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1. 发明授权

US06420440B1 Method for recycling alignment layer materials 有权
标题翻译：回收定向层材料的方法
公开(公告)号：US06420440B1
公开(公告)日：2002-07-16
申请号：US09556299
申请日：2000-04-24
申请人： Bong-Woo Lee , Soo-Won Lee , Sho-Hak Nam , Jin-Ho Ju , Soo-Im Jeong , Hong-Sick Park , Sung-Chul Kang
发明人： Bong-Woo Lee , Soo-Won Lee , Sho-Hak Nam , Jin-Ho Ju , Soo-Im Jeong , Hong-Sick Park , Sung-Chul Kang
IPC分类号： C08J1104
CPC分类号： G02F1/133711
摘要： The present invention relates to a method for recycling an alignment layer material. The recycled alignment layer material shows the same characteristics as an original alignment layer material. The waste solution of the alignment layer material produced during the liquid crystal display manufacturing processes is recycled by solidifying polyamic acids and soluble polyimides by putting a waste solution of the alignment layer material into an organic solution or ultra purified water in which the alignment layer material constituents of polyamic acids and soluble polyimides are insoluble, separating polyamic acids and soluble polyimides from the organic solvent or ultra purified water, and dissolving the separated solid polyamic acids and soluble polyimides into a solvent. Recycling the alignment layer material in this method can significantly reduce the manufacturing costs.
摘要翻译：本发明涉及一种再循环对准层材料的方法。再生取向层材料与原来的配向层材料具有相同的特性。在液晶显示器制造过程中产生的取向层材料的废溶液通过将取向层材料的废溶液放入有机溶液或超纯水中来固化聚酰胺酸和可溶性聚酰亚胺来再循环，其中取向层材料成分的聚酰胺酸和可溶性聚酰亚胺是不溶的，从有机溶剂或超纯水中分离聚酰胺酸和可溶性聚酰亚胺，并将分离的固体聚酰胺酸和可溶性聚酰亚胺溶解在溶剂中。以这种方法回收对准层材料可以显着降低制造成本。

2. 发明授权

US06386102B1 Alignment layer printing device 有权
标题翻译：定位层印刷装置
公开(公告)号：US06386102B1
公开(公告)日：2002-05-14
申请号：US09475794
申请日：1999-12-30
申请人： Weon-Woo Choi , Keun-Yong Lee , Gi-Pyeong Kim , Kun-Jong Lee , Jin-Ho Ju , Soo-Im Jeong , Bong-Woo Lee
发明人： Weon-Woo Choi , Keun-Yong Lee , Gi-Pyeong Kim , Kun-Jong Lee , Jin-Ho Ju , Soo-Im Jeong , Bong-Woo Lee
IPC分类号： B41F3100
CPC分类号： G02F1/133711
摘要： The present invention discloses an alignment layer printing device in which already used waste liquid is recovered for printing the alignment layer and can be reused in alignment layer printing. An alignment layer printing device consists of a raw material supplying device in which the alignment layer raw materials are supplied, a printing device in which the above raw materials that are supplied from the above raw material supplying device are printed on some object material, a recovery device in which the alignment layer raw materials that are not actually used in the printing are rerouted to the above raw material supplying device.
摘要翻译：本发明公开了一种取向层印刷装置，其中回收已经使用的废液用于印刷取向层，并且可以在对准层印刷中重新使用。定向层印刷装置由供给取向层原料的原料供给装置，将从上述原料供给装置供给的上述原料印刷在某些物品上的印刷装置，回收其中在印刷中实际不使用的取向层原料被重新路由到上述原料供给装置的装置。

3. 发明授权

US06645682B2 Thinner for rinsing photoresist and method of treating photoresist layer 失效
标题翻译：用于冲洗光刻胶的稀释剂和处理光致抗蚀剂层的方法
公开(公告)号：US06645682B2
公开(公告)日：2003-11-11
申请号：US10169033
申请日：2002-06-25
申请人： Hong-Sick Park , Jin-Ho Ju , Yu-Kyung Lee , Sung-Chul Kang , Sae-Tae Oh , Doek-Man Kang
发明人： Hong-Sick Park , Jin-Ho Ju , Yu-Kyung Lee , Sung-Chul Kang , Sae-Tae Oh , Doek-Man Kang
IPC分类号： G03F742
CPC分类号： G03F7/168 , G03F7/38 , G03F7/42 , G03F7/422 , H01L21/02052 , H01L21/0274 , H01L21/31133
摘要： A thinner for rinsing photoresist including 50 to 80 wt. % of n-butyl acetate, propylene glycol alkyl ether, and propylene glycol alkyl ether acetate, is provided. The thinner is neither toxic to humans nor ecologically undesirable and has no unpleasant odor. The waste solutions thereof and associated waste water are easily handed so as to render this thinner environmental friendly. Additionally, the photoresist thinner of the present invention has excellent rinsing ability.
摘要翻译：用于冲洗光致抗蚀剂的稀释剂，包括50至80wt。提供了乙酸正丁酯，丙二醇烷基醚和丙二醇烷基醚乙酸酯的％。稀释剂既不对人体有毒，也不对生态有害，无异味。其废溶液和相关的废水容易交付，以使其更环保。此外，本发明的光致抗蚀剂薄膜具有优异的漂洗能力。

