专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US07378230B2 Photoresist composition for multi-micro nozzle head coater 有权
标题翻译：用于多微喷嘴头涂布机的光刻胶组合物
公开(公告)号：US07378230B2
公开(公告)日：2008-05-27
申请号：US10750845
申请日：2004-01-05
申请人： Sung-Chul Kang , Jin-Ho Ju , You-Kyoung Lee , Dong-Ki Lee , Hyo-Youl Kim , Hoon Kang , Seung-Uk Lee , Byung-Uk Kim
发明人： Sung-Chul Kang , Jin-Ho Ju , You-Kyoung Lee , Dong-Ki Lee , Hyo-Youl Kim , Hoon Kang , Seung-Uk Lee , Byung-Uk Kim
IPC分类号： G03F7/32 , G03F7/023
CPC分类号： G03F7/0236 , G03F7/0048
摘要： The present invention relates to a photoresist composition for an MMN (multi-micro nozzle) head coater, more particularly to a photoresist composition comprising a novolak resin with a molecular weight ranging from 2000 to 12,000, a diazide photoactive compound, an organic solvent, and a Si-based surfactant for use in liquid crystal display circuits.The photoresist composition for liquid crystal display circuits of the present invention solves the stain problem, which occurs in MMN head coaters used for large-scale substrate glass, and improves coating characteristics, so that it can be utilized industrially and is expected to significantly improve productivity.
摘要翻译：本发明涉及一种用于MMN（多微喷嘴）喷涂机的光致抗蚀剂组合物，更具体地说涉及一种光致抗蚀剂组合物，其包含分子量范围为2000-12,000的酚醛清漆树脂，二叠氮光敏化合物，有机溶剂和用于液晶显示电路的Si基表面活性剂。本发明的液晶显示电路用光致抗蚀剂组合物解决了用于大规模基板玻璃的MMN头涂布机中发生的污渍问题，并且改善了涂布特性，从而可以在工业上得到利用并且预期显着提高生产率。

2. 发明授权

US06893791B2 Photoresist composition and method of forming pattern using the same 有权
标题翻译：光刻胶组合物和使用其形成图案的方法
公开(公告)号：US06893791B2
公开(公告)日：2005-05-17
申请号：US10259152
申请日：2002-09-27
申请人： You-Kyoung Lee , Sung-Chul Kang , Jin-Ho Ju , Dong-Ki Lee , Seung-Uk Lee , Hoon Kang
发明人： You-Kyoung Lee , Sung-Chul Kang , Jin-Ho Ju , Dong-Ki Lee , Seung-Uk Lee , Hoon Kang
IPC分类号： G03F7/004 , G02F1/13 , G03F7/008 , G03F7/022 , G03F7/023 , G03F7/40 , G03F7/30
CPC分类号： G03F7/0236 , G03F7/0226 , G03F7/40
摘要： Disclosed is a photoresist composition having a good sensitivity and residual layer characteristic and a method of forming a pattern using the same. The photoresist composition includes 5-30% by weight of a polymer resin, 2-10% by weight of a photosensitive compound, 0.1-10% by weight of a sensitivity enhancing agent, 0.1-10% by weight of a sensitivity restraining agent and 60-90% by weight of an organic solvent. A photoresist layer is formed by coating the photoresist composition on a substrate and then drying the coated photoresist composition. Then, thus obtained photoresist layer is exposed by using a mask having a predetermined pattern. Then, a photoresist pattern is formed by developing thus exposed photoresist layer. The photoresist pattern exhibits a uniform layer thickness and critical dimension.
摘要翻译：公开了具有良好的灵敏度和残留层特性的光致抗蚀剂组合物和使用其形成图案的方法。光致抗蚀剂组合物包含5-30重量％的聚合物树脂，2-10重量％的感光性化合物，0.1-10重量％的敏感性增强剂，0.1-10重量％的敏感性抑制剂和 60-90重量％的有机溶剂。通过将光致抗蚀剂组合物涂覆在基材上，然后干燥涂覆的光致抗蚀剂组合物，形成光致抗蚀剂层然后，通过使用具有预定图案的掩模曝光所得到的光致抗蚀剂层。然后，通过显影这样曝光的光刻胶层形成光致抗蚀剂图案。光致抗蚀剂图案具有均匀的层厚度和临界尺寸。

