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1. 发明申请

WO2007045501A1 CHARGED PARTICLE SYSTEM 审中-公开
标题翻译：充电颗粒系统
公开(公告)号：WO2007045501A1
公开(公告)日：2007-04-26
申请号：PCT/EP2006/010158
申请日：2006-10-20
申请人： CARL ZEISS SMS GMBH , BUSCHBECK, Herbert , PLATZGUMMER, Elmar , STENGL, Gerhard , VONACH, Herbert
发明人： BUSCHBECK, Herbert , PLATZGUMMER, Elmar , STENGL, Gerhard , VONACH, Herbert
IPC分类号： H01J37/147 , H01J37/317 , H01J37/21
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/147 , H01J37/21 , H01J2237/0492 , H01J2237/24578
摘要： A charged particle system comprises a particle source for generating a beam of charged particles and a particle-optical projection system. The particle-optical projection system comprises a focusing first magnetic lens (403) comprising an outer pole piece (411) having a radial inner end (411’), and an inner pole piece (412) having a lowermost end (412’) disposed closest to the radial inner end of the outer pole piece, a gap being formed by those; a focusing electrostatic lens (450) having at least a first electrode (451) and a second electrode (450) disposed in a region of the gap; and a controller (C ) configured to control a focusing power of the first electrostatic lens based on a signal indicative of a distance of a surface of a substrate from a portion of the first magnetic lens disposed closest to the substrate.
摘要翻译：带电粒子系统包括用于产生带电粒子束的粒子源和粒子光学投影系统。粒子光学投影系统包括聚焦第一磁性透镜（403），其包括具有径向内端（411'）的外极片（411）和设置有最下端（412'）的内极片（412）最靠近外极片的径向内端的间隙由它们形成; 具有至少设置在所述间隙的区域中的第一电极（451）和第二电极（450）的聚焦静电透镜（450）以及控制器（C），被配置为基于表示基板的表面距离最靠近基板设置的第一磁性透镜的部分的距离的信号来控制第一静电透镜的聚焦能力。

2. 发明申请

WO2007017255A1 PARTICLE-OPTICAL SYSTEM 审中-公开
标题翻译：颗粒光学系统
公开(公告)号：WO2007017255A1
公开(公告)日：2007-02-15
申请号：PCT/EP2006/007849
申请日：2006-08-08
申请人： CARL ZEISS SMS GMBH , PLATZGUMMER, Elmar , STENGL, Gerhard , FALKNER, Helmut
发明人： PLATZGUMMER, Elmar , STENGL, Gerhard , FALKNER, Helmut
IPC分类号： H01J37/317 , H01J37/12
CPC分类号： H01J37/12 , B82Y10/00 , B82Y40/00 , H01J37/3177
摘要： The present invention relates to a multi-beamlet multi- column particle-optical system comprising a plurality of columns which are disposed in an array for simultaneously exposing a substrate, each column having an optical axis and comprising: a beamlet generating arrangement comprising at least one multi-aperture plate for generating a pattern of multiple beamlets of charged particles, and an electrostatic lens arrangement comprising at least one electrode element; the at least one electrode element having an aperture defined by an inner peripheral edge facing the optical axis, the aperture having a center and a predetermined shape in a plane orthogonal to the optical axis; wherein in at least one of the plurality of columns, the predetermined shape of the aperture is a non- circular shape with at least one of a protrusion and an indentation from an ideal circle about the center of the aperture.
摘要翻译：多子束多列粒子光学系统技术领域本发明涉及一种多子束多列粒子光学系统，其包括多个列，其被布置成阵列以同时暴露衬底，每个列具有光轴，并且包括：子束产生装置，其包括至少一个用于产生多个带电粒子束的图案的多孔板，以及包括至少一个电极元件的静电透镜装置; 所述至少一个电极元件具有由面向光轴的内周边缘限定的孔，所述孔在与所述光轴正交的平面中具有中心和预定形状; 其中在所述多个列中的至少一个列中，所述孔的预定形状是非圆形形状，其具有围绕所述孔的中心的来自理想圆的突起和凹陷中的至少一个。

