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1. 发明申请

US20090277895A1 MOUNTING TABLE STRUCTURE, AND PROCESSING APPARATUS 有权
标题翻译：安装台结构和加工设备
公开(公告)号：US20090277895A1
公开(公告)日：2009-11-12
申请号：US12505282
申请日：2009-07-17
申请人： Tomohito KOMATSU , Hirohiko Yamamoto , Daisuke Toriya
发明人： Tomohito KOMATSU , Hirohiko Yamamoto , Daisuke Toriya
IPC分类号： F27D11/00 , A47B37/00
CPC分类号： H01L21/67103 , C23C16/4586
摘要： A mounting table body made of ceramic includes power-receiving conductor portions and buried therein. A surface of mounting table body is formed with a recessed connection hole and a connection terminal electrically jointed to the power-receiving conductor portion and exposed into the connection hole, the connection terminal being made of a high-melting-point metal, an alloy thereof or a compound thereof. A power-feeding line member provided with a power-feeding connector portion is inserted at its leading end portion into the connection hole to feed electricity to the power-receiving conductor portion. A stress relaxing member is interposed between the connection terminal and the power-feeding connector portion. The stress relaxing member and the connection terminal are jointed together by a brazing material. The stress relaxing member is made of a metal free from cobalt and nickel or an alloy thereof.
摘要翻译：由陶瓷制成的安装台体包括受电导体部分并埋入其中。安装台体的表面形成有凹入的连接孔和电连接到受电导体部分并暴露于连接孔中的连接端子，连接端子由高熔点金属制成，其合金或其化合物。设置有供电连接器部分的馈电线构件在其前端部插入到连接孔中以将电力馈送到电力接收导体部分。在连接端子和供电连接器部分之间设置应力缓和部件。应力缓和构件和连接端子通过钎焊材料接合在一起。应力松弛部件由不含钴，镍或其合金的金属制成。

2. 外观设计

USD658692S1 Liner for plasma processing apparatus 有权
标题翻译：等离子体处理设备的衬板
公开(公告)号：USD658692S1
公开(公告)日：2012-05-01
申请号：US29401103
申请日：2011-09-07
申请人： Kouki Suzuki , Daisuke Toriya , Koichi Yamazaki
设计人： Kouki Suzuki , Daisuke Toriya , Koichi Yamazaki

3. 发明申请

US20050115501A1 Processing device and method of maintaining the device 失效
标题翻译：处理装置和维护装置的方法
公开(公告)号：US20050115501A1
公开(公告)日：2005-06-02
申请号：US10503126
申请日：2003-02-07
申请人： Daisuke Toriya , Kenji Homma , Akihiko Tsukada , Kouji Shimomura
发明人： Daisuke Toriya , Kenji Homma , Akihiko Tsukada , Kouji Shimomura
IPC分类号： G01F1/00 , C23C16/44 , C23C16/448 , G01F25/00 , G05D7/06 , H01L21/304 , H01L21/31 , C23C16/00
CPC分类号： G05D7/0635 , C23C16/4402 , C23C16/4481 , Y10T137/0419 , Y10T137/4259 , Y10T137/7759
摘要： A film processing device using vaporized liquid source capable of confirming the flow control accuracy of flow control equipment such as a mass flow controller (15) controlling the flow of the liquid source without separating the flow control equipment from piping and disassembling the piping, comprising a bypass passage (41) for bypassing a part of a washing fluid feed passage (32) for feeding washing fluid to a liquid source feed passage (12) and a flowmeter such as an MFM (42), wherein the washing fluid is allowed to flow to the mass flow controller (15) through the MFM (42), and the flow of the washing fluid detected by the MFM (42) is compared with a target flow set in the mass flow controller (15) to check whether the mass flow controller (15) operates normally or not.
摘要翻译：一种使用气化液体源的膜处理装置，其能够确认流量控制设备的流量控制精度，例如质量流量控制器（15），其控制液体源的流动，而不将流量控制设备与管道分离并拆卸管道，包括旁路通道（41），用于旁路用于将洗涤流体供给到液体源供给通道（12）的一部分洗涤流体供给通道（32）和诸如MFM（42）的流量计，其中允许洗涤流体流动通过MFM（42）到质量流量控制器（15），并且将由MFM（42）检测到的洗涤流体的流量与在质量流量控制器（15）中设定的目标流量进行比较，以检查质量流量控制器（15）正常运行。

