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1. 发明授权

US4918320A Alignment method usable in a step-and-repeat type exposure apparatus for either global or dye-by-dye alignment 失效
标题翻译：可用于全球或逐个染料对齐的步进重复型曝光装置中的对准方法
公开(公告)号：US4918320A
公开(公告)日：1990-04-17
申请号：US170359
申请日：1988-03-18
申请人： Bunei Hamasaki , Hajime Igarashi , Akiya Nakai , Naoki Ayata
发明人： Bunei Hamasaki , Hajime Igarashi , Akiya Nakai , Naoki Ayata
IPC分类号： G03F9/00
CPC分类号： G03F9/7003
摘要： A method of aligning a semiconductor wafer, usable in a step-and-repeat type exposure apparatus for projecting, in a reduced scale, images of a pattern formed on a reticle upon different shot areas on the semiconductor wafer in a predetermined sequence. According to this alignment method, the wafer is moved stepwise before the initiation of step-and-repeat exposures of the shot areas on the wafer and in accordance with a predetermined layout grid concerning the sites of the shot areas on the wafer. While moving the wafer stepwise in this manner, any positional deviation of each of some of the shot areas with respect to the layout grid is measured by use of a reduction projection lens system and, from the results of measurement, a corrected grid is prepared according to which grid the amount of stepwise movement of the wafer to be made for the step-and-repeat exposures thereof is determined. By this, for the exposures, the wafer can be moved stepwise exactly in accordance with the actual layout of the shot areas. Sample shot areas which are the subject of measurement can be selected under predetermined conditions. Additionally, of the values obtained as a result of the measurement, any extraordinary one or ones may be determined on the basis of the variance and then are excluded at the time of calculations made to determine the corrected grid. Thus, the stepwise movement of the wafer for the step-and-repeat exposures thereof can be controlled with higher precision.
摘要翻译：一种可用于步进重复型曝光装置中的半导体晶片的对准方法，用于以预定的顺序，在半导体晶片上的不同照射区域上以缩小的尺度投影形成在掩模版上的图案的图像。根据这种对准方法，晶片在晶片上的拍摄区域的重复曝光开始之前逐步移动，并且根据关于晶片上的照射区域的位置的预定布局网格。当以这种方式逐步移动晶片时，通过使用还原投影透镜系统来测量相对于布局格栅的一些照射区域中的每一个的任何位置偏差，并且根据测量结果，根据确定要进行步进重复曝光的晶圆的逐步移动量。由此，对于曝光，晶片可以根据拍摄区域的实际布局精确地逐步移动。作为测量对象的采样拍摄区域可以在预定条件下选择。此外，作为测量结果获得的值，可以基于方差来确定任何非常一个或一个，然后在进行计算时排除以确定校正的网格。因此，可以更高精度地控制用于步进重复曝光的晶片的逐步移动。

2. 发明授权

US4811059A Alignment method 失效
标题翻译：对齐方法
公开(公告)号：US4811059A
公开(公告)日：1989-03-07
申请号：US104582
申请日：1987-10-02
申请人： Bunei Hamasaki , Shinji Utamura , Akiya Nakai
发明人： Bunei Hamasaki , Shinji Utamura , Akiya Nakai
IPC分类号： G03F9/00 , H01L21/027 , H01L21/30 , H01L21/67 , H01L21/68 , G03B27/32
CPC分类号： G03F9/70
摘要： An improved alignment method usable in a step-and-repeat type alignment and exposure apparatus for photolighographically transferring images of a pattern of a reticle onto different shot areas on a semiconductor wafer, for manufacture of semiconductor devices. According to this method, the alignment is executed with respect to an X direction, a Y direction and a rotational direction parallel to a plane containing the X and Y directions. With regard to the rotational direction, positional deviation of the wafer as a whole with respect to the reticle is measured and corrected prior to the initiation of the step-and-repeat photoprinting. With regard to the X and Y directions, detection and correction of any deviation are executed for each of the shot areas of the wafer. By this, high-accuracy and high-speed alignment is attainable for all the shot areas of the wafer.
摘要翻译：一种可用于步进重复型对准和曝光装置的改进的对准方法，用于将半导体晶片上的不同射出区域的图案的图像转印到半导体器件的制造中。根据该方法，相对于与包含X和Y方向的平面平行的X方向，Y方向和旋转方向执行对准。关于旋转方向，在开始步进重复照相打印之前测量和校正晶片相对于掩模版的位置偏差。对于X方向和Y方向，对于晶片的每个拍摄区域执行任何偏差的检测和校正。由此，可以对晶片的所有照射区域实现高精度和高速对准。