3. 发明申请

WO2007009804A1 CHARGED PARTICLE BEAM EXPOSURE SYSTEM AND BEAM MANIPULATING ARRANGEMENT 审中-公开
标题翻译：充电颗粒光束曝光系统和光束操纵装置
公开(公告)号：WO2007009804A1
公开(公告)日：2007-01-25
申请号：PCT/EP2006/007182
申请日：2006-07-20
申请人： CARL ZEISS SMS GMBH , PLATZGUMMER, Elmar , STENGL, Gerhard
发明人： PLATZGUMMER, Elmar , STENGL, Gerhard
IPC分类号： H01J37/317
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3174 , H01J2237/0435
摘要： A beam manipulating arrangement for a multi beam application using charged particles comprises a multi-aperture plate having plural apertures traversed by beams of charged particles. A frame portion of the multi-aperture plate is heated to reduce temperature gradients within the multi-aperture plate. Further, a heat emissivity of a surface of the multi-aperture plate may be higher in some regions as compared to other regions in view of also reducing temperature gradients.
摘要翻译：用于使用带电粒子的多光束施加的光束操纵装置包括具有由带电粒子束穿过的多个孔的多孔板。加热多孔板的框架部分以降低多孔板内的温度梯度。此外，考虑到降低温度梯度，与其他区域相比，多孔板的表面的发热率在一些区域可能更高。

4. 发明申请

WO2007048433A1 CHARGED PARTICLE BEAM EXPOSURE SYSTEM 审中-公开
标题翻译：充电颗粒光束曝光系统
公开(公告)号：WO2007048433A1
公开(公告)日：2007-05-03
申请号：PCT/EP2005/011593
申请日：2005-10-28
申请人： CARL ZEISS SMS GMBH , PLATZGUMMER, Elmar , KNIPPELMEYER, Rainer
发明人： PLATZGUMMER, Elmar , KNIPPELMEYER, Rainer
IPC分类号： H01J37/04 , H01J37/317
CPC分类号： H01J37/3177 , B82Y10/00 , B82Y40/00 , H01J37/045 , H01J37/3023 , H01J2237/0435 , H01J2237/30472 , H01J2237/31754 , H01J2237/31774
摘要： A charged particle beam exposure system has a blanking aperture array (31) having groups of apertures (53) controlled by shift registers (75), wherein different inputs (C) to the shift registers influence a different number of apertures. Charged particle beamlets traversing the apertures are scanned across a charged particle sensitive substrate in synchronism with a clock signal of the shift registers.
摘要翻译：带电粒子束曝光系统具有由移位寄存器（75）控制的孔组（53）的消隐孔阵列（31），其中对移位寄存器的不同输入（C）影响不同数量的孔。与移位寄存器的时钟信号同步地，穿过孔的带电粒子子束跨带电粒子敏感衬底扫描。

5. 发明申请

WO2006086815A3 CHARGED-PARTICLE EXPOSURE APPARATUS 审中-公开
公开(公告)号：WO2006086815A3
公开(公告)日：2006-08-24
申请号：PCT/AT2006/000060
申请日：2006-02-16
申请人： IMS NANOFABRICATION GMBH , PLATZGUMMER, Elmar , CERNUSCA, Stefan , STENGL, Gerhard
发明人： PLATZGUMMER, Elmar , CERNUSCA, Stefan , STENGL, Gerhard
IPC分类号： H01J37/317
摘要： A particle-beam projection processing apparatus (100) for irradiating a target (41), with an illumination system (101) for forming a wide-area illuminating beam (Ip) of energetic electrically charged particles; a pattern definition means (102) for positioning an aperture pattern (21) in the path of the illuminating beam; and a projection system (103) for projecting the beam thus patterned (pb) onto a target (41) to be positioned after the projection system. A foil (34, 35) located across the path of the patterned beam (pb) is positioned between the pattern definition means (102) and the position of the target (41) at a location close to an image (i0) of the aperture pattern (21) formed by the projection system.

