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1. 发明授权

US06279590B1 Cleaning method and cleaning apparatus 失效
标题翻译：清洁方法和清洁装置
公开(公告)号：US06279590B1
公开(公告)日：2001-08-28
申请号：US09621679
申请日：2000-07-24
申请人： Tohru Okuda , Taimi Oketani , Masatoshi Hayashi , Yasuhiro Matsushima
发明人： Tohru Okuda , Taimi Oketani , Masatoshi Hayashi , Yasuhiro Matsushima
IPC分类号： B08B304
CPC分类号： B08B3/104 , Y10S134/902
摘要： A cleaning apparatus in accordance with the present invention includes a first inflow section, provided on a first side surface of a cleaning tank having a substantially rectangular parallelopiped shape, having two inflow openings, a second inflow section, provided on a second side surface facing the first side surface, having inflow openings, and outflow openings for releasing a cleaning liquid flown in from the first and second inflow sections. The cleaning liquid flowing in from the inflow openings forms complex and strong flows in the cleaning tank, thus removing contaminants on a cleaning target evenly and efficiently without nonuniformity and preventing stagnation of the cleaning liquid in the cleaning tank. The cleaning liquid released in filtered by a circulatory section and is allowed to flow into the cleaning tank again through a pipe. As a result, it is possible to clean evenly and efficiently a large cleaning target such as a glass substrate used for liquid crystal display devices and other devices.
摘要翻译：根据本发明的清洁装置包括：第一流入部分，设置在具有大致矩形的平行六面体形状的清洗槽的第一侧面上，具有两个流入口，第二流入部分，设置在面向第一侧表面，具有流入开口和用于释放从第一和第二流入部分流入的清洗液体的流出开口。从流入口流入的清洗液在清洗槽内形成复杂而强烈的流动，从而均匀有效地除去清洁对象物上的污染物而不会不均匀，并防止清洗液体在清洗槽中停滞。由循环部分过滤的清洗液再次通过管道流入清洗槽。结果，可以均匀且有效地清洁诸如用于液晶显示装置和其它装置的玻璃基板等大型清洁对象。

2. 发明授权

US06368756B1 Photomask, method for producing TFT substrate, and method for producing display device 有权
标题翻译：光掩模，TFT基板的制造方法以及显示装置的制造方法
公开(公告)号：US06368756B1
公开(公告)日：2002-04-09
申请号：US09511117
申请日：2000-02-23
申请人： Shigeyuki Yamada , Taimi Oketani , Yoshinori Shimada
发明人： Shigeyuki Yamada , Taimi Oketani , Yoshinori Shimada
IPC分类号： G03F188
CPC分类号： G03F1/78
摘要： A photomask of the present invention is a photomask for use in production of a display device, the photomask having on its surface a plurality of drawn areas and a transitional portion between two adjacent ones of the drawn areas. A pattern is formed on at least one of the drawn areas. A ratio between a pattern pitch and a transitional portion pitch is an integral ratio such that a length defined by a least common multiple of the pattern pitch and the transitional portion pitch is 1 mm or less.
摘要翻译：本发明的光掩模是用于制造显示装置的光掩模，该光掩模在其表面上具有多个拉伸区域和两个相邻的拉伸区域之间的过渡部分。在至少一个绘制区域上形成图案。图案间距和过渡部间距之间的比是整数比，使得由图案间距和过渡部间距的最小公倍数限定的长度为1mm以下。

3. 发明授权

US06686322B1 Cleaning agent and cleaning process using the same 有权
标题翻译：清洁剂和清洁工艺使用相同
公开(公告)号：US06686322B1
公开(公告)日：2004-02-03
申请号：US09581118
申请日：2000-08-28
申请人： Masahiro Nohara , Ryou Hashimoto , Taimi Oketani , Hisaki Abe , Taketo Maruyama , Tetsuo Aoyama
发明人： Masahiro Nohara , Ryou Hashimoto , Taimi Oketani , Hisaki Abe , Taketo Maruyama , Tetsuo Aoyama
IPC分类号： C11D942
CPC分类号： H01L21/02071 , C03C23/0075 , C11D3/3947 , C11D7/08 , C11D7/3245 , C11D7/36 , C11D11/0047 , C23G1/24 , G02F1/13439 , G03F7/423 , H01L21/0273 , H01L21/31116
摘要： A cleaning agent which comprises 0.1 to 60% by weight of an oxidizing agent and 0.0001 to 5% by weight of a chelating agent. In the process for producing semiconductor integrated circuits, a pattern layer of a photoresist used as an etching mask and residues formed from the photoresist by dry etching can be easily removed with the cleaning agent. In the process for producing substrates for liquid crystal display panels, residues derived from a conductive thin film formed by dry etching can also be easily removed. In the cleaning processes using the cleaning agent, wiring materials or insulating materials in thin film circuit devices or other materials used for producing substrates of semiconductor integrated circuits and liquid crystal panels are not corroded.
摘要翻译：一种清洁剂，其包含0.1至60重量％的氧化剂和0.0001至5重量％的螯合剂。在制造半导体集成电路的过程中，可以容易地用清洁剂去除用作蚀刻掩模的光致抗蚀剂的图案层和由干蚀刻形成的残留物。在液晶显示面板用基板的制造方法中，也可以容易地除去由干蚀刻形成的导电薄膜得到的残留物。在使用清洁剂的清洁方法中，薄膜电路器件中的配线材料或绝缘材料或用于制造半导体集成电路和液晶面板的基板的其它材料不被腐蚀。

