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1. 发明申请

US20090277895A1 MOUNTING TABLE STRUCTURE, AND PROCESSING APPARATUS 有权
标题翻译：安装台结构和加工设备
公开(公告)号：US20090277895A1
公开(公告)日：2009-11-12
申请号：US12505282
申请日：2009-07-17
申请人： Tomohito KOMATSU , Hirohiko Yamamoto , Daisuke Toriya
发明人： Tomohito KOMATSU , Hirohiko Yamamoto , Daisuke Toriya
IPC分类号： F27D11/00 , A47B37/00
CPC分类号： H01L21/67103 , C23C16/4586
摘要： A mounting table body made of ceramic includes power-receiving conductor portions and buried therein. A surface of mounting table body is formed with a recessed connection hole and a connection terminal electrically jointed to the power-receiving conductor portion and exposed into the connection hole, the connection terminal being made of a high-melting-point metal, an alloy thereof or a compound thereof. A power-feeding line member provided with a power-feeding connector portion is inserted at its leading end portion into the connection hole to feed electricity to the power-receiving conductor portion. A stress relaxing member is interposed between the connection terminal and the power-feeding connector portion. The stress relaxing member and the connection terminal are jointed together by a brazing material. The stress relaxing member is made of a metal free from cobalt and nickel or an alloy thereof.
摘要翻译：由陶瓷制成的安装台体包括受电导体部分并埋入其中。安装台体的表面形成有凹入的连接孔和电连接到受电导体部分并暴露于连接孔中的连接端子，连接端子由高熔点金属制成，其合金或其化合物。设置有供电连接器部分的馈电线构件在其前端部插入到连接孔中以将电力馈送到电力接收导体部分。在连接端子和供电连接器部分之间设置应力缓和部件。应力缓和构件和连接端子通过钎焊材料接合在一起。应力松弛部件由不含钴，镍或其合金的金属制成。

2. 发明申请

US20110005686A1 LOADING TABLE STRUCTURE AND PROCESSING DEVICE 审中-公开
标题翻译：装载台结构和加工装置
公开(公告)号：US20110005686A1
公开(公告)日：2011-01-13
申请号：US12877760
申请日：2010-09-08
申请人： Sumi TANAKA , Tomohito KOMATSU , Hiroo KAWASAKI
发明人： Sumi TANAKA , Tomohito KOMATSU , Hiroo KAWASAKI
IPC分类号： C23F1/08 , C23C16/00 , C23C16/46
CPC分类号： H01L21/68757 , H01L21/67248 , H01L21/68792
摘要： A loading table structure which is adapted, in order to prevent damage to the loading table, so that large thermal stress does not occur in the loading table and so that the amount of supply of a purge gas for corrosion prevention to the loading table is minimized. The loading table structure is formed in a processing container capable of discharging gas contained therein and is used to load thereon an object to be processed. The loading table structure is provided with a loading table on which the object to be processed is loaded and which consists of a dielectric, a heating means which is provided to the loading table and which heats the object to be processed loaded on the loading table, and protective strut tubes which are mounted so as to vertically rise from the bottom section of the processing container, which have upper ends joined to the lower surface of the loading table to support the loading table, and which consist of a dielectric. A functional bar extending up to the loading table is inserted into each protective strut tube.
摘要翻译：一种装载台结构，其适于防止对装载台的损坏，使得在装载台中不会发生大的热应力，并且使得对装载台的防腐蚀净化气体的供应量最小化。装载台结构形成在能够排出容纳在其中的气体的处理容器中，并用于在其上装载要处理的物体。装载台结构设置有装载台，加载对象被加载到该装载台，并由电介质构成，加热装置设置在装载台上并加热装载台上加工的被处理物体，以及保护支柱管，其安装成从处理容器的底部部分垂直地升起，上游端连接到装载台的下表面以支撑装载台，并由电介质构成。延伸到装载台的功能杆插入每个保护支柱管中。

