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61. 发明授权

US08483035B2 Thermally assisted magnetic recording head inspection method and apparatus 有权
标题翻译：热辅助磁记录头检查方法和装置
公开(公告)号：US08483035B2
公开(公告)日：2013-07-09
申请号：US13482065
申请日：2012-05-29
申请人： Kaifeng Zhang , Takenori Hirose , Masahiro Watanabe , Shinji Homma , Tsuneo Nakagomi , Teruaki Tokutomi , Toshihiko Nakata , Takehiro Tachizaki
发明人： Kaifeng Zhang , Takenori Hirose , Masahiro Watanabe , Shinji Homma , Tsuneo Nakagomi , Teruaki Tokutomi , Toshihiko Nakata , Takehiro Tachizaki
IPC分类号： G11B7/00 , G11B5/09
CPC分类号： G11B5/455 , G11B2005/0021
摘要： In a method and an apparatus for inspecting a thermally assisted magnetic recording head element, a specimen is mounted on a table movable in a plane of a scanning probe microscope device, evanescent light is generated from a portion of light emission of evanescent light of the specimen, scattered light of the evanescent light is detected by moving the table in the plane while a cantilever of the scanning probe microscope having a probe is vertically vibrated in the vicinity of a surface of the specimen, and an intensity distribution of the evanescent light emitted from the portion of light emission of evanescent light or a surface profile of the portion of light emission of evanescent light of the specimen is inspected using position information of generation of the evanescent light based on the detected scattered light.
摘要翻译：在用于检查热辅助磁记录头元件的方法和装置中，将样本安装在可在扫描探针显微镜装置的平面中移动的台上，从所述样本的渐逝光的发光部分产生ev逝光通过在平面中移动台来检测ev逝光的散射光，同时具有探针的扫描探针显微镜的悬臂在试样的表面附近垂直振动，并且从from射光发射的ev逝光的强度分布使用基于检测到的散射光的ev逝光的产生的位置信息来检查ev逝光的发光部分或试样的ev逝光的发光部分的表面轮廓。

62. 发明申请

US20130160552A1 INTERNAL DEFECT INSPECTION METHOD AND APPARATUS FOR THE SAME 有权
标题翻译：内部缺陷检查方法及其设备
公开(公告)号：US20130160552A1
公开(公告)日：2013-06-27
申请号：US13819355
申请日：2011-06-01
申请人： Toshihiko Nakata , Tetsuya Matsui , Takehiro Tachizaki , Kazushi Yoshimura , Masahiro Watanabe
发明人： Toshihiko Nakata , Tetsuya Matsui , Takehiro Tachizaki , Kazushi Yoshimura , Masahiro Watanabe
IPC分类号： G01N29/22 , G01N29/04
CPC分类号： G01N29/221 , G01N29/04 , G01N29/043 , G01N29/0654 , G01N29/2418
摘要： It is intended to provide an internal defect inspection method and an apparatus for implementing the method by which an ultrasonic wave is excited in a sample without contact with the sample and accordingly without damaging the sample, and an ultrasonic wave from any internal defect of the sample is detected without being affected by the sample surface, in a non-contact state and with high sensitivity.By the internal defect inspection method, an ultrasonic wave is emitted from an ultrasonic wave transmitter toward a sample, an ultrasonic wave reflected by the sample is detected as an interference signal with an imaging type common-path interferometer, an ultrasonic wave signal is obtained from the interference signal, and any defect within the sample is detected from the ultrasonic wave signal.
摘要翻译：旨在提供一种内部缺陷检查方法和实现这样一种方法的装置，其中超声波在样品中被激发而不与样品接触，因此不损伤样品，并且来自样品的任何内部缺陷的超声波被检测而不受样品表面的影响，处于非接触状态并具有高灵敏度。通过内部缺陷检查方法，从超声波发射器向样品发射超声波，将由样本反射的超声波作为干涉信号与成像式共轨干涉仪进行检测，从超声波信号从超声波信号中检测出干扰信号和样本内的任何缺陷。