4. 发明授权

US07425479B2 Method of manufacturing a thin film transistor array panel 失效
标题翻译：制造薄膜晶体管阵列面板的方法
公开(公告)号：US07425479B2
公开(公告)日：2008-09-16
申请号：US11777042
申请日：2007-07-12
申请人： Soo-Im Jeong , You-Kyoung Lee , Jin-Ho Ju
发明人： Soo-Im Jeong , You-Kyoung Lee , Jin-Ho Ju
IPC分类号： H01L21/00
CPC分类号： H01L27/12 , G02F1/136227 , H01L27/1248 , H01L27/1292
摘要： The present invention provides a thin film transistor array panel comprising: an insulating substrate; a first signal line formed on the insulating substrate and extending in a first direction; a second signal line formed on the insulating substrate, extending in a second direction, and intersecting the first signal line; a thin film transistor connected to the first and second signal lines; a passivation layer formed on the second signal line and having a contact hole exposing a portion of the second signal line; and a pixel electrode formed on the passivation layer and connected to the thin film transistor through the contact hole, wherein the passivation layer is formed by coating an organic solution that includes an organic insulating material and a solvent including at least one of PGMEP, EEP, and nBA.
摘要翻译：本发明提供一种薄膜晶体管阵列板，包括：绝缘基板; 形成在所述绝缘基板上并沿第一方向延伸的第一信号线; 形成在所述绝缘基板上的第二信号线，沿第二方向延伸并与所述第一信号线相交; 连接到第一和第二信号线的薄膜晶体管; 钝化层，其形成在所述第二信号线上并且具有暴露所述第二信号线的一部分的接触孔; 以及形成在所述钝化层上并通过所述接触孔连接到所述薄膜晶体管的像素电极，其中所述钝化层通过涂覆包括有机绝缘材料的有机溶液和包含至少一种PGMEP，EEP的溶剂形成，和nBA。

5. 发明申请

US20050127366A1 Thin film transistor array panel 审中-公开
标题翻译：薄膜晶体管阵列面板
公开(公告)号：US20050127366A1
公开(公告)日：2005-06-16
申请号：US10989636
申请日：2004-11-17
申请人： Soo-Im Jeong , You-Kyoung Lee , Jin-Ho Ju
发明人： Soo-Im Jeong , You-Kyoung Lee , Jin-Ho Ju
IPC分类号： G02F1/136 , G02F1/1362 , H01L21/77 , H01L21/84 , H01L27/12 , H01L29/04
CPC分类号： H01L27/12 , G02F1/136227 , H01L27/1248 , H01L27/1292
摘要： The present invention provides a thin film transistor array panel comprising: an insulating substrate; a first signal line formed on the insulating substrate and extending in a first direction; a second signal line formed on the insulating substrate, extending in a second direction, and intersecting the first signal line; a thin film transistor connected to the first and second signal lines; a passivation layer formed on the second signal line and having a contact hole exposing a portion of the second signal line; and a pixel electrode formed on the passivation layer and connected to the thin film transistor through the contact hole, wherein the passivation layer is formed by coating an organic solution that includes an organic insulating material and a solvent including at least one of PGMEP, EEP, and nBA.
摘要翻译：本发明提供一种薄膜晶体管阵列板，包括：绝缘基板; 形成在所述绝缘基板上并沿第一方向延伸的第一信号线; 形成在所述绝缘基板上的第二信号线，沿第二方向延伸并与所述第一信号线相交; 连接到第一和第二信号线的薄膜晶体管; 钝化层，其形成在所述第二信号线上并且具有暴露所述第二信号线的一部分的接触孔; 以及形成在所述钝化层上并通过所述接触孔连接到所述薄膜晶体管的像素电极，其中所述钝化层通过涂覆包括有机绝缘材料的有机溶液和包含至少一种PGMEP，EEP的溶剂形成，和nBA。

