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1. 发明授权

US06455203B1 Mask structure and method of manufacturing the same 失效
标题翻译：面膜结构及其制造方法
公开(公告)号：US06455203B1
公开(公告)日：2002-09-24
申请号：US09545464
申请日：2000-04-07
申请人： Mitsuaki Amemiya , Shunichi Uzawa , Keiko Chiba
发明人： Mitsuaki Amemiya , Shunichi Uzawa , Keiko Chiba
IPC分类号： G03F900
CPC分类号： G03F9/00 , G03F1/22 , G03F7/2022
摘要： A mask manufacturing method includes performing a multiple exposure process to a substrate so that a number of latent images are formed on the substrate, and processing the exposed substrate to produce actual mask patterns, wherein the multiple exposure process includes a first exposure step for forming a latent image of relatively-fine periodic patterns on the substrate by use of a first master mask having absorptive periodic patterns, and a second exposure step for forming a latent image of relatively-rough patterns on the substrate by use of a second master mask having absorptive patterns.
摘要翻译：掩模制造方法包括对基板进行多次曝光处理，使得在基板上形成多个潜像，并处理曝光的基板以产生实际的掩模图案，其中多次曝光处理包括第一曝光步骤，用于形成通过使用具有吸收性周期性图案的第一主掩模在基板上的相对精细的周期性图案的潜像，以及第二曝光步骤，用于通过使用具有吸收性的第二主掩模在基板上形成相对粗糙的图案的潜像模式。

2. 发明授权

US06324250B1 Exposure method 有权
标题翻译：曝光方法
公开(公告)号：US06324250B1
公开(公告)日：2001-11-27
申请号：US09425224
申请日：1999-10-22
申请人： Mitsuaki Amemiya , Shunichi Uzawa , Yutaka Watanabe
发明人： Mitsuaki Amemiya , Shunichi Uzawa , Yutaka Watanabe
IPC分类号： H01L2130
CPC分类号： G03F7/70425 , G03F1/22 , G03F1/50 , G03F7/2022
摘要： An exposure method for transferring a pattern of a mask onto a workpiece in a proximity exposure system, includes a first exposure step for exposing a predetermined portion of the workpiece, while maintaining a first spacing between the mask and the workpiece, and a second exposure step for exposing the predetermined portion of the workpiece, while maintaining a second spacing, different from the first spacing, between the mask and the workpiece, wherein exposures in the first and second exposure steps are performed superposedly, prior to a development process.
摘要翻译：一种用于在接近曝光系统中将掩模图案转印到工件上的曝光方法包括：第一曝光步骤，用于在保持掩模和工件之间的第一间隔的同时保持工件的预定部分，以及第二曝光步骤用于在所述掩模和所述工件之间保持与所述第一间隔不同的第二间隔的情况下暴露所述工件的预定部分，其中在显影处理之前，重叠地执行所述第一和第二曝光步骤中的曝光。

3. 发明授权

US5641264A Substrate conveying device and method of controlling the same 失效
标题翻译：基板输送装置及其控制方法
公开(公告)号：US5641264A
公开(公告)日：1997-06-24
申请号：US996870
申请日：1992-12-21
申请人： Mitsutoshi Kuno , Hidehiko Fujioka , Nobutoshi Mizusawa , Yuji Chiba , Takao Kariya , Koji Uda , Shunichi Uzawa , Eigo Kawakami
发明人： Mitsutoshi Kuno , Hidehiko Fujioka , Nobutoshi Mizusawa , Yuji Chiba , Takao Kariya , Koji Uda , Shunichi Uzawa , Eigo Kawakami
IPC分类号： G03F7/20 , H01L21/687 , B65G65/00
CPC分类号： G03F7/70741 , H01L21/68707 , Y10S294/907
摘要： A method of controlling a conveying device having a gripping hand for gripping an article to be conveyed and a conveying mechanism for conveying the gripping hand, wherein a pressing force applied to the gripping hand through the article being conveyed is detected and the conveying operation of the conveying mechanism is stopped when the pressing force exceeds a predetermined force.
摘要翻译：一种控制输送装置的方法，所述输送装置具有用于夹持要输送的物品的夹持手和用于输送夹持手的输送机构，其中检测到通过被输送物品施加到抓握手的按压力，并且输送操作当按压力超过预定力时，输送机构停止。

