基本信息:
- 专利标题： CHARGED-PARTICLE EXPOSURE APPARATUS
- 申请号：PCT/AT2006/000060 申请日：2006-02-16
- 公开(公告)号：WO2006086815A3 公开(公告)日：2006-08-24
- 发明人： PLATZGUMMER, Elmar , CERNUSCA, Stefan , STENGL, Gerhard
- 申请人： IMS NANOFABRICATION GMBH , PLATZGUMMER, Elmar , CERNUSCA, Stefan , STENGL, Gerhard
- 申请人地址： Schreygasse 3, A-1020 Wien AT
- 专利权人： IMS NANOFABRICATION GMBH,PLATZGUMMER, Elmar,CERNUSCA, Stefan,STENGL, Gerhard
- 当前专利权人： IMS NANOFABRICATION GMBH,PLATZGUMMER, Elmar,CERNUSCA, Stefan,STENGL, Gerhard
- 当前专利权人地址： Schreygasse 3, A-1020 Wien AT
- 代理机构： MATSCHNIG, Franz
- 优先权： ATA 20050218
- 主分类号： H01J37/317
- IPC分类号： H01J37/317
摘要：
A particle-beam projection processing apparatus (100) for irradiating a target (41), with an illumination system (101) for forming a wide-area illuminating beam (Ip) of energetic electrically charged particles; a pattern definition means (102) for positioning an aperture pattern (21) in the path of the illuminating beam; and a projection system (103) for projecting the beam thus patterned (pb) onto a target (41) to be positioned after the projection system. A foil (34, 35) located across the path of the patterned beam (pb) is positioned between the pattern definition means (102) and the position of the target (41) at a location close to an image (i0) of the aperture pattern (21) formed by the projection system.
IPC结构图谱:
| H | 电学 |
| --H01 | 基本电气元件 |
| ----H01J | 放电管或放电灯 |
| ------H01J37/00 | 有把物质或材料引入使受到放电作用的结构的电子管,如为了对其检验或加工的 |
| --------H01J37/02 | .零部件 |
| ----------H01J37/317 | ..用于改变物体的特性或在其上加上薄层的，如离子注入 |