4. 发明授权

US6132523A Method of cleaning a substrate in a cleaning tank using plural fluid flows 有权
标题翻译：使用多个流体流清洗清洗槽中的基板的方法
公开(公告)号：US6132523A
公开(公告)日：2000-10-17
申请号：US145970
申请日：1998-09-03
申请人： Tohru Okuda , Taimi Oketani , Masatoshi Hayashi , Yasuhiro Matsushima
发明人： Tohru Okuda , Taimi Oketani , Masatoshi Hayashi , Yasuhiro Matsushima
IPC分类号： B08B3/10 , B08B3/02 , B08B3/04
CPC分类号： B08B3/104 , Y10S134/902
摘要： A cleaning apparatus and method in accordance with the present invention includes a first inflow section, provided on a first side surface of a cleaning tank having a substantially rectangular parallelopiped shape, having two inflow openings, a second inflow section, provided on a second side surface facing the first side surface, having inflow openings, and outflow openings for releasing a cleaning liquid flown in from the first and second inflow sections. The cleaning liquid flowing in from the inflow openings forms complex and strong flows in the cleaning tank, thus removing contaminants on a cleaning target evenly and efficiently without nonuniformity and preventing stagnation of the cleaning liquid in the cleaning tank. The cleaning liquid released in filtered by a circulatory section and is allowed to flow into the cleaning tank again through a pipe. As a result, it is possible to clean evenly and efficiently a large cleaning target such as a glass substrate used for liquid crystal display devices and other devices.
摘要翻译：根据本发明的清洁装置和方法包括：第一流入部分，设置在具有大致矩形平行六面体形状的清洗槽的第一侧表面上，具有两个流入开口;第二流入部分，设置在第二侧表面上面向具有流入开口的第一侧表面和用于释放从第一和第二流入部分流入的清洗液体的流出开口。从流入口流入的清洗液在清洗槽内形成复杂而强烈的流动，从而均匀有效地除去清洁对象物上的污染物而不会不均匀，并防止清洗液体在清洗槽中停滞。由循环部分过滤的清洗液再次通过管道流入清洗槽。结果，可以均匀且有效地清洁诸如用于液晶显示装置和其它装置的玻璃基板等大型清洁对象。

5. 发明申请

US20130235278A1 LIQUID CRYSTAL PANEL, LIQUID CRYSTAL DISPLAY DEVICE, TELEVISION DEVICE, AND METHOD OF MANUFACTURING LIQUID CRYSTAL PANEL 审中-公开
标题翻译：液晶板，液晶显示装置，电视装置及制造液晶面板的方法
公开(公告)号：US20130235278A1
公开(公告)日：2013-09-12
申请号：US13878590
申请日：2011-10-07
申请人： Shigeki Tanaka , Nobufumi Tomimaru , Makoto Kanbe , Shunichi Takeuchi , Taimi Oketani
发明人： Shigeki Tanaka , Nobufumi Tomimaru , Makoto Kanbe , Shunichi Takeuchi , Taimi Oketani
IPC分类号： G02F1/1335
CPC分类号： G02F1/133512 , G02F1/1333 , G02F2001/133368 , G02F2201/508
摘要： A method of manufacturing a liquid crystal panel in which the bright point defect is effectively corrected is provided. The method of manufacturing a liquid crystal panel 11 including a pair of substrates 40 and 30, and a liquid crystal layer 50 provided between the pair of the substrates 40 and 30 includes detecting a bright point defect in the liquid crystal panel 11; forming a first light blocking portion BL1 in one of the substrates 40 and 30 and in a part of an area that surrounds the bright point defect with a plan view; forming a recess in a portion of one of the substrates 40, 30 that overlaps the bright point defect and on a surface of the one of the substrates 40 and 30 that is opposite from a surface facing the liquid crystal layer; and forming a second light blocking portion BL2 in the recess.
摘要翻译：提供一种制造有效校正亮点缺陷的液晶面板的方法。包括一对基板40,30的液晶面板11的制造方法和设置在一对基板40,30之间的液晶层50包括检测液晶面板11中的亮点缺陷; 在基板40和30中的一个以及在平面图中围绕亮点缺陷的区域的一部分中形成第一遮光部分BL1; 在与所述亮点缺陷重叠的一个基板40,30的与面向液晶层的表面相对的基板40和30的一个表面上形成凹部; 以及在所述凹部中形成第二遮光部分BL2。

