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1. 发明授权

US07837796B2 Process chamber, inline coating installation and method for treating a substrate 有权
标题翻译：处理室，在线涂布装置和处理基材的方法
公开(公告)号：US07837796B2
公开(公告)日：2010-11-23
申请号：US11680361
申请日：2007-02-28
申请人： Juergen Henrich , Michael Schaefer , Edgar Haberkorn
发明人： Juergen Henrich , Michael Schaefer , Edgar Haberkorn
IPC分类号： C23C16/00
CPC分类号： C23C16/54
摘要： A process chamber 1 for PECVD (Plasma Enhanced Chemical Vapor Deposition) coating of a substrate includes an electrode, which is integrated in a contact frame, which is firmly connected to the recipient. A movable carrier in the process chamber carries at least one substrate. The carrier is transported by means of a driven roller positioner into the process chamber or out of the process chamber along a transport route defined by the movement. As soon as the carrier inside the recipient has reached a certain position, the lower roller positioner is uncoupled from carrier by lowering by means of a lifting device. In this regard, the carrier detaches itself from the upper roller positioner. Then, the carrier is accepted by a transfer device (not shown) and brought from the transport position laterally into a treatment position in contact with the contact frame. In this way, reliable contact is produced between the electrode and a counter-electrode provided in carrier. At the same time, other carriers, in so far as the contact frame is removed laterally far enough from the transport route, during the coating of the carrier, can be moved past this.
摘要翻译：用于基板的PECVD（等离子体增强化学气相沉积）涂层的处理室1包括集成在接触框架中的电极，其牢固地连接到接收器。处理室中的可移动载体承载至少一个基板。载体通过从动辊定位器沿着由运动限定的运输路线输送到处理室中或从处理室中输送。一旦收件人内的承运人已经达到一定的位置，则下辊定位器通过借助于提升装置的下降而脱离载体。在这方面，载体将自身从上辊定位器分离。然后，托架被转移装置（未示出）接受，并从运输位置横向地进入与接触框架接触的处理位置。以这种方式，在电极和设置在载体中的对电极之间产生可靠的接触。同时，在载体的涂覆期间，其他载体，只要在接触框架从输送路线横向移开足够远的位置即可移动过去。

2. 发明申请

US20130171757A1 ADVANCED PLATFORM FOR PASSIVATING CRYSTALLINE SILICON SOLAR CELLS 审中-公开
标题翻译：用于封闭晶体硅太阳能电池的先进平台
公开(公告)号：US20130171757A1
公开(公告)日：2013-07-04
申请号：US13732662
申请日：2013-01-02
申请人： HARI K. PONNEKANTI , Alexander S. Polyak , James L'Heureux , Michael S. Cox , Christopher T. Lane , Edward P. Hammond, IV , Hemant P. Mungekar , Susanne Schlaefer , Wolfgang Buschbeck , Juergen Henrich , Andreas Lopp
发明人： HARI K. PONNEKANTI , Alexander S. Polyak , James L'Heureux , Michael S. Cox , Christopher T. Lane , Edward P. Hammond, IV , Hemant P. Mungekar , Susanne Schlaefer , Wolfgang Buschbeck , Juergen Henrich , Andreas Lopp
IPC分类号： H01L31/18
CPC分类号： H01L31/18 , C23C14/568 , C23C16/54 , H01L21/67115 , H01L21/67173 , H01L21/6776
摘要： The present invention generally provides a high throughput substrate processing system that is used to form one or more regions of a solar cell device. In one configuration of a processing system, one or more solar cell passivating or dielectric layers are deposited and further processed within one or more processing chambers contained within the high throughput substrate processing system. The processing chambers may be, for example, plasma enhanced chemical vapor deposition (PECVD) chambers, low pressure chemical vapor deposition (LPCVD) chambers, atomic layer deposition (ALD) chambers, physical vapor deposition (PVD) or sputtering chambers, thermal processing chambers (e.g., RTA or RTO chambers), substrate reorientation chambers (e.g., flipping chambers) and/or other similar processing chambers.
摘要翻译：本发明通常提供用于形成太阳能电池器件的一个或多个区域的高通量衬底处理系统。在处理系统的一种配置中，一个或多个太阳能电池钝化或电介质层被沉积并在包含在高通量衬底处理系统内的一个或多个处理室内进一步处理。处理室可以是例如等离子体增强化学气相沉积（PECVD）室，低压化学气相沉积（LPCVD）室，原子层沉积（ALD）室，物理气相沉积（PVD）或溅射室，热处理室（例如，RTA或RTO室），基板重新定向室（例如，翻转室）和/或其它类似的处理室。