3. 发明申请

US20060008728A1 Photoresist composition 有权
标题翻译：光刻胶组成
公开(公告)号：US20060008728A1
公开(公告)日：2006-01-12
申请号：US11174872
申请日：2005-07-05
申请人： Hoon Kang , Seung-uk Lee , Woo-sik Jun , Dae-youn Park , Ju-hyuk Kim , Byung-uk Kim
发明人： Hoon Kang , Seung-uk Lee , Woo-sik Jun , Dae-youn Park , Ju-hyuk Kim , Byung-uk Kim
IPC分类号： G03C5/18
CPC分类号： G03F7/0048 , G03F7/0007 , G03F7/022
摘要： The present invention provides a photoresist composition and more particularly, a photoresist composition comprising a) a novolak resin, b) a diazide compound, and c) a solvent containing propylene glycol methyl ether acetate (PGMEA) and 2,2,4-triemthyl-1,3-penthanediolmonoisobutylate (TMPMB). The photoresist composition according to the invention has excellent coating uniformity and stain inhibitory properties after coating so that it can be easily applied to real industrial fields and it can improve working environments due to the reduction of amounts to be consumed, the decrease of time to be required for manufacture, etc. when manufactured on a large scale.
摘要翻译：本发明提供一种光致抗蚀剂组合物，更具体地说，涉及一种光致抗蚀剂组合物，其包含：a）酚醛清漆树脂，b）二叠氮化合物，和c）含有丙二醇甲基醚乙酸酯（PGMEA）和2,2,4-三甲基 - 1,3-戊二醇单异丁酸酯（TMPMB）。根据本发明的光致抗蚀剂组合物在涂布后具有优异的涂布均匀性和防污性，使得其可以容易地应用于实际工业领域，并且可以由于减少待消耗的量而减少工作环境，减少时间制造时需要大规模制造。

4. 发明授权

US07195854B2 Photoresist composition 有权
标题翻译：光刻胶组成
公开(公告)号：US07195854B2
公开(公告)日：2007-03-27
申请号：US11174872
申请日：2005-07-05
申请人： Hoon Kang , Seung-uk Lee , Woo-sik Jun , Dae-youn Park , Ju-hyuk Kim , Byung-uk Kim
发明人： Hoon Kang , Seung-uk Lee , Woo-sik Jun , Dae-youn Park , Ju-hyuk Kim , Byung-uk Kim
IPC分类号： G03F7/023
CPC分类号： G03F7/0048 , G03F7/0007 , G03F7/022
摘要： The present invention provides a photoresist composition and more particularly, a photoresist composition comprising a) a novolak resin, b) a diazide compound, and c) a solvent containing propylene glycol methyl ether acetate (PGMEA) and 2,2,4-triemthyl-1,3-penthanediolmonoisobutylate (TMPMB). The photoresist composition according to the invention has excellent coating uniformity and stain inhibitory properties after coating so that it can be easily applied to real industrial fields and it can improve working environments due to the reduction of amounts to be consumed, the decrease of time to be required for manufacture, etc. when manufactured on a large scale.
摘要翻译：本发明提供一种光致抗蚀剂组合物，更具体地说，涉及一种光致抗蚀剂组合物，其包含a）一种酚醛清漆树脂，b）一种重氮化合物，和c）含有丙二醇甲基醚乙酸酯（PGMEA）和2,2,4-三甲基 - 1,3-戊二醇单异丁酸酯（TMPMB）。根据本发明的光致抗蚀剂组合物在涂布后具有优异的涂布均匀性和防污性，使得其可以容易地应用于实际工业领域，并且可以由于减少待消耗的量而减少工作环境，减少时间制造时需要大规模制造。