3. 发明授权

US4881100A Alignment method 失效
标题翻译：对齐方法
公开(公告)号：US4881100A
公开(公告)日：1989-11-14
申请号：US273187
申请日：1988-11-16
申请人： Akiya Nakai , Bunei Hamasaki , Shinji Utamura
发明人： Akiya Nakai , Bunei Hamasaki , Shinji Utamura
IPC分类号： G03F9/00
CPC分类号： G03F9/7046
摘要： An alignment method usable in an apparatus for transferring images of a pattern of a mask onto different portions of a semiconductor wafer in a step-and-repeat manner, is disclosed. In this alignment method, positional deviation of at least one portion of the wafer with respect to the mask is measured and, on the basis of this measurement, the mask and the wafer are aligned with each other. After this,step-and-repeat exposure is executed. When the measurement of the positional deviation of the at least one portion of the wafer is unattainable, another portion of the wafer is selected and the deviation measurement is executed in respect to the selected portion. In another aspect of the invention, with regard to a rotational component of the deviation of the wafer, measurement and alignment are repeatedly executed until the rotational component becomes less than a predetermined value. Thereafter, the step-and-repeat exposure is initiated.
摘要翻译：公开了一种可用于将半导体晶片图案的图像以步进重复的方式传送到半导体晶片的不同部分的装置的对准方法。在该对准方法中，测量晶片相对于掩模的至少一部分的位置偏移，并且基于该测量，掩模和晶片彼此对准。之后，执行逐步重复曝光。当晶片的至少一部分的位置偏移的测量是不可测量的时，选择晶片的另一部分，并相对于所选择的部分执行偏差测量。在本发明的另一方面，关于晶片的偏离的旋转分量，重复执行测量和对准直到旋转分量变得小于预定值。此后，开始步进和重复曝光。

4. 发明授权

US5543921A Aligning method utilizing reliability weighting coefficients 失效
标题翻译：利用可靠性加权系数对齐方法
公开(公告)号：US5543921A
公开(公告)日：1996-08-06
申请号：US465098
申请日：1995-06-05
申请人： Shigeyuki Uzawa , Akiya Nakai , Masaaki Imaizumi , Hiroshi Tanaka , Noburu Takakura , Yoshio Kaneko
发明人： Shigeyuki Uzawa , Akiya Nakai , Masaaki Imaizumi , Hiroshi Tanaka , Noburu Takakura , Yoshio Kaneko
IPC分类号： G03F9/00 , G01B11/00
CPC分类号： G03F9/7088 , G03F9/7003 , G03F9/7092
摘要： An aligning method suitably usable in a semiconductor device manufacturing exposure apparatus of step-and-repeat type, for sequentially positioning regions on a wafer to an exposure position. In one preferred form, the marks provided on selected regions of the wafer are detected to obtain corresponding mark signals and then respective positional data related to the positions or positional errors of the selected regions are measured, on the basis of the mark signals. Then, the reliability of each measured positional data of a corresponding selected region is detected, on the basis of the state of a corresponding mark signal or the state of that measured positional data and by using fuzzy reasoning, for example. Corrected positional data related to the disposition of all the regions on the wafer is then prepared by using the measured positional data of the selected regions, wherein, for preparation of the corrected positional data, each measured positional data is weighted in accordance with the detected reliability thereof such that measured positional data having higher reliability is more influential to determine the corrected positional data.
摘要翻译：适用于步进重复类型的半导体器件制造曝光设备中的对准方法，用于将晶片上的区域顺序地定位到曝光位置。在一个优选形式中，检测提供在晶片的选定区域上的标记以获得对应的标记信号，然后基于标记信号测量与所选区域的位置或位置误差相关的各个位置数据。然后，基于对应的标记信号的状态或测量的位置数据的状态，并通过使用模糊推理来检测对应的选择区域的每个测量位置数据的可靠性。然后通过使用测量的所选择的区域的位置数据来准备与晶片上的所有区域的配置相关的位置数据，其中，为了准备校正的位置数据，根据检测到的可靠性对每个测量的位置数据进行加权使得具有较高可靠性的测量位置数据对确定校正的位置数据更有影响力。