3. 发明申请

US20100095890A1 GAS SUPPLY SYSTEM, PUMPING SYSTEM, COATING SYSTEM, GAS SUPPLY METHOD, AND PUMPING METHOD 审中-公开
标题翻译：气体供应系统，抽水系统，涂装系统，气体供应方法和抽水方法
公开(公告)号：US20100095890A1
公开(公告)日：2010-04-22
申请号：US12256091
申请日：2008-10-22
申请人： Thomas GEBELE , Juergen HENRICH , Thomas LEIPNITZ , Stefan KLEIN
发明人： Thomas GEBELE , Juergen HENRICH , Thomas LEIPNITZ , Stefan KLEIN
IPC分类号： C23C16/54 , G05D7/06 , C23C14/34 , G05D16/20
CPC分类号： G05D7/0652 , C23C14/56 , C23C16/4412 , G05D16/204 , Y10T137/0324 , Y10T137/0379 , Y10T137/85986 , Y10T137/86027 , Y10T137/86083 , Y10T137/877 , Y10T137/87772
摘要： A gas supply system 20 for supplying a gas into a pumping system 10 is provided, the pumping system including a plurality of pumping means 14, 16, the gas supply system comprising a gas inlet 22 and plurality of gas conduits 24, 25 fluidly connected to the gas inlet and each having a gas outlet 27, 28 fluidly connectable to the pumping system 10, wherein the gas outlets of the plurality of gas conduits are in parallel fluidly connectable to the pumping system and each gas conduit is provided with a gradient adjustment means adapted to provide at least one gradient of gas amount supplied to the pumping system.
摘要翻译：提供了一种用于将气体供应到泵送系统10中的气体供应系统20，该泵送系统包括多个泵送装置14,16，气体供应系统包括气体入口22和多个气体导管24,25，其流体连接到气体入口并且每个具有可流体地连接到泵送系统10的气体出口27,28，其中多个气体导管的气体出口并联可流动地连接到泵送系统，并且每个气体导管设置有梯度调节装置适于提供供应到泵送系统的气体量的至少一个梯度。

4. 发明申请

US20110104627A1 SUBSTRATE TRANSPORT SYSTEM AND METHOD 审中-公开
标题翻译：基板运输系统和方法
公开(公告)号：US20110104627A1
公开(公告)日：2011-05-05
申请号：US12612633
申请日：2009-11-04
申请人： Michael SCHAEFER , Tobias BERGMANN , Josef HOFFMANN , Andreas SAUER , Juergen HENRICH , Andreas GEISS
发明人： Michael SCHAEFER , Tobias BERGMANN , Josef HOFFMANN , Andreas SAUER , Juergen HENRICH , Andreas GEISS
IPC分类号： F27D3/00
CPC分类号： H01L21/67706 , C03B35/183 , C03B35/184 , C03B35/189
摘要： A substrate transport system adapted for transporting a substrate moving in a substrate transport direction in a processing chamber is provided. The substrate transport system includes a plurality of transport rollers each having a transport shaft and a transport wheel. The transport shaft and the transport wheel are adapted for supporting the moving substrate. A heating means is arranged between the position of the moving substrate and the transport shaft and is adapted for heating the moving substrate.
摘要翻译：提供了一种适于传送在处理室中沿基板输送方向移动的基板的基板输送系统。基板输送系统包括多个输送辊，每个输送辊具有输送轴和输送轮。输送轴和输送轮适于支撑移动的基板。在移动基板的位置和输送轴之间设置加热装置，并且适于加热移动的基板。

5. 发明申请

US20080184933A1 PROCESS CHAMBER, INLINE COATING INSTALLATION AND METHOD FOR TREATING A SUBSTRATE 有权
标题翻译：过程室，在线涂装安装和处理基板的方法
公开(公告)号：US20080184933A1
公开(公告)日：2008-08-07
申请号：US11680361
申请日：2007-02-28
申请人： Juergen Henrich , Michael Schaefer , Edgar Haberkorn
发明人： Juergen Henrich , Michael Schaefer , Edgar Haberkorn
IPC分类号： C23C16/455
CPC分类号： C23C16/54
摘要： A process chamber 1 for PECVD (Plasma Enhanced Chemical Vapor Deposition) coating of a substrate includes an electrode, which is integrated in a contact frame, which is firmly connected to the recipient. A movable carrier in the process chamber carries at least one substrate. The carrier is transported by means of a driven roller positioner into the process chamber or out of the process chamber along a transport route defined by the movement. As soon as the carrier inside the recipient has reached a certain position, the lower roller positioner is uncoupled from carrier by lowering by means of a lifting device. In this regard, the carrier detaches itself from the upper roller positioner. Then, the carrier is accepted by a transfer device (not shown) and brought from the transport position laterally into a treatment position in contact with the contact frame. In this way, reliable contact is produced between the electrode and a counter-electrode provided in carrier. At the same time, other carriers, in so far as the contact frame is removed laterally far enough from the transport route, during the coating of the carrier, can be moved past this.
摘要翻译：用于基板的PECVD（等离子体增强化学气相沉积）涂层的处理室1包括集成在接触框架中的电极，其牢固地连接到接收器。处理室中的可移动载体承载至少一个基板。载体通过从动辊定位器沿着由运动限定的运输路线输送到处理室中或从处理室中输送。一旦收件人内的承运人已经达到一定的位置，则下辊定位器通过借助于提升装置的下降而脱离载体。在这方面，载体将自身从上辊定位器分离。然后，托架被转移装置（未示出）接受，并从运输位置横向地进入与接触框架接触的处理位置。以这种方式，在电极和设置在载体中的对电极之间产生可靠的接触。同时，在载体的涂覆期间，其他载体，只要在接触框架从输送路线横向移开足够远的位置即可移动过去。