63. 发明申请

US20130155400A1 METHOD AND DEVICE FOR INSPECTING FOR DEFECTS 有权
标题翻译：用于检查缺陷的方法和装置
公开(公告)号：US20130155400A1
公开(公告)日：2013-06-20
申请号：US13700520
申请日：2011-05-20
申请人： Toshiyuki Nakao , Junguo Xu , Yuki Shimizu , Toshihiko Nakata , Toshifumi Honda , Yukihiro Shibata , Yuta Urano
发明人： Toshiyuki Nakao , Junguo Xu , Yuki Shimizu , Toshihiko Nakata , Toshifumi Honda , Yukihiro Shibata , Yuta Urano
IPC分类号： G01N21/95
CPC分类号： G01N21/95 , G01N21/9501 , G01Q60/22 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： A defect inspecting method is provided which comprises a pre-scan defect inspecting process including a pre-scan irradiating step for casting irradiation light onto the surface of a sample, a pre-scan detecting step for detecting the scattered lights, and a pre-scan defect information collecting step for obtaining information on preselected defects present on the sample surface on the basis of the scattered lights; a near-field defect inspecting process including a near-field irradiating step in which the distance between the sample surface and a near-field head is adjusted so that the sample surface is irradiated, a near-field detecting step for detecting near-field light response, and a near-field defect information collecting step for obtaining information on the preselected defects on the basis of the near-field light response; and a merging process for inspecting defects present on the sample surface by merging the pieces of information on the preselected defects.
摘要翻译：提供一种缺陷检查方法，其包括预扫描缺陷检查处理，其包括用于将照射光投射到样品表面上的预扫描照射步骤，用于检测散射光的预扫描检测步骤，以及预扫描缺陷信息收集步骤，用于基于散射光获得在样品表面上存在的预选缺陷的信息; 包括近场照射步骤的近场缺陷检查处理，其中调整样品表面和近场磁头之间的距离以照射样品表面;近场检测步骤，用于检测近场光响应和近场缺陷信息收集步骤，用于基于近场光响应获得关于预选缺陷的信息; 以及通过合并关于预选缺陷的信息来检查存在于样品表面上的缺陷的合并过程。

64. 发明授权

US08462330B2 Method and apparatus for detecting defects 失效
标题翻译：检测缺陷的方法和装置
公开(公告)号：US08462330B2
公开(公告)日：2013-06-11
申请号：US13362808
申请日：2012-01-31
申请人： Hiroyuki Nakano , Toshihiko Nakata , Sachio Uto , Akira Hamamatsu , Shunji Maeda , Yuta Urano
发明人： Hiroyuki Nakano , Toshihiko Nakata , Sachio Uto , Akira Hamamatsu , Shunji Maeda , Yuta Urano
IPC分类号： G01N21/88
CPC分类号： G01N21/956 , G01N21/47 , G01N21/94 , G01N21/9501 , G01N2021/8822
摘要： A method and apparatus for detecting defects are provided for detecting defects or foreign matter on an object to be inspected. The apparatus includes a movable stage for mounting a specimen, an illumination system for irradiating a circuit pattern with light from an inclined direction, and an image-forming optical system for forming an image of an irradiated detection area on a detector from the upward and oblique directions. With this arrangement, diffracted light and scattered light caused on the circuit pattern through the illumination by the illumination system is collected. A spatial filter is provided on a Fourier transform surface for blocking the diffracted light from a linear part of the circuit pattern. The scattered and reflected light received by the detector is converted into an electrical signal. The converted electrical signal of one chip is compared with that of the other adjacent chip.
摘要翻译：提供一种用于检测缺陷的方法和装置，用于检测被检测物体上的缺陷或异物。该装置包括用于安装样本的可移动台，用于从倾斜方向的光照射电路图案的照明系统和用于从上方和倾斜形成检测器上的照射检测区域的图像的图像形成光学系统方向。利用这种布置，收集通过照明系统的照明在电路图案上产生的衍射光和散射光。在傅立叶变换表面上提供空间滤波器，用于阻挡来自电路图形的线性部分的衍射光。由检测器接收的散射和反射光被转换成电信号。将一个芯片的转换电信号与另一个芯片的转换电信号进行比较。

65. 发明授权

US08451439B2 Apparatus and method for inspecting pattern 有权
标题翻译：用于检查图案的装置和方法
公开(公告)号：US08451439B2
公开(公告)日：2013-05-28
申请号：US13423862
申请日：2012-03-19
申请人： Sachio Uto , Minoru Yoshida , Toshihiko Nakata , Shunzi Maeda , Atsushi Shimoda
发明人： Sachio Uto , Minoru Yoshida , Toshihiko Nakata , Shunzi Maeda , Atsushi Shimoda
IPC分类号： G01N21/00
CPC分类号： G01N21/21 , G01N21/33 , G01N21/55 , G01N21/9501 , G01N21/956 , G01N21/95607 , G01N2021/151 , G01N2021/95615 , G01N2201/06113 , G01N2201/1035
摘要： A method and apparatus for inspecting defects includes emitting an ultraviolet light from an ultraviolet light source, illuminating a specimen with the ultraviolet light in which a polarization condition of the ultraviolet light is controlled, controlling a polarization condition of light reflected from the specimen which is illuminated by the polarization condition controlled ultraviolet light, detecting the light reflected from the specimen, processing the detected light so as to detect defects, and outputting information about the defects. The ultraviolet light source is disposed in a clean environment supplied with clean gas and separated from outside.
摘要翻译：用于检查缺陷的方法和装置包括从紫外光源发射紫外光，用受紫外光的偏振条件的紫外线照射样本，控制从被照射的样本反射的光的偏振状态通过偏光条件控制的紫外光，检测从样本反射的光，处理检测到的光以检测缺陷，并输出关于缺陷的信息。紫外光源设置在清洁环境中，并提供清洁气体并与外界分离。

