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1. 发明授权

US06832616B2 Substrate treating apparatus 失效
标题翻译：底物处理装置
公开(公告)号：US06832616B2
公开(公告)日：2004-12-21
申请号：US10205202
申请日：2002-07-26
申请人： Kunihiro Miyazaki
发明人： Kunihiro Miyazaki
IPC分类号： B08B304
CPC分类号： H01L21/67051 , B08B3/02 , B08B3/04 , Y10S134/902
摘要： The present invention is directed to a substrate treating apparatus of a multi-nozzle type comprising an outer tube nozzle through which a chemical fluid, a combination of a chemical fluid and a gas, pure water, or a combination of pure water and a gas is discharged onto a substrate to be treated, and an inner tube nozzle through which a chemical fluid, a combination of a chemical fluid and a gas, pure water, or a combination of pure water and a gas is discharged onto the substrate. The inner tube nozzle may be provided in the outer tube nozzle such that the inner and outer tube nozzles constitute a multi-nozzle structure. The outer tube nozzle may have at a distal end a wafer top that may extend parallel to the substrate from the distal end, and be adapted to avoid contact with the substrate during treatment.
摘要翻译：本发明涉及一种多喷嘴型的基板处理装置，其包括外管喷嘴，化学流体，化学流体和气体的组合，纯水或纯水和气体的组合通过该外管喷嘴排出到待处理的基板上，并且内部管嘴，化学流体，化学流体和气体的组合，纯水或纯水和气体的组合通过该内管喷嘴排出到基板上。内管喷嘴可以设置在外管喷嘴中，使得内管喷嘴和外管喷嘴构成多喷嘴结构。外管喷嘴可以在远端处具有晶片顶部，晶片顶部可以从远端平行于基板延伸，并且适于避免在处理期间与基板接触。

2. 发明授权

US06820635B1 Flushing attachment for hydrant 有权
标题翻译：消防栓冲洗附件
公开(公告)号：US06820635B1
公开(公告)日：2004-11-23
申请号：US10656572
申请日：2003-09-05
申请人： Daniel G. McKeague
发明人： Daniel G. McKeague
IPC分类号： B08B304
CPC分类号： E03B9/04 , E03B9/14 , E03B9/18 , Y10T137/0424 , Y10T137/4245 , Y10T137/5468 , Y10T137/5485 , Y10T137/86389 , Y10T137/86397 , Y10T137/86405 , Y10T137/87917
摘要： A device and method for automatically flushing hydrants. The device is installed externally to an existing hydrant. The device comprises a nipple having an internally threaded collar for attaching the device to a hydrant outlet, a valve, a control for automatically operating the valve, and a lockable box containing at least the valve, the box having an outlet for allowing water from the hydrant to pass from the valve to the exterior of the box. The box functions as an enclosure and may be of any desired configuration.
摘要翻译：用于自动冲洗消防栓的装置和方法。设备外部安装在现有的消防栓上。该装置包括具有用于将装置附接到消防栓出口的内螺纹套环的接头，阀，用于自动操作阀的控制器和至少包含阀的可锁定箱，该箱具有出口，用于允许来自消防栓从阀门传递到箱体的外部。盒子作为外壳起作用，可以是任何所需的配置。

3. 发明授权

US06792960B2 Clipper oil stand 失效
标题翻译： Clipper油架
公开(公告)号：US06792960B2
公开(公告)日：2004-09-21
申请号：US10309019
申请日：2002-12-04
申请人： Terrance Peele , Dezella M. Peele
发明人： Terrance Peele , Dezella M. Peele
IPC分类号： B08B304
CPC分类号： A61L2/26 , A45D27/46
摘要： The clipper oil stand has a reservoir for containing a suitable oil for cleaning, lubricating, disinfecting, and scenting the blades of a hair clipper. The reservoir has at least one sidewall and a bottom wall for containing the oil, and a cover attached to the sidewall by a hinge. A well having sloped sidewalls and a perforated bottom wall depends from the cover. A sloped cradle is mounted on top of the cover. The hair clippers are placed in the cradle, blade end downwards, the clipper blades extending through an opening in the bottom of the cradle so that oil filling into the well from the reservoir cleans and lubricates the hair clipper blades.
摘要翻译：剪刀机架具有用于容纳用于清洁，润滑，消毒和吹发剪刀的叶片的合适的油的储存器。储存器具有用于容纳油的至少一个侧壁和底壁，以及通过铰链附接到侧壁的盖。具有倾斜侧壁和穿孔底壁的孔取决于盖。一个倾斜的摇篮安装在盖子的顶部。剪发器被放置在托架中，刀片端部向下延伸，裁剪刀片延伸穿过托架底部的开口，使得从储存器填充到孔中的油清洁和润滑剪发刀片。

