction illumination field facets (19 K ) which provide for a correction of the illumination of the object field (5) via associated correction illumination pupil facets (27 K ). The result is an illumination optics which allows unwanted variations of illumination parameters, for instance an illumination intensity distribution or an illumination angle distribution, to be corrected across the object field.
摘要翻译：用于EUV微光刻的照明光学器件用于将照明光束从辐射源引导到物场，其具有在较长场尺寸（x）和较短场尺寸（y）之间的延伸比，该比率远大于1。场面反射镜（13）具有多个场面（19），用于在对象场中设定定义的照明条件。场面反射镜（13）下游的跟随光学器件用于将照明光发射到物场（5）中。以下光学器件包括具有多个光瞳面（27）的光瞳小面镜（14）。场分面（19）在每种情况下分别被分配给光瞳面（27），使得照射光束（10）中的每一个场景面（19）中的一个照射的部分被引导到物场（5）通过相关联的光瞳面（27）。场面反射镜（13）不仅包括通过相关联的基本照明光瞳（27G）提供对象场（5）的基本照明的多个基本照明场面（19G），而且还包括多个校正照明场面（19K），其经由相关联的校正照明光瞳面（27K）提供对物场（5）的照明的校正。结果是照明光学元件允许在整个对象场校正照明参数的不期望的变化，例如照明强度分布或照明角度分布。

2. 发明申请

WO2006131517A2 BELEUCHTUNGSEINRICHTUNG EINER MIKROLITHOGRAPHISCHEN PROJEKTIONSBELICHTUNGSANLAGE 审中-公开
标题翻译：点亮的微光刻投射曝光设备
公开(公告)号：WO2006131517A2
公开(公告)日：2006-12-14
申请号：PCT/EP2006/062929
申请日：2006-06-06
申请人： CARL ZEISS SMT AG , FIOLKA, Damian , TOTZECK, Michael , SCHARNWEBER, Ralf , ZENKE, Jörg
发明人： FIOLKA, Damian , TOTZECK, Michael , SCHARNWEBER, Ralf , ZENKE, Jörg
IPC分类号： G03F7/20
CPC分类号： G03F7/70566 , G03F7/70075
摘要： Die vorliegende Erfindung betrifft eine Beleuchtungseinrichtung einer mikrolithographischen Projektionsbelichtungsanlage, in welcher eine Vorzugsrichtung der Polarisation weitgehend oder vollständig eliminiert werden kann. Die Beleuchtungseinrichtung weist eine Lichtquelle (135), welche entlang einer Lichtausbreitungsrichtung sich ausbreitendes, im Wesentlichen linear polarisiertes Licht erzeugt, ein Lichtmischsystem (148), einen Depolarisator (10, 30, 40), welcher in Lichtausbreitungsrichtung vor dem Lichtmischsystem (148) angeordnet ist und in Verbindung mit dem Lichtmischsystem (148) in einer Beleuchtungsebene zumindest zum Teil eine effektive Depolarisation bewirkt, und eine Lambda/4-Platte (20), welche in der Lichtausbreitungsrichtung nach dem Depolarisator (10, 30, 40) angeordnet ist, auf.
摘要翻译：本发明涉及微光刻投射曝光设备的照明系统，其中偏振的优选方向可以是基本上或完全消除。该照明装置包括沿着光传播方向上传播的光源（135），产生大致线性偏振光，光混合系统（148），其在所述光混合系统的前面布置在光传播方向上的消偏振器（10，30，40）（148）和至少部分地导致有效的去极化结合在照明平面上的光混合系统（148），并且在该解偏光器的下游的光的传播方向的λ/ 4板（20）（10，30，40）布置在。