5. 发明授权

US08895439B2 Method for forming pattern and method for manufacturing display device by using the same 有权
标题翻译：用于形成图案的方法和使用该显示装置的方法
公开(公告)号：US08895439B2
公开(公告)日：2014-11-25
申请号：US13486858
申请日：2012-06-01
申请人： Woo-Seok Jeon , Jong Kwang Lee , Jin Ho Ju , Min Kang , Hoon Kang , Seung Bo Shim , Gwui-Hyun Park , Bong-Yeon Kim , Seon-II Kim
发明人： Woo-Seok Jeon , Jong Kwang Lee , Jin Ho Ju , Min Kang , Hoon Kang , Seung Bo Shim , Gwui-Hyun Park , Bong-Yeon Kim , Seon-II Kim
IPC分类号： H01L21/00 , G03F7/20
CPC分类号： G03F7/203 , G03F7/20 , G03F7/70466 , Y10S438/942
摘要： A method for forming a fine exposure pattern where a width and an interval of the pattern are each 1CD, by first exposing a photoresist by using an exposure mask where an interval ratio of a light shielding part and a light transmission part is 2CD:1CD to 4CD:1CD, and then second exposing the photoresist after the exposure mask is shifted at a predetermined interval, or second exposing the photoresist by using an exposure mask formed at a position where a light transmission part is shifted at a predetermined interval, and developing the photoresist, such that it is possible to form a display device having a pixel electrode including a plurality of fine branch electrodes having a smaller width and interval than a resolution of an exposure apparatus.
摘要翻译：通过使用遮光部和光透射部的间隔比为2CD:1CD的曝光掩模，首先使光致抗蚀剂曝光，形成图案的宽度和间隔为1CD的微细曝光图案的方法， 4CD：1CD，然后在曝光掩模以预定间隔移动之后第二次曝光光致抗蚀剂，或者通过使用形成在光透射部分以预定间隔移动的位置处的曝光掩模来第二次曝光光致抗蚀剂，光致抗蚀剂，使得可以形成具有像素电极的显示装置，该像素电极包括具有比曝光装置的分辨率更小的宽度和间隔的多个细分支电极。

6. 发明授权

US08324003B2 Method for manufacturing a thin film transistor array panel 有权
标题翻译：薄膜晶体管阵列面板的制造方法
公开(公告)号：US08324003B2
公开(公告)日：2012-12-04
申请号：US12767667
申请日：2010-04-26
申请人： Hoon Kang , Jin-Ho Ju , Yang-Ho Jung , Jae-Sung Kim
发明人： Hoon Kang , Jin-Ho Ju , Yang-Ho Jung , Jae-Sung Kim
IPC分类号： H01L21/311 , H01L33/44
CPC分类号： H01L21/76816 , H01L27/124 , H01L27/1288
摘要： A thin film transistor display panel includes gate wiring formed on an insulation substrate and including gate lines, and gate electrodes and gate pads connected to the gate lines; a gate insulation layer covering the gate wiring; a semiconductor pattern formed over the gate insulation layer; data wiring formed over the gate insulation layer or the semiconductor pattern and including source electrodes, drain electrodes, and data pads; a protection layer including a Nega-PR type of organic insulating layer formed all over the semiconductor pattern and the data wiring, wherein the thickness of the Nega-PR type of organic insulating layer in both the gate and data pad regions is smaller than in the other regions; and a pixel electrode connected to the drain electrode. When exposing the Nega-PR type of passivation layer in the pad region during a photolithography process, a photomask having a lattice pattern made of a metal such as Cr that has a line width of less than the resolution of a light exposer is used. Thus, the resulting post-etch height of the passivation layer can be selectively controlled so as to provide reduced effective thickness in the pad regions.
摘要翻译：薄膜晶体管显示面板包括形成在绝缘基板上并包括栅极线的栅极布线，以及连接到栅极线的栅电极和栅极焊盘; 覆盖栅极布线的栅极绝缘层; 形成在所述栅极绝缘层上的半导体图案; 数据线形成在栅极绝缘层或半导体图案上，并且包括源电极，漏电极和数据焊盘; 包括形成在整个半导体图案上的Nega-PR型有机绝缘层和数据布线的保护层，其中栅极和数据焊盘区域中的Nega-PR类型的有机绝缘层的厚度小于其他地区; 以及连接到漏电极的像素电极。在光刻工艺中，当在焊盘区域中曝光Nega-PR类型的钝化层时，使用具有由诸如Cr之类的金属制成的格子图案的光掩模，该栅极图案的线宽小于曝光器的分辨率。因此，可以选择性地控制所得到的钝化层的蚀刻后高度，以便在焊盘区域中提供减小的有效厚度。

