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1. 发明授权

US07911601B2 Apparatus and method for inspecting pattern 有权
标题翻译：用于检查图案的装置和方法
公开(公告)号：US07911601B2
公开(公告)日：2011-03-22
申请号：US12263682
申请日：2008-11-03
申请人： Sachio Uto , Minoru Yoshida , Toshihiko Nakata , Shunzi Maeda , Atsushi Shimoda
发明人： Sachio Uto , Minoru Yoshida , Toshihiko Nakata , Shunzi Maeda , Atsushi Shimoda
IPC分类号： G01N21/00
CPC分类号： G01N21/21 , G01N21/33 , G01N21/55 , G01N21/9501 , G01N21/956 , G01N21/95607 , G01N2021/151 , G01N2021/95615 , G01N2201/06113 , G01N2201/1035
摘要： A method and apparatus for inspecting defects includes emitting an ultraviolet light from an ultraviolet light source, illuminating a specimen with the ultraviolet light in which a polarization condition of the ultraviolet light is controlled, controlling a polarization condition of light reflected from the specimen which is illuminated by the polarization condition controlled ultraviolet light, detecting the light reflected from the specimen, processing the detected light so as to detect defects, and outputting information about the defects. The ultraviolet light source is disposed in a clean environment supplied with clean gas and separated from outside.
摘要翻译：用于检查缺陷的方法和装置包括从紫外线光源发射紫外光，用紫外光的紫外线照射样本，其中控制紫外光的偏振条件，控制从被照射的样本反射的光的偏振状态通过偏光条件控制的紫外光，检测从样本反射的光，处理检测到的光以检测缺陷，并输出关于缺陷的信息。紫外光源设置在清洁环境中，并提供清洁气体并与外界分离。

2. 发明申请

US20060256328A1 Apparatus and method for inspecting pattern 失效
公开(公告)号：US20060256328A1
公开(公告)日：2006-11-16
申请号：US11488620
申请日：2006-07-19
申请人： Sachio Uto , Minoru Yoshida , Toshihiko Nakata , Shunzi Maeda , Atsushi Shimoda
发明人： Sachio Uto , Minoru Yoshida , Toshihiko Nakata , Shunzi Maeda , Atsushi Shimoda
IPC分类号： G01N21/88
CPC分类号： G01N21/21 , G01N21/33 , G01N21/55 , G01N21/9501 , G01N21/956 , G01N21/95607 , G01N2021/151 , G01N2021/95615 , G01N2201/06113 , G01N2201/1035
摘要： An apparatus for inspecting defects including a table which mounts a specimen to be inspected and which is movable in a plane, an ultraviolet light source for emitting ultraviolet light, an illuminating unit for illuminating the specimen mounted on the table with light emitted from the ultraviolet light source, a detecting unit for forming an image of the specimen illuminated by the illuminating unit and for detecting the image with an image sensor, and an image processing unit for processing the image detected by the image sensor and for outputting information about defects detected on the specimen. The illuminating unit and detecting unit are disposed in a clean environment which is supplied therein with clean gas and which is separated from outside by a wall.

3. 发明授权

US07081953B2 Apparatus and method for inspecting pattern 失效
标题翻译：用于检查图案的装置和方法
公开(公告)号：US07081953B2
公开(公告)日：2006-07-25
申请号：US10979169
申请日：2004-11-03
申请人： Sachio Uto , Minoru Yoshida , Toshihiko Nakata , Shunzi Maeda , Atsushi Shimoda
发明人： Sachio Uto , Minoru Yoshida , Toshihiko Nakata , Shunzi Maeda , Atsushi Shimoda
IPC分类号： G01N21/00
CPC分类号： G01N21/21 , G01N21/33 , G01N21/55 , G01N21/9501 , G01N21/956 , G01N21/95607 , G01N2021/151 , G01N2021/95615 , G01N2201/06113 , G01N2201/1035
摘要： An apparatus for inspecting defects including a table which mounts a specimen to be inspected and which is movable in a plane, an ultraviolet light source for emitting ultraviolet light, an illuminating unit for illuminating the specimen mounted on the table with light emitted from the ultraviolet light source, a detecting unit for forming an image of the specimen illuminated by the illuminating unit and for detecting the image with an image sensor, and an image processing unit for processing the image detected by the image sensor and for outputting information about defects detected on the specimen. The illuminating unit and detecting unit are disposed in a clean environment which is supplied therein with clean gas and which is separated from outside by a wall.
摘要翻译：一种用于检查缺陷的装置，包括安装待检查样本并且可在平面中移动的台面，用于发射紫外线的紫外光源的照明单元，用于对从紫外线发射的光照射安装在桌子上的样本的照明单元源，用于形成由所述照明单元照射的所述样本的图像并且用图像传感器检测图像的检测单元，以及图像处理单元，用于处理由所述图像传感器检测到的图像，并且用于输出关于在所述图像传感器上检测到的缺陷的信息; 标本。照明单元和检测单元设置在清洁的环境中，其中提供有清洁的气体并且由壁与外部分离。

