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    • 2. 发明授权
    • Image processing apparatus
    • 图像处理装置
    • US4538182A
    • 1985-08-27
    • US374102
    • 1982-05-03
    • Seiji SaitoNaoki AyataHidetoshi SuzukiKunitaka OzawaNoboru Koumura
    • Seiji SaitoNaoki AyataHidetoshi SuzukiKunitaka OzawaNoboru Koumura
    • H04N1/387H04N1/62H04N1/40
    • H04N1/3872H04N1/62
    • An image processing apparatus has CCDs for reading image data of an original, an edge detector for detecting edges of an area specified on the original with a loop or marks of a specific color, an area detector for detecting the specified area, memories for storing the image data read by the CCDs, and a data selector and a data switching circuit for selecting the image data read by one of the CCDs which is to be supplied to an inkjet head for recording. For preventing contamination of the original, the loop or marks can be drawn on the original through an original cover including a transparent or semitransparent sheet member facing the image of the original. Images inside and outside the area or areas can be selectively reproduced in various combinations of the normal mode, red output modes involving different types of color conversion, and extinguishing mode. Image data from another source which is stored in another memory can be inserted at a desired part of the reproduced copy.
    • 图像处理装置具有用于读取原稿的图像数据的CCD,用于检测具有特定颜色的循环或标记的原稿上指定的区域的边缘的边缘检测器,用于检测指定区域的存储器,用于存储 由CCD读取的图像数据,以及数据选择器和数据切换电路,用于选择要供应到用于记录的喷墨头的CCD之一读取的图像数据。 为了防止原稿的污染,可以通过包括面向原稿的图像的透明或半透明片材的原件盖将原件上的环或标记拉出。 可以以常规模式,涉及不同类型的颜色转换的红色输出模式和熄灭模式的各种组合来选择性地再现区域或区域内外的图像。 存储在另一个存储器中的另一个源的图像数据可以被插入到再现的拷贝的期望部分。
    • 3. 发明授权
    • Solid-state photoelectric transducer
    • 固态光电传感器
    • US4390791A
    • 1983-06-28
    • US247752
    • 1981-03-26
    • Katsunori HatanakaShunichi UzawaYutaka HiraiNaoki Ayata
    • Katsunori HatanakaShunichi UzawaYutaka HiraiNaoki Ayata
    • H01L27/146H01J40/14
    • H01L27/14665
    • A solid-state photoelectric transducer comprises a plurality of output units for photoelectrically converted signals which units are constructed of: a plurality of photoelectric converter elements, a plurality of signal accumulators for accumulating signals output from said photoelectric converter elements corresponding to an amount of light incident on said photoelectric converter elements, each of said signal accumulators being connected with an associated one of said photoelectric converter elements; a plurality of devices for returning the signal accumulators from a signal accumulating state to an initial state, each of said devices being connected with an associated one of the signal accumulators; a plurality of signal amplifiers for outputting amplified signals corresponding to the signals accumulated in the signal accumulators, each signal amplifier being connected with an associated signal accumulator; and a plurality of cross-talk preventors for preventing cross-talk of the signal output from each signal amplifier, each signal amplifier being provided with one of the cross-talk preventors; a plurality of said signal amplifiers being exclusively selected by a unit selecting signal in each of said output units, said output units having a controlling line which transmits a controlling signal for controlling each of the return devices to the initial state in common, and the signal amplifiers of the same level in each output unit having a signal output line in common.
    • 固态光电变换器包括多个用于光电转换信号的输出单元,其单元由以下构成:多个光电转换元件,多个信号累加器,用于累积从所述光电转换元件输出的信号,该信号对应于入射光量 在所述光电转换元件上,每个所述信号存储器与所述光电转换元件中的相关联的一个连接; 用于将信号累加器从信号累积状态返回到初始状态的多个装置,每个所述装置与相关联的一个信号累加器连接; 多个信号放大器,用于输出对应于积累在信号累加器中的信号的放大信号,每个信号放大器与相关联的信号累加器连接; 以及用于防止从每个信号放大器输出的信号的串扰的多个串扰防止器,每个信号放大器设置有串扰防止器之一; 多个所述信号放大器由每个所述输出单元中的单元选择信号专门选择,所述输出单元具有控制线,所述控制线将用于将每个返回装置的每个返回装置共同控制到初始状态,并且所述信号 每个输出单元中具有相同电平的放大器具有共同的信号输出线。
    • 7. 发明授权
    • Method of detecting position of a mark
    • 检测标记位置的方法
    • US4933715A
    • 1990-06-12
    • US301366
    • 1989-01-25
    • Yuichi YamadaNaoki AyataHiroki SuzukawaHideki Nogawa
    • Yuichi YamadaNaoki AyataHiroki SuzukawaHideki Nogawa
    • G01B11/00G03F9/00H01L21/027H01L21/30H01L21/68
    • G03F9/70
    • A mark detecting method and device suitably applicable to the alignment of a reticle in a semiconductor device manufacturing exposure apparatus, called a stepper, is disclosed. A mark is provided by repeated patterns having specific pitches. These patterns are set so that at least one pitch of the patterns differs, on a light-receiving surface of an image sensor which receives an image of the mark, from a multiple, by an integral number, of the sampling pitch (pitch of picture elements) of the image sensor. In one preferred form, the mark is formed by repeated patterns of a number N (.gtoreq.2), wherein at least one pitch Pp of the patterns satisfies, on the light-receiving surface of the image sensor, a relationship Pp=(m+n/N).times.Pix where m is an arbitrary number, n is an integral number which satisfies 1.ltoreq.n.ltoreq.N, and Pix is the sampling pitch of the image sensor. The image of such a mark is photoelectrically converted to thereby determine the position of the mark. With the proposed concept, any error which might be caused upon quantization of the mark image by the picture elements of the image sensor can be canceled or compensated at the time of calculation of the mark center. Therefore, the precision of the mark center detection can be improved.