6. 发明申请

US20120229736A1 LIQUID CRYSTAL PANEL AND LIQUID CRYSTAL DISPLAY DEVICE 审中-公开
标题翻译：液晶面板和液晶显示装置
公开(公告)号：US20120229736A1
公开(公告)日：2012-09-13
申请号：US13510718
申请日：2010-10-07
申请人： Tomofumi Osaki , Taimi Oketani
发明人： Tomofumi Osaki , Taimi Oketani
IPC分类号： G02F1/1335 , G02F1/1339
CPC分类号： G02F1/133512 , G02F1/1341 , G02F2001/133388
摘要： Disclosed is a liquid crystal panel that can prevent a light leakage from the outside through a sealing portion and that can achieve excellent display quality and a narrower frame. The liquid crystal panel 10 is provided with, in a non-display region 10B on a surface of a first substrate 11 on a side facing a second substrate 12, a black matrix installation area 30, which includes a black matrix forming section 32 and a black matrix non-forming section 34 that is enclosed by the black matrix forming section. A sealing portion 16 is formed in the black matrix installation area 30 such that a portion thereof that makes direct contact with the first substrate 11 is arranged in the black matrix non-forming section 34. On the side of the first substrate 11 that is opposite to the side facing the second substrate 12, a light-shielding member 52 that can block any light regardless of a polarization degree is disposed in a section that corresponds to the black matrix non-forming section 34 such that a part of the light-shielding member overlaps a black matrix 24 through the first substrate 11 interposed therebetween.
摘要翻译：公开了一种液晶面板，其能够通过密封部防止从外部的光泄漏，并且可以实现优异的显示质量和较窄的框架。在面向第二基板12的一侧的第一基板11的表面的非显示区域10B中设置有黑矩阵设置区域30，黑矩阵设置区域30包括黑矩阵形成部32和由黑矩阵形成部包围的黑矩阵非形成部34。密封部16形成在黑矩阵安装区域30中，使得其与第一基板11直接接触的部分布置在黑矩阵非成形部分34中。在第一基板11的相对的一侧在与第二基板12相对的一侧，在与黑矩阵非成形部34相对应的部分中设置能够阻挡任何光的遮光部件52，而不管偏光度如何，遮光部件52的一部分构件通过插入其间的第一基板11与黑矩阵24重叠。

7. 发明授权

US06523701B1 Elongated rib for cassette and substrate cassette 有权
标题翻译：用于盒式磁带和衬底盒的细长肋骨
公开(公告)号：US06523701B1
公开(公告)日：2003-02-25
申请号：US09655872
申请日：2000-09-06
申请人： Toshio Yoshida , Yuji Amano , Taimi Oketani , Masayuki Tsuji , Isao Saraoka
发明人： Toshio Yoshida , Yuji Amano , Taimi Oketani , Masayuki Tsuji , Isao Saraoka
IPC分类号： A47G1908
CPC分类号： H01L21/6734 , H01L21/67343
摘要： A cassette for supporting substrates and an elongated rib therefor is described and represents a further improvement in the previously proposed elongated rib systems of the prior art and is designed particularly to preclude deflection and dampen vibrations of loaded substrates. The elongated ribs for the cassette project from side panels utilizing an elongated rib structure including three segments; namely, a base resin body, a bar-like intermediate resin body extending from the base resin body, and a terminal resin body disposed at the forward end of the intermediate resin body. Preferably, the elongated rib structure includes a linearreinforcing member inserted fromthe base resin body to the intermediate resin body or, alternatively, from the base resin body through the intermediate resin body to the terminal resin body.
摘要翻译：描述了用于支撑基板的盒和用于其的细长肋，并且表示了先前提出的现有技术的细长肋系统的进一步改进，并且被特别设计用于防止加载的基板的偏转和阻尼振动。用于盒的细长肋条利用包括三个段的细长肋结构从侧板突出; 即基体树脂体，从基体树脂体延伸的棒状中间树脂体，以及设置在中间树脂体的前端的端子树脂体。优选地，细长肋结构包括从基体树脂体向中间树脂体插入的线性增强部件，或者从基体树脂体通过中间树脂体向端子树脂体插入。