4. 发明授权

US08451439B2 Apparatus and method for inspecting pattern 有权
标题翻译：用于检查图案的装置和方法
公开(公告)号：US08451439B2
公开(公告)日：2013-05-28
申请号：US13423862
申请日：2012-03-19
申请人： Sachio Uto , Minoru Yoshida , Toshihiko Nakata , Shunzi Maeda , Atsushi Shimoda
发明人： Sachio Uto , Minoru Yoshida , Toshihiko Nakata , Shunzi Maeda , Atsushi Shimoda
IPC分类号： G01N21/00
CPC分类号： G01N21/21 , G01N21/33 , G01N21/55 , G01N21/9501 , G01N21/956 , G01N21/95607 , G01N2021/151 , G01N2021/95615 , G01N2201/06113 , G01N2201/1035
摘要： A method and apparatus for inspecting defects includes emitting an ultraviolet light from an ultraviolet light source, illuminating a specimen with the ultraviolet light in which a polarization condition of the ultraviolet light is controlled, controlling a polarization condition of light reflected from the specimen which is illuminated by the polarization condition controlled ultraviolet light, detecting the light reflected from the specimen, processing the detected light so as to detect defects, and outputting information about the defects. The ultraviolet light source is disposed in a clean environment supplied with clean gas and separated from outside.
摘要翻译：用于检查缺陷的方法和装置包括从紫外光源发射紫外光，用受紫外光的偏振条件的紫外线照射样本，控制从被照射的样本反射的光的偏振状态通过偏光条件控制的紫外光，检测从样本反射的光，处理检测到的光以检测缺陷，并输出关于缺陷的信息。紫外光源设置在清洁环境中，并提供清洁气体并与外界分离。

5. 发明申请

US20050062961A1 Apparatus and method for inspecting pattern 失效
标题翻译：用于检查图案的装置和方法
公开(公告)号：US20050062961A1
公开(公告)日：2005-03-24
申请号：US10979169
申请日：2004-11-03
申请人： Sachio Uto , Minoru Yoshida , Toshihiko Nakata , Shunzi Maeda , Atsushi Shimoda
发明人： Sachio Uto , Minoru Yoshida , Toshihiko Nakata , Shunzi Maeda , Atsushi Shimoda
IPC分类号： G01N21/33 , G01N21/95 , G01N21/956 , H01L21/66 , G01N21/88
CPC分类号： G01N21/21 , G01N21/33 , G01N21/55 , G01N21/9501 , G01N21/956 , G01N21/95607 , G01N2021/151 , G01N2021/95615 , G01N2201/06113 , G01N2201/1035
摘要： An apparatus for inspecting defects including a table which mounts a specimen to be inspected and which is movable in a plane, an ultraviolet light source for emitting ultraviolet light, an illuminating unit for illuminating the specimen mounted on the table with light emitted from the ultraviolet light source, a detecting unit for forming an image of the specimen illuminated by the illuminating unit and for detecting the image with an image sensor, and an image processing unit for processing the image detected by the image sensor and for outputting information about defects detected on the specimen. The illuminating unit and detecting unit are disposed in a clean environment which is supplied therein with clean gas and which is separated from outside by a wall.
摘要翻译：一种用于检查缺陷的装置，包括安装待检查样本并且可在平面中移动的台面，用于发射紫外线的紫外光源的照明单元，用于对从紫外线发射的光照射安装在桌子上的样本的照明单元源，用于形成由所述照明单元照射的所述样本的图像并且用图像传感器检测图像的检测单元，以及图像处理单元，用于处理由所述图像传感器检测到的图像，并且用于输出关于在所述图像传感器上检测到的缺陷的信息; 标本。照明单元和检测单元设置在清洁的环境中，其中提供有清洁的气体并且由壁与外部分离。