3. 发明申请

WO2007093396A1 ILLUMINATION SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
标题翻译：微波投影曝光装置照明系统
公开(公告)号：WO2007093396A1
公开(公告)日：2007-08-23
申请号：PCT/EP2007/001267
申请日：2007-02-14
申请人： CARL ZEISS SMT AG , WANGLER, Johannes , SIEKMANN, Heiko , WEIBLE, Kenneth , SCHARNWEBER, Ralf , MAUL, Manfred , DEGUENTHER, Markus , LAYH, Michael , SCHOLZ, Axel , SPENGLER, Uwe , VÖLKEL, Reinhard
发明人： WANGLER, Johannes , SIEKMANN, Heiko , WEIBLE, Kenneth , SCHARNWEBER, Ralf , MAUL, Manfred , DEGUENTHER, Markus , LAYH, Michael , SCHOLZ, Axel , SPENGLER, Uwe , VÖLKEL, Reinhard
IPC分类号： G03F7/20
CPC分类号： G03F7/70191 , G02B3/0056 , G02B27/0911 , G03F7/70058 , G03F7/70075 , G03F7/70083 , G03F7/70158
摘要： An illumination system for a microlithographic projection exposure apparatus comprises a light source (30) and an optical integrator (56) . The latter has first optical subelements (561X, 561Y, 562X, 562Y) and produces a plurality of secondary light sources (82) each emitting a light bundle. A condenser (62) effects a superposition of the light bundles in a mask plane (70) . At least one scattering structure (58, 60) comprises a plurality of individually designed second optical subelements that are arranged in front of or behind the secondary light sources. The first and second optical subelements are configured such that optical subelements illuminated with identical irradiance distributions are separated by more than 5 mm.
摘要翻译：一种用于微光刻投影曝光装置的照明系统，包括光源（30）和光学积分器（56）。后者具有第一光学子元件（561X，561Y，562X，562Y）并且产生多个发射光束的次级光源（82）。冷凝器（62）实现光束在掩模平面（70）中的叠加。至少一个散射结构（58,60）包括多个单独设计的第二光学子元件，其布置在二次光源的前面或后面。第一和第二光学子元件被配置为使得以相同辐照度分布照射的光学子元件被分开超过5mm。

4. 发明申请

WO2007093436A1 OPTICAL INTEGRATOR FOR AN ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
标题翻译：微电子投影曝光装置照明系统的光学积分器
公开(公告)号：WO2007093436A1
公开(公告)日：2007-08-23
申请号：PCT/EP2007/001370
申请日：2007-02-16
申请人： CARL ZEISS SMT AG , WOLF, Oliver , SIEKMANN, Heiko , KALCHBRENNER, Eva , RENNON, Siegfried , WANGLER, Johannes , BRESAN, Andre , GERHARD, Michael , HAVERKAMP, Nils , SCHOLZ, Axel , SCHARNWEBER, Ralf , LAYH, Michael , BURKART, Stefan
发明人： WOLF, Oliver , SIEKMANN, Heiko , KALCHBRENNER, Eva , RENNON, Siegfried , WANGLER, Johannes , BRESAN, Andre , GERHARD, Michael , HAVERKAMP, Nils , SCHOLZ, Axel , SCHARNWEBER, Ralf , LAYH, Michael , BURKART, Stefan
IPC分类号： G03F7/20
CPC分类号： G03F7/70958 , G03F7/70075 , Y10T83/0304 , Y10T83/04
摘要： An optical integrator for producing a plurality of secondary light sources in an illumination system of a microlithographic projection exposure apparatus comprises a first array of elongated convexly curved first microlenses (112X) that are arranged side by side in a first plane and have first vertex lines (V). The optical integrator further comprises a second array of elongated convexly curved second microlenses (114X; 214X) that are arranged side by side in a second plane and have second vertex lines (V 1 to V 4 ). At least one second vertex line or a portion thereof does not coincide, in a projection along an optical axis of the optical integrator, with any one of the first vertex lines (V) or portions thereof.
摘要翻译：一种用于在微光刻投影曝光装置的照明系统中制造多个次级光源的光学积分器，包括在第一平面中并排设置并具有第一顶点线的第一阵列的细长的凸形弯曲的第一微透镜（112X） V）。光学积分器还包括细长的凸形弯曲的第二微透镜（114X; 214X）的第二阵列，所述第二阵列在第二平面中并排布置，并且具有第二顶点线（V SUB 1至V 4））。在沿着光学积分器的光轴的投影中，至少一个第二顶点线或其一部分与第一顶点线（V）中的任何一个或其部分不一致。

