专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US06279590B1 Cleaning method and cleaning apparatus 失效
标题翻译：清洁方法和清洁装置
公开(公告)号：US06279590B1
公开(公告)日：2001-08-28
申请号：US09621679
申请日：2000-07-24
申请人： Tohru Okuda , Taimi Oketani , Masatoshi Hayashi , Yasuhiro Matsushima
发明人： Tohru Okuda , Taimi Oketani , Masatoshi Hayashi , Yasuhiro Matsushima
IPC分类号： B08B304
CPC分类号： B08B3/104 , Y10S134/902
摘要： A cleaning apparatus in accordance with the present invention includes a first inflow section, provided on a first side surface of a cleaning tank having a substantially rectangular parallelopiped shape, having two inflow openings, a second inflow section, provided on a second side surface facing the first side surface, having inflow openings, and outflow openings for releasing a cleaning liquid flown in from the first and second inflow sections. The cleaning liquid flowing in from the inflow openings forms complex and strong flows in the cleaning tank, thus removing contaminants on a cleaning target evenly and efficiently without nonuniformity and preventing stagnation of the cleaning liquid in the cleaning tank. The cleaning liquid released in filtered by a circulatory section and is allowed to flow into the cleaning tank again through a pipe. As a result, it is possible to clean evenly and efficiently a large cleaning target such as a glass substrate used for liquid crystal display devices and other devices.
摘要翻译：根据本发明的清洁装置包括：第一流入部分，设置在具有大致矩形的平行六面体形状的清洗槽的第一侧面上，具有两个流入口，第二流入部分，设置在面向第一侧表面，具有流入开口和用于释放从第一和第二流入部分流入的清洗液体的流出开口。从流入口流入的清洗液在清洗槽内形成复杂而强烈的流动，从而均匀有效地除去清洁对象物上的污染物而不会不均匀，并防止清洗液体在清洗槽中停滞。由循环部分过滤的清洗液再次通过管道流入清洗槽。结果，可以均匀且有效地清洁诸如用于液晶显示装置和其它装置的玻璃基板等大型清洁对象。

2. 发明授权

US6132523A Method of cleaning a substrate in a cleaning tank using plural fluid flows 有权
标题翻译：使用多个流体流清洗清洗槽中的基板的方法
公开(公告)号：US6132523A
公开(公告)日：2000-10-17
申请号：US145970
申请日：1998-09-03
申请人： Tohru Okuda , Taimi Oketani , Masatoshi Hayashi , Yasuhiro Matsushima
发明人： Tohru Okuda , Taimi Oketani , Masatoshi Hayashi , Yasuhiro Matsushima
IPC分类号： B08B3/10 , B08B3/02 , B08B3/04
CPC分类号： B08B3/104 , Y10S134/902
摘要： A cleaning apparatus and method in accordance with the present invention includes a first inflow section, provided on a first side surface of a cleaning tank having a substantially rectangular parallelopiped shape, having two inflow openings, a second inflow section, provided on a second side surface facing the first side surface, having inflow openings, and outflow openings for releasing a cleaning liquid flown in from the first and second inflow sections. The cleaning liquid flowing in from the inflow openings forms complex and strong flows in the cleaning tank, thus removing contaminants on a cleaning target evenly and efficiently without nonuniformity and preventing stagnation of the cleaning liquid in the cleaning tank. The cleaning liquid released in filtered by a circulatory section and is allowed to flow into the cleaning tank again through a pipe. As a result, it is possible to clean evenly and efficiently a large cleaning target such as a glass substrate used for liquid crystal display devices and other devices.
摘要翻译：根据本发明的清洁装置和方法包括：第一流入部分，设置在具有大致矩形平行六面体形状的清洗槽的第一侧表面上，具有两个流入开口;第二流入部分，设置在第二侧表面上面向具有流入开口的第一侧表面和用于释放从第一和第二流入部分流入的清洗液体的流出开口。从流入口流入的清洗液在清洗槽内形成复杂而强烈的流动，从而均匀有效地除去清洁对象物上的污染物而不会不均匀，并防止清洗液体在清洗槽中停滞。由循环部分过滤的清洗液再次通过管道流入清洗槽。结果，可以均匀且有效地清洁诸如用于液晶显示装置和其它装置的玻璃基板等大型清洁对象。