4. 发明授权

US5459573A Light quantity controlling apparatus 失效
标题翻译：光量控制装置
公开(公告)号：US5459573A
公开(公告)日：1995-10-17
申请号：US291747
申请日：1994-08-17
申请人： Naoto Abe , Koji Uda , Isamu Shimoda , Shunichi Uzawa , Noriyuki Nose
发明人： Naoto Abe , Koji Uda , Isamu Shimoda , Shunichi Uzawa , Noriyuki Nose
IPC分类号： G01B11/00 , G01D5/26 , G03F9/00 , H01L21/68 , H01L31/12 , H01L33/00 , H01S5/06 , H01S5/062 , H01S5/0683 , G01N21/86
CPC分类号： G03F9/7088 , G03F9/7049 , H01L21/68 , H01L21/682 , H01S5/06835 , H01S5/06216
摘要： A position detecting apparatus usable for aligning mask and a semiconductor wafer, wherein a laser beam produced by a semiconductor laser is projected through a predetermined optical system to alignment marks formed on the mask and the wafer, and the light reflected by the marks are detected by an accumulation type sensor to produce an electrical signal, from which the relative positional relation between the mask and the wafer are detected on the basis of the electrical signal. To obtain proper mark signals, the quantity of light incident on the accumulation sensor is controlled. In this apparatus, the beam emitting strength of the semiconductor laser is made constant, and the control of thee amount of light incident on the accumulation sensor is effected by controlling the operation period of the semiconductor laser. In addition, the actuation timing of the semiconductor laser is advanced from the accumulation start of the accumulation type sensor by the time required for the semiconductor laser to be thermally stabilized after its actuation. The mark detection signal produced by the accumulation sensor is precise.
摘要翻译：一种可用于对准掩模和半导体晶片的位置检测装置，其中由半导体激光器产生的激光束通过预定的光学系统投射到形成在掩模和晶片上的对准标记，并且由标记反射的光被用于产生电信号的累积型传感器，根据电信号检测掩模和晶片之间的相对位置关系。为了获得适当的标记信号，控制入射在累积传感器上的光量。在该装置中，半导体激光器的发射光强度保持恒定，并且通过控制半导体激光器的工作周期来控制入射到积聚传感器上的光量。此外，半导体激光器的激活定时从累积型传感器的累积开始到半导体激光器在其致动之后被热稳定所需的时间前进。由积累传感器产生的标记检测信号是精确的。

5. 发明授权

US5443932A Exposure method 失效
标题翻译：曝光方法
公开(公告)号：US5443932A
公开(公告)日：1995-08-22
申请号：US161099
申请日：1993-12-03
申请人： Hirohisa Ohta , Kunitaka Ozawa , Eigo Kawakami , Shunichi Uzawa
发明人： Hirohisa Ohta , Kunitaka Ozawa , Eigo Kawakami , Shunichi Uzawa
IPC分类号： G03F7/20 , G03F9/00 , H01L21/027 , H01L21/30
CPC分类号： G03F9/7023 , G03F7/201
摘要： An exposure method includes disposing a mask and a semiconductor wafer opposed to each other in a close proximity relation with respect to a Z-axis direction and printing a pattern of the mask on each of different shot areas of the semiconductor wafer in a step-and-repeat manner, with a predetermined exposure energy. In this method, the spacing between the mask and the wafer for the paralleling of them is made larger than the spacing therebetween as assumed at the time of mask-to-wafer alignment with respect to X-Y plane or the spacing between the mask and the wafer as assumed at the time of exposure of the wafer to the mask. After the paralleling of the mask and the wafer, the mask and the wafer are moved closer to each other in the Z-axis direction and alignment and exposure is performed. This ensures that the alignment and exposure are effected at an optimum spacing while, on the other hand, contact of the mask and the wafer at the time of paralleling is precluded.
摘要翻译：曝光方法包括以相对于Z轴方向彼此紧密相对的方式设置掩模和半导体晶片，并且在半导体晶片的不同照射区域的每一个上以均匀的方式印刷掩模的图案，并且以预定的曝光能量。在这种方法中，掩模和与它们并联的晶片之间的间隔被制成大于它们之间的间隔，如假设在相对于XY平面的掩模到晶片对准时或掩模和晶片之间的间隔如在晶片暴露于掩模时所假设的那样。在掩模和晶片平行之后，掩模和晶片在Z轴方向上彼此靠近移动，并进行对准和曝光。这确保了对准和曝光以最佳间隔进行，另一方面，阻止了并联时的掩模与晶片的接触。