8. 发明授权

US06500270B2 Resist film removing composition and method for manufacturing thin film circuit element using the composition 失效
标题翻译：抗蚀膜去除组合物和使用该组合物制造薄膜电路元件的方法
公开(公告)号：US06500270B2
公开(公告)日：2002-12-31
申请号：US09176523
申请日：1998-10-21
申请人： Masahiro Nohara , Yukihiko Takeuchi , Taimi Oketani , Taketo Maruyama , Tetsuya Karita , Hisaki Abe , Tetsuo Aoyama
发明人： Masahiro Nohara , Yukihiko Takeuchi , Taimi Oketani , Taketo Maruyama , Tetsuya Karita , Hisaki Abe , Tetsuo Aoyama
IPC分类号： C23G100
CPC分类号： C11D7/5013 , C11D7/3218 , C11D7/3263 , C11D7/3272 , C11D11/0047
摘要： A resist film removing composition used in the manufacture of a thin film circuit element having an organic insulation film which comprises 50 to 70% by weight of an alkanolamine having 3 or more carbon atoms, 20 to 30% by weight of a water-miscible solvent and 10 to 20% by weight of water. The resist film removing composition can easily remove a resist film remaining after etching, without swelling the organic insulation film.
摘要翻译：一种用于制造具有有机绝缘膜的薄膜电路元件的抗蚀膜去除组合物，该有机绝缘膜包含50至70重量％的具有3个或更多个碳原子的链烷醇胺，20至30重量％的水混溶性溶剂和10〜20重量％的水。抗蚀剂膜去除组合物可以容易地除去蚀刻后残留的抗蚀剂膜，而不会使有机绝缘膜膨胀。

9. 发明授权

US5782978A Coating device with movable fluid supply nozzle and rotatable substrate holder 失效
标题翻译：涂层装置带有可移动的液体供应喷嘴和可旋转的基板支架
公开(公告)号：US5782978A
公开(公告)日：1998-07-21
申请号：US876866
申请日：1997-06-16
申请人： Kazuo Kinose , Takeshi Yonezawa , Taimi Oketani , Tomoo Yamamoto
发明人： Kazuo Kinose , Takeshi Yonezawa , Taimi Oketani , Tomoo Yamamoto
IPC分类号： B05C11/08 , B05D1/00 , B05D1/40 , G03F7/16 , H01L21/00 , H01L21/027 , B05C5/00
CPC分类号： H01L21/6715 , B05C11/08 , B05D1/005 , G03F7/162
摘要： A fluid application apparatus of the present invention includes a rotatable substrate holding mechanism (4), a photoresist liquid supply portion (5) and a motor mechanism (26). The photoresist liquid supply portion (5) supplies resist fluid to a region smaller than the entire region of the substrate surface while moving in the horizontal direction relative to the substrate holding mechanism (4). The motor mechanism (26) rotates the substrate holding mechanism (4) to diffuse the resist fluid over the entire surface of the substrate and form a resist layer having a predetermined thickness.
摘要翻译：本发明的流体涂布装置包括可旋转的基板保持机构（4），光致抗蚀剂液体供应部分（5）和马达机构（26）。光致抗蚀剂液体供应部分（5）在相对于基板保持机构（4）在水平方向上移动的同时，向比基板表面的整个区域小的区域提供抵抗流体。马达机构（26）使基板保持机构（4）旋转，以将抗蚀剂流体扩散到基板的整个表面上，并形成具有预定厚度的抗蚀剂层。

10. 发明授权

US06617097B2 Exposure method 有权
标题翻译：曝光方法
公开(公告)号：US06617097B2
公开(公告)日：2003-09-09
申请号：US09747910
申请日：2000-12-22
申请人： Yasunori Nishimura , Taimi Oketani , Tsuyoshi Naraki
发明人： Yasunori Nishimura , Taimi Oketani , Tsuyoshi Naraki
IPC分类号： G03C556
CPC分类号： G03F9/7084 , G03F7/70275 , G03F7/70358 , G03F7/70433
摘要： The present invention aims at reducing the number of scanning exposure and at enhancing throughput. the above-mentioned objective is achieved by allowing a substrate 14 to be placed in sideways with respect to a substrate holder 15a (placing the longer sides of the substrate in parallel to the shorter sides of the substrate holder) depending on the size of the apparatus and the size of the substrate 14. It is acceptable even when areas other than an effective exposure area of the substrate 14 should project out from the substrate holder.
摘要翻译：本发明的目的在于减少扫描曝光次数和提高生产量。上述目的是通过使基板14相对于基板保持器15a侧向放置（将基板的长边平行放置到基板保持器的短边），这取决于装置的尺寸和基板14的尺寸。即使基板14的有效曝光区域以外的区域从基板支架突出出来也是可以接受的。

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