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1. 发明授权

US07837796B2 Process chamber, inline coating installation and method for treating a substrate 有权
标题翻译：处理室，在线涂布装置和处理基材的方法
公开(公告)号：US07837796B2
公开(公告)日：2010-11-23
申请号：US11680361
申请日：2007-02-28
申请人： Juergen Henrich , Michael Schaefer , Edgar Haberkorn
发明人： Juergen Henrich , Michael Schaefer , Edgar Haberkorn
IPC分类号： C23C16/00
CPC分类号： C23C16/54
摘要： A process chamber 1 for PECVD (Plasma Enhanced Chemical Vapor Deposition) coating of a substrate includes an electrode, which is integrated in a contact frame, which is firmly connected to the recipient. A movable carrier in the process chamber carries at least one substrate. The carrier is transported by means of a driven roller positioner into the process chamber or out of the process chamber along a transport route defined by the movement. As soon as the carrier inside the recipient has reached a certain position, the lower roller positioner is uncoupled from carrier by lowering by means of a lifting device. In this regard, the carrier detaches itself from the upper roller positioner. Then, the carrier is accepted by a transfer device (not shown) and brought from the transport position laterally into a treatment position in contact with the contact frame. In this way, reliable contact is produced between the electrode and a counter-electrode provided in carrier. At the same time, other carriers, in so far as the contact frame is removed laterally far enough from the transport route, during the coating of the carrier, can be moved past this.
摘要翻译：用于基板的PECVD（等离子体增强化学气相沉积）涂层的处理室1包括集成在接触框架中的电极，其牢固地连接到接收器。处理室中的可移动载体承载至少一个基板。载体通过从动辊定位器沿着由运动限定的运输路线输送到处理室中或从处理室中输送。一旦收件人内的承运人已经达到一定的位置，则下辊定位器通过借助于提升装置的下降而脱离载体。在这方面，载体将自身从上辊定位器分离。然后，托架被转移装置（未示出）接受，并从运输位置横向地进入与接触框架接触的处理位置。以这种方式，在电极和设置在载体中的对电极之间产生可靠的接触。同时，在载体的涂覆期间，其他载体，只要在接触框架从输送路线横向移开足够远的位置即可移动过去。

2. 发明申请

US20080184933A1 PROCESS CHAMBER, INLINE COATING INSTALLATION AND METHOD FOR TREATING A SUBSTRATE 有权
标题翻译：过程室，在线涂装安装和处理基板的方法
公开(公告)号：US20080184933A1
公开(公告)日：2008-08-07
申请号：US11680361
申请日：2007-02-28
申请人： Juergen Henrich , Michael Schaefer , Edgar Haberkorn
发明人： Juergen Henrich , Michael Schaefer , Edgar Haberkorn
IPC分类号： C23C16/455
CPC分类号： C23C16/54
摘要： A process chamber 1 for PECVD (Plasma Enhanced Chemical Vapor Deposition) coating of a substrate includes an electrode, which is integrated in a contact frame, which is firmly connected to the recipient. A movable carrier in the process chamber carries at least one substrate. The carrier is transported by means of a driven roller positioner into the process chamber or out of the process chamber along a transport route defined by the movement. As soon as the carrier inside the recipient has reached a certain position, the lower roller positioner is uncoupled from carrier by lowering by means of a lifting device. In this regard, the carrier detaches itself from the upper roller positioner. Then, the carrier is accepted by a transfer device (not shown) and brought from the transport position laterally into a treatment position in contact with the contact frame. In this way, reliable contact is produced between the electrode and a counter-electrode provided in carrier. At the same time, other carriers, in so far as the contact frame is removed laterally far enough from the transport route, during the coating of the carrier, can be moved past this.
摘要翻译：用于基板的PECVD（等离子体增强化学气相沉积）涂层的处理室1包括集成在接触框架中的电极，其牢固地连接到接收器。处理室中的可移动载体承载至少一个基板。载体通过从动辊定位器沿着由运动限定的运输路线输送到处理室中或从处理室中输送。一旦收件人内的承运人已经达到一定的位置，则下辊定位器通过借助于提升装置的下降而脱离载体。在这方面，载体将自身从上辊定位器分离。然后，托架被转移装置（未示出）接受，并从运输位置横向地进入与接触框架接触的处理位置。以这种方式，在电极和设置在载体中的对电极之间产生可靠的接触。同时，在载体的涂覆期间，其他载体，只要在接触框架从输送路线横向移开足够远的位置即可移动过去。

