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1. 发明授权

US06893791B2 Photoresist composition and method of forming pattern using the same 有权
标题翻译：光刻胶组合物和使用其形成图案的方法
公开(公告)号：US06893791B2
公开(公告)日：2005-05-17
申请号：US10259152
申请日：2002-09-27
申请人： You-Kyoung Lee , Sung-Chul Kang , Jin-Ho Ju , Dong-Ki Lee , Seung-Uk Lee , Hoon Kang
发明人： You-Kyoung Lee , Sung-Chul Kang , Jin-Ho Ju , Dong-Ki Lee , Seung-Uk Lee , Hoon Kang
IPC分类号： G03F7/004 , G02F1/13 , G03F7/008 , G03F7/022 , G03F7/023 , G03F7/40 , G03F7/30
CPC分类号： G03F7/0236 , G03F7/0226 , G03F7/40
摘要： Disclosed is a photoresist composition having a good sensitivity and residual layer characteristic and a method of forming a pattern using the same. The photoresist composition includes 5-30% by weight of a polymer resin, 2-10% by weight of a photosensitive compound, 0.1-10% by weight of a sensitivity enhancing agent, 0.1-10% by weight of a sensitivity restraining agent and 60-90% by weight of an organic solvent. A photoresist layer is formed by coating the photoresist composition on a substrate and then drying the coated photoresist composition. Then, thus obtained photoresist layer is exposed by using a mask having a predetermined pattern. Then, a photoresist pattern is formed by developing thus exposed photoresist layer. The photoresist pattern exhibits a uniform layer thickness and critical dimension.
摘要翻译：公开了具有良好的灵敏度和残留层特性的光致抗蚀剂组合物和使用其形成图案的方法。光致抗蚀剂组合物包含5-30重量％的聚合物树脂，2-10重量％的感光性化合物，0.1-10重量％的敏感性增强剂，0.1-10重量％的敏感性抑制剂和 60-90重量％的有机溶剂。通过将光致抗蚀剂组合物涂覆在基材上，然后干燥涂覆的光致抗蚀剂组合物，形成光致抗蚀剂层然后，通过使用具有预定图案的掩模曝光所得到的光致抗蚀剂层。然后，通过显影这样曝光的光刻胶层形成光致抗蚀剂图案。光致抗蚀剂图案具有均匀的层厚度和临界尺寸。

2. 发明授权

US07378230B2 Photoresist composition for multi-micro nozzle head coater 有权
标题翻译：用于多微喷嘴头涂布机的光刻胶组合物
公开(公告)号：US07378230B2
公开(公告)日：2008-05-27
申请号：US10750845
申请日：2004-01-05
申请人： Sung-Chul Kang , Jin-Ho Ju , You-Kyoung Lee , Dong-Ki Lee , Hyo-Youl Kim , Hoon Kang , Seung-Uk Lee , Byung-Uk Kim
发明人： Sung-Chul Kang , Jin-Ho Ju , You-Kyoung Lee , Dong-Ki Lee , Hyo-Youl Kim , Hoon Kang , Seung-Uk Lee , Byung-Uk Kim
IPC分类号： G03F7/32 , G03F7/023
CPC分类号： G03F7/0236 , G03F7/0048
摘要： The present invention relates to a photoresist composition for an MMN (multi-micro nozzle) head coater, more particularly to a photoresist composition comprising a novolak resin with a molecular weight ranging from 2000 to 12,000, a diazide photoactive compound, an organic solvent, and a Si-based surfactant for use in liquid crystal display circuits.The photoresist composition for liquid crystal display circuits of the present invention solves the stain problem, which occurs in MMN head coaters used for large-scale substrate glass, and improves coating characteristics, so that it can be utilized industrially and is expected to significantly improve productivity.
摘要翻译：本发明涉及一种用于MMN（多微喷嘴）喷涂机的光致抗蚀剂组合物，更具体地说涉及一种光致抗蚀剂组合物，其包含分子量范围为2000-12,000的酚醛清漆树脂，二叠氮光敏化合物，有机溶剂和用于液晶显示电路的Si基表面活性剂。本发明的液晶显示电路用光致抗蚀剂组合物解决了用于大规模基板玻璃的MMN头涂布机中发生的污渍问题，并且改善了涂布特性，从而可以在工业上得到利用并且预期显着提高生产率。