5. 发明申请

WO2011147658A1 OPTICAL SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION APPARATUS 审中-公开
标题翻译：用于微晶投影装置的光学系统
公开(公告)号：WO2011147658A1
公开(公告)日：2011-12-01
申请号：PCT/EP2011/056830
申请日：2011-04-29
申请人： CARL ZEISS SMT GMBH , SÄNGER, Ingo , SCHARNWEBER, Ralf , DITTMANN, Olaf , GRUNER, Toralf , WEIß, Gundula , MAJOR, András G. , VOGT, Martin , DEGÜNTHER, Markus , WANGLER, Johannes , KORB, Thomas , WALDIS, Severin
发明人： SÄNGER, Ingo , SCHARNWEBER, Ralf , DITTMANN, Olaf , GRUNER, Toralf , WEIß, Gundula , MAJOR, András G. , VOGT, Martin , DEGÜNTHER, Markus , WANGLER, Johannes , KORB, Thomas , WALDIS, Severin
IPC分类号： G03F7/20
CPC分类号： G03F7/70116 , G03F7/70566
摘要： The invention concerns an optical system for a microlithographic projection exposure apparatus and a microlithographic exposure method. In an embodiment an optical system for a microlithographic projection exposure apparatus includes at least one mirror arrangement (200, 720, 730, 920) having a plurality of mirror elements (200a, 200b, 200c, 721, 722, 733, 731, 732, 733,...) which are displaceable independently of each other for altering an angular distribution of the light reflected by the mirror arrangement (200, 720, 730, 920), and at least one manipulator (300, 720, 910) which is arranged downstream of said mirror arrangement (200, 720, 730, 920) in the light propagation direction and has a raster arrangement of manipulator elements (301, 302,..., 600, 721, 722, 723,... ) in such a way that light incident on the manipulator (300, 600, 720, 910) in operation of the optical system is influenced differently in its polarisation state and/or in its intensity in dependence on the incidence location, wherein at least two mutually different illumination settings (420, 520) are adjustable by the variation in an angular distribution of the light reflected by the mirror arrangement (200), wherein said illumination settings (420, 520) differ from each other in that identical regions of a pupil plane of the illumination system (10) are illuminated with light of a different polarisation state.
摘要翻译：本发明涉及一种用于微光刻投影曝光装置和微光刻曝光方法的光学系统。在一个实施例中，用于微光刻投影曝光装置的光学系统包括具有多个反射镜元件（200a，200b，200c，721,722,733,731,732,920）的至少一个反射镜装置（200,720,730,920） 733，...），其可彼此独立地移位，以改变由反射镜装置（200,720,730,920）反射的光的角分布，以及至少一个操纵器（300,720,910），其是在光传播方向上布置在所述反射镜装置（200,720,730,920）的下游，并且具有光栅装置，其中所述操纵元件（301,302，...，600,721,722,723，...）入射在光学系统操作的操纵器（300,600,720,910）上的光的偏振状态和/或其强度根据入射位置受到不同的影响，其中至少两个相互不同照明设置（420,520）可通过角度dist的变化进行调节由反射镜装置（200）反射的光的贡献，其中所述照明设置（420,520）彼此不同，因为照明系统（10）的光瞳平面的相同区域被不同偏振态的光照射。

6. 发明公开

EP1984787A1 ILLUMINATION SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 失效转让
标题翻译：照明系统，微型投影光刻曝光装置
公开(公告)号：EP1984787A1
公开(公告)日：2008-10-29
申请号：EP07703454.4
申请日：2007-02-14
申请人： Carl Zeiss SMT AG
发明人： WANGLER, Johannes , SIEKMANN, Heiko , WEIBLE, Kenneth , SCHARNWEBER, Ralf , MAUL, Manfred , DEGUENTHER, Markus , LAYH, Michael , SCHOLZ, Axel , SPENGLER, Uwe , VÖLKEL, Reinhard
IPC分类号： G03F7/20
CPC分类号： G03F7/70191 , G02B3/0056 , G02B27/0911 , G03F7/70058 , G03F7/70075 , G03F7/70083 , G03F7/70158
摘要： An illumination system for a microlithographic projection exposure apparatus comprises a light source (30) and an optical integrator (56) . The latter has first optical subelements (561X, 561Y, 562X, 562Y) and produces a plurality of secondary light sources (82) each emitting a light bundle. A condenser (62) effects a superposition of the light bundles in a mask plane (70) . At least one scattering structure (58, 60) comprises a plurality of individually designed second optical subelements that are arranged in front of or behind the secondary light sources. The first and second optical subelements are configured such that optical subelements illuminated with identical irradiance distributions are separated by more than 5 mm.

7. 发明公开

EP1984788A1 OPTICAL INTEGRATOR FOR AN ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 有权
标题翻译：用于照明系统的光学积分器的微投影光刻曝光装置
公开(公告)号：EP1984788A1
公开(公告)日：2008-10-29
申请号：EP07703501.2
申请日：2007-02-16
申请人： Carl Zeiss SMT AG
发明人： WOLF, Oliver , SIEKMANN, Heiko , KALCHBRENNER, Eva , RENNON, Siegfried , WANGLER, Johannes , BRESAN, Andre , GERHARD, Michael , HAVERKAMP, Nils , SCHOLZ, Axel , SCHARNWEBER, Ralf , LAYH, Michael , BURKART, Stefan
IPC分类号： G03F7/20
CPC分类号： G03F7/70958 , G03F7/70075 , Y10T83/0304 , Y10T83/04
摘要： An optical integrator for producing a plurality of secondary light sources in an illumination system of a microlithographic projection exposure apparatus comprises a first array of elongated convexly curved first microlenses (112X) that are arranged side by side in a first plane and have first vertex lines (V). The optical integrator further comprises a second array of elongated convexly curved second microlenses (114X; 214X) that are arranged side by side in a second plane and have second vertex lines (V1 to V4). At least one second vertex line or a portion thereof does not coincide, in a projection along an optical axis of the optical integrator, with any one of the first vertex lines (V) or portions thereof.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式