7. 发明申请

US20110051059A1 ORGANIC LAYER COMPOSITION AND LIQUID CRYSTAL DISPLAY USING THE SAME 有权
标题翻译：有机层组合物和使用其的液晶显示
公开(公告)号：US20110051059A1
公开(公告)日：2011-03-03
申请号：US12723419
申请日：2010-03-12
申请人： Hoon Kang , Jae-Sung Kim , Yang-Ho Jung , Jin-Ho Ju , Doo-Hee Jung , Jung-In Park , Shi-Yul Kim
发明人： Hoon Kang , Jae-Sung Kim , Yang-Ho Jung , Jin-Ho Ju , Doo-Hee Jung , Jung-In Park , Shi-Yul Kim
IPC分类号： G02F1/1333 , C08F224/00 , C08F220/06 , C08F220/26 , C08F232/08 , C08F222/04 , C08G67/04 , C08G77/14 , C08G73/10 , C08G65/00 , G02F1/1337
CPC分类号： C08F220/06 , C08F220/26 , C08F222/04 , C08F224/00 , C08G73/1067 , G02F1/133707 , G02F1/133719 , G02F1/133753 , G02F1/133788 , G02F1/136209 , G02F1/13624 , G02F2001/133726 , G02F2001/133746 , G02F2001/133757 , G02F2001/136222 , G02F2201/086 , G02F2202/022 , G02F2202/103 , G02F2202/104
摘要： An organic layer composition and a liquid crystal display including the same are provided. An organic layer composition according to an exemplary embodiment includes a binder formed by copolymerizing compounds included in a first group and a second group, wherein the first group includes an acryl-based compound and the second group includes a compound without a —COO— group.
摘要翻译：提供了有机层组合物和包括其的液晶显示器。根据示例性实施方案的有机层组合物包括通过共聚第一组中包含的化合物和第二组而形成的粘合剂，其中第一组包括丙烯酸类化合物，第二组包括不含-COO-基团的化合物。

8. 发明授权

US08809467B2 Organic layer composition and liquid crystal display using the same 有权
标题翻译：有机层组成和使用其的液晶显示器
公开(公告)号：US08809467B2
公开(公告)日：2014-08-19
申请号：US12723419
申请日：2010-03-12
申请人： Hoon Kang , Jae-Sung Kim , Yang-Ho Jung , Jin-Ho Ju , Doo-Hee Jung , Jung-In Park , Shi-Yul Kim
发明人： Hoon Kang , Jae-Sung Kim , Yang-Ho Jung , Jin-Ho Ju , Doo-Hee Jung , Jung-In Park , Shi-Yul Kim
IPC分类号： C08G59/00
CPC分类号： C08F220/06 , C08F220/26 , C08F222/04 , C08F224/00 , C08G73/1067 , G02F1/133707 , G02F1/133719 , G02F1/133753 , G02F1/133788 , G02F1/136209 , G02F1/13624 , G02F2001/133726 , G02F2001/133746 , G02F2001/133757 , G02F2001/136222 , G02F2201/086 , G02F2202/022 , G02F2202/103 , G02F2202/104
摘要： An organic layer composition and a liquid crystal display including the same are provided. An organic layer composition according to an exemplary embodiment includes a binder formed by copolymerizing compounds included in a first group and a second group, wherein the first group includes an acryl-based compound and the second group includes a compound without a —COO— group.
摘要翻译：提供了有机层组合物和包括其的液晶显示器。根据示例性实施方案的有机层组合物包括通过共聚第一组中包含的化合物和第二组而形成的粘合剂，其中第一组包括丙烯酸类化合物，第二组包括不含-COO-基团的化合物。