6. 发明授权

US07144662B2 Photoresist composition having a high heat resistance 有权
标题翻译：具有高耐热性的光刻胶组合物
公开(公告)号：US07144662B2
公开(公告)日：2006-12-05
申请号：US10493193
申请日：2002-02-20
申请人： Dong-Ki Lee , Sung-Chul Kang , You-Kyoung Lee , Jin-Ho Ju
发明人： Dong-Ki Lee , Sung-Chul Kang , You-Kyoung Lee , Jin-Ho Ju
IPC分类号： G03F7/023
CPC分类号： G03F7/0226
摘要： The present invention relates to a photoresist composition having high heat resistance used in the production process of an LCD, and more particularly, to a photoresist composition having high heat resistance, capable of decreasing process tact (a way), of process simplification, and of the retrenchment of expenditures. The inventive composition facilitates this through making it possible to skip 5 processes, such as Cr metal deposition forming a metal film, and the photo/etch/PR strip/etch steps of the whole surface of the metal, by substituting the inventive composition for the usual metal film, such that N+ ion doping in production of TFT-LCD can take place due its high heat resistance.
摘要翻译：本发明涉及在LCD的生产过程中使用的具有高耐热性的光致抗蚀剂组合物，更具体地说，涉及具有高耐热性，能够降低工艺简化的工艺（一种方法）的光致抗蚀剂组合物，以及削减支出。本发明的组合物通过使得本发明的组合物代替本发明的组合物可以跳过5种工艺，例如形成金属膜的Cr金属沉积和金属的整个表面的光刻/蚀刻/ PR剥离/蚀刻步骤通常的金属膜，由于其高耐热性，可以发生TFT-LCD的生产中的N + + / - 离子掺杂。

7. 发明授权

US06893791B2 Photoresist composition and method of forming pattern using the same 有权
标题翻译：光刻胶组合物和使用其形成图案的方法
公开(公告)号：US06893791B2
公开(公告)日：2005-05-17
申请号：US10259152
申请日：2002-09-27
申请人： You-Kyoung Lee , Sung-Chul Kang , Jin-Ho Ju , Dong-Ki Lee , Seung-Uk Lee , Hoon Kang
发明人： You-Kyoung Lee , Sung-Chul Kang , Jin-Ho Ju , Dong-Ki Lee , Seung-Uk Lee , Hoon Kang
IPC分类号： G03F7/004 , G02F1/13 , G03F7/008 , G03F7/022 , G03F7/023 , G03F7/40 , G03F7/30
CPC分类号： G03F7/0236 , G03F7/0226 , G03F7/40
摘要： Disclosed is a photoresist composition having a good sensitivity and residual layer characteristic and a method of forming a pattern using the same. The photoresist composition includes 5-30% by weight of a polymer resin, 2-10% by weight of a photosensitive compound, 0.1-10% by weight of a sensitivity enhancing agent, 0.1-10% by weight of a sensitivity restraining agent and 60-90% by weight of an organic solvent. A photoresist layer is formed by coating the photoresist composition on a substrate and then drying the coated photoresist composition. Then, thus obtained photoresist layer is exposed by using a mask having a predetermined pattern. Then, a photoresist pattern is formed by developing thus exposed photoresist layer. The photoresist pattern exhibits a uniform layer thickness and critical dimension.
摘要翻译：公开了具有良好的灵敏度和残留层特性的光致抗蚀剂组合物和使用其形成图案的方法。光致抗蚀剂组合物包含5-30重量％的聚合物树脂，2-10重量％的感光性化合物，0.1-10重量％的敏感性增强剂，0.1-10重量％的敏感性抑制剂和 60-90重量％的有机溶剂。通过将光致抗蚀剂组合物涂覆在基材上，然后干燥涂覆的光致抗蚀剂组合物，形成光致抗蚀剂层然后，通过使用具有预定图案的掩模曝光所得到的光致抗蚀剂层。然后，通过显影这样曝光的光刻胶层形成光致抗蚀剂图案。光致抗蚀剂图案具有均匀的层厚度和临界尺寸。