    • 公开了适用于半导体装置制造用曝光装置(称为步进机)中的掩模版的取向的标记检测方法和装置。 通过具有特定间距的重复图案提供标记。 这些图案被设置为使得图案的至少一个间距在从接收标记的图像的图像传感器的光接收表面上的不同之处,取决于采样间距(图像的间距) 元素)。 在一个优选形式中,标记由数目N(> / = 2)的重复图案形成,其中图案的至少一个间距Pp在图像传感器的光接收表面上满足关系Pp =( m + n / N)xPix其中m是任意数,n是满足1≤n≤N的整数,并且Pix是图像传感器的采样间距。 这样的标记的图像被光电转换,从而确定标记的位置。 利用所提出的概念,可以在计算标记中心时消除或补偿由图像传感器的图像元素对标记图像进行量化时可能引起的任何错误。 因此,可以提高标记中心检测的精度。
    • 8. 发明授权
    • Alignment method usable in a step-and-repeat type exposure apparatus for
either global or dye-by-dye alignment
    • 可用于全球或逐个染料对齐的步进重复型曝光装置中的对准方法
    • US4918320A
    • 1990-04-17
    • US170359
    • 1988-03-18
    • Bunei HamasakiHajime IgarashiAkiya NakaiNaoki Ayata
    • Bunei HamasakiHajime IgarashiAkiya NakaiNaoki Ayata
    • G03F9/00
    • G03F9/7003
    • A method of aligning a semiconductor wafer, usable in a step-and-repeat type exposure apparatus for projecting, in a reduced scale, images of a pattern formed on a reticle upon different shot areas on the semiconductor wafer in a predetermined sequence. According to this alignment method, the wafer is moved stepwise before the initiation of step-and-repeat exposures of the shot areas on the wafer and in accordance with a predetermined layout grid concerning the sites of the shot areas on the wafer. While moving the wafer stepwise in this manner, any positional deviation of each of some of the shot areas with respect to the layout grid is measured by use of a reduction projection lens system and, from the results of measurement, a corrected grid is prepared according to which grid the amount of stepwise movement of the wafer to be made for the step-and-repeat exposures thereof is determined. By this, for the exposures, the wafer can be moved stepwise exactly in accordance with the actual layout of the shot areas. Sample shot areas which are the subject of measurement can be selected under predetermined conditions. Additionally, of the values obtained as a result of the measurement, any extraordinary one or ones may be determined on the basis of the variance and then are excluded at the time of calculations made to determine the corrected grid. Thus, the stepwise movement of the wafer for the step-and-repeat exposures thereof can be controlled with higher precision.
    • 一种可用于步进重复型曝光装置中的半导体晶片的对准方法,用于以预定的顺序,在半导体晶片上的不同照射区域上以缩小的尺度投影形成在掩模版上的图案的图像。 根据这种对准方法,晶片在晶片上的拍摄区域的重复曝光开始之前逐步移动,并且根据关于晶片上的照射区域的位置的预定布局网格。 当以这种方式逐步移动晶片时,通过使用还原投影透镜系统来测量相对于布局格栅的一些照射区域中的每一个的任何位置偏差,并且根据测量结果,根据 确定要进行步进重复曝光的晶圆的逐步移动量。 由此,对于曝光,晶片可以根据拍摄区域的实际布局精确地逐步移动。 作为测量对象的采样拍摄区域可以在预定条件下选择。 此外,作为测量结果获得的值,可以基于方差来确定任何非常一个或一个,然后在进行计算时排除以确定校正的网格。 因此,可以更高精度地控制用于步进重复曝光的晶片的逐步移动。
    • 9. 发明授权
    • Alignment and exposure apparatus
    • 对准和曝光设备
    • US4669867A
    • 1987-06-02
    • US701623
    • 1985-02-14
    • Koji UdaKazuyuki OdaNaoki Ayata
    • Koji UdaKazuyuki OdaNaoki Ayata
    • G03F9/00G03B27/42
    • G03F9/70
    • An alignment and exposure apparatus in which sequential operations of pattern projection for projecting a pattern of a first object, at a reduced ratio, onto a second object through an optical system, stepwise movement for moving the second object stepwise relative to the first object, detection for detecting any positional deviation between the first and second objects at a position at which the stepwise movement of the second object is terminated, and correction for correcting the positional relation between the first and second objects on the basis of the detected positional deviation, are repeated relative to the second object to thereby print the patterns onto the second object in a reduced scale. Upon correction of the positional relation between the first and second objects, at least one of the first and second objects is displaced in accordance with the magnitude of the detected positional deviation and/or, upon stepwise movement of the second object, the amount of stepwise movement to be made is corrected in accordance with the detected positional deviation with respect to the position at which the preceding stepwise movement of the second object is terminated. By this, the time required for repetitions of exposures is reduced.
    • 一种对准和曝光装置,其中用于通过光学系统将第一物体的图案以减小的比例投影到第二物体上的图案投影的顺序操作,用于相对于第一物体逐步移动第二物体的逐步移动,检测 用于检测在第二物体的逐步移动终止的位置处的第一和第二物体之间的任何位置偏差,并且基于检测到的位置偏差校正第一和第二物体之间的位置关系的校正被重复 从而以更小的比例将图案印刷到第二物体上。 在校正第一和第二物体之间的位置关系时,第一和第二物体中的至少一个根据检测到的位置偏差的大小而移位和/或在第二物体的逐步移动时, 根据检测到的相对于第二物体的先前逐步移动终止的位置的位置偏差来校正要进行的移动。 因此,减少重复曝光所需的时间。