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1. 发明授权

US06991150B2 Method of build up welding to thin-walled portion 有权
标题翻译：堆焊到薄壁部分的方法
公开(公告)号：US06991150B2
公开(公告)日：2006-01-31
申请号：US10651203
申请日：2003-08-29
申请人： Akihiro Sato , Kiyofumi Ishikawa , Hiroyuki Miyazawa , Hiroto Yamaoka , Yasuhiro Aoki
发明人： Akihiro Sato , Kiyofumi Ishikawa , Hiroyuki Miyazawa , Hiroto Yamaoka , Yasuhiro Aoki
IPC分类号： B23K31/02 , B23P6/04
CPC分类号： B23P6/007 , B23K9/038 , B23K9/04 , B23K37/06 , B23K2101/001 , F01D5/005 , F05D2230/80 , Y10T29/49318
摘要： A recess formed in close contact with a thin-walled portion 3a of a workpiece to store molten metal at a surfaced portion, a jig 4 manufactured from a material with a higher heat-resisting temperature than that of the molten metal and a satisfactorily large heat capacity, a step (A) wherein the jig is installed on the workpiece, a preheating step (B) in which the workpiece and the jig are preheated to a predetermined temperature under the condition that jig 4 is installed, a build up welding step (C) for build up welding the thin-walled portion of the workpiece and forming weld beads at surfaced portion, and a jig-removing step (D) for removing the jig after weld beads solidify completely.
摘要翻译：形成为与工件的薄壁部分3a紧密接触以形成表面部分处的熔融金属的凹部，由耐熔温度高于熔融金属的材料制成的夹具4，并且具有令人满意的大热容量，其中夹具安装在工件上的步骤（A），在安装夹具4的条件下将工件和夹具预热到预定温度的预热步骤（B），建立焊接步骤（C），用于堆焊工件的薄壁部分并在表面部分形成焊缝;以及用于在焊珠完全固化之后移除夹具的夹具去除步骤（D）。

2. 发明申请

US20050173496A1 Method of build up welding to thin-walled portion 有权
标题翻译：堆焊到薄壁部分的方法
公开(公告)号：US20050173496A1
公开(公告)日：2005-08-11
申请号：US10651203
申请日：2003-08-29
申请人： Akihiro Sato , Kiyofumi Ishikawa , Hiroyuki Miyazawa , Hiroto Yamaoka , Yasuhiro Aoki
发明人： Akihiro Sato , Kiyofumi Ishikawa , Hiroyuki Miyazawa , Hiroto Yamaoka , Yasuhiro Aoki
IPC分类号： F01D5/12 , B23K9/00 , B23K9/038 , B23K9/04 , B23K9/235 , B23K37/04 , B23K37/06 , F01D5/00 , B23K31/02
CPC分类号： B23P6/007 , B23K9/038 , B23K9/04 , B23K37/06 , B23K2101/001 , F01D5/005 , F05D2230/80 , Y10T29/49318
摘要： A recess formed in close contact with a thin-walled portion 3a of a workpiece to store molten metal at a surfaced portion, a jig 4 manufactured from a material with a higher heat-resisting temperature than that of the molten metal and a satisfactorily large heat capacity, a step (A) wherein the jig is installed on the workpiece, a preheating step (B) in which the workpiece and the jig are preheated to a predetermined temperature under the condition that jig 4 is installed, a build up welding step (C) for build up welding the thin-walled portion of the workpiece and forming weld beads at surfaced portion, and a jig-removing step (D) for removing the jig after weld beads solidify completely.
摘要翻译：形成为与工件的薄壁部分3a紧密接触以形成表面部分处的熔融金属的凹部，由耐熔温度高于熔融金属的材料制成的夹具4，并且具有令人满意的大热容量，其中夹具安装在工件上的步骤（A），在安装夹具4的条件下将工件和夹具预热到预定温度的预热步骤（B），建立焊接步骤（C），用于堆焊工件的薄壁部分并在表面部分形成焊缝;以及用于在焊珠完全固化之后移除夹具的夹具去除步骤（D）。