3. 发明申请

US20060260251A1 Tile wall structure and construction method therefor 审中-公开
标题翻译：瓷砖墙体结构及施工方法
公开(公告)号：US20060260251A1
公开(公告)日：2006-11-23
申请号：US11453990
申请日：2006-06-16
申请人： Masatoshi Hayashi , Masahiro Matuda , Mitsuaki Watanabe
发明人： Masatoshi Hayashi , Masahiro Matuda , Mitsuaki Watanabe
IPC分类号： E04B2/00
CPC分类号： E04F13/0826
摘要： A tile wall structure and a tile wall construction method are disclosed which eliminate the necessity to perform inking for each tile support rail to significantly facilitate an installation operation of tile support rails. A tile supporting portion having upwardly and downwardly projecting portions is formed on a lower side edge of each tile support rail while a tile has upper and lower supporting grooves formed on upper and lower surfaces thereof. The tile support rails are disposed on the skeleton such that adjacent lower and upper portions thereof overlap with each other and positioning portions thereof are positioned relative to each other at the overlapping portions. Each tile is supported between the tile supporting portions of adjacent upper and lower tile support rails with the upper supporting groove engaged with the downwardly projecting portion of the tile supporting portion of the upper side tile support rail and with the lower supporting groove engaged with the upwardly projecting portion of the tile supporting portion of the lower side tile support rail.
摘要翻译：公开了瓦片壁结构和瓦片壁结构方法，其消除了为每个瓦片支撑轨道执行着墨以显着促进瓦片支撑轨道的安装操作的必要性。具有向上和向下突出部分的瓦片支撑部分形成在每个瓦片支撑轨道的下侧边缘上，而瓦片具有形成在其上表面和下表面上的上支撑槽和下支撑槽。瓦片支撑轨道设置在骨架上，使得相邻的下部和上部彼此重叠，并且其重叠部分相对于彼此定位。每个瓦片被支撑在相邻的上瓦片和下瓦片支撑轨道的瓦片支撑部分之间，其中上支撑槽与上侧瓦片支撑轨道的瓦片支撑部分的向下突出部分接合，并且下支撑槽与向上下侧瓦片支撑轨道的瓦片支撑部分的突出部分。

4. 发明授权

US06822938B2 Optical disk having lands and grooves with a reduced track pitch 有权
标题翻译：具有具有减小轨道间距的平台和凹槽的光盘
公开(公告)号：US06822938B2
公开(公告)日：2004-11-23
申请号：US10395731
申请日：2003-03-24
申请人： Hiroyuki Matsumoto , Seiji Morita , Masatoshi Hayashi , Satomi Yoshibe
发明人： Hiroyuki Matsumoto , Seiji Morita , Masatoshi Hayashi , Satomi Yoshibe
IPC分类号： G11B724
CPC分类号： G11B7/24079 , G11B7/007 , G11B7/00718 , G11B7/26 , G11B11/10584
摘要： An optical disk has grooves and lands located on the disk. A predetermined distance between the grooves and lands is defined as a predetermined track pitch. The predetermined track pitch is defined in term of a laser wavelength used during an operation. The grooves have a depth “d” in relation to the lands. The depth is related to a parameter variable “a” and a refraction index “n” of a substrate.
摘要翻译：光盘具有位于盘上的凹槽和平台。凹槽和平台之间的预定距离被定义为预定轨道间距。根据在操作期间使用的激光波长来定义预定轨道间距。凹槽相对于土地具有深度“d”。深度与衬底的参数变量“a”和折射率“n”有关。

5. 发明申请

US20090036640A1 Oligomer Removing Agent for Polyester-Based Fiber Material 审中-公开
标题翻译：聚酯纤维材料低聚物去除剂
公开(公告)号：US20090036640A1
公开(公告)日：2009-02-05
申请号：US11988059
申请日：2007-04-25
申请人： Masaaki Hosoda , Masatoshi Hayashi
发明人： Masaaki Hosoda , Masatoshi Hayashi
IPC分类号： C08G63/688
CPC分类号： D06P5/22 , C08G63/672 , C08G63/6886 , D06P1/5271 , D06P3/52 , D06P3/54
摘要： An oligomer removing agent for polyester-based fiber materials comprises a polyester copolymer which is obtained by polycondensation of a dibasic acid component containing 15-65 mol % of a sulfonate group-containing dibasic acid and a dihydric alcohol component containing polyethylene glycol with a molecular weight of 900-3500, and which has a 200° C. melt viscosity of 5000-23,000 mPa·s and has 10-40 mass % polyoxyethylene chains in the molecule. The oligomer removing agent is able to overcome the problems caused by deposition of polyester oligomers, when added to the dyeing bath in a dyeing step for polyester fiber materials or for fiber materials that are composites thereof with other fiber materials.
摘要翻译：聚酯类纤维材料的低聚物除去剂包括通过使含有15-65mol％的含磺酸酯基的二元酸的二元酸成分和含有分子量的聚乙二醇的二元醇成分缩聚得到的聚酯共聚物为900-3500，熔体粘度为200-200℃，分子中具有10-40质量％的聚氧乙烯链。当在聚酯纤维材料的染色步骤中加入到染色浴中时，或者与其它纤维材料的复合材料的纤维材料相比，低聚物除去剂能够克服聚酯低聚物沉积所引起的问题。

