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1. 发明授权

US4937618A Alignment and exposure apparatus and method for manufacture of integrated circuits 失效
标题翻译：对准和曝光装置及集成电路的制造方法
公开(公告)号：US4937618A
公开(公告)日：1990-06-26
申请号：US368881
申请日：1989-06-20
申请人： Naoki Ayata , Mitsugu Yamamura , Bunei Hamasaki , Masao Kosugi , Kazuo Takahashi , Mitsuaki Seki
发明人： Naoki Ayata , Mitsugu Yamamura , Bunei Hamasaki , Masao Kosugi , Kazuo Takahashi , Mitsuaki Seki
IPC分类号： G03F7/20 , G03F9/00
CPC分类号： G03F9/7088 , G03F7/70058 , G03F7/70725 , G03F9/7023 , G03F9/7057
摘要： An alignment apparatus including a first off-axis alignment optical system having a magnification, and a second off-axis alignment optical system having a magnification higher than that of the first off-axis alignment optical system, wherein the apparatus is operable in a global alignment mode using the second off-axis alignment optical system. In another aspect, there is provided an alignment apparatus which includes a first off-axis alignment optical system having a magnification, a second off-axis alignment optical system having a magnification higher than that of the first off-axis alignment optical system, and a TTL alignment optical system, wherein the alignment apparatus is operable in a global alignment mode using the second off-axis alignment optical system and is operable in another global alignment mode using the TTL optical alignment system.
摘要翻译：一种对准装置，包括具有倍率的第一离轴对准光学系统和具有高于第一离轴对准光学系统的倍率的第二离轴对准光学系统，其中该装置可以全局对准模式使用第二离轴对准光学系统。在另一方面，提供了一种对准装置，其包括具有倍率的第一离轴对准光学系统，具有比第一离轴对准光学系统的放大率高的倍率的第二离轴对准光学系统，以及 TTL对准光学系统，其中对准装置可以使用第二离轴对准光学系统以全局对准模式操作，并且可以使用TTL光学对准系统以另一全局对准模式操作。

2. 发明授权

US4600282A Alignment apparatus 失效
标题翻译：校准装置
公开(公告)号：US4600282A
公开(公告)日：1986-07-15
申请号：US667993
申请日：1984-11-05
申请人： Mitsugu Yamamura , Minoru Yomoda
发明人： Mitsugu Yamamura , Minoru Yomoda
IPC分类号： G03F7/20 , G03F7/207 , G03F9/00 , G03B27/34
CPC分类号： G03F9/7088 , G03F7/70691 , G03F9/7026 , G03F9/7057
摘要： An alignment apparatus for positioning on a wafer an image of a mask formed by a projection optical system. The apparatus includes a first detecting system for detecting the distance between an imaging plane of the optical system and the wafer, a driving mechanism for moving the wafer in the direction of the optical axis of the optical system and a second detecting system for detecting the amount of movement of the wafer. The driving mechanism is controlled while the distance detected by the first detecting system is compared with the amount of movement detected by the second detecting system, whereby the wafer is correctly and accurately positioned on the imaging plane of the optical system.
摘要翻译：一种用于在晶片上定位由投影光学系统形成的掩模的图像的对准装置。该装置包括用于检测光学系统的成像平面与晶片之间的距离的第一检测系统，用于在光学系统的光轴方向上移动晶片的驱动机构和用于检测光学系统的量的第二检测系统的晶片的移动。控制驱动机构，同时将由第一检测系统检测到的距离与由第二检测系统检测到的移动量进行比较，从而将晶片正确且准确地定位在光学系统的成像平面上。