3. 发明授权

US07144662B2 Photoresist composition having a high heat resistance 有权
标题翻译：具有高耐热性的光刻胶组合物
公开(公告)号：US07144662B2
公开(公告)日：2006-12-05
申请号：US10493193
申请日：2002-02-20
申请人： Dong-Ki Lee , Sung-Chul Kang , You-Kyoung Lee , Jin-Ho Ju
发明人： Dong-Ki Lee , Sung-Chul Kang , You-Kyoung Lee , Jin-Ho Ju
IPC分类号： G03F7/023
CPC分类号： G03F7/0226
摘要： The present invention relates to a photoresist composition having high heat resistance used in the production process of an LCD, and more particularly, to a photoresist composition having high heat resistance, capable of decreasing process tact (a way), of process simplification, and of the retrenchment of expenditures. The inventive composition facilitates this through making it possible to skip 5 processes, such as Cr metal deposition forming a metal film, and the photo/etch/PR strip/etch steps of the whole surface of the metal, by substituting the inventive composition for the usual metal film, such that N+ ion doping in production of TFT-LCD can take place due its high heat resistance.
摘要翻译：本发明涉及在LCD的生产过程中使用的具有高耐热性的光致抗蚀剂组合物，更具体地说，涉及具有高耐热性，能够降低工艺简化的工艺（一种方法）的光致抗蚀剂组合物，以及削减支出。本发明的组合物通过使得本发明的组合物代替本发明的组合物可以跳过5种工艺，例如形成金属膜的Cr金属沉积和金属的整个表面的光刻/蚀刻/ PR剥离/蚀刻步骤通常的金属膜，由于其高耐热性，可以发生TFT-LCD的生产中的N + + / - 离子掺杂。

4. 发明授权

US06686120B2 Photoresist composition and method of forming pattern using the same 有权
标题翻译：光刻胶组合物和使用其形成图案的方法
公开(公告)号：US06686120B2
公开(公告)日：2004-02-03
申请号：US10219711
申请日：2002-08-15
申请人： You-Kyoung Lee , Sung-Chul Kang , Jin-Ho Ju , Dong-Ki Lee
发明人： You-Kyoung Lee , Sung-Chul Kang , Jin-Ho Ju , Dong-Ki Lee
IPC分类号： G03F7023
CPC分类号： G03F7/0233 , G03F7/40
摘要： Disclosed is a photoresist composition including a thermal acid generator and a method of forming a pattern using the same. The photoresist composition includes about 100 parts by weight of an alkali-soluble acryl copolymer, about 5-100 parts by weight of 1,2-quinonediazide compound, about 2-35 parts by weight of nitrogen-containing cross-linking agent and about 0.1-10 parts by weight of a thermal acid generator which produces an acid by heat. The photoresist composition is coated on a substrate and dried to form a photoresist layer. The photoresist layer is exposed by using a mask having a predetermined shape. Thus obtained exposed photoresist layer is developed by using an aqueous alkaline solution to form a photoresist pattern. Thus obtained photoresist pattern is heated to be cured without generating thermal reflow.
摘要翻译：公开了一种光致抗蚀剂组合物，其包括热酸产生剂和使用其形成图案的方法。光致抗蚀剂组合物包括约100重量份的碱溶性丙烯酸共聚物，约5-100重量份的1,2-醌二叠氮化合物，约2-35重量份含氮交联剂和约0.1重量份 -10重量份的通过加热产生酸的热酸发生剂。将光致抗蚀剂组合物涂布在基材上并干燥以形成光致抗蚀剂层。通过使用具有预定形状的掩模来曝光光致抗蚀剂层。通过使用碱性水溶液来形成曝光的光致抗蚀剂层以形成光致抗蚀剂图案。将得到的光致抗蚀剂图案加热固化而不产生热回流。

5. 发明授权

US07612028B2 Thinner composition, method of preparing the same and method of recovering the same 有权
标题翻译：较薄组合物，其制备方法及其回收方法
公开(公告)号：US07612028B2
公开(公告)日：2009-11-03
申请号：US11294058
申请日：2005-12-05
申请人： Dong-Ki Lee , Jin-Ho Ju , Hi-Kuk Lee , Seon-Su Sin , Kwang-Soo Lee , Jae-Woong Mun
发明人： Dong-Ki Lee , Jin-Ho Ju , Hi-Kuk Lee , Seon-Su Sin , Kwang-Soo Lee , Jae-Woong Mun
IPC分类号： C11D7/50
CPC分类号： C11D11/0047 , C11D7/263 , C11D7/266 , C11D7/5022
摘要： A thinner composition is provided which includes about 60-80% by weight of propylene glycol mono-alkyl ether having a boiling point of T1° C., about 10-30% by weight of alkyl acetate having a boiling point of T2° C., and about 1-10% by weight of a solvent. The solvent has a boiling point of T3° C. and satisfies the equation (1). T2
摘要翻译：提供了一种更薄的组合物，其包含约60-80重量％的沸点为T1℃的丙二醇单烷基醚，约10-30重量％的沸点为T2℃的烷基乙酸酯。，和约1-10重量％的溶剂。溶剂的沸点为T3℃，满足式（1）。 T232 + 30（1）。