5. 发明授权

US5563708A Semiconductor device manufacturing method wherein the substrate is interferically aligned by measuring the rotation of the original 失效
标题翻译：半导体器件制造方法，其中通过测量原件的旋转来干涉地对准衬底
公开(公告)号：US5563708A
公开(公告)日：1996-10-08
申请号：US252580
申请日：1994-06-01
申请人： Akiya Nakai
发明人： Akiya Nakai
IPC分类号： G03F7/22 , G03F9/00 , H01L21/027 , H01L21/30 , G01B9/02
CPC分类号： G03F9/70
摘要： In a step-and-repeat type semiconductor device manufacturing exposure apparatus, a pattern of a reticle can be transferred to a wafer with no chip rotation or no array error. For this sake, the direction of rotation of an X axis or a Y axis of the reticle about a Z axis is detected, and an X-Y-.theta. stage is rotationally moved about the Z axis in accordance with the detected value and by using a measurement output of a laser interferometer. Also, after rotational movement of the X-Y-.theta. stage about the Z axis, the X-Y-.theta. stage is moved while using a measurement output of the laser interferometer, to print the pattern of the reticle onto different zones of the wafer sequentially.
摘要翻译：在步进重复型半导体器件制造曝光装置中，可以将光罩的图案转印到晶片上，而不会产生芯片旋转或没有阵列误差。为此，检测分度线绕Z轴的X轴或Y轴的旋转方向，并且根据检测值将XY-θ级绕Z轴旋转移动，并通过使用测量输出激光干涉仪。此外，在X-Y-θ级围绕Z轴旋转运动之后，X-Y-θ级在使用激光干涉仪的测量输出的同时移动，以将光罩的图案顺序地印刷到晶片的不同区域上。

6. 发明授权

US06466968B2 Information processing system capable of file transmission and information processing apparatus in the system 失效
标题翻译：能够进行文件传输的信息处理系统和系统中的信息处理装置
公开(公告)号：US06466968B2
公开(公告)日：2002-10-15
申请号：US09092869
申请日：1998-06-08
申请人： Masahiko Shirai , Takeshi Baba , Akiya Nakai , Shuji Yamoto , Tokuko Kanda
发明人： Masahiko Shirai , Takeshi Baba , Akiya Nakai , Shuji Yamoto , Tokuko Kanda
IPC分类号： G06F1516
CPC分类号： G06Q10/107 , H04L51/08
摘要： In a mail sending apparatus, an attached file generation unit generates an attached file in which an access method for a designated file is described. A mail tool attaches the attached file to a mail message to form mail data, and transmits it to a designated destination through a mail server. In a mail receiving apparatus, a mail reader extracts the attached file from the mail data received through a mail server. An attached file analysis unit analyzes the access method described in the attached file. A file reception unit accesses a file management/transmission tool in accordance with the access method to receive and display the designated file.
摘要翻译：在邮件发送装置中，附加文件生成单元生成附加文件，其中描述了指定文件的访问方法。邮件工具将所附文件附加到邮件消息以形成邮件数据，并通过邮件服务器将其发送到指定的目的地。在邮件接收装置中，邮件阅读器从通过邮件服务器接收的邮件数据中提取附加文件。附件文件分析单元分析附件中描述的访问方法。文件接收单元根据访问方式访问文件管理/传输工具以接收和显示指定的文件。

7. 发明授权

US06333786B1 Aligning method 失效
标题翻译：对齐方式
公开(公告)号：US06333786B1
公开(公告)日：2001-12-25
申请号：US08139059
申请日：1993-10-21
申请人： Shigeyuki Uzawa , Akiya Nakai , Masaaki Imaizumi , Hiroshi Tanaka , Noburu Takakura , Yoshio Kaneko
发明人： Shigeyuki Uzawa , Akiya Nakai , Masaaki Imaizumi , Hiroshi Tanaka , Noburu Takakura , Yoshio Kaneko
IPC分类号： G01B1100
CPC分类号： G03F9/7092 , G03F9/7003 , G03F9/7088
摘要： An aligning method suitably usable in a semiconductor device manufacturing exposure apparatus of step-and-repeat type, for sequentially positioning regions on a wafer to an exposure position. In one preferred form, the marks provided on selected regions of the wafer are detected to obtain corresponding mark signals and then respective positional data related to the positions or positional errors of the selected regions are measured, on the basis of the mark signals. Then, the reliability of each measured positional data of a corresponding selected region is detected, on the basis of the state of a corresponding mark signal or the state of that measured positional data and by using fuzzy reasoning, for example. Corrected positional data related to the disposition of all the regions on the wafer is then prepared by using the measured positional data of the selected regions, wherein, for preparation of the corrected positional data, each measured positional data is weighted in accordance with the detected reliability thereof such that measured positional data having higher reliability is more influential to determine of the corrected positional data. For sequential positioning of the regions on the wafer to the exposure position, the wafer movement is controlled on the basis of the prepared corrected positional data, whereby high-precision alignment of each region is assured.
摘要翻译：适用于步进重复类型的半导体器件制造曝光设备中的对准方法，用于将晶片上的区域顺序地定位到曝光位置。在一个优选形式中，检测提供在晶片的选定区域上的标记以获得对应的标记信号，然后基于标记信号测量与所选区域的位置或位置误差相关的各个位置数据。然后，基于对应的标记信号的状态或测量的位置数据的状态，并通过使用模糊推理来检测对应的选择区域的每个测量位置数据的可靠性。然后通过使用测量的所选择的区域的位置数据来准备与晶片上的所有区域的配置相关的位置数据，其中，为了准备校正的位置数据，根据检测到的可靠性对每个测量的位置数据进行加权使得具有较高可靠性的测量位置数据对确定校正的位置数据更有影响力。为了将晶片上的区域顺序定位到曝光位置，基于准备的校正位置数据来控制晶片移动，从而确保每个区域的高精度对准。