3. 发明授权

US06511365B2 Lapping machine 失效
标题翻译：研磨机
公开(公告)号：US06511365B2
公开(公告)日：2003-01-28
申请号：US09459036
申请日：1999-12-10
申请人： Shigeo Terashima , Hiroyuki Miyazawa
发明人： Shigeo Terashima , Hiroyuki Miyazawa
IPC分类号： B24B100
CPC分类号： B24B53/017 , B24B37/048 , B24B49/14 , G11B5/1871 , G11B5/3116 , G11B5/3163 , G11B5/3903
摘要： An object of the present invention is to provide a lapping machine in which abrasive grains can be efficiently and completely removed from a lapping plate. In the lapping machine of the present invention, a lapping plate has a lapping face and rotates about a rotary shaft. A moving member has a wiping face extended in a longitudinal and moves, in a plane parallel to the lapping face of the lapping plate, in the direction perpendicular to the wiping face. A driving mechanism moves the moving member. With this structure, the moving member securely catches and removes foreign substances from the lapping plate. The foreign substances left can be completely removed in a short time and the working efficiency of the lapping steps can be highly improved.
摘要翻译：本发明的目的是提供一种研磨机，其中磨粒可以从研磨盘中有效地和完全地除去。在本发明的研磨机中，研磨板具有研磨面并围绕旋转轴旋转。移动构件具有沿纵向延伸的擦拭面，在与研磨板的研磨面平行的平面中，在与擦拭面垂直的方向上移动。驱动机构移动移动构件。利用这种结构，移动构件牢固地捕获并从研磨板上去除异物。留下的异物可以在短时间内完全去除，研磨步骤的工作效率可以大大提高。

4. 发明授权

US5640282A Base body of reflecting mirror and method for preparing the same 失效
标题翻译：反射镜的基体及其制备方法
公开(公告)号：US5640282A
公开(公告)日：1997-06-17
申请号：US775095
申请日：1991-10-11
申请人： Yoshiaki Ise , Hiroyuki Miyazawa , Hiroyuki Kimura , Shinichi Okoshi , Tatsumasa Nakamura , Toshiyuki Kato
发明人： Yoshiaki Ise , Hiroyuki Miyazawa , Hiroyuki Kimura , Shinichi Okoshi , Tatsumasa Nakamura , Toshiyuki Kato
IPC分类号： G02B5/08 , G02B5/10 , G02B7/182 , G02B7/183
CPC分类号： G02B7/183 , G02B5/08 , G02B5/10 , Y10S359/90 , Y10T428/249969 , Y10T428/249976 , Y10T428/249977
摘要： A light-weight base body of a reflecting mirror, such as those used in reflecting astronomical telescopes, is proposed which is made from fused silica glass or high-silica glass and is advantageous in respect of the excellent thermal and mechanical stability in dimensions to ensure high performance of the reflecting mirror. The base body is composed of a front plate, i.e. a surface plate to provide the optical surface, and a supporting body of porous foamed glass integrally bonded to the front plate. These two parts of the base body can be bonded together by sandwiching a layer of a finely divided silica powder therebetween and heating the assemblage at a temperature higher than the softening point of the silica powder so that the silica powder is softened or melted to firmly join the two parts sandwiching the powder layer. The base body can be further improved in respect of the mechanical stability by providing a rear plate backing the porous foamed body and a reinforcing hoop-like side layer surrounding the side surface of the porous foamed body, each made from fused quartz glass or high-silica glass and bonded to the porous foamed body by utilizing melting of a layer of silica powder therebetween.
摘要翻译：提出了一种反射镜的轻质基体，例如用于反射天文望远镜的反射镜，其由熔融石英玻璃或高硅石玻璃制成，并且在尺寸方面优良的热和机械稳定性是有利的，以确保高性能的反光镜。基体由前板，即提供光学表面的表面板和与前板一体地结合的多孔泡沫玻璃的支撑体组成。基体的这两个部分可以通过在其间夹有细碎的二氧化硅粉末层而将它们粘合在一起，并在高于二氧化硅粉末的软化点的温度下加热组合物，使得二氧化硅粉末软化或熔化以牢固地连接两部分夹在粉末层上。通过提供背面多孔泡沫体的后板和围绕多孔泡沫体的侧表面的加强箍型侧层，每个由熔融石英玻璃或高熔点石英玻璃制成，可以进一步改善基体的机械稳定性，二氧化硅玻璃，并通过利用二氧化硅粉末之间的熔融而与多孔发泡体结合。

