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1. 发明授权

US4937618A Alignment and exposure apparatus and method for manufacture of integrated circuits 失效
标题翻译：对准和曝光装置及集成电路的制造方法
公开(公告)号：US4937618A
公开(公告)日：1990-06-26
申请号：US368881
申请日：1989-06-20
申请人： Naoki Ayata , Mitsugu Yamamura , Bunei Hamasaki , Masao Kosugi , Kazuo Takahashi , Mitsuaki Seki
发明人： Naoki Ayata , Mitsugu Yamamura , Bunei Hamasaki , Masao Kosugi , Kazuo Takahashi , Mitsuaki Seki
IPC分类号： G03F7/20 , G03F9/00
CPC分类号： G03F9/7088 , G03F7/70058 , G03F7/70725 , G03F9/7023 , G03F9/7057
摘要： An alignment apparatus including a first off-axis alignment optical system having a magnification, and a second off-axis alignment optical system having a magnification higher than that of the first off-axis alignment optical system, wherein the apparatus is operable in a global alignment mode using the second off-axis alignment optical system. In another aspect, there is provided an alignment apparatus which includes a first off-axis alignment optical system having a magnification, a second off-axis alignment optical system having a magnification higher than that of the first off-axis alignment optical system, and a TTL alignment optical system, wherein the alignment apparatus is operable in a global alignment mode using the second off-axis alignment optical system and is operable in another global alignment mode using the TTL optical alignment system.
摘要翻译：一种对准装置，包括具有倍率的第一离轴对准光学系统和具有高于第一离轴对准光学系统的倍率的第二离轴对准光学系统，其中该装置可以全局对准模式使用第二离轴对准光学系统。在另一方面，提供了一种对准装置，其包括具有倍率的第一离轴对准光学系统，具有比第一离轴对准光学系统的放大率高的倍率的第二离轴对准光学系统，以及 TTL对准光学系统，其中对准装置可以使用第二离轴对准光学系统以全局对准模式操作，并且可以使用TTL光学对准系统以另一全局对准模式操作。

2. 发明授权

US5050111A Alignment and exposure apparatus and method for manufacture of integrated circuits 失效
标题翻译：对准和曝光装置及集成电路的制造方法
公开(公告)号：US5050111A
公开(公告)日：1991-09-17
申请号：US542653
申请日：1990-06-25
申请人： Naoki Ayata , Mitsugu Yamamura , Bunei Hamasaki , Masao Kosugi , Kazuo Takahashi , Mitsuaki Seki
发明人： Naoki Ayata , Mitsugu Yamamura , Bunei Hamasaki , Masao Kosugi , Kazuo Takahashi , Mitsuaki Seki
IPC分类号： G03F7/20 , G03F9/00
CPC分类号： G03F9/7088 , G03F7/70058 , G03F7/70725 , G03F9/7023 , G03F9/7057
摘要： An alignment apparatus includes a first off-axis alignment optical system having a magnification, and a second off-axis alignment optical system having a magnification higher than that of the first off-axis alignment optical system, wherein the apparatus is operable in a global alignment mode using the second off-axis alignment optical system. In another aspect, an alignment apparatus includes a first off-axis alignment optical system having a magnification, a second off-axis alignment optical system having a magnification higher than that of the first off-axis alignment optical system, and a TTL alignment optical system, wherein the alignment apparatus is operable in a global alignment mode using the second off-axis alignment optical system and is operable in another global alignment mode using the TTL optical alignment system.