6. 发明授权

US06831737B2 Apparatus and method for inspecting pattern 失效
标题翻译：用于检查图案的装置和方法
公开(公告)号：US06831737B2
公开(公告)日：2004-12-14
申请号：US10050778
申请日：2002-01-18
申请人： Sachio Uto , Minoru Yoshida , Toshihiko Nakata , Shunzi Maeda , Atsushi Shimoda
发明人： Sachio Uto , Minoru Yoshida , Toshihiko Nakata , Shunzi Maeda , Atsushi Shimoda
IPC分类号： G01N2100
CPC分类号： G01N21/21 , G01N21/33 , G01N21/55 , G01N21/9501 , G01N21/956 , G01N21/95607 , G01N2021/151 , G01N2021/95615 , G01N2201/06113 , G01N2201/1035
摘要： The present invention provides a pattern defect inspecting apparatus wherein an amount-of-light monitor unit detects a variation in the amount of ultraviolet laser light during inspection to thereby determine the presence or absence of an influence thereof exerted on the inspection and detects the prediction of the life of a light source and a malfunction thereof, and the interior of an optical system is cleaned up to thereby ensure the prolongation of the life of each optical part and long-term reliability thereof, and a method thereof.
摘要翻译：本发明提供了一种图案缺陷检查装置，其中光量监视器单元检测检查期间紫外激光量的变化，从而确定其对检查的影响的有无，并检测预测光源的寿命和故障以及光学系统的内部被清理，从而确保每个光学部件的寿命延长及其长期可靠性及其方法。

7. 发明授权

US07446866B2 Apparatus and method for inspecting pattern 失效
标题翻译：用于检查图案的装置和方法
公开(公告)号：US07446866B2
公开(公告)日：2008-11-04
申请号：US11488620
申请日：2006-07-19
申请人： Sachio Uto , Minoru Yoshida , Toshihiko Nakata , Shunzi Maeda , Atsushi Shimoda
发明人： Sachio Uto , Minoru Yoshida , Toshihiko Nakata , Shunzi Maeda , Atsushi Shimoda
IPC分类号： G01N21/00
CPC分类号： G01N21/21 , G01N21/33 , G01N21/55 , G01N21/9501 , G01N21/956 , G01N21/95607 , G01N2021/151 , G01N2021/95615 , G01N2201/06113 , G01N2201/1035
摘要： An apparatus for inspecting defects including a table which mounts a specimen to be inspected and which is movable in a plane, an ultraviolet light source for emitting ultraviolet light, an illuminating unit for illuminating the specimen mounted on the table with light emitted from the ultraviolet light source, a detecting unit for forming an image of the specimen illuminated by the illuminating unit and for detecting the image with an image sensor, and an image processing unit for processing the image detected by the image sensor and for outputting information about defects detected on the specimen. The illuminating unit and detecting unit are disposed in a clean environment which is supplied therein with clean gas and which is separated from outside by a wall.
摘要翻译：一种用于检查缺陷的装置，包括安装待检查样本并且可在平面中移动的台面，用于发射紫外线的紫外光源的照明单元，用于对从紫外线发射的光照射安装在桌子上的样本的照明单元源，用于形成由所述照明单元照射的所述样本的图像并且用图像传感器检测图像的检测单元，以及图像处理单元，用于处理由所述图像传感器检测到的图像，并且用于输出关于在所述图像传感器上检测到的缺陷的信息; 标本。照明单元和检测单元设置在清洁的环境中，其中提供有清洁的气体并且由壁与外部分离。