5. 发明授权

US4962052A Method for producing semiconductor integrated circuit device 失效
标题翻译：半导体集成电路器件的制造方法
公开(公告)号：US4962052A
公开(公告)日：1990-10-09
申请号：US478050
申请日：1990-02-07
申请人： Kyoichiro Asayama , Hiroyuki Miyazawa , Yutaka Kobayashi , Seigou Yukutake
发明人： Kyoichiro Asayama , Hiroyuki Miyazawa , Yutaka Kobayashi , Seigou Yukutake
IPC分类号： H01L21/331 , H01L21/8249 , H01L27/06 , H01L27/10 , H01L27/105 , H01L29/10 , H01L29/73 , H01L29/732
CPC分类号： H01L29/66272 , H01L21/8249 , H01L27/0623 , H01L29/1004 , H01L27/105
摘要： A method for producing a memory LSI having in its peripheral circuitry an MISFET of LDD structure and a vertical type bipolar transistor is disclosed. More particularly, an impurity for forming a low impurity concentration region of the said MISFET of LDD structure is introduced sideways of an emitter-base junction of the bipolar transistor. By the introduction of the said impurity, an effective impurity concentration near the base surface is reduced and the cut-off frequency of the bipolar transistor is improved.
摘要翻译：公开了一种在其外围电路中具有LDD结构的MISFET和垂直型双极晶体管的存储器LSI的制造方法。更具体地，用于形成LDD结构的所述MISFET的低杂质浓度区域的杂质被侧向引入双极晶体管的发射极 - 基极结。通过引入所述杂质，降低了基极表面附近的有效杂质浓度，提高了双极晶体管的截止频率。

6. 发明授权

US5917211A Semiconductor integrated circuit, method of fabricating the same and apparatus for fabricating the same 失效
标题翻译：半导体集成电路及其制造方法及其制造装置
公开(公告)号：US5917211A
公开(公告)日：1999-06-29
申请号：US979543
申请日：1997-11-25
申请人： Jun Murata , Yoshitaka Tadaki , Hiroko Kaneko , Toshihiro Sekiguchi , Hiroyuki Uchiyama , Hisashi Nakamura , Toshio Maeda , Osamu Kasahara , Hiromichi Enami , Atsushi Ogishima , Masaki Nagao , Michimasa Funabashi , Yasuo Kiguchi , Masayuki Kojima , Atsuyoshi Koike , Hiroyuki Miyazawa , Masato Sadaoka , Kazuya Kadota , Tadashi Chikahara , Kazuo Nojiri , Yutaka Kobayashi
发明人： Jun Murata , Yoshitaka Tadaki , Hiroko Kaneko , Toshihiro Sekiguchi , Hiroyuki Uchiyama , Hisashi Nakamura , Toshio Maeda , Osamu Kasahara , Hiromichi Enami , Atsushi Ogishima , Masaki Nagao , Michimasa Funabashi , Yasuo Kiguchi , Masayuki Kojima , Atsuyoshi Koike , Hiroyuki Miyazawa , Masato Sadaoka , Kazuya Kadota , Tadashi Chikahara , Kazuo Nojiri , Yutaka Kobayashi
IPC分类号： H01L21/8234 , H01L27/105 , H01L27/08 , H01L29/76 , H01L29/94
CPC分类号： H01L27/105 , H01L21/823425
摘要： A semiconductor integrated circuit comprising first n-channel MISFETs constituting the memory cells of a storage system, second n-channel MISFETs constituting the peripheral circuits of the storage system, and third n-channel MISFETs constituting the output circuit among the peripheral circuits. The respective threshold voltages of the first n-channel MISFETs, the second n-channel MISFETs and the third n-channel MISFETs are decreased in that order when the respective gate lengths of those MISFETs are substantially the same.
摘要翻译：一种半导体集成电路，包括构成存储系统的存储单元的第一n沟道MISFET，构成存储系统的外围电路的第二n沟道MISFET和构成外围电路中的输出电路的第三n沟道MISFET。当这些MISFET的各个栅极长度基本相同时，第一n沟道MISFET，第二n沟道MISFET和第三n沟道MISFET的阈值电压依次减小。