3. 发明授权

US5365342A Alignment and exposure apparatus and method for manufacture of integrated circuits 失效
标题翻译：对准和曝光装置及集成电路的制造方法
公开(公告)号：US5365342A
公开(公告)日：1994-11-15
申请号：US29363
申请日：1993-03-10
申请人： Naoki Ayata , Mitsugu Yamamura , Bunei Hamasaki , Masao Kosugi , Kazuo Takahashi , Mitsuaki Seki
发明人： Naoki Ayata , Mitsugu Yamamura , Bunei Hamasaki , Masao Kosugi , Kazuo Takahashi , Mitsuaki Seki
IPC分类号： G03F7/20 , G03F9/00 , H01L21/30 , G01B11/00
CPC分类号： G03F9/7088 , G03F7/70058 , G03F7/70725 , G03F9/7023 , G03F9/7057 , H01L21/30
摘要： An alignment apparatus includes a first off-axis alignment optical system having a magnification, and a second off-axis alignment optical system having a magnification higher than that of the first off-axis alignment optical system, wherein the apparatus is operable in a global alignment mode using the second off-axis alignment optical system. In another aspect, an alignment apparatus which includes a first off-axis alignment optical system having a magnification, a second off-axis alignment optical system having a magnification higher than that of the first off-axis alignment optical system, and a TTL alignment optical system, wherein the alignment apparatus is operable in a global alignment mode using the second off-axis alignment optical system and is operable in another global alignment mode using the TTL optical alignment system.
摘要翻译：对准装置包括具有倍率的第一离轴对准光学系统和具有高于第一离轴对准光学系统的倍率的第二离轴对准光学系统，其中该装置可以全局对准模式使用第二离轴对准光学系统。在另一方面，一种对准装置，包括具有放大率的第一离轴对准光学系统，具有高于第一离轴对准光学系统的倍率的第二离轴对准光学系统，以及TTL对准光学系统，其中所述对准装置可以使用所述第二离轴对准光学系统以全局对准模式操作，并且可以使用所述TTL光学对准系统在另一全局对准模式中操作。

4. 发明授权

US4918320A Alignment method usable in a step-and-repeat type exposure apparatus for either global or dye-by-dye alignment 失效
标题翻译：可用于全球或逐个染料对齐的步进重复型曝光装置中的对准方法
公开(公告)号：US4918320A
公开(公告)日：1990-04-17
申请号：US170359
申请日：1988-03-18
申请人： Bunei Hamasaki , Hajime Igarashi , Akiya Nakai , Naoki Ayata
发明人： Bunei Hamasaki , Hajime Igarashi , Akiya Nakai , Naoki Ayata
IPC分类号： G03F9/00
CPC分类号： G03F9/7003
摘要： A method of aligning a semiconductor wafer, usable in a step-and-repeat type exposure apparatus for projecting, in a reduced scale, images of a pattern formed on a reticle upon different shot areas on the semiconductor wafer in a predetermined sequence. According to this alignment method, the wafer is moved stepwise before the initiation of step-and-repeat exposures of the shot areas on the wafer and in accordance with a predetermined layout grid concerning the sites of the shot areas on the wafer. While moving the wafer stepwise in this manner, any positional deviation of each of some of the shot areas with respect to the layout grid is measured by use of a reduction projection lens system and, from the results of measurement, a corrected grid is prepared according to which grid the amount of stepwise movement of the wafer to be made for the step-and-repeat exposures thereof is determined. By this, for the exposures, the wafer can be moved stepwise exactly in accordance with the actual layout of the shot areas. Sample shot areas which are the subject of measurement can be selected under predetermined conditions. Additionally, of the values obtained as a result of the measurement, any extraordinary one or ones may be determined on the basis of the variance and then are excluded at the time of calculations made to determine the corrected grid. Thus, the stepwise movement of the wafer for the step-and-repeat exposures thereof can be controlled with higher precision.
摘要翻译：一种可用于步进重复型曝光装置中的半导体晶片的对准方法，用于以预定的顺序，在半导体晶片上的不同照射区域上以缩小的尺度投影形成在掩模版上的图案的图像。根据这种对准方法，晶片在晶片上的拍摄区域的重复曝光开始之前逐步移动，并且根据关于晶片上的照射区域的位置的预定布局网格。当以这种方式逐步移动晶片时，通过使用还原投影透镜系统来测量相对于布局格栅的一些照射区域中的每一个的任何位置偏差，并且根据测量结果，根据确定要进行步进重复曝光的晶圆的逐步移动量。由此，对于曝光，晶片可以根据拍摄区域的实际布局精确地逐步移动。作为测量对象的采样拍摄区域可以在预定条件下选择。此外，作为测量结果获得的值，可以基于方差来确定任何非常一个或一个，然后在进行计算时排除以确定校正的网格。因此，可以更高精度地控制用于步进重复曝光的晶片的逐步移动。