6. 发明申请

US20060124596A1 Thinner composition, method of preparing the same and method of recovering the same 有权
标题翻译：较薄组合物，其制备方法及其回收方法
公开(公告)号：US20060124596A1
公开(公告)日：2006-06-15
申请号：US11294058
申请日：2005-12-05
申请人： Dong-Ki Lee , Jin-Ho Ju , Hi-Kuk Lee , Seon-Su Sin , Kwang-Soo Lee , Jae-Woong Mun
发明人： Dong-Ki Lee , Jin-Ho Ju , Hi-Kuk Lee , Seon-Su Sin , Kwang-Soo Lee , Jae-Woong Mun
IPC分类号： C09K13/00 , C09K13/06 , B44C1/22 , C03C25/68
CPC分类号： C11D11/0047 , C11D7/263 , C11D7/266 , C11D7/5022
摘要： A thinner composition is provided which includes about 60-80% by weight of propylene glycol mono-alkyl ether having a boiling point of T1° C., about 10-30% by weight of alkyl acetate having a boiling point of T2° C., and about 1-10% by weight of a solvent. The solvent has a boiling point of T3° C. and satisifes the equation (1). T2
摘要翻译：提供了更薄的组合物，其包含约60-80重量％的沸点为T 1℃的丙二醇单烷基醚，约10-30重量％的具有沸点为T 2℃，和约1-10重量％的溶剂。溶剂的沸点为T 3℃，满足式（1）。 <？in-line-formula description =“In-line Formulas”end =“lead”？> T <2> 3 +30（1）<？in-line-formula description =“In-line Formulas”end =“tail”？>

7. 发明申请

US20050089790A1 Photoresist composition for a spinless coater and method of forming a photoresist pattern using the same 审中-公开
标题翻译：用于无纺涂布机的光致抗蚀剂组合物和使用其形成光致抗蚀剂图案的方法
公开(公告)号：US20050089790A1
公开(公告)日：2005-04-28
申请号：US10931387
申请日：2004-09-01
申请人： Dong-Ki Lee , Jin-Ho Ju , Hyo-Youl Kim
发明人： Dong-Ki Lee , Jin-Ho Ju , Hyo-Youl Kim
IPC分类号： G03C5/18 , G03F7/004 , G03F7/022 , G03F7/023
CPC分类号： G03F7/0048 , G03F7/022 , G03F7/023
摘要： A photoresist composition for a spinless coater includes a novolak resin having a weight average molecular weight of about 2,000 to about 15,000, a diazide based photosensitive compound and a volatile organic solvent. The photoresist composition is applied to a substrate of a liquid crystal display apparatus to reduce blots and enhance application uniformity. A highly volatile solvent, such as n-propyl acetate (nPAC) or n-butyl acetate (nBA) is used in the photoresist composition as the volatile organic solvent. The photoresist composition including the volatile organic solvent gives a photoresist film that has a uniform thickness. Hence, the generation of small resin blots and thick blots may be reduced.
摘要翻译：无纺涂布机用光致抗蚀剂组合物包括重均分子量为约2,000至约15,000的酚醛清漆树脂，二叠氮基感光性化合物和挥发性有机溶剂。将光致抗蚀剂组合物施加到液晶显示装置的基板上以减少印迹并提高应用均匀性。在光致抗蚀剂组合物中使用高挥发性溶剂如乙酸正丙酯（nPAC）或乙酸正丁酯（nBA）作为挥发性有机溶剂。包括挥发性有机溶剂的光致抗蚀剂组合物提供具有均匀厚度的光致抗蚀剂膜。因此，可能减少产生小的树脂印迹和厚的印迹。

8. 发明授权

US08716171B2 Method of manufacturing a porous gallium (III) oxide photocatalyst for preparation of hydrocarbons 有权
标题翻译：制造用于制备碳氢化合物的多孔镓（III）光催化剂的方法
公开(公告)号：US08716171B2
公开(公告)日：2014-05-06
申请号：US13527351
申请日：2012-06-19
申请人： Jeung-Ku Kang , Hang-Ah Park , Jung-Hoon Choi , Kyung-Min Choi , Dong-Ki Lee
发明人： Jeung-Ku Kang , Hang-Ah Park , Jung-Hoon Choi , Kyung-Min Choi , Dong-Ki Lee
IPC分类号： B01J13/00 , B01J23/00 , B01J23/08 , B01F3/00 , C09K3/00 , B01F17/00
CPC分类号： B01J35/002 , B01J35/0013 , B01J35/004 , B01J35/026 , B01J35/1014 , B01J35/1071 , B01J35/1076 , B01J37/031 , C01G15/00 , C01P2002/72 , C01P2004/03 , C01P2004/04 , C01P2004/12 , C01P2006/12 , C01P2006/16 , C07C1/02 , C07C2523/08 , C07C9/04
摘要： The present invention relates to preparation of porous gallium (III) oxide [Ga2O3] photocatalyst for production of hydrocarbons a porous gallium oxide photocatalyst for production of hydrocarbons, manufactured by the foregoing method, and a process of producing hydrocarbons using the porous gallium oxide photocatalyst for production of hydrocarbons, manufactured by the foregoing method.
摘要翻译：本发明涉及通过上述方法制备用于生产碳氢化合物的多孔氧化镓光催化剂的多孔氧化镓（III）[Ga 2 O 3]光催化剂的制备，以及使用多孔氧化镓光催化剂生产碳氢化合物的方法通过上述方法制造碳氢化合物。