66. 发明授权

US08228495B2 Defects inspecting apparatus and defects inspecting method 有权
标题翻译：缺陷检查设备和缺陷检查方法
公开(公告)号：US08228495B2
公开(公告)日：2012-07-24
申请号：US13221935
申请日：2011-08-31
申请人： Sachio Uto , Minori Noguchi , Hidetoshi Nishiyama , Yoshimasa Ohshima , Akira Hamamatsu , Takahiro Jingu , Toshihiko Nakata , Masahiro Watanabe
发明人： Sachio Uto , Minori Noguchi , Hidetoshi Nishiyama , Yoshimasa Ohshima , Akira Hamamatsu , Takahiro Jingu , Toshihiko Nakata , Masahiro Watanabe
IPC分类号： G01N21/00
CPC分类号： G01N21/00 , G01N21/9501 , G06T7/0004 , G06T2207/30148
摘要： An inspecting apparatus and method including first and second illuminating units for illuminating a surface of a specimen to be inspected with different incident angles and first and second detecting optical units arranged at different elevation angle directions to the surface of the specimen for detecting images of the specimen illuminated by the first and second illuminating units.
摘要翻译：一种检查装置和方法，包括：第一和第二照明单元，用于以不同的入射角照射待检查样本的表面;以及第一和第二检测光学单元，其以不同的仰角方向布置在样本的表面上，用于检测样本的图像由第一和第二照明单元照亮。

67. 发明授权

US08181268B2 Scanning probe microscope and method of observing sample using the same 有权
标题翻译：扫描探针显微镜及使用其的观察样品的方法
公开(公告)号：US08181268B2
公开(公告)日：2012-05-15
申请号：US12864196
申请日：2008-12-18
申请人： Toshihiko Nakata , Masahiro Watanabe , Takashi Inoue , Kishio Hidaka , Makoto Okai , Toshiaki Morita , Motoyuki Hirooka
发明人： Toshihiko Nakata , Masahiro Watanabe , Takashi Inoue , Kishio Hidaka , Makoto Okai , Toshiaki Morita , Motoyuki Hirooka
IPC分类号： G01N13/10
CPC分类号： G01Q60/06 , G01N21/648 , G01Q60/22 , G01Q70/12
摘要： Optical information and topographic information of the surface of a sample are measured at a nanometer-order resolution and with high reproducibility without damaging a probe and the sample by combining a nanometer-order cylindrical structure with a nanometer-order microstructure to form a plasmon intensifying near-field probe having a nanometer-order optical resolution and by repeating approach/retreat of the probe to/from each measurement point on the sample at a low contact force.
摘要翻译：以纳米级分辨率和高重现性测量样品表面的光学信息和地形信息，而不损害探针和样品，通过将纳米级圆柱结构与纳米级微结构组合以形成等离子体激元附近具有纳米级光学分辨率并且以低接触力重复将样品上的每个测量点的探针接近/退回。