7. 发明授权

US5651827A Single-wafer heat-treatment apparatus and method of manufacturing reactor vessel used for same 失效
标题翻译：单晶片热处理设备
公开(公告)号：US5651827A
公开(公告)日：1997-07-29
申请号：US583774
申请日：1996-01-11
申请人： Masaaki Aoyama , Hiroyuki Miyazawa
发明人： Masaaki Aoyama , Hiroyuki Miyazawa
IPC分类号： C03B19/09 , C03C3/06 , C23C16/44 , C30B25/10 , C30B31/10 , C30B35/00 , H01L21/00 , C23C16/00
CPC分类号： H01L21/67115 , C03B19/095 , C03C3/06 , C23C16/44 , C30B25/10 , C30B31/10 , C30B35/002 , C03C2201/80 , C03C2203/10 , Y02P40/57
摘要： A reactor vessel includes a quartz glass body having sidewalls and a ceiling formed as a single unit without welds. Translucent or opaque portions are formed by bubbles in the glass where heat insulation is desired and transparent portions are formed by absence of bubbles where heat transmission and visibility are desired. The body is formed by adding quartz glass powder to a mold which is rotated about a central axis so that centrifugal force causes a layer of powder to form on the inside of the mold. The layer is then heated until it melts.
摘要翻译：反应堆容器包括具有侧壁的石英玻璃体和形成为没有焊接的单个单元的天花板。半透明或不透明部分由玻璃中的气泡形成，其中期望隔热，并且通过不需要传热和可视性的气泡形成透明部分。通过将石英玻璃粉末添加到围绕中心轴线旋转的模具中形成主体，使得离心力在模具内部形成一层粉末。然后将该层加热至其熔化。

8. 发明授权

US5617262A Base body of reflecting mirror and method for preparing the same 失效
公开(公告)号：US5617262A
公开(公告)日：1997-04-01
申请号：US567165
申请日：1995-12-05
申请人： Yoshiaki Ise , Hiroyuki Miyazawa , Hiroyuki Kimura , Shinichi Okoshi , Tatsumasa Nakamura , Toshiyuki Kato
发明人： Yoshiaki Ise , Hiroyuki Miyazawa , Hiroyuki Kimura , Shinichi Okoshi , Tatsumasa Nakamura , Toshiyuki Kato
IPC分类号： G02B5/08 , G02B5/10 , G02B7/182 , G02B7/183 , B32B3/26
CPC分类号： G02B7/183 , G02B5/08 , G02B5/10 , Y10S359/90 , Y10T428/249969 , Y10T428/249976 , Y10T428/249977
摘要： A light-weight base body of a reflecting mirror, such as those used in reflecting astronomical telescopes, is proposed which is made from fused silica glass or high-silica glass and is advantageous in respect of the excellent thermal and mechanical stability in dimensions to ensure high performance of the reflecting mirror. The base body is composed of a front plate, i.e. a surface plate to provide the optical surface, and a supporting body of porous foamed glass integrally bonded to the front plate. These two parts of the base body can be bonded together by sandwiching a layer of a finely divided silica powder therebetween and heating the assemblage at a temperature higher than the softening point of the silica powder so that the silica powder is softened or melted to firmly join the two parts sandwiching the powder layer. The base body can be further improved in respect of the mechanical stability by providing a rear plate backing the porous foamed body and a reinforcing hoop-like side layer surrounding the side surface of the porous foamed body, each made from fused quartz glass or high-silica glass and bonded to the porous foamed body by utilizing melting of a layer of silica powder therebetween.