6. 发明专利

DE2214467A1 Particle beam characterization - using rotating metal wire probe and two additional electrodes 未知
公开(公告)号：DE2214467A1
公开(公告)日：1973-10-04
申请号：DE2214467
申请日：1972-03-24
申请人： MEIER JUERGEN HENRICH
发明人： MEIER JUERGEN-HENRICH
IPC分类号： G01T1/29 , H05H7/00
摘要： The appts. operates in high vacuum conditions to determine the spatial coordinates, intensity, and profile of a particle beam using a metal wire probe driven by a synchronous motor. The wire probe has the shape of the ellipse and is fastened at about 45 degrees to an arm carried at right angles to the motor spindle, which itself is approx. at right angles to the beam. Two additional electrodes are also used to give further information on beam parometers.

7. 发明申请

US20130199891A1 DYNAMIC LOAD LOCK WITH CELLULAR STRUCTURE FOR DISCRETE SUBSTRATES 有权
标题翻译：动态负载锁定用于分离基板的细胞结构
公开(公告)号：US20130199891A1
公开(公告)日：2013-08-08
申请号：US13748271
申请日：2013-01-23
申请人： Wolfgang BUSCHBECK , Juergen HENRICH , Andreas LOPP , Susanne SCHLAEFER
发明人： Wolfgang BUSCHBECK , Juergen HENRICH , Andreas LOPP , Susanne SCHLAEFER
IPC分类号： H01L21/677
CPC分类号： H01L21/67739 , H01L21/67201
摘要： A dynamic load lock chamber that includes a plurality of actuators positioned along its length to achieve a desired pressure gradient from an atmospheric pressure side to a processing pressure side of the chamber is provided. The chamber includes a transport belt continuously running through the chamber to transport substrates from the atmospheric pressure side to the processing pressure side of the chamber, if situated on an inlet side of a production line, and from the processing pressure side to the atmospheric pressure side of the chamber, if positioned on an outlet side of the production line. Separation mechanisms may be attached to the belt to separate discrete regions within the chamber into a plurality of discrete volumes. Substrates may be disposed between the separation mechanisms, such that separation between adjacent pressure regions within the chamber is maintained as the substrates are transported through the chamber.
摘要翻译：提供一种动态负载锁定室，其包括沿其长度定位的多个致动器，以实现从室的大气压侧到处理压力侧的期望的压力梯度。所述腔室包括连续运行通过所述腔室的输送带，以将衬底从所述大气压侧输送到所述腔室的处理压力侧，如果位于生产线的入口侧，以及从处理压力侧到大气压侧如果位于生产线的出口侧。分离机构可以附接到带上以将腔室内的离散区域分离成多个离散体积。衬底可以设置在分离机构之间，使得当衬底被输送通过腔室时，保持室内的相邻压力区域之间的间隔。