6. 发明授权

US06407979B1 High density optical disk and a method for manufacturing same 有权
标题翻译：高密度光盘及其制造方法
公开(公告)号：US06407979B1
公开(公告)日：2002-06-18
申请号：US09264735
申请日：1999-03-09
申请人： Hiroyuki Matsumoto , Seiji Morita , Masatoshi Hayashi
发明人： Hiroyuki Matsumoto , Seiji Morita , Masatoshi Hayashi
IPC分类号： G11B724
CPC分类号： G11B7/24079 , G11B7/007 , G11B7/00718 , G11B7/26 , G11B11/10584
摘要： A high density disk and a method of manufacturing the same is disclosed. High density is achieved by narrowing groove pitch and increasing groove depth in a manner which does not sacrifice any desirable features of the high density optical disk medium.
摘要翻译：公开了一种高密度盘及其制造方法。通过以不牺牲高密度光盘介质的任何期望特征的方式使沟槽间距变窄并增加沟槽深度来获得高密度。

7. 发明授权

US5106976A Fused pyrazine sulfoxide derivatives for use as antiulcer agents 失效
标题翻译：用作抗菌剂的熔融吡咯烷酮衍生物
公开(公告)号：US5106976A
公开(公告)日：1992-04-21
申请号：US506171
申请日：1990-04-09
申请人： Susumu Okabe , Masaru Satoh , Tomio Yamakawa , Yutaka Nomura , Masatoshi Hayashi
发明人： Susumu Okabe , Masaru Satoh , Tomio Yamakawa , Yutaka Nomura , Masatoshi Hayashi
IPC分类号： C07D241/44 , C07D401/12 , C07D471/04
CPC分类号： C07D401/12 , C07D241/44 , C07D471/04
摘要： Novel sulfoxide derivatives having the formula (I) 5 or (V) show a gastric acid-secretion inhibitory effect: ##STR1## wherein each of R.sup.1 and R.sup.2 is hydrogen, lower alkyl, hydroxyalkyl, phenyl, phenylalkyl or cycloalkyl, R.sup.1 and R.sup.2 may form together with the adjacent N atom a heterocyclic group; each of R.sup.3, R.sup.4, R.sup.4a, R.sup.4b, R.sup.5, R.sup.6, and R.sup.7 is hydrogen, halogen, lower alkoxy, lower alkyl, trifluoromethyl, or fluorine atom-containing lower alkoxy; Y is CH or N; and Z is unsubstituted or substituted 2-pyridine or 2-aminophenyl.

8. 发明授权

US4933458A Certain gastric acid secretion inhibiting sulfoxides 失效
标题翻译：某些胃酸分泌抑制亚砜
公开(公告)号：US4933458A
公开(公告)日：1990-06-12
申请号：US198086
申请日：1988-05-24
申请人： Susumu Okabe , Masaru Satoh , Tomio Yamakawa , Yutaka Nomura , Masatoshi Hayashi
发明人： Susumu Okabe , Masaru Satoh , Tomio Yamakawa , Yutaka Nomura , Masatoshi Hayashi
IPC分类号： C07D241/44 , C07D401/12 , C07D471/04
CPC分类号： C07D401/12 , C07D241/44 , C07D471/04
摘要： Sulfoxide derivatives having the formula (I) or (V) show a gastric acid-secretion inhibitory effect: ##STR1## wherein each of R.sup.1 and R.sup.2 is hydrogen, lower alkyl, hydroxyalkyl, phenyl, phenylalkyl or cycloalkyl, R.sup.1 and R.sup.2 may form together with the adjacent N atom a heterocyclic group; each of R.sup.3, R.sup.4, R.sup.4a, R.sup.4b, R.sup.5, R.sup.6, and R.sup.7 is hydrogen, halogen, lower alkoxy, lower alkyl, trifluoromethyl, or fluorine atom-containing lower alkoxy; Y is CH or N; and Z is unsubstituted or substituted 2-pyridine or 2-aminophenyl.
摘要翻译：具有式（I）或（V）的亚砜衍生物显示出胃酸分泌抑制作用：其中R1和R2各自为氢，低级烷基，羟烷基，苯基，苯基烷基或环烷基，R 1和R 2可以与相邻的N原子一起形成杂环基; R3，R4，R4a，R4b，R5，R6和R7各自为氢，卤素，低级烷氧基，低级烷基，三氟甲基或含氟原子的低级烷氧基; Y是CH或N; Z是未取代的或取代的2-吡啶或2-氨基苯基。