3. 发明授权

US5365342A Alignment and exposure apparatus and method for manufacture of integrated circuits 失效
标题翻译：对准和曝光装置及集成电路的制造方法
公开(公告)号：US5365342A
公开(公告)日：1994-11-15
申请号：US29363
申请日：1993-03-10
申请人： Naoki Ayata , Mitsugu Yamamura , Bunei Hamasaki , Masao Kosugi , Kazuo Takahashi , Mitsuaki Seki
发明人： Naoki Ayata , Mitsugu Yamamura , Bunei Hamasaki , Masao Kosugi , Kazuo Takahashi , Mitsuaki Seki
IPC分类号： G03F7/20 , G03F9/00 , H01L21/30 , G01B11/00
CPC分类号： G03F9/7088 , G03F7/70058 , G03F7/70725 , G03F9/7023 , G03F9/7057 , H01L21/30
摘要： An alignment apparatus includes a first off-axis alignment optical system having a magnification, and a second off-axis alignment optical system having a magnification higher than that of the first off-axis alignment optical system, wherein the apparatus is operable in a global alignment mode using the second off-axis alignment optical system. In another aspect, an alignment apparatus which includes a first off-axis alignment optical system having a magnification, a second off-axis alignment optical system having a magnification higher than that of the first off-axis alignment optical system, and a TTL alignment optical system, wherein the alignment apparatus is operable in a global alignment mode using the second off-axis alignment optical system and is operable in another global alignment mode using the TTL optical alignment system.
摘要翻译：对准装置包括具有倍率的第一离轴对准光学系统和具有高于第一离轴对准光学系统的倍率的第二离轴对准光学系统，其中该装置可以全局对准模式使用第二离轴对准光学系统。在另一方面，一种对准装置，包括具有放大率的第一离轴对准光学系统，具有高于第一离轴对准光学系统的倍率的第二离轴对准光学系统，以及TTL对准光学系统，其中所述对准装置可以使用所述第二离轴对准光学系统以全局对准模式操作，并且可以使用所述TTL光学对准系统在另一全局对准模式中操作。

4. 发明授权

US4669842A Projection optical device 失效
标题翻译：投影光学装置
公开(公告)号：US4669842A
公开(公告)日：1987-06-02
申请号：US677517
申请日：1984-12-03
申请人： Minoru Yomoda , Mitsugu Yamamura
发明人： Minoru Yomoda , Mitsugu Yamamura
IPC分类号： G02B7/00 , G03F7/20 , G03F7/207 , G03F9/00 , G03B27/34
CPC分类号： G03F7/70233 , G02B7/008 , G03F7/70241 , G03F7/70258 , G03F7/707 , G03F7/70716 , G03F7/70875 , G03F7/70891 , G03F9/7026
摘要： An optical device projects a pattern of a first object on a second object through an optical system. Changes in the temperature of the optical system or changes in the ambient temperature of the optical system are detected and, on the basis of the detected temperature, any focus deviation or displacement of the optical system due to the temperature change is corrected. The correction of the focus deviation is achieved by controlling the temperature of the optical system or the position of the second object.
摘要翻译：光学设备通过光学系统投射第二物体上的第一物体的图案。检测光学系统的温度变化或光学系统的环境温度的变化，并且基于检测到的温度，校正由于温度变化引起的光学系统的任何焦点偏离或位移。通过控制光学系统的温度或第二物体的位置来实现聚焦偏差的校正。

5. 发明授权

US5050111A Alignment and exposure apparatus and method for manufacture of integrated circuits 失效
标题翻译：对准和曝光装置及集成电路的制造方法
公开(公告)号：US5050111A
公开(公告)日：1991-09-17
申请号：US542653
申请日：1990-06-25
申请人： Naoki Ayata , Mitsugu Yamamura , Bunei Hamasaki , Masao Kosugi , Kazuo Takahashi , Mitsuaki Seki
发明人： Naoki Ayata , Mitsugu Yamamura , Bunei Hamasaki , Masao Kosugi , Kazuo Takahashi , Mitsuaki Seki
IPC分类号： G03F7/20 , G03F9/00
CPC分类号： G03F9/7088 , G03F7/70058 , G03F7/70725 , G03F9/7023 , G03F9/7057
摘要： An alignment apparatus includes a first off-axis alignment optical system having a magnification, and a second off-axis alignment optical system having a magnification higher than that of the first off-axis alignment optical system, wherein the apparatus is operable in a global alignment mode using the second off-axis alignment optical system. In another aspect, an alignment apparatus includes a first off-axis alignment optical system having a magnification, a second off-axis alignment optical system having a magnification higher than that of the first off-axis alignment optical system, and a TTL alignment optical system, wherein the alignment apparatus is operable in a global alignment mode using the second off-axis alignment optical system and is operable in another global alignment mode using the TTL optical alignment system.

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