4. 发明授权

US08334481B2 Mounting table structure, and processing apparatus 有权
标题翻译：安装台结构和加工设备
公开(公告)号：US08334481B2
公开(公告)日：2012-12-18
申请号：US12505282
申请日：2009-07-17
申请人： Tomohito Komatsu , Hirohiko Yamamoto , Daisuke Toriya
发明人： Tomohito Komatsu , Hirohiko Yamamoto , Daisuke Toriya
IPC分类号： F27B5/14 , F27D11/02 , H05B3/03 , H05B3/08
CPC分类号： H01L21/67103 , C23C16/4586
摘要： A mounting table body made of ceramic includes power-receiving conductor portions and buried therein. A surface of mounting table body is formed with a recessed connection hole and a connection terminal electrically jointed to the power-receiving conductor portion and exposed into the connection hole, the connection terminal being made of a high-melting-point metal, an alloy thereof or a compound thereof. A power-feeding line member provided with a power-feeding connector portion is inserted at its leading end portion into the connection hole to feed electricity to the power-receiving conductor portion. A stress relaxing member is interposed between the connection terminal and the power-feeding connector portion. The stress relaxing member and the connection terminal are jointed together by a brazing material. The stress relaxing member is made of a metal free from cobalt and nickel or an alloy thereof.
摘要翻译：由陶瓷制成的安装台体包括受电导体部分并埋入其中。安装台体的表面形成有凹入的连接孔和电连接到受电导体部分并暴露于连接孔中的连接端子，连接端子由高熔点金属制成，其合金或其化合物。设置有供电连接器部分的馈电线构件在其前端部插入到连接孔中，以将电力馈送到电力接收导体部分。在连接端子和供电连接器部分之间设置应力缓和部件。应力缓和构件和连接端子通过钎焊材料接合在一起。应力松弛部件由不含钴，镍或其合金的金属制成。

5. 发明申请

US20100323313A1 STAGE STRUCTURE AND HEAT TREATMENT APPARATUS 审中-公开
标题翻译：阶段结构和热处理设备
公开(公告)号：US20100323313A1
公开(公告)日：2010-12-23
申请号：US12918244
申请日：2009-03-13
申请人： Daisuke Toriya , Hirohiko Yamamoto
发明人： Daisuke Toriya , Hirohiko Yamamoto
IPC分类号： F27B5/16 , B23Q3/00
CPC分类号： H01L21/68792 , C23C16/4586 , H01L21/67103 , H01L21/67115
摘要： There is provided a stage structure which can prevent the formation of a cool spot in the central portion of a stage, thereby preventing breakage of the stage, and can enhance the in-plane uniformity of heat treatment of a processing object.The stage structure, provided in a treatment container of a heat treatment apparatus, for placing thereon a semiconductor wafer W as a processing object to be heat treated, includes: a stage 52 for placing the processing object on it; and a cylindrical support post 54 jointed to the center of the lower surface of the stage and supporting the stage. A heat reflecting section 56 is provided at an upper position within the support post and close to the lower surface of the stage. The use of the heat reflecting section 56 prevents the formation of a cool spot in the central portion of the stage 54.
摘要翻译：提供了可以防止在台的中心部分形成冷点的台架结构，从而防止工作台的断裂，并且可以增强加工对象的热处理的面内均匀性。设置在热处理装置的处理容器中的用于放置作为待处理的加工对象的半导体晶片W的载物台结构包括：用于将加工对象放置在其上的台52; 以及圆柱形支撑柱54，其连接到台的下表面的中心并且支撑台。热反射部分56设置在支撑柱内的上部位置并靠近平台的下表面。使用热反射部分56防止在台54的中心部分形成冷点。

6. 发明授权

US07367350B2 Processing device and method of maintaining the device 失效
标题翻译：处理装置和维护装置的方法
公开(公告)号：US07367350B2
公开(公告)日：2008-05-06
申请号：US10503126
申请日：2003-02-07
申请人： Daisuke Toriya , Kenji Homma , Akihiko Tsukada , Kouji Shimomura
发明人： Daisuke Toriya , Kenji Homma , Akihiko Tsukada , Kouji Shimomura
IPC分类号： G05D7/06
CPC分类号： G05D7/0635 , C23C16/4402 , C23C16/4481 , Y10T137/0419 , Y10T137/4259 , Y10T137/7759
摘要： A film processing device using vaporized liquid source capable of confirming the flow control accuracy of flow control equipment such as a mass flow controller (15) controlling the flow of the liquid source without separating the flow control equipment from piping and disassembling the piping, comprising a bypass passage (41) for bypassing a part of a washing fluid feed passage (32) for feeding washing fluid to a liquid source feed passage (12) and a flowmeter such as an MFM (42), wherein the washing fluid is allowed to flow to the mass flow controller (15) through the MFM (42), and the flow of the washing fluid detected by the MFM (42) is compared with a target flow set in the mass flow controller (15) to check whether the mass flow controller (15) operates normally or not.
摘要翻译：一种使用气化液体源的膜处理装置，其能够确认流量控制设备的流量控制精度，例如质量流量控制器（15），其控制液体源的流动，而不将流量控制设备与管道分离并拆卸管道，包括旁路通道（41），用于旁路用于将洗涤流体供给到液体源供给通道（12）的一部分洗涤流体供给通道（32）和诸如MFM（42）的流量计，其中允许洗涤流体流动通过MFM（42）到质量流量控制器（15），并且将由MFM（42）检测到的洗涤流体的流量与在质量流量控制器（15）中设定的目标流量进行比较，以检查质量流量控制器（15）正常运行。

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