68. 发明申请

US20120062903A1 METHOD AND APPARATUS FOR MEASURING DISPLACEMENT OF A SAMPLE TO BE INSPECTED USING AN INTERFERENCE LIGHT 有权
标题翻译：用于测量使用干扰光检测样品的位移的方法和装置
公开(公告)号：US20120062903A1
公开(公告)日：2012-03-15
申请号：US13302948
申请日：2011-11-22
申请人： Toshihiko Nakata , Masahiro Watanabe , Shuichi Baba , Yasuhiro Yoshitake , Mineo Nomoto
发明人： Toshihiko Nakata , Masahiro Watanabe , Shuichi Baba , Yasuhiro Yoshitake , Mineo Nomoto
IPC分类号： G01B9/02
CPC分类号： G01B9/02057 , G01B9/02003 , G01B9/02081 , G01B2290/30 , G01B2290/70 , G03F7/70775
摘要： In a displacement measurement apparatus using light interference, a probe light path is spatially separated from a reference light path. Therefore, when a temperature or refractive index distribution by a fluctuation of air or the like, or a mechanical vibration is generated, an optical path difference fluctuates between both of the optical paths, and a measurement error is generated. In the solution, an optical axis of probe light is brought close to that of reference light by a distance which is not influenced by any disturbance, a sample is irradiated with the probe light, a reference surface is irradiated with the reference light, reflected light beams are allowed to interfere with each other, and a displacement of the sample is obtained from the resultant interference light to thereby prevent the measurement error from being generated by the fluctuation of the optical path difference.
摘要翻译：在使用光干涉的位移测量装置中，探针光路在空间上与参考光路分离。因此，当通过空气等的波动或机械振动产生温度或折射率分布时，光路差在两个光路之间波动，并且产生测量误差。在该解决方案中，将探测光的光轴靠近参考光的光轴不受任何干扰影响的距离，用探测光照射样品，用参考光照射参考表面，反射光允许光束彼此干涉，并且从所得到的干涉光中获得样品的位移，从而防止由于光程差的波动而产生测量误差。

69. 发明申请

US20120019816A1 DEFECT INSPECTION METHOD AND DEFECT INSPECTION APPARATUS 审中-公开
标题翻译：缺陷检查方法和缺陷检查装置
公开(公告)号：US20120019816A1
公开(公告)日：2012-01-26
申请号：US13145138
申请日：2010-01-06
申请人： Yukihiro Shibata , Toshihiko Nakata , Toshifumi Honda , Yasuhiro Yoshitake
发明人： Yukihiro Shibata , Toshihiko Nakata , Toshifumi Honda , Yasuhiro Yoshitake
IPC分类号： G01N21/88
CPC分类号： G01N21/95 , G01N21/21 , G01N21/47 , G01N21/9501 , G01N21/956 , G01N21/95607
摘要： The present invention provides a spatial filtering technology for exposing a defect image independently of polarization properties of defect scattered light, a defect inspection method for increasing a defect capture rate by suppressing the brightness saturation of a normal pattern, and a defect inspection apparatus that uses the defect inspection method. An array of spatial filters is disposed in one or more optical paths, which are obtained by polarizing and splitting a detection optical path, to filter diffracted light and scattered light emitted from the normal pattern. An image whose brightness saturation is suppressed is obtained by controlling an illumination light amount and/or detection efficiency during image detection in accordance with the amount of scattered light from the normal pattern.
摘要翻译：本发明提供了一种独立于缺陷散射光的偏振特性曝光缺陷图像的空间滤波技术，通过抑制正常图案的亮度饱和来增加缺陷捕获率的缺陷检查方法，以及使用缺陷检查方法。空间滤波器阵列设置在通过偏振和分离检测光路获得的一个或多个光路中，以滤除衍射光和从正常图案发射的散射光。根据来自正常图案的散射光的量，通过控制图像检测期间的照明光量和/或检测效率来获得亮度饱和度被抑制的图像。

70. 发明授权

US08013989B2 Defects inspecting apparatus and defects inspecting method 有权
标题翻译：缺陷检查设备和缺陷检查方法
公开(公告)号：US08013989B2
公开(公告)日：2011-09-06
申请号：US12823510
申请日：2010-06-25
申请人： Sachio Uto , Minori Noguchi , Hidetoshi Nishiyama , Yoshimasa Ohshima , Akira Hamamatsu , Takahiro Jingu , Toshihiko Nakata , Masahiro Watanabe
发明人： Sachio Uto , Minori Noguchi , Hidetoshi Nishiyama , Yoshimasa Ohshima , Akira Hamamatsu , Takahiro Jingu , Toshihiko Nakata , Masahiro Watanabe
IPC分类号： G01N21/00
CPC分类号： G01N21/00 , G01N21/9501 , G06T7/0004 , G06T2207/30148
摘要： An inspecting apparatus and method including first and second illuminating units for illuminating a surface of a specimen to be inspected with different incident angles and first and second detecting optical units arranged at different elevation angle directions to the surface of the specimen for detecting images of the specimen illuminated by the first and second illuminating units.
摘要翻译：一种检查装置和方法，包括：第一和第二照明单元，用于以不同的入射角照射待检查样本的表面;以及第一和第二检测光学单元，其以不同的仰角方向布置在样本的表面上，用于检测样本的图像由第一和第二照明单元照亮。

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