6. 发明申请

WO2007112465A1 PARTICLE-BEAM EXPOSURE APPARATUS WITH OVERALL-MODULATION OF A PATTERNED BEAM 审中-公开
标题翻译：颗粒光束曝光装置，具有整体调制的图案
公开(公告)号：WO2007112465A1
公开(公告)日：2007-10-11
申请号：PCT/AT2007/000132
申请日：2007-03-16
申请人： IMS NANOFABRICATION AG , PLATZGUMMER, Elmar
发明人： PLATZGUMMER, Elmar
IPC分类号： H01J37/04 , H01J37/317
CPC分类号： H01J37/045 , B82Y10/00 , B82Y40/00 , H01J37/3175 , H01J37/3177 , H01J2237/0435 , H01J2237/1506 , H01J2237/31766 , H01J2237/31774 , H01J2237/31777
摘要： In a charged-particle exposure apparatus (100) for exposure of a target (41) with a beam of electrically charged particles, the illumination system (101) comprises a deflector means (401) adapted to vary the direction of incidence of the illuminating beam upon the pattern definition means, the pattern definition means (20) forms the shape of the illuminating beam into a desired pattern, and the projection optics system (103) projects an image of the beam shape defined in the pattern definition means onto the target (41); the projection optics system comprises a blocking aperture means (204) having an opening and being adapted to block passage of beams traversing outside said opening, namely when the deflector means (401) is activated to tilt the beamlet by a sufficient angle from its non-deflected path, e.g., for blanking out during the process of loading a pattern into the pattern definition means.
摘要翻译：在用于用带电粒子束照射目标（41）的带电粒子曝光装置（100）中，照明系统（101）包括偏转装置（401），该偏转装置适于改变照明光束的入射方向在图案定义装置上，图案定义装置（20）将照明光束的形状形成为期望的图案，并且投影光学系统（103）将在图案定义装置中限定的光束形状的图像投射到目标（ 41）; 投影光学系统包括具有开口的阻挡孔口装置（204），并且适于阻挡穿过所述开口外侧的梁的通过，即当偏转装置（401）被启动以使子束从其非易失性位置倾斜足够的角度时，偏转路径，例如，在将图案加载到图案定义装置的过程中用于消隐。

7. 发明申请

WO2006084298A1 CHARGED-PARTICLE EXPOSURE APPARATUS WITH ELECTROSTATIC ZONE PLATE 审中-公开
标题翻译：带静电带的充电颗粒曝光装置
公开(公告)号：WO2006084298A1
公开(公告)日：2006-08-17
申请号：PCT/AT2006/000049
申请日：2006-02-09
申请人： IMS NANOFABRICATION GMBH , PLATZGUMMER, Elmar , CERNUSCA, Stefan
发明人： PLATZGUMMER, Elmar , CERNUSCA, Stefan
IPC分类号： H01J37/317
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3174
摘要： A particle-beam projection processing apparatus for irradiating a target by means of a beam of energetic electrically charged particles, comprising an illumination system, a pattern definition system for positioning an aperture arrangement composed of apertures transparent to the energetic particles in the path of the illuminating beam, and a projection system to project the beam onto a target, further comprising at least one plate electrode means (8), which has openings corresponding to the apertures of the pattern definition system and comprising a composite electrode (281) composed of a number of partial electrodes (830,831) being arranged non-overlapping and adjoining to each other, the total lateral dimensions of the composite electrode covering the aperture arrangement (21) of the pattern definition system. The partial electrodes can be applied different electrostatic potentials.
摘要翻译：一种粒子束投射处理装置，用于通过能量带电粒子束照射目标物，所述粒子束包括照明系统，用于定位孔径装置的图案定义系统，所述孔组件由在所述照射路径中的所述能量粒子透明的孔组成光束和投影系统以将光束投影到目标上，还包括至少一个平板电极装置（8），其具有对应于图案定义系统的孔的开口，并且包括由数字组成的复合电极（281）部分电极（830,831）被布置成彼此不重叠和相邻，覆盖图案定义系统的孔布置（21）的复合电极的总横向尺寸。部分电极可以施加不同的静电电位。