5. 发明授权

US5197118A Control system for a fine pattern printing apparatus 失效
标题翻译：精细图案印刷装置的控制系统
公开(公告)号：US5197118A
公开(公告)日：1993-03-23
申请号：US752986
申请日：1991-09-03
申请人： Ryuichi Sato , Masanori Numata , Bunei Hamasaki , Naoki Ayata
发明人： Ryuichi Sato , Masanori Numata , Bunei Hamasaki , Naoki Ayata
IPC分类号： G03F7/20
CPC分类号： G03F7/70525
摘要： A system for controlling operation of a fine pattern printing apparatus. The system including a command storing portion in which a plurality of unit-operation instructing commands capable of instructing execution of corresponding unit operations which are components of the pattern printing operation of the apparatus and at least one sequential operation instructing command including a combination of at least a predetermined portion of the unit-operation instructing commands are stored. A command selecting portion for allowing selection of the commands stored in the command storing portion; a sequence setting portion cooperative with the command selecting portion so as to set, in the command storing portion, a desired sequential operation instructing command formed by a plurality of unit-operation instructing commands each of which is stored in the command storing portion. The sequential operation instructing command set in the storing portion by the sequence setting portion is selectable by the command selecting portion and operation controlling portion cooperative with the command selecting portion so as to control the operation of the apparatus in accordance with such one of the commands stored in the storing portion that is selected by the selection portion.
摘要翻译：一种用于控制精细图案印刷装置的操作的系统。该系统包括命令存储部分，其中能够指示作为装置的图案打印操作的组成部分的相应单元操作的多个单元操作指令命令以及包括至少一个组合的至少一个顺序操作指令命令存储单位操作指示命令的预定部分。命令选择部分，用于允许选择存储在命令存储部分中的命令; 与命令选择部分协作的序列设置部分，以便在命令存储部分中设置由存储在命令存储部分中的多个单元操作指令命令形成的期望的顺序操作指令命令。由命令选择部分和操作控制部分与命令选择部分协调选择由序列设置部分在存储部分中设置的顺序操作指令命令，以便根据存储的命令之一来控制装置的操作在由选择部分选择的存储部分中。

6. 发明授权

US5006864A Information read-out and recording apparatus 失效
标题翻译：信息读出和记录装置
公开(公告)号：US5006864A
公开(公告)日：1991-04-09
申请号：US508526
申请日：1990-04-11
申请人： Naoki Ayata , Yoshiaki Shirato , Yasushi Takatori , Mitsuaki Seki
发明人： Naoki Ayata , Yoshiaki Shirato , Yasushi Takatori , Mitsuaki Seki
IPC分类号： B41J2/05 , B41J2/07 , B41J2/155 , B41J2/21 , B41J3/62 , H04N1/193 , H04N1/40
CPC分类号： H04N1/40031 , B41J2/04533 , B41J2/04541 , B41J2/04543 , B41J2/0458 , B41J2/04588 , B41J2/0459 , B41J2/04591 , B41J2/04593 , B41J2/07 , B41J2/155 , B41J2/2128 , B41J3/62 , H04N1/1931 , B41J2202/19 , B41J2202/20
摘要： An information read-out and recording apparatus includes an optical information read-out device for converting optical information into electrical information signals. A serial-input/parallel-output shift register stores information signals from the optical information read-out device and a latch circuit stores information from the shift register for supply to a recording device. The recording device records on a recording medium in accordance with the output of the latch circuit, which parallelly stores the contents of the shift register after a predetermined number of bits of information have been serially stored in the shift register.