6. 发明授权

US5285488A Exposure apparatus 失效
标题翻译：曝光装置
公开(公告)号：US5285488A
公开(公告)日：1994-02-08
申请号：US974307
申请日：1992-11-10
申请人： Yutaka Watanabe , Ryuichi Ebinuma , Nobutoshi Mizusawa , Shunichi Uzawa , Takao Kariya
发明人： Yutaka Watanabe , Ryuichi Ebinuma , Nobutoshi Mizusawa , Shunichi Uzawa , Takao Kariya
IPC分类号： G03F7/20 , G21K5/00
CPC分类号： G03F7/702
摘要： An exposure apparatus includes an exposure beam source for projecting a beam flux for exposure, having a non-uniform intensity distribution, toward a range including an exposure zone, set with respect to a main body of the exposure apparatus; illuminance detectors disposed at least at two points inside the exposure beam flux but outside the exposure zone; and a detecting device for detecting a change in intensity of the exposure beam and a change in relative position of the exposure zone and the exposure beam flux, on the basis of detected illuminances at the two points.
摘要翻译：曝光装置包括：曝光束源，用于将曝光用光束投射到具有相对于曝光装置的主体的曝光区域的范围内，具有不均匀的强度分布; 照度检测器至少设置在曝光光束内部的两个点处，但在曝光区域外; 以及检测装置，其基于两点处的检测到的照度，检测曝光光束的强度变化和曝光区域和曝光光束通量的相对位置的变化。

7. 发明授权

US5182615A Exposure apparatus 失效
标题翻译：曝光装置
公开(公告)号：US5182615A
公开(公告)日：1993-01-26
申请号：US563420
申请日：1990-08-07
申请人： Hiroshi Kurosawa , Koji Uda , Kunitaka Ozawa , Shunichi Uzawa , Nobutoshi Mizusawa , Shigeyuki Suda , Noriyuki Nose , Takao Kariya
发明人： Hiroshi Kurosawa , Koji Uda , Kunitaka Ozawa , Shunichi Uzawa , Nobutoshi Mizusawa , Shigeyuki Suda , Noriyuki Nose , Takao Kariya
IPC分类号： G03F7/20 , G03F9/00
CPC分类号： G03F7/70691 , G03F9/7049
摘要： An exposure apparatus for printing a pattern of a mask to a wafer includes a mask moving mechanism for moving the mask; a wafer moving mechanism or moving the wafer along a predetermined movement coordinate; a measuring system for measuring an error with respect to the movement coordinate, resulting from the movement of the mask by the mask moving mechanism; and a memorizing device for memorizing a data table prepared on the basis of the error measured by the measuring system; wherein the wafer moving mechanism uses the data in the data table when it moves the wafer for positioning of the wafer with respect to the mask.