8. 发明授权

US06461785B1 Composition for positive photoresist 有权
标题翻译：正性光致抗蚀剂的组成
公开(公告)号：US06461785B1
公开(公告)日：2002-10-08
申请号：US09651114
申请日：2000-08-30
申请人： Jin-Ho Ju , Yu-Kyung Lee , Hong-Sik Park , Yun-Jung Nah , Ki-Soo Kim , Sung-Chul Kang
发明人： Jin-Ho Ju , Yu-Kyung Lee , Hong-Sik Park , Yun-Jung Nah , Ki-Soo Kim , Sung-Chul Kang
IPC分类号： G03F7023
CPC分类号： G03F7/0048 , G03F7/0226
摘要： A photoresist composition is provided. The photoresist composition includes a polymer resin for forming a photoresist layer, a photosensitive chemical for changing solubility of the photoresist layer when exposed to some form of radiation, and 3-methoxybutyl acetate, 2-heptanone, and 4-butyrolactone as a solvent. The composition has a good photosensitivity and remainder ratio, and no unpleasant odor.
摘要翻译：提供光致抗蚀剂组合物。光致抗蚀剂组合物包括用于形成光致抗蚀剂层的聚合物树脂，当暴露于某种形式的辐射时改变光致抗蚀剂层的溶解度的光敏化学品，以及3-甲氧基丁基乙酸酯，2-庚酮和4-丁内酯作为溶剂。该组合物具有良好的光敏性和余量比，并且没有令人不愉快的气味。

9. 发明授权

US07378230B2 Photoresist composition for multi-micro nozzle head coater 有权
标题翻译：用于多微喷嘴头涂布机的光刻胶组合物
公开(公告)号：US07378230B2
公开(公告)日：2008-05-27
申请号：US10750845
申请日：2004-01-05
申请人： Sung-Chul Kang , Jin-Ho Ju , You-Kyoung Lee , Dong-Ki Lee , Hyo-Youl Kim , Hoon Kang , Seung-Uk Lee , Byung-Uk Kim
发明人： Sung-Chul Kang , Jin-Ho Ju , You-Kyoung Lee , Dong-Ki Lee , Hyo-Youl Kim , Hoon Kang , Seung-Uk Lee , Byung-Uk Kim
IPC分类号： G03F7/32 , G03F7/023
CPC分类号： G03F7/0236 , G03F7/0048
摘要： The present invention relates to a photoresist composition for an MMN (multi-micro nozzle) head coater, more particularly to a photoresist composition comprising a novolak resin with a molecular weight ranging from 2000 to 12,000, a diazide photoactive compound, an organic solvent, and a Si-based surfactant for use in liquid crystal display circuits.The photoresist composition for liquid crystal display circuits of the present invention solves the stain problem, which occurs in MMN head coaters used for large-scale substrate glass, and improves coating characteristics, so that it can be utilized industrially and is expected to significantly improve productivity.
摘要翻译：本发明涉及一种用于MMN（多微喷嘴）喷涂机的光致抗蚀剂组合物，更具体地说涉及一种光致抗蚀剂组合物，其包含分子量范围为2000-12,000的酚醛清漆树脂，二叠氮光敏化合物，有机溶剂和用于液晶显示电路的Si基表面活性剂。本发明的液晶显示电路用光致抗蚀剂组合物解决了用于大规模基板玻璃的MMN头涂布机中发生的污渍问题，并且改善了涂布特性，从而可以在工业上得到利用并且预期显着提高生产率。

10. 发明授权

US5914607A Apparatus and methods for analyzing a sample solution, including first and second ion detectors 失效
标题翻译：用于分析样品溶液的装置和方法，包括第一和第二离子检测器
公开(公告)号：US5914607A
公开(公告)日：1999-06-22
申请号：US839402
申请日：1997-04-11
申请人： Jin-Ho Ju , Sang-Kyong Kim , Sung-Chul Kang
发明人： Jin-Ho Ju , Sang-Kyong Kim , Sung-Chul Kang
IPC分类号： G01N1/00 , G01N27/06 , G01N33/18 , G01R27/22 , H01L21/304 , H01L21/66 , G01R27/26
CPC分类号： G01N33/18
摘要： A sample solution contained in a sample vessel is analyzed using a positive ion detector and a negative ion detector. The positive ion detector and the negative ion detector are supplied with the sample solution from the sample vessel, while isolating the positive ion detector and the negative ion detector from one another. Accordingly, the sample solution is not supplied from the positive ion detector to the negative ion detector, and the sample solution is not supplied from the negative ion detector to the positive ion detector. The positive ion detector and negative ion detector are preferably supplied with sample solution from the sample vessel using a bidirectional valve having an input port and first and second output ports. The input port is connected to the sample vessel, the first output port is connected to the first detector, and the second output port is connected to the second detector.
摘要翻译：使用正离子检测器和负离子检测器分析样品容器中包含的样品溶液。将正离子检测器和负离子检测器从样品容器中提供样品溶液，同时将正离子检测器和负离子检测器彼此隔离。因此，样品溶液不从正离子检测器供给负离子检测器，样品溶液不从负离子检测器供给正离子检测器。正离子检测器和负离子检测器优选地使用具有输入端口和第一和第二输出端口的双向阀从样品容器提供样品溶液。输入端口连接到采样容器，第一输出端口连接到第一检测器，第二输出端口连接到第二检测器。

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