7. 发明授权

US4719357A Semiconductor circuit manufacturing apparatus having selectively operable detectors for effecting automatic alignment 失效
标题翻译：具有选择性地操作的检测器的半导体电路制造设备用于实现自动对准
公开(公告)号：US4719357A
公开(公告)日：1988-01-12
申请号：US8134
申请日：1987-01-22
申请人： Naoki Ayata , Tadashi Konuki , Masao Kosugi
发明人： Naoki Ayata , Tadashi Konuki , Masao Kosugi
IPC分类号： G03F9/00 , G01B11/27
CPC分类号： G03F9/7069 , G03F9/7076 , G03F9/7092
摘要： A semiconductor circuit manufacturing apparatus wherein a wafer has a plurality of zones to be exposed one by one to a pattern of a mask, including detector apparatus for detecting a relative position between the mask and a said zone to be exposed and producing outputs representative of the relative position; a device for exposing the said zone to the mask pattern after they are aligned; a device for producing information for identifying said zone which is going to be exposed; a selector, responsive to said information producing device, for selecting all or a part of the outputs of said detecting apparatus; and a device for determining, on the basis of the selected outputs of said detecting apparatus, a positional deviation between the mask pattern and the zone to be exposed thereto.
摘要翻译：一种半导体电路制造装置，其中晶片具有要逐个暴露于掩模图案的多个区域，包括用于检测掩模和所述待曝光区域之间的相对位置的检测器装置，并且产生代表相对位置; 用于在所述掩模图案对准之后将所述区域暴露于所述掩模图案的装置; 用于产生用于识别将被暴露的区域的信息的装置; 响应于所述信息产生装置的选择器，用于选择所述检测装置的全部或一部分输出; 以及用于根据所述检测装置的所选择的输出确定掩模图案和要暴露于其之间的区域之间的位置偏差的装置。

8. 发明授权

US5486848A Recording apparatus which twice ejects droplets to the same position and image forming apparatus with u-shaped material path 失效
标题翻译：两次将液滴喷射到相同位置的记录装置和具有u形材料路径的图像形成装置
公开(公告)号：US5486848A
公开(公告)日：1996-01-23
申请号：US409638
申请日：1995-03-23
申请人： Naoki Ayata , Yoshiaki Shirato , Yasushi Takatori , Mitsuaki Seki
发明人： Naoki Ayata , Yoshiaki Shirato , Yasushi Takatori , Mitsuaki Seki
IPC分类号： B41J2/05 , B41J2/07 , B41J2/155 , B41J2/21 , B41J3/62 , H04N1/193 , H04N1/40
CPC分类号： H04N1/40031 , B41J2/04533 , B41J2/04541 , B41J2/04543 , B41J2/0458 , B41J2/04588 , B41J2/0459 , B41J2/04591 , B41J2/04593 , B41J2/07 , B41J2/155 , B41J2/2128 , B41J3/62 , H04N1/1931 , B41J2202/19 , B41J2202/20
摘要： An information recording apparatus comprises a recording unit for recording on a recording medium and control means for controlling the recording unit to twice eject droplets to the same position on the recording medium so that the tone of the recording is emphasized. In another aspect of the disclosure, an image forming apparatus includes a storage unit for storing recording material, an image forming unit in which an image is formed without contacting the recording material and a discharge unit for discharging the recording material on which the image has been formed. A transporting mechanism transports the recording material from the storage unit, through the image forming unit to the discharge unit along a U-shaped transporting path.
摘要翻译：信息记录装置包括用于在记录介质上记录的记录单元和用于控制记录单元两次将液滴喷射到记录介质上相同位置的控制装置，从而强调记录的色调。在本公开的另一方面，图像形成装置包括用于存储记录材料的存储单元，其中形成图像而不与记录材料接触的图像形成单元和用于排出其上已经存在图像的记录材料的放电单元形成。传送机构将记录材料从存储单元通过图像形成单元沿着U形传送路径传送到排出单元。