8. 发明授权

US5172402A Exposure apparatus 失效
标题翻译：曝光装置
公开(公告)号：US5172402A
公开(公告)日：1992-12-15
申请号：US666649
申请日：1991-03-08
申请人： Nobutoshi Mizusawa , Ryuichi Ebinuma , Hiroshi Kurosawa , Koji Uda , Takao Kariya , Shunichi Uzawa
发明人： Nobutoshi Mizusawa , Ryuichi Ebinuma , Hiroshi Kurosawa , Koji Uda , Takao Kariya , Shunichi Uzawa
IPC分类号： G03F7/20
CPC分类号： G03F7/70008 , G03F7/702
摘要： An exposure method for manufacture of semiconductor devices, includes moving a shutter having an edge so that the edge is related to a predetermined exposure region; projecting an exposure beam to the edge of the shutter and to at least a portion of the exposure region; determining a position of a shadow of the edge of the shutter formed by the exposure beam with respect to a predetermined coordinate system related to movement of a movable chuck; adjusting the shutter in accordance with the determination; placing a substrate on the chuck; moving the chuck so that the substrate is related to the exposure region; and controlling the exposure of the substrate with the exposure beam through the shutter.

9. 发明授权

US5155523A Workpiece supporting mechanism 失效
标题翻译：工作支持机制
公开(公告)号：US5155523A
公开(公告)日：1992-10-13
申请号：US350648
申请日：1989-05-11
申请人： Shinichi Hara , Shunichi Uzawa
发明人： Shinichi Hara , Shunichi Uzawa
IPC分类号： G12B5/00 , F16F15/02 , G03F7/20 , G05D19/02 , G12B9/08 , H01L21/00 , H01L21/027 , H01L21/30 , H01L21/687 , H01L41/04
CPC分类号： H01L21/67288 , F16F15/02 , G03F7/70725 , G03F7/70866 , G03F7/709 , G05D19/02 , H01L21/68785 , H01L41/042
摘要： A workpiece supporting mechanism suitably usable in an exposure apparatus, is disclosed. The mechanism includes a workpiece supporting member which is provided with a displacement sensor such as a speed sensor or an acceleration sensor. A vibrator such as a piezoelectric device is added to the supporting member or a stage which supports the supporting member. Any vibration of the workpiece or the supporting member is detected by the displacement sensor and, in accordance with the detection, the vibrator is energized to cancel the vibration of the workpiece and the workpiece supporting member.

10. 发明授权

US5150391A Exposure apparatus 失效
公开(公告)号：US5150391A
公开(公告)日：1992-09-22
申请号：US830449
申请日：1992-02-05
申请人： Ryuichi Ebinuma , Nobutoshi Mizusawa , Takao Kariya , Shigeyuki Suda , Shunichi Uzawa
发明人： Ryuichi Ebinuma , Nobutoshi Mizusawa , Takao Kariya , Shigeyuki Suda , Shunichi Uzawa
IPC分类号： G03F7/20 , G03F9/00 , H01L21/027 , H01L21/30
CPC分类号： G03F7/70066 , G03F7/70858 , G03F7/70891 , G03F9/70
摘要： An exposure apparatus for transferring a pattern of an original onto a workpiece, includes a blocking member for defining a rectangular exposure region with respect to at least one of the original and the workpiece, wherein the exposure for the pattern transfer can be effected with the exposure region defined by the blocking member. Plural detection systems detect a positional deviation between the original and the workpiece, each of which is disposed so as to be associated with at least one of four sides of the rectangular exposure region. Plural first movable stages each is provided so as to be associated with at least one of the four sides, and each is adapted to carry thereon one of the detection systems disposed to be associated with a corresponding side. Each first movable stage comprises a single-axis stage movable in a direction parallel to a corresponding side. Plural second stages each carryies thereon corresponding one of the first movable stages, and each comprises a single-axis stage movable in a direction perpendicular to a corresponding side and in a direction parallel to the rectangular exposure region. Each second movable state is operable to displace the light blocking member to change the rectangular exposure region.

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