9. 发明授权

US08120623B2 Apparatuses for overlaying images, portable devices having the same and methods of overlaying images 有权
标题翻译：用于覆盖图像的装置，具有相同的便携式装置以及重叠图像的方法
公开(公告)号：US08120623B2
公开(公告)日：2012-02-21
申请号：US12225099
申请日：2007-03-15
申请人： Dong-Ki Lee , Jung-Bum Oh
发明人： Dong-Ki Lee , Jung-Bum Oh
IPC分类号： G09G5/00
CPC分类号： H04N5/44504 , H04N21/41407 , H04N21/4312
摘要： An apparatus for overlaying images includes a broadcast image layer generator, an application image layer generator, and an overlay processor. The broadcast image layer generator generates a broadcast image layer based on a received broadcast signal. The application image layer generator generates an application image layer based on an application image. The overlay processor generates an overlay image obtained by overlaying the broadcast image layer with the application image layer, so that a broadcast image corresponding to the broadcast image layer and an application image corresponding to the application image layer may be displayed simultaneously on a screen. The broadcast image and the application image may be displayed simultaneously on a screen, and visibility and readability of a text in the application image may be enhanced based on the user's preference and the user's recognition ability when the portable device performs multi-tasking in which multiple programs are simultaneously executed.
摘要翻译：覆盖图像的装置包括广播图像层生成器，应用图像层生成器和覆盖处理器。广播图像层发生器基于接收到的广播信号生成广播图像层。应用图像层生成器基于应用图像生成应用图像层。覆盖处理器生成通过将广播图像层与应用图像层重叠而获得的覆盖图像，从而可以在屏幕上同时显示与广播图像层对应的广播图像和与应用图像层对应的应用图像。广播图像和应用图像可以在屏幕上同时显示，并且当便携式设备执行多重任务时，可以基于用户的偏好和用户的识别能力来增强应用图像中的文本的可视性和可读性程序同时执行。

10. 发明申请

US20090033680A1 Apparatuses For Overlaying Images, Portable Devices Having The Same And Methods Of Overlaying Images 有权
标题翻译：用于覆盖图像的装置，具有相同的便携式设备和覆盖图像的方法
公开(公告)号：US20090033680A1
公开(公告)日：2009-02-05
申请号：US12225099
申请日：2007-03-15
申请人： Dong-Ki Lee , Jung-Bum Oh
发明人： Dong-Ki Lee , Jung-Bum Oh
IPC分类号： G09G5/00 , G09G5/02
CPC分类号： H04N5/44504 , H04N21/41407 , H04N21/4312
摘要： An apparatus for overlaying images includes a broadcast image layer generator, an application image layer generator, and an overlay processor. The broadcast image layer generator generates a broadcast image layer based on a received broadcast signal. The application image layer generator generates an application image layer based on an application image. The overlay processor generates an overlay image obtained by overlaying the broadcast image layer with the application image layer, so that a broadcast image corresponding to the broadcast image layer and an application image corresponding to the application image layer may be displayed simultaneously on a screen. The broadcast image and the application image may be displayed simultaneously on a screen, and visibility and readability of a text in the application image may be enhanced based on the user's preference and the user's recognition ability when the portable device performs multi-tasking in which multiple programs are simultaneously executed.
摘要翻译：覆盖图像的装置包括广播图像层生成器，应用图像层生成器和覆盖处理器。广播图像层发生器基于接收到的广播信号生成广播图像层。应用图像层生成器基于应用图像生成应用图像层。覆盖处理器生成通过将广播图像层与应用图像层重叠而获得的覆盖图像，从而可以在屏幕上同时显示与广播图像层对应的广播图像和与应用图像层对应的应用图像。广播图像和应用图像可以在屏幕上同时显示，并且当便携式设备执行多重任务时，可以基于用户的偏好和用户的识别能力来增强应用图像中的文本的可视性和可读性程序同时执行。

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