9. 发明授权

US4463359A Droplet generating method and apparatus thereof 失效
标题翻译：液滴产生方法及装置
公开(公告)号：US4463359A
公开(公告)日：1984-07-31
申请号：US133327
申请日：1980-03-24
申请人： Naoki Ayata , Yoshiaki Shirato , Yasushi Takatori , Mitsuaki Seki
发明人： Naoki Ayata , Yoshiaki Shirato , Yasushi Takatori , Mitsuaki Seki
IPC分类号： B41J2/05 , B41J2/07 , B41J2/155 , B41J2/21 , B41J3/62 , H04N1/193 , H04N1/40 , G01D15/18
CPC分类号： H04N1/40031 , B41J2/04533 , B41J2/04541 , B41J2/04543 , B41J2/0458 , B41J2/04588 , B41J2/0459 , B41J2/04591 , B41J2/04593 , B41J2/07 , B41J2/155 , B41J2/2128 , B41J3/62 , H04N1/1931 , B41J2202/19 , B41J2202/20
摘要： This invention provides a method of and apparatus for emitting a droplet from an orifice by generating a bubble in a small liquid chamber in response to a droplet generating instruction. The method and apparatus are particularly characterized having gradual contraction of the bubble to prevent excessive recession of the orifice in the liquid chamber which recession would hinder subsequent droplet generation.For achieving the above-mentioned functions the droplet generating apparatus, or the droplet emitting head, is provided with a structure which allows effective generation and annihilation of the bubble. The present invention also provides a novel apparatus having emission heads in a staggered block arrangement for improving alignment density of the devices and elements and time-division drive circuitry.
摘要翻译：本发明提供了一种用于响应于液滴产生指令在小液体室中产生气泡从孔口发射液滴的方法和装置。该方法和装置的特征在于具有气泡的逐渐收缩以防止液体室中的孔口的过度凹陷，该凹陷将阻碍随后的液滴产生。为了实现上述功能，液滴产生装置或液滴喷射头具有允许气泡的有效产生和消除的结构。本发明还提供一种新颖的装置，其具有交错块装置中的发射头，用于改善装置和元件以及时分驱动电路的对准密度。

10. 发明授权

US06264297B1 Liquid jet recording using a multi-part drive signal sequentially applied to plural blocks of thermal elements 失效
标题翻译：使用依次施加到多个热元件块的多部分驱动信号的液体喷射记录
公开(公告)号：US06264297B1
公开(公告)日：2001-07-24
申请号：US08178438
申请日：1994-01-06
申请人： Naoki Ayata , Yoshiaki Shirato , Yasushi Takatori , Mitsuaki Seki
发明人： Naoki Ayata , Yoshiaki Shirato , Yasushi Takatori , Mitsuaki Seki
IPC分类号： B41T2938
CPC分类号： H04N1/40031 , B41J2/04533 , B41J2/04541 , B41J2/04543 , B41J2/0458 , B41J2/04588 , B41J2/0459 , B41J2/04591 , B41J2/04593 , B41J2/07 , B41J2/155 , B41J2/2128 , B41J3/62 , B41J2202/19 , B41J2202/20 , H04N1/1931
摘要： A liquid droplet forming method is used with an apparatus that includes a liquid jet recording head having a plurality of blocks of thermal elements, each of which blocks includes a plurality of the thermal elements arranged on a substrate at a pitch of at least ten thermal elements per millimeter, with each thermal element ejecting a liquid droplet from the head upon application thereto of a drive signal pulse. Each drive signal pulse comprises a multi-part signal that includes a first part that pre-heats the liquid to an extent that a droplet is not ejected followed by a second part which heats the pre-heated liquid to an extent that a bubble is formed and a liquid droplet is ejected from the head. The plural blocks of thermal elements are driven in accordance with the generated drive signal pulses in a time-division manner such that no two blocks are driven simultaneously. In addition, the thermal elements in each block are driven in successive activation cycles by permitting time-divided application of drive signal pulses to all of the thermal elements in each block during each cycle.
摘要翻译：使用液滴形成方法，该装置包括具有多个热元件块的液体喷射记录头，每个块包括以至少十个热元件的间距布置在基底上的多个热元件每个热元件在施加驱动信号脉冲时从头部喷射液滴。每个驱动信号脉冲包括多部分信号，该多部分信号包括第一部分，该第一部分将液体预加热到不喷射液滴的程度，随后是将预热液体加热到形成气泡的程度的第二部分并且从头部喷出液滴。多个热元件块根据所产生的驱动信号脉冲以时分方式驱动，使得不同时驱动两个块。此外，每个块中的热元件在连续的激活周期中被驱动，允许在每个周期期间将驱动信号脉冲分时施加到每个块中的所有热元件。

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