9. 发明申请

US20050064321A1 Positive photoresist composition for liquid crystal device 审中-公开
标题翻译：用于液晶装置的正光致抗蚀剂组合物
公开(公告)号：US20050064321A1
公开(公告)日：2005-03-24
申请号：US10494486
申请日：2002-10-21
申请人： Hoon Kang , Joon-Yeon Cho , Dong-Min Kim , Seung-Uk Lee
发明人： Hoon Kang , Joon-Yeon Cho , Dong-Min Kim , Seung-Uk Lee
IPC分类号： G03F7/008 , G03F7/00 , G03F7/004 , G03F7/023 , H01L21/027 , G03C1/494
CPC分类号： G03F7/0236 , G03F7/0007
摘要： The present invention relates to an LCD circuit photoresist composition for manufacturing fine circuit patterns on liquid crystal display circuits or semiconductor integrated circuits, and more particularly, and LCD circuit photoresist composition including (a) mixed polymer resins comprising a novolak resin with a molecular weight ranging from 3,000 to 9,000 and a fractionated novolak resin with a molecular weight ranging from 3,500 to 10,000; (b) a diazide-type photosensitive compound; (c) a photosensitizer; and (d) organic solvents. An LCD circuit photoresist composition of the present invention has excellent photosensitivity, retention ratio, resolution, contrast, heat resistance, adhesion, and stripper solubility, thus this photoresist composition can be easily applied to industrial work places for better working environments.
摘要翻译：本发明涉及用于在液晶显示电路或半导体集成电路上制造精细电路图案的LCD电路光致抗蚀剂组合物，更具体地说，涉及包括（a）包含分子量范围的酚醛清漆树脂的混合聚合物树脂的LCD电路光致抗蚀剂组合物 3,000至9,000份，分子量为3,500至10,000份的分级酚醛清漆树脂; （b）二叠氮型光敏化合物; （c）光敏剂; 和（d）有机溶剂。本发明的LCD电路光阻组合物具有优异的光敏性，保留率，分辨率，对比度，耐热性，粘合性和剥离剂溶解性，因此该光致抗蚀剂组合物可以容易地应用于工业工作场所，从而达到更好的工作环境。

10. 发明授权

US09632339B2 3D image display device including display panel and patterned retarder 有权
公开(公告)号：US09632339B2
公开(公告)日：2017-04-25
申请号：US12643267
申请日：2009-12-21
申请人： Insu Baik , Hoon Kang , Sudong Roh
发明人： Insu Baik , Hoon Kang , Sudong Roh
IPC分类号： G02F1/1333 , G02B27/22 , G02B27/26 , H04N13/04 , G02F1/1345
CPC分类号： G02F1/1333 , G02B27/2242 , G02B27/26 , G02F1/13452 , G02F2413/01 , H04N13/337
摘要： A three-dimensional (3D) image display device includes a display panel including an upper substrate and a lower substrate, the lower substrate having a pixel array area overlapped with the upper substrate and a pad area formed on at least one side of the lower substrate outside the pixel array area, wherein the display panel displays a left eye image and a right eye image; and a patterned retarder attached to the display panel and having retarder patterns to apply first and second polarizations to light from the display panel corresponding to the left eye image and the right eye image, respectively, wherein the pad area includes a first area in which data pads extending from data lines of the pixel array area are formed, and a second area in which gate pads extending from gate lines of the pixel array area are formed, and wherein the first area is exposed when the display panel and the patterned retarder are attached.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式