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1. 发明授权

US07378230B2 Photoresist composition for multi-micro nozzle head coater 有权
标题翻译：用于多微喷嘴头涂布机的光刻胶组合物
公开(公告)号：US07378230B2
公开(公告)日：2008-05-27
申请号：US10750845
申请日：2004-01-05
申请人： Sung-Chul Kang , Jin-Ho Ju , You-Kyoung Lee , Dong-Ki Lee , Hyo-Youl Kim , Hoon Kang , Seung-Uk Lee , Byung-Uk Kim
发明人： Sung-Chul Kang , Jin-Ho Ju , You-Kyoung Lee , Dong-Ki Lee , Hyo-Youl Kim , Hoon Kang , Seung-Uk Lee , Byung-Uk Kim
IPC分类号： G03F7/32 , G03F7/023
CPC分类号： G03F7/0236 , G03F7/0048
摘要： The present invention relates to a photoresist composition for an MMN (multi-micro nozzle) head coater, more particularly to a photoresist composition comprising a novolak resin with a molecular weight ranging from 2000 to 12,000, a diazide photoactive compound, an organic solvent, and a Si-based surfactant for use in liquid crystal display circuits.The photoresist composition for liquid crystal display circuits of the present invention solves the stain problem, which occurs in MMN head coaters used for large-scale substrate glass, and improves coating characteristics, so that it can be utilized industrially and is expected to significantly improve productivity.
摘要翻译：本发明涉及一种用于MMN（多微喷嘴）喷涂机的光致抗蚀剂组合物，更具体地说涉及一种光致抗蚀剂组合物，其包含分子量范围为2000-12,000的酚醛清漆树脂，二叠氮光敏化合物，有机溶剂和用于液晶显示电路的Si基表面活性剂。本发明的液晶显示电路用光致抗蚀剂组合物解决了用于大规模基板玻璃的MMN头涂布机中发生的污渍问题，并且改善了涂布特性，从而可以在工业上得到利用并且预期显着提高生产率。

2. 发明授权

US06893791B2 Photoresist composition and method of forming pattern using the same 有权
标题翻译：光刻胶组合物和使用其形成图案的方法
公开(公告)号：US06893791B2
公开(公告)日：2005-05-17
申请号：US10259152
申请日：2002-09-27
申请人： You-Kyoung Lee , Sung-Chul Kang , Jin-Ho Ju , Dong-Ki Lee , Seung-Uk Lee , Hoon Kang
发明人： You-Kyoung Lee , Sung-Chul Kang , Jin-Ho Ju , Dong-Ki Lee , Seung-Uk Lee , Hoon Kang
IPC分类号： G03F7/004 , G02F1/13 , G03F7/008 , G03F7/022 , G03F7/023 , G03F7/40 , G03F7/30
CPC分类号： G03F7/0236 , G03F7/0226 , G03F7/40
摘要： Disclosed is a photoresist composition having a good sensitivity and residual layer characteristic and a method of forming a pattern using the same. The photoresist composition includes 5-30% by weight of a polymer resin, 2-10% by weight of a photosensitive compound, 0.1-10% by weight of a sensitivity enhancing agent, 0.1-10% by weight of a sensitivity restraining agent and 60-90% by weight of an organic solvent. A photoresist layer is formed by coating the photoresist composition on a substrate and then drying the coated photoresist composition. Then, thus obtained photoresist layer is exposed by using a mask having a predetermined pattern. Then, a photoresist pattern is formed by developing thus exposed photoresist layer. The photoresist pattern exhibits a uniform layer thickness and critical dimension.
摘要翻译：公开了具有良好的灵敏度和残留层特性的光致抗蚀剂组合物和使用其形成图案的方法。光致抗蚀剂组合物包含5-30重量％的聚合物树脂，2-10重量％的感光性化合物，0.1-10重量％的敏感性增强剂，0.1-10重量％的敏感性抑制剂和 60-90重量％的有机溶剂。通过将光致抗蚀剂组合物涂覆在基材上，然后干燥涂覆的光致抗蚀剂组合物，形成光致抗蚀剂层然后，通过使用具有预定图案的掩模曝光所得到的光致抗蚀剂层。然后，通过显影这样曝光的光刻胶层形成光致抗蚀剂图案。光致抗蚀剂图案具有均匀的层厚度和临界尺寸。

3. 发明申请

US20050064321A1 Positive photoresist composition for liquid crystal device 审中-公开
标题翻译：用于液晶装置的正光致抗蚀剂组合物
公开(公告)号：US20050064321A1
公开(公告)日：2005-03-24
申请号：US10494486
申请日：2002-10-21
申请人： Hoon Kang , Joon-Yeon Cho , Dong-Min Kim , Seung-Uk Lee
发明人： Hoon Kang , Joon-Yeon Cho , Dong-Min Kim , Seung-Uk Lee
IPC分类号： G03F7/008 , G03F7/00 , G03F7/004 , G03F7/023 , H01L21/027 , G03C1/494
CPC分类号： G03F7/0236 , G03F7/0007
摘要： The present invention relates to an LCD circuit photoresist composition for manufacturing fine circuit patterns on liquid crystal display circuits or semiconductor integrated circuits, and more particularly, and LCD circuit photoresist composition including (a) mixed polymer resins comprising a novolak resin with a molecular weight ranging from 3,000 to 9,000 and a fractionated novolak resin with a molecular weight ranging from 3,500 to 10,000; (b) a diazide-type photosensitive compound; (c) a photosensitizer; and (d) organic solvents. An LCD circuit photoresist composition of the present invention has excellent photosensitivity, retention ratio, resolution, contrast, heat resistance, adhesion, and stripper solubility, thus this photoresist composition can be easily applied to industrial work places for better working environments.
摘要翻译：本发明涉及用于在液晶显示电路或半导体集成电路上制造精细电路图案的LCD电路光致抗蚀剂组合物，更具体地说，涉及包括（a）包含分子量范围的酚醛清漆树脂的混合聚合物树脂的LCD电路光致抗蚀剂组合物 3,000至9,000份，分子量为3,500至10,000份的分级酚醛清漆树脂; （b）二叠氮型光敏化合物; （c）光敏剂; 和（d）有机溶剂。本发明的LCD电路光阻组合物具有优异的光敏性，保留率，分辨率，对比度，耐热性，粘合性和剥离剂溶解性，因此该光致抗蚀剂组合物可以容易地应用于工业工作场所，从而达到更好的工作环境。

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