4. 发明授权

US06777379B2 Cleaning solution and method of cleaning anti-reflective coating composition using the same 失效
标题翻译：清洁溶液及使用其的抗反射涂料组合物的清洗方法
公开(公告)号：US06777379B2
公开(公告)日：2004-08-17
申请号：US10136370
申请日：2002-05-02
申请人： Dong-Jin Park , Kyung-Dae Kim , Hoi-Sik Chung , Pil-Kwon Jun , Young-Ho Kim
发明人： Dong-Jin Park , Kyung-Dae Kim , Hoi-Sik Chung , Pil-Kwon Jun , Young-Ho Kim
IPC分类号： B08B304
CPC分类号： C11D7/06 , C11D7/10 , C11D7/264 , C11D7/32 , C11D7/5004 , C11D11/0047 , Y10S134/902
摘要： A cleaning solution for a cured anti-reflective layer (AFC layer) component and a method of cleaning an anti-reflective layer component by using the same, wherein the cleaning solution comprises about 5-30% by weight of ammonium hydroxide, about 23-70% by weight of an organic solvent and about 10-50% by weight of water. When an organic material is spattered to adjacent equipment during implementing a coating process onto a wafer, the equipment is detached and then is dipped into the cleaning solution. Thereafter, the equipment is rinsed and dried. Cured and non-cured organic materials are advantageously removed. Cured organic materials left for a period of time, particularly anti-reflective layer components are advantageously removed.
摘要翻译：用于固化的抗反射层（AFC层）组分的清洁溶液和通过使用该清洁溶液清洁抗反射层组分的方法，其中所述清洁溶液包含约5-30重量％的氢氧化铵，约23- 70重量％的有机溶剂和约10-50重量％的水。当在晶片上实施涂覆工艺期间将有机材料溅射到相邻设备时，将设备分离，然后浸入清洁溶液中。此后，将设备冲洗干燥。有机地除去固化和未固化的有机材料。留下一段时间的固化有机材料，特别是抗反射层组分有利地被去除。

5. 发明授权

US06737221B2 Mass production method of semiconductor integrated circuit device and manufacturing method of electronic device 有权
标题翻译：半导体集成电路器件的大规模生产方法和电子器件的制造方法
公开(公告)号：US06737221B2
公开(公告)日：2004-05-18
申请号：US10424854
申请日：2003-04-29
申请人： Takuya Futase , Tomonori Saeki , Mieko Kashi
发明人： Takuya Futase , Tomonori Saeki , Mieko Kashi
IPC分类号： B08B304
CPC分类号： C23F1/30 , H01L21/32134 , H01L27/10814 , H01L28/55 , H01L28/60 , Y10S134/902
摘要： In order to prevent the contamination of wafers made of a transition metal in a semiconductor mass production process, the mass production method of a semiconductor integrated circuit device of the invention comprises the steps of depositing an Ru film on individual wafers passing through a wafer process, removing the Ru film from outer edge portions of a device side and a back side of individual wafers, on which said Ru film has been deposited, by means of an aqueous solution containing orthoperiodic acid and nitric acid, and subjecting said individual wafers, from which said Ru film has been removed, to a lithographic step, an inspection step or a thermal treating step that is in common use relation with a plurality of wafers belonging to lower layer steps (an initial element formation step and a wiring step prior to the formation of a gate insulating film).
摘要翻译：为了防止在半导体批量生产工艺中由过渡金属制成的晶片的污染，本发明的半导体集成电路器件的批量生产方法包括以下步骤：在通过晶片工艺的各个晶片上沉积Ru膜，通过含有正周期酸和硝酸的水溶液从沉积有Ru膜的单个晶片的器件侧和背面的外边缘部分去除Ru膜，并对其进行处理所述Ru膜已被去除，涉及光刻步骤，与属于下层步骤的多个晶片（初始元素形成步骤和形成前的布线步骤）具有通用关系的检查步骤或热处理步骤的栅极绝缘膜）。