8. 发明授权

US6097495A Aligning method 失效
标题翻译：对齐方式
公开(公告)号：US6097495A
公开(公告)日：2000-08-01
申请号：US102752
申请日：1998-06-23
申请人： Shigeyuki Uzawa , Akiya Nakai , Masaaki Imaizumi , Hiroshi Tanaka , Noburu Takakura , Yoshio Kaneko
发明人： Shigeyuki Uzawa , Akiya Nakai , Masaaki Imaizumi , Hiroshi Tanaka , Noburu Takakura , Yoshio Kaneko
IPC分类号： G03F9/00 , G01B11/00
CPC分类号： G03F9/7088 , G03F9/7003 , G03F9/7092
摘要： An aligning method suitably usable in a semiconductor device manufacturing exposure apparatus of step-and-repeat type, for sequentially positioning regions on a wafer to an exposure position. In one preferred form, the marks provided on selected regions of the wafer are detected to obtain corresponding mark signals and then respective positional data related to the positions or positional errors of the selected regions are measured, on the basis of the mark signals. Then, the reliability of each measured positional data of a corresponding selected region is detected, on the basis of the state of a corresponding mark signal or the state of that measured positional data and by using fuzzy reasoning, for example. Corrected positional data related to the disposition of all the regions on the wafer is then prepared by using the measured positional data of the selected regions, wherein, for preparation of the corrected positional data, each measured positional data is weighted in accordance with the detected reliability thereof such that measured positional data having higher reliability is more influential to determine the corrected positional data. For sequential positioning of the regions on the wafer to the exposure position, the wafer movement is controlled on the basis of the prepared corrected positional data, whereby high-precision alignment of each region is assured.
摘要翻译：适用于步进重复类型的半导体器件制造曝光设备中的对准方法，用于将晶片上的区域顺序地定位到曝光位置。在一个优选形式中，检测提供在晶片的选定区域上的标记以获得对应的标记信号，然后基于标记信号测量与所选区域的位置或位置误差相关的各个位置数据。然后，基于对应的标记信号的状态或测量的位置数据的状态，并通过使用模糊推理来检测对应的选择区域的每个测量位置数据的可靠性。然后通过使用测量的所选择的区域的位置数据来准备与晶片上的所有区域的配置相关的位置数据，其中，为了准备校正的位置数据，根据检测到的可靠性对每个测量的位置数据进行加权使得具有较高可靠性的测量位置数据对确定校正的位置数据更有影响力。为了将晶片上的区域顺序定位到曝光位置，基于准备的校正位置数据来控制晶片移动，从而确保每个区域的高精度对准。

9. 发明授权

US06253248B1 Information processing apparatus and method 失效
标题翻译：信息处理装置和方法
公开(公告)号：US06253248B1
公开(公告)日：2001-06-26
申请号：US09095073
申请日：1998-06-10
申请人： Akiya Nakai , Takeshi Baba , Masahiko Shirai , Shuji Yamoto , Tokuko Kanda
发明人： Akiya Nakai , Takeshi Baba , Masahiko Shirai , Shuji Yamoto , Tokuko Kanda
IPC分类号： G06F1516
CPC分类号： H04L12/66 , H04L29/06 , H04L67/42 , H04L69/08
摘要： A proxy server is present in the path between the client and server, and intervenes in communication therebetween. Upon receiving a request from the client according to the HTTP protocol, the proxy server specifies a server based on the request, and determines the communication protocol to be used in the communication with the specified server. If the CM protocol is determined, the proxy server generates request data suitable for the CM protocol by adding necessary information, so as to implement the request contents included in the request, and communicates with the server. The proxy server sends back the processing result based on the request to the client according to the HTTP protocol.
摘要翻译：代理服务器存在于客户端和服务器之间的路径中，并介入其间的通信。在根据HTTP协议从客户端接收到请求时，代理服务器根据该请求指定服务器，并确定要与指定服务器的通信中使用的通信协议。如果确定了CM协议，则代理服务器通过添加必要的信息来生成适合于CM协议的请求数据，以便实现请求中包含的请求内容，并与服务器进行通信。代理服务器根据HTTP协议向客户端发送处理结果。

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