9. 发明申请

US20110107526A1 OLIGOMER REMOVING AGENT FOR POLYESTER-BASED FIBER MATERIAL 有权
标题翻译：用于聚酯纤维材料的低聚物去除剂
公开(公告)号：US20110107526A1
公开(公告)日：2011-05-12
申请号：US13011749
申请日：2011-01-21
申请人： Masaaki Hosoda , Masatoshi Hayashi
发明人： Masaaki Hosoda , Masatoshi Hayashi
IPC分类号： C09B67/00
CPC分类号： D06P5/22 , C08G63/672 , C08G63/6886 , D06P1/5271 , D06P3/52 , D06P3/54
摘要： An oligomer removing agent for polyester-based fiber materials comprises a polyester copolymer which is obtained by polycondensation of a dibasic acid component containing 15-65 mol % of a sulfonate group-containing dibasic acid and a dihydric alcohol component containing polyethylene glycol with a molecular weight of 900-3500, and which has a 200° C. melt viscosity of 5000-23,000 mPa·s and has 10-40 mass % polyoxyethylene chains in the molecule. The oligomer removing agent is able to overcome the problems caused by deposition of polyester oligomers, when added to the dyeing bath in a dyeing step for polyester fiber materials or for fiber materials that are composites thereof with other fiber materials.
摘要翻译：聚酯类纤维材料的低聚物除去剂包括通过使含有15-65mol％的含磺酸酯基的二元酸的二元酸成分和含有分子量的聚乙二醇的二元醇成分缩聚得到的聚酯共聚物为900-3500，熔体粘度为200-200℃，熔体粘度为5000-23000mPa·s，分子中具有10-40质量％的聚氧乙烯链。当在聚酯纤维材料的染色步骤中加入到染色浴中时，或者与其它纤维材料的复合材料的纤维材料相比，低聚物除去剂能够克服聚酯低聚物沉积所引起的问题。

10. 发明授权

US07764428B2 Optical element, optical system, and waveguide 有权
标题翻译：光学元件，光学系统和波导
公开(公告)号：US07764428B2
公开(公告)日：2010-07-27
申请号：US11630225
申请日：2005-06-15
申请人： Masatoshi Hayashi , Atsushi Katsunuma
发明人： Masatoshi Hayashi , Atsushi Katsunuma
IPC分类号： G02B27/10
CPC分类号： G02B6/4206 , G02B3/0043 , G02B3/0062 , G02B3/04 , G02B6/12002 , G02B6/30 , G02B6/32 , G02B6/3676 , G02B6/368 , G02B6/425
摘要： The light beam 5a emitted from a light source Pa is formed into a parallel light beam 6a upon entering the substrate 1 as a result of the effect of lens strips 2a. The parallel light beam 6a reaches the end surface on the emission side of the substrate 1, and is there subjected to the effect of lens strips 3a so that this light beam is focused at a focal position Qa (focal point) on the rear side of the lens strips 3a. Similarly, the light beam 5b emitted from a light source Pb is subjected to the effect of lens strips 2b and is formed into a parallel light beam 6b inside the substrate 1; this light beam is then further subjected to the effect of lens strips 3b, and is therefore focused at a focal point Qb located in a position that is separated from the surface of the substrate 1 by a distance of f. The y direction positions of the light source Pa and the focal points Qa and Qb are respectively shifted by a distance equal to the spacing between the axis of rotational symmetry 4a of the lens strips 2a and 3a and the axis of rotational symmetry 4b of the lens strips 2b and 3b.
摘要翻译：由于透镜条2a的影响，从光源Pa发射的光束5a在进入基板1时形成为平行光束6a。平行光束6a到达基板1的发射侧的端面，并且受到透镜条3a的影响，使得该光束聚焦在位于背面侧的焦点位置Qa（焦点）镜片条3a。类似地，从光源Pb发射的光束5b受到透镜条2b的影响，并且在基板1内形成平行光束6b; 然后该光束进一步受到透镜条3b的影响，因此聚焦在位于从基板1的表面离开f的距离的位置的焦点Qb处。光源Pa和焦点Qa和Qb的y方向位置分别移动等于透镜条2a和3a的旋转对称4a的轴线与透镜的旋转对称4b的轴线之间的距离条2b和3b。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式