6. 发明授权

US06718992B1 Liquid neutral to alkaline hard-surface cleaning composition 有权
标题翻译：液体中性至碱性硬表面清洗剂组合物
公开(公告)号：US06718992B1
公开(公告)日：2004-04-13
申请号：US09763054
申请日：2001-02-16
申请人： Sergio Cardola , Panos Iakovides , Laura Orlandini , Maria Rosa Rescio
发明人： Sergio Cardola , Panos Iakovides , Laura Orlandini , Maria Rosa Rescio
IPC分类号： B08B304
CPC分类号： C11D3/222 , C11D3/225 , C11D3/3776
摘要： Neutral to basic compositions comprising surfactants other than amphoteric surfactants, copolymers of vinylpyrrolidone and an alkylenically unsaturated monomer, and a polysaccharide polymer. Also, employment of these compositions in processes for treating hard surfaces, providing a shine benefit to the hard surfaces, reducing limescale deposits and watermarks from hard surfaces, and for providing a “next-time” cleaning benefit to hard surfaces.
摘要翻译：中性至包含除两性表面活性剂之外的表面活性剂，乙烯基吡咯烷酮和烯属不饱和单体的共聚物和多糖聚合物的基础组合物。此外，这些组合物在处理硬表面的方法中使用，为硬表面提供光泽益处，从硬表面减少石灰沉积物和水印，以及为硬表面提供“下一次”清洁益处。

7. 发明授权

US06715502B1 Automatic fuel system cleaner 有权
标题翻译：自动燃油系统更清洁
公开(公告)号：US06715502B1
公开(公告)日：2004-04-06
申请号：US09929579
申请日：2001-08-14
申请人： John A. Rome , Bill Kavadeles , Jesus G. Orejel
发明人： John A. Rome , Bill Kavadeles , Jesus G. Orejel
IPC分类号： B08B304
CPC分类号： F02M65/007 , F02B77/04
摘要： An apparatus and method for cleaning either a diesel or a gasoline fuel system. The automatic fuel cleaner apparatus comprises a diesel service portion and a gasoline service portion. The diesel and gasoline service portions each includes a return hose having a first end capable of being coupled to a fuel line outlet of the fuel system. Each service portion further includes a detergent reservoir having an input connected to the return hose. Each service portion also includes a pump having an input connected to an output of the detergent reservoir. The diesel and gasoline service portions each further includes an output hose having a first end connected to a pump output and a second end capable of being coupled to a fuel line inlet. The gasoline service portion also comprises a pressure regulator connected to the output of the gasoline pump.
摘要翻译：一种用于清洁柴油或汽油燃料系统的装置和方法。自动燃料净化装置包括柴油机服务部分和汽油服务部分。柴油和汽油服务部分各自包括返回软管，其具有能够联接到燃料系统的燃料管路出口的第一端。每个服务部分还包括具有连接到返回软管的输入的洗涤剂储存器。每个服务部分还包括具有连接到洗涤剂储存器的输出的输入的泵。柴油和汽油服务部分每个还包括输出软管，其具有连接到泵输出的第一端和能够联接到燃料管路入口的第二端。汽油服务部分还包括连接到汽油泵的输出的压力调节器。