9. 发明授权

US4921815A Method of producing a semiconductor memory device having trench capacitors 失效
标题翻译：制造具有沟槽电容器的半导体存储器件的方法
公开(公告)号：US4921815A
公开(公告)日：1990-05-01
申请号：US203931
申请日：1988-06-08
申请人： Hiroyuki Miyazawa
发明人： Hiroyuki Miyazawa
IPC分类号： H01L27/10 , H01L21/822 , H01L21/8242 , H01L27/04 , H01L27/108
CPC分类号： H01L27/10829
摘要： A D-RAM is disclosed which isolates the capacitors of memory cells and also isolates the adjacent memory cells by utilizing trenches formed on a semiconductor substrate. The device is particularly intended to the area of each memory cell and prevent the occurrence of a leakage current between the adjacent memory cells. Two side walls of the trench are used as the capacitors of two different memory cells, respectively, and these capacitors are isolated from each other by a thick oxide film that is formed on the bottom of each trench.
摘要翻译：公开了一种D-RAM，其隔离存储单元的电容器，并且还通过利用形成在半导体衬底上的沟槽来隔离相邻的存储单元。该器件特别用于每个存储单元的区域，并且防止相邻存储单元之间发生漏电流。沟槽的两个侧壁分别用作两个不同存储单元的电容器，并且这些电容器通过形成在每个沟槽的底部上的厚氧化膜彼此隔离。

10. 发明授权

US6043118A Semiconductor memory circuit device and method for fabricating a semiconductor memory device circuit 失效
标题翻译：半导体存储器电路器件及半导体存储器件电路的制造方法
公开(公告)号：US6043118A
公开(公告)日：2000-03-28
申请号：US800018
申请日：1997-02-13
申请人： Naokatsu Suwanai , Hiroyuki Miyazawa , Atushi Ogishima , Masaki Nagao , Kyoichiro Asayama , Hiroyuki Uchiyama , Yoshiyuki Kaneko , Takashi Yoneoka , Kozo Watanabe , Kazuya Endo , Hiroki Soeda
发明人： Naokatsu Suwanai , Hiroyuki Miyazawa , Atushi Ogishima , Masaki Nagao , Kyoichiro Asayama , Hiroyuki Uchiyama , Yoshiyuki Kaneko , Takashi Yoneoka , Kozo Watanabe , Kazuya Endo , Hiroki Soeda
IPC分类号： H01L21/8242 , H01L27/108
CPC分类号： H01L27/10844 , H01L27/10805 , H01L27/10808
摘要： In a semiconductor memory circuit device wherein each memory cell is constituted by a series circuit of a memory cell selecting MISFET and an information storing capacitor of a stacked structure, there are present in a first region as a memory cell array region a first MISFET having a gate electrode and source and drain regions; first and second capacity electrodes and a dielectric film extending onto a first insulating film on the gate electrode; a second insulating film positioned on the second capacity electrode; and a first wiring positioned on the second insulating film, while in a second region as a peripheral circuit region there are present a second MISFET having a gate electrode and source and drain regions; a first insulating film on the gate electrode; a third insulating film on the first insulating film; a second insulating film on the third insulating film; and a second wiring on the second insulating film.
摘要翻译：在其中每个存储单元由存储单元选择MISFET的串联电路和层叠结构的信息存储电容器构成的半导体存储器电路器件中，在第一区域中存在作为存储单元阵列区域的第一MISFET，其具有栅极电极和源极和漏极区域; 第一和第二电容电极和延伸到栅电极上的第一绝缘膜上的电介质膜; 位于所述第二容量电极上的第二绝缘膜; 以及位于所述第二绝缘膜上的第一布线，而在作为外围电路区域的第二区域中存在具有栅极电极和源极和漏极区域的第二MISFET; 栅电极上的第一绝缘膜; 第一绝缘膜上的第三绝缘膜; 第三绝缘膜上的第二绝缘膜; 以及在第二绝缘膜上的第二布线。

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