8. 发明申请

US20090218214A1 BACKSIDE COATING PREVENTION DEVICE, COATING CHAMBER COMPRISING A BACKSIDE COATING PREVENTION DEVICE, AND METHOD OF COATING 审中-公开
标题翻译：背面涂层防护装置，包括背面涂层防止装置的涂布室和涂布方法
公开(公告)号：US20090218214A1
公开(公告)日：2009-09-03
申请号：US12177632
申请日：2008-07-22
申请人： Andreas SAUER , Juergen HENRICH , Thomas GEBELE
发明人： Andreas SAUER , Juergen HENRICH , Thomas GEBELE
IPC分类号： C23C14/04
CPC分类号： C23C14/042 , C23C14/56 , C23C14/564 , C23C16/45519 , H01J37/32477 , H01J37/32623 , H01J37/32761
摘要： A backside coating prevention device adapted for a coating chamber for coating plate-shaped substrates is provided, said coating chamber being adapted for coating continuously or discontinuously transported plate-shaped substrates, comprising a front wall having a substrate feeding opening and a rear wall having a substrate discharge opening, a coating material source adapted for dispensing coating material into the coating chamber, and a transport system, a front side of the transport system facing the coating material source, the transport system being adapted for continuously or discontinuously transporting a plurality of plate-shaped substrates along a transport path on the front side of the transport system, wherein said backside coating prevention device is adapted for providing a gas barrier at the front side of the transport system and adjacent to the backsides of the plurality of plate-shapes substrates for preventing backside coating of the plate-shaped substrates.
摘要翻译：提供一种适用于涂布板状基板的涂布室的背面涂布防止装置，所述涂布室适用于连续地或不连续地传送的板状基材，包括具有基板供给口的前壁和具有基板供给口的后壁基材排出口，用于将涂料分配到涂布室中的涂料源和运输系统，运送系统的正面与涂料源相对，运输系统适于连续或不连续运送多个板沿着运输系统前侧的输送路径形成基板，其中所述背面涂层防止装置适用于在输送系统的前侧提供气体屏障并且邻近多个板状基板的背面用于防止板状基板的背面涂覆。

9. 发明申请

US20090217872A1 BACKSIDE COATING PREVENTION DEVICE, COATING CHAMBER DEVICE FOR COATING PLATE-SHAPED SUBSTRATES, AND METHOD OF COATING 审中-公开
标题翻译：背面涂层防护装置，用于涂覆板形基材的涂层室装置和涂层方法
公开(公告)号：US20090217872A1
公开(公告)日：2009-09-03
申请号：US12128856
申请日：2008-05-29
申请人： Andreas Sauer , Juergen Henrich , Joachim Mueller
发明人： Andreas Sauer , Juergen Henrich , Joachim Mueller
IPC分类号： C23C16/00
CPC分类号： C23C16/45519 , C23C14/042 , C23C14/56 , C23C14/564 , H01J37/32477 , H01J37/32623
摘要： A backside coating prevention device adapted for a coating chamber for coating plate-shaped substrates, said coating chamber comprising a plurality of walls, a coating material source for dispensing coating material into the coating chamber, a substrate support, a front side of the substrate support facing the coating material source, the substrate support being adapted for supporting on the front side one or more plate-shaped substrates each having a substrate front side and thereby defining a substrate front plane, wherein said backside coating prevention device comprises two or more screens, the screens being provided at least two of the walls of the coating chamber, each screen having a protruding member protruding from the respective wall.
摘要翻译：一种适合用于涂覆板状基材的涂布室的背面涂层防止装置，所述涂布室包括多个壁，用于将涂料分散到涂布室中的涂料源，基材载体，基材载体的前侧所述基板支撑件适于在前侧支撑一个或多个具有基板前侧的板状基板，从而限定基板正面，其中所述背面涂层防止装置包括两个或更多个屏幕，屏幕设置在涂覆室的至少两个壁中，每个屏幕具有从相应的壁突出的突出构件。

10. 发明申请

US20090061627A1 METHOD FOR PRODUCING A METAL BACKSIDE CONTACT OF A SEMICONDUCTOR COMPONENT, IN PARTICULAR, A SOLAR CELL 失效
标题翻译：用于制造特别是太阳能电池的半导体元件的金属背面接触的方法
公开(公告)号：US20090061627A1
公开(公告)日：2009-03-05
申请号：US12202123
申请日：2008-08-29
申请人： Roland Trassl , Jian Liu , Stephan Wieder , Juergen Henrich , Gerhard Rist
发明人： Roland Trassl , Jian Liu , Stephan Wieder , Juergen Henrich , Gerhard Rist
IPC分类号： H01L21/768 , H01L21/677
CPC分类号： H01L31/022425 , Y02E10/50
摘要： The present invention relates to a method for manufacturing a backside contact of a semiconductor component, in particular, of a solar cell, comprising a metallic layer on the backside of a substrate in a vacuum treatment chamber, and the use of a vacuum treatment system for performing said method. Through this method and its use, in particular silicon based solar cells, can be provided with a back contact in a simple manner in a continuous process sequence, wherein the process sequence can be provided particularly efficient and economical, since no handling systems for rotating the substrate are required, and in particular silk screening steps can be dispensed with.
摘要翻译：本发明涉及一种用于制造半导体部件，特别是太阳能电池的背面接触的方法，所述太阳能电池在真空处理室中在基板的背面上包括金属层，并且使用真空处理系统执行所述方法。通过这种方法及其使用，特别是硅基太阳能电池可以以连续的工艺顺序以简单的方式提供背面接触，其中可以提供特别有效和经济的工艺顺序，因为没有用于旋转基材是必需的，特别是可以省去丝印步骤。

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