3. 发明申请

US20130171757A1 ADVANCED PLATFORM FOR PASSIVATING CRYSTALLINE SILICON SOLAR CELLS 审中-公开
标题翻译：用于封闭晶体硅太阳能电池的先进平台
公开(公告)号：US20130171757A1
公开(公告)日：2013-07-04
申请号：US13732662
申请日：2013-01-02
申请人： HARI K. PONNEKANTI , Alexander S. Polyak , James L'Heureux , Michael S. Cox , Christopher T. Lane , Edward P. Hammond, IV , Hemant P. Mungekar , Susanne Schlaefer , Wolfgang Buschbeck , Juergen Henrich , Andreas Lopp
发明人： HARI K. PONNEKANTI , Alexander S. Polyak , James L'Heureux , Michael S. Cox , Christopher T. Lane , Edward P. Hammond, IV , Hemant P. Mungekar , Susanne Schlaefer , Wolfgang Buschbeck , Juergen Henrich , Andreas Lopp
IPC分类号： H01L31/18
CPC分类号： H01L31/18 , C23C14/568 , C23C16/54 , H01L21/67115 , H01L21/67173 , H01L21/6776
摘要： The present invention generally provides a high throughput substrate processing system that is used to form one or more regions of a solar cell device. In one configuration of a processing system, one or more solar cell passivating or dielectric layers are deposited and further processed within one or more processing chambers contained within the high throughput substrate processing system. The processing chambers may be, for example, plasma enhanced chemical vapor deposition (PECVD) chambers, low pressure chemical vapor deposition (LPCVD) chambers, atomic layer deposition (ALD) chambers, physical vapor deposition (PVD) or sputtering chambers, thermal processing chambers (e.g., RTA or RTO chambers), substrate reorientation chambers (e.g., flipping chambers) and/or other similar processing chambers.
摘要翻译：本发明通常提供用于形成太阳能电池器件的一个或多个区域的高通量衬底处理系统。在处理系统的一种配置中，一个或多个太阳能电池钝化或电介质层被沉积并在包含在高通量衬底处理系统内的一个或多个处理室内进一步处理。处理室可以是例如等离子体增强化学气相沉积（PECVD）室，低压化学气相沉积（LPCVD）室，原子层沉积（ALD）室，物理气相沉积（PVD）或溅射室，热处理室（例如，RTA或RTO室），基板重新定向室（例如，翻转室）和/或其它类似的处理室。

4. 发明申请

US20090217872A1 BACKSIDE COATING PREVENTION DEVICE, COATING CHAMBER DEVICE FOR COATING PLATE-SHAPED SUBSTRATES, AND METHOD OF COATING 审中-公开
标题翻译：背面涂层防护装置，用于涂覆板形基材的涂层室装置和涂层方法
公开(公告)号：US20090217872A1
公开(公告)日：2009-09-03
申请号：US12128856
申请日：2008-05-29
申请人： Andreas Sauer , Juergen Henrich , Joachim Mueller
发明人： Andreas Sauer , Juergen Henrich , Joachim Mueller
IPC分类号： C23C16/00
CPC分类号： C23C16/45519 , C23C14/042 , C23C14/56 , C23C14/564 , H01J37/32477 , H01J37/32623
摘要： A backside coating prevention device adapted for a coating chamber for coating plate-shaped substrates, said coating chamber comprising a plurality of walls, a coating material source for dispensing coating material into the coating chamber, a substrate support, a front side of the substrate support facing the coating material source, the substrate support being adapted for supporting on the front side one or more plate-shaped substrates each having a substrate front side and thereby defining a substrate front plane, wherein said backside coating prevention device comprises two or more screens, the screens being provided at least two of the walls of the coating chamber, each screen having a protruding member protruding from the respective wall.
摘要翻译：一种适合用于涂覆板状基材的涂布室的背面涂层防止装置，所述涂布室包括多个壁，用于将涂料分散到涂布室中的涂料源，基材载体，基材载体的前侧所述基板支撑件适于在前侧支撑一个或多个具有基板前侧的板状基板，从而限定基板正面，其中所述背面涂层防止装置包括两个或更多个屏幕，屏幕设置在涂覆室的至少两个壁中，每个屏幕具有从相应的壁突出的突出构件。

5. 发明申请

US20090061627A1 METHOD FOR PRODUCING A METAL BACKSIDE CONTACT OF A SEMICONDUCTOR COMPONENT, IN PARTICULAR, A SOLAR CELL 失效
标题翻译：用于制造特别是太阳能电池的半导体元件的金属背面接触的方法
公开(公告)号：US20090061627A1
公开(公告)日：2009-03-05
申请号：US12202123
申请日：2008-08-29
申请人： Roland Trassl , Jian Liu , Stephan Wieder , Juergen Henrich , Gerhard Rist
发明人： Roland Trassl , Jian Liu , Stephan Wieder , Juergen Henrich , Gerhard Rist
IPC分类号： H01L21/768 , H01L21/677
CPC分类号： H01L31/022425 , Y02E10/50
摘要： The present invention relates to a method for manufacturing a backside contact of a semiconductor component, in particular, of a solar cell, comprising a metallic layer on the backside of a substrate in a vacuum treatment chamber, and the use of a vacuum treatment system for performing said method. Through this method and its use, in particular silicon based solar cells, can be provided with a back contact in a simple manner in a continuous process sequence, wherein the process sequence can be provided particularly efficient and economical, since no handling systems for rotating the substrate are required, and in particular silk screening steps can be dispensed with.
摘要翻译：本发明涉及一种用于制造半导体部件，特别是太阳能电池的背面接触的方法，所述太阳能电池在真空处理室中在基板的背面上包括金属层，并且使用真空处理系统执行所述方法。通过这种方法及其使用，特别是硅基太阳能电池可以以连续的工艺顺序以简单的方式提供背面接触，其中可以提供特别有效和经济的工艺顺序，因为没有用于旋转基材是必需的，特别是可以省去丝印步骤。

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