8. 发明授权

EP1943660B1 CHARGED PARTICLE BEAM EXPOSURE SYSTEM 有权
标题翻译：带电粒子束曝光系统
公开(公告)号：EP1943660B1
公开(公告)日：2009-03-04
申请号：EP05801831.8
申请日：2005-10-28
申请人： Carl Zeiss SMS GmbH
发明人： PLATZGUMMER, Elmar , KNIPPELMEYER, Rainer
IPC分类号： H01J37/04 , H01J37/317
CPC分类号： H01J37/3177 , B82Y10/00 , B82Y40/00 , H01J37/045 , H01J37/3023 , H01J2237/0435 , H01J2237/30472 , H01J2237/31754 , H01J2237/31774
摘要： A charged particle beam exposure system has a blanking aperture array (31) having groups of apertures (53) controlled by shift registers (75), wherein different inputs (C) to the shift registers influence a different number of apertures. Charged particle beamlets traversing the apertures are scanned across a charged particle sensitive substrate in synchronism with a clock signal of the shift registers.
摘要翻译：带电粒子束曝光系统具有具有由移位寄存器（75）控制的多组孔（53）的消隐孔径阵列（31），其中移位寄存器的不同输入（C）影响不同数量的孔径。与移位寄存器的时钟信号同步地通过带电粒子敏感衬底扫描穿过孔的带电粒子小射束。

9. 发明授权

EP1943660B9 CHARGED PARTICLE BEAM EXPOSURE SYSTEM 有权
标题翻译：曝光系统带电粒子
公开(公告)号：EP1943660B9
公开(公告)日：2009-09-09
申请号：EP05801831.8
申请日：2005-10-28
申请人： Carl Zeiss SMS GmbH
发明人： PLATZGUMMER, Elmar , KNIPPELMEYER, Rainer
IPC分类号： H01J37/04 , H01J37/317
CPC分类号： H01J37/3177 , B82Y10/00 , B82Y40/00 , H01J37/045 , H01J37/3023 , H01J2237/0435 , H01J2237/30472 , H01J2237/31754 , H01J2237/31774
摘要： A charged particle beam exposure system has a blanking aperture array (31) having groups of apertures (53) controlled by shift registers (75), wherein different inputs (C) to the shift registers influence a different number of apertures. Charged particle beamlets traversing the apertures are scanned across a charged particle sensitive substrate in synchronism with a clock signal of the shift registers.

10. 发明公开

EP1943660A1 CHARGED PARTICLE BEAM EXPOSURE SYSTEM 有权
标题翻译：曝光系统带电粒子
公开(公告)号：EP1943660A1
公开(公告)日：2008-07-16
申请号：EP05801831.8
申请日：2005-10-28
申请人： Carl Zeiss SMS GmbH
发明人： PLATZGUMMER, Elmar , KNIPPELMEYER, Rainer
IPC分类号： H01J37/04 , H01J37/317
CPC分类号： H01J37/3177 , B82Y10/00 , B82Y40/00 , H01J37/045 , H01J37/3023 , H01J2237/0435 , H01J2237/30472 , H01J2237/31754 , H01J2237/31774
摘要： A charged particle beam exposure system has a blanking aperture array (31) having groups of apertures (53) controlled by shift registers (75), wherein different inputs (C) to the shift registers influence a different number of apertures. Charged particle beamlets traversing the apertures are scanned across a charged particle sensitive substrate in synchronism with a clock signal of the shift registers.

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