3. 发明申请

US20100186673A1 VAPORIZER, MATERIAL GAS SUPPLY SYSTEM INCLUDING VAPORIZER AND FILM FORMING APPARATUS USING SUCH SYSTEM 审中-公开
标题翻译：蒸发器，包括蒸发器的材料供应系统和使用这种系统的成膜设备
公开(公告)号：US20100186673A1
公开(公告)日：2010-07-29
申请号：US12710890
申请日：2010-02-23
申请人： Sumi TANAKA , Tomohito KOMATSU , Munehisa FUTAMURA
发明人： Sumi TANAKA , Tomohito KOMATSU , Munehisa FUTAMURA
IPC分类号： H01L21/46
CPC分类号： B23K20/08 , C23C16/4486
摘要： A vaporizer having a simple structure with improved thermal efficiency is provided. A vaporizer includes a nozzle unit for jetting a liquid material in a mist state, a vaporizing unit having vaporizing paths which vaporize the material mist and form a material gas, and an ejection unit for sending the material gas to the subsequent stage. The vaporizing unit includes a vaporizing unit main body having the vaporizing paths, a main body container containing the vaporizing unit main body, a heater for heating the material mist passing through the vaporizing paths, and connecting members arranged on both end sections of the main body container. The vaporizing unit main body and the main body container are formed of a material having thermal conductivity higher than that of the material of the connecting members. The end sections of the main body container and the connecting members are bonded by explosion bonding.
摘要翻译：提供了一种具有提高热效率的简单结构的蒸发器。蒸发器包括用于喷射处于雾状的液体物质的喷嘴单元，具有使材料雾气化并形成原料气体的蒸发路径的蒸发单元，以及用于将原料气体送至后续阶段的喷射单元。蒸发单元包括具有蒸发路径的蒸发单元主体，容纳蒸发单元主体的主体容器，用于加热通过蒸发路径的材料雾的加热器，以及布置在主体的两个端部上的连接构件容器。蒸发单元主体和主体容器由导热率高于连接构件材料的材料形成。主体容器和连接构件的端部通过爆炸粘合结合。

4. 发明申请

US20120247675A1 PLASMA PROCESSING APPARATUS AND PLASMA GENERATION ANTENNA 有权
标题翻译：等离子体处理装置和等离子体生成天线
公开(公告)号：US20120247675A1
公开(公告)日：2012-10-04
申请号：US13435552
申请日：2012-03-30
申请人： Taro IKEDA , Tomohito KOMATSU , Shigeru KASAI
发明人： Taro IKEDA , Tomohito KOMATSU , Shigeru KASAI
IPC分类号： H01L21/3065 , H01Q13/10
CPC分类号： H01J37/3222 , C23C16/45565 , C23C16/511 , H01J37/32211 , H01J37/32229 , H01J37/3244 , H01J37/32449 , H05H1/46 , H05H2001/463
摘要： A plasma generation antenna and a plasma processing apparatus can supply a gas and an electromagnetic wave effectively. A plasma processing apparatus 10 includes a processing chamber 100 in which a plasma process is performed; a wavelength shortening plate 480 configured to transmit an electromagnetic wave; and a plasma generation antenna 200 having a shower head 210 provided adjacent to the wavelength shortening plate 480. The shower head 210 is made of a conductor, and has a multiple number of gas holes 215 and a multiple number of slots 220 through which the electromagnetic wave passes. The slots 220 are provided at positions isolated from the gas holes 215.
摘要翻译：等离子体发生天线和等离子体处理装置可以有效地提供气体和电磁波。等离子体处理装置10包括其中执行等离子体处理的处理室100; 构造成透射电磁波的波长缩短板480; 以及等离子体产生天线200，其具有与波长缩短板480相邻设置的淋浴喷头210.喷头210由导体制成，并具有多个气孔215和多个槽220，电磁波通。槽220设置在与气孔215隔开的位置处。

5. 发明申请

US20090095733A1 MOUNTING TABLE STRUCTURE AND HEAT TREATMENT APPARATUS 有权
标题翻译：安装台结构和热处理设备
公开(公告)号：US20090095733A1
公开(公告)日：2009-04-16
申请号：US12336207
申请日：2008-12-16
申请人： Tomohito KOMATSU
发明人： Tomohito KOMATSU
IPC分类号： H05B3/06
CPC分类号： H01L21/67103 , C23C16/4581 , C23C16/48 , H01L21/324 , H05B3/143
摘要： Provided is a mounting table structure having a replaceable heating plate by removably arranging the heating plate in a heating plate accommodating chamber. A mounting table structure is provided with a mounting table, which is arranged inside a processing chamber and mounts thereon a target object, for performing specified heat treatment to the target object, and a hollow supporting column which supports the mounting table by making the mounting table stand on a bottom portion of the processing chamber. The mounting table is provided with a heating plate having a heater composed of an electric heat source embedded in a heat-resistant material, and a heating plate accommodating chamber composed of a heat-resistant and corrosion-resistant material for removably receiving the heating plate. The heating plate accommodating container includes a container body having an opening, and a cover portion attached to the container body. Thus, the heating plate is permitted to be replaced.
摘要翻译：提供了一种安装台结构，其具有可更换的加热板，通过将加热板可拆卸地布置在加热板容纳室中。安装台结构设置有安装台，该安装台布置在处理室内部并安装在其上的目标物体，用于对目标物体进行特定的热处理;以及中空支撑柱，其通过制造安装台来支撑安装台站立在处理室的底部。安装台设置有加热板，该加热板具有由嵌入耐热材料的电热源构成的加热器，以及由用于可拆卸地接收加热板的耐热耐腐蚀材料构成的加热板容纳室。加热板容纳容器包括具有开口的容器主体和附接到容器主体的盖部。因此，允许更换加热板。

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