8. 发明授权

US06682607B1 Reconditioning of semiconductor substrates to remove photoresist during semiconductor device fabrication 有权
标题翻译：在半导体器件制造期间重新调整半导体衬底以去除光致抗蚀剂
公开(公告)号：US06682607B1
公开(公告)日：2004-01-27
申请号：US10092215
申请日：2002-03-05
申请人： Anthony J. Farino
发明人： Anthony J. Farino
IPC分类号： B08B304
CPC分类号： H01L21/31133 , B08B3/02 , G03F7/3021 , G03F7/422 , H01L21/67028 , H01L21/6708 , Y10S134/902
摘要： A method for reconditioning the surface of a semiconductor substrate to remove an unwanted (i.e. defective) layer of photoresist is disclosed. The method adapts a conventional automated spinner which is used to rotate the substrate at high speed while a stream of a first solvent (e.g. acetone) is used to dissolve the photoresist. A stream of a second solvent (e.g. methanol) is then used to clean the substrate at a lower speed, with the substrate being allowed to dry with continued rotation. The method of the present invention can be used within a photolithography track so that the substrates need never leave the track for reconditioning.
摘要翻译：公开了一种用于修复半导体衬底的表面以去除不需要的（即有缺陷的）光致抗蚀剂层的方法。该方法适用于常规的自动旋转器，其用于以高速旋转基底，同时使用第一溶剂（例如丙酮）流来溶解光致抗蚀剂。然后使用第二溶剂（例如甲醇）的流以更低的速度清洗基材，使基材持续旋转干燥。本发明的方法可以在光刻轨道内使用，使得基板不需要离开轨道进行修复。

9. 发明授权

US06663720B2 Method of prevent an etcher from being eroded 失效
公开(公告)号：US06663720B2
公开(公告)日：2003-12-16
申请号：US09888397
申请日：2001-06-26
申请人： Chiang Wen-Peng , Hsu Ching-Ho
发明人： Chiang Wen-Peng , Hsu Ching-Ho
IPC分类号： B08B304
CPC分类号： C23G5/02803 , H01J37/32862
摘要： A method of prevention maintenance preventing parts of an etcher from being eroded is disclosed. First, a layer of hydrogen-free chemical compound is formed on surface of the parts of the etcher according to one embodiment of the present invention. Otherwise, the parts of the etcher are immersed into a tank containing hydrogen-free chemical compound according to another embodiment of the present invention. After that, a standard process of prevention maintenance is performed by a cleaning agent.

10. 发明授权

US06616776B1 Method for removing engine deposits in a reciprocating internal combustion engine 有权
标题翻译：用于去除往复式内燃机中的发动机沉积物的方法
公开(公告)号：US06616776B1
公开(公告)日：2003-09-09
申请号：US10289799
申请日：2002-11-06
申请人： Majid R. Ahmadi , Damon C. Vaudrin
发明人： Majid R. Ahmadi , Damon C. Vaudrin
IPC分类号： B08B304
CPC分类号： C11D11/0041 , C10L10/06 , C11D1/44 , C11D1/72 , C11D1/825 , C11D3/2068 , C11D3/2096 , C11D3/3746 , C11D3/43 , F02B77/04
摘要： Disclosed are methods for removing engine deposits in a recprocating internal combustion engine by introducing a cleaning composition into an air-intake manifold of a warmed-up and idling reciprocating internal combustion engine and running the engine while the cleaning composition is being introduced. One such cleaning composition suitable for these methods comprises a first solution containing a mixture of: (a) a phenoxy mono- or poly(oxyalkylene) alcohol; (b) at least one solvent selected from (1) an alkoxy mono- or poly(oxyalkylene) alcohol and (2) an aliphatic or aromatic organic solvent; and (c) at least one nitrogen-containing detergent additive; and a second solution containing a mixture of: (d). a phenoxy mono- or poly(oxyalkylene) alcohol; (e) a cyclic carbonate; and (e) water.
摘要翻译：公开了通过将清洁组合物引入预热和空转往复式内燃机的进气歧管中并在引入清洁组合物的同时运行发动机的方法来清除在内燃机中的发动机沉积物。一种适用于这些方法的清洁组合物包括含有以下混合物的第一溶液：（a）苯氧基单 - 或多（氧化烯）醇; （b）至少一种选自（1）烷氧基单 - 或聚（氧化烯）醇和（2）脂族或芳族有机溶剂的溶剂; 和（c）至少一种含氮洗涤剂添加剂; 和含有（d）的混合物的第二溶液。苯氧基单或多（氧化烯）醇; （e）环状碳酸酯; 和（e）水。

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