8. 发明授权

US08149395B2 Apparatus and method for inspecting pattern 失效
标题翻译：用于检查图案的装置和方法
公开(公告)号：US08149395B2
公开(公告)日：2012-04-03
申请号：US13069091
申请日：2011-03-22
申请人： Sachio Uto , Minoru Yoshida , Toshihiko Nakata , Shunzi Maeda , Atsushi Shimoda
发明人： Sachio Uto , Minoru Yoshida , Toshihiko Nakata , Shunzi Maeda , Atsushi Shimoda
IPC分类号： G01N21/00
CPC分类号： G01N21/21 , G01N21/33 , G01N21/55 , G01N21/9501 , G01N21/956 , G01N21/95607 , G01N2021/151 , G01N2021/95615 , G01N2201/06113 , G01N2201/1035
摘要： A method and apparatus for inspecting defects includes emitting an ultraviolet light from an ultraviolet light source, illuminating a specimen with the ultraviolet light in which a polarization condition of the ultraviolet light is controlled, controlling a polarization condition of light reflected from the specimen which is illuminated by the polarization condition controlled ultraviolet light, detecting the light reflected from the specimen, processing the detected light so as to detect defects, and outputting information about the defects. The ultraviolet light source is disposed in a clean environment supplied with clean gas and separated from outside.
摘要翻译：用于检查缺陷的方法和装置包括从紫外光源发射紫外光，用受紫外光的偏振条件的紫外线照射样本，控制从被照射的样本反射的光的偏振状态通过偏光条件控制的紫外光，检测从样本反射的光，处理检测到的光以检测缺陷，并输出关于缺陷的信息。紫外光源设置在清洁环境中，并提供清洁气体并与外界分离。

9. 发明授权

US06721047B2 Method and apparatus for inspecting defects of a specimen 失效
标题翻译：用于检查样本缺陷的方法和装置
公开(公告)号：US06721047B2
公开(公告)日：2004-04-13
申请号：US09944858
申请日：2001-08-31
申请人： Atsushi Shimoda , Sachio Uto , Minoru Yoshida , Shunji Maeda , Toshihiko Nakata
发明人： Atsushi Shimoda , Sachio Uto , Minoru Yoshida , Shunji Maeda , Toshihiko Nakata
IPC分类号： G01N2100
CPC分类号： G01N21/95684
摘要： The object of the invention is to provide high-sensitivity detection of fine patterns on a transparent inter-layer insulative film and defects on the same layer. Detection is performed with lower-layer patterns and defects on the same layer defocused, thus allowing detection of just the defects from the process that is intended for inspection. An inspection apparatus for a specimen on which a plurality of patterns intended to have identical shapes are arranged in a uniform manner includes: an imaging optical system with a relationship between illumination wavelength and objective lens numerical aperture that provides a resolution of no more than 0.18 microns, or preferably no more than 0.13 microns; an opto-electric converter disposed at an imaging position of the imaging optical system; an auto-focus optical system formed with an optical path disposed separate from the imaging optical system, with illumination applied at an incident angle of at least 85 degrees, preferably at least 88 degrees; means for adjusting a focal position of the imaging optical system based on a detection signal from the auto-focus optical system; and means for processing electronic signals from the opto-electrical converter.
摘要翻译：本发明的目的是提供在透明层间绝缘膜上的精细图案的高灵敏度检测和同一层上的缺陷。以相同层上的较低层图案和缺陷进行检测，散焦，从而允许仅检测来自用于检查的过程的缺陷。用于其上具有相同形状的多个图案的样本的检查装置以均匀的方式布置包括：具有提供不超过0.18微米的分辨率的照明波长和物镜数值孔径之间的关系的成像光学系统，或优选不超过0.13微米; 设置在成像光学系统的成像位置处的光电转换器; 形成有与成像光学系统分开设置的光路的自动聚焦光学系统，其入射角至少为85度，优选为至少88度; 用于基于来自所述自动聚焦光学系统的检测信号调整所述成像光学系统的焦点位置的装置; 以及用于处理来自光电转换器的电子信号的装置。

10. 发明授权

US06943876B2 Method and apparatus for detecting pattern defects 失效
标题翻译：检测图案缺陷的方法和装置
公开(公告)号：US06943876B2
公开(公告)日：2005-09-13
申请号：US10223423
申请日：2002-08-20
申请人： Minoru Yoshida , Sachio Uto , Shunji Maeda , Toshihiko Nakata
发明人： Minoru Yoshida , Sachio Uto , Shunji Maeda , Toshihiko Nakata
IPC分类号： G01B11/30 , G01N21/956 , H01L21/66 , G02N21/88
CPC分类号： G01N21/95684
摘要： A method and apparatus for detecting pattern defects which includes annularly scanning of a laser beam emitted from a laser light source on a pupil of an objective lens, illuminating the scanned laser beam, through the objective lens, onto a sample on which there is formed a pattern coated with an optically transparent thin film, acquiring an optical image of the illuminated sample, and processing the acquired image to find defects in the pattern. The annular scan diameter of the laser beam is determined based on the thickness of the optically transparent thin film.
摘要翻译：一种用于检测图案缺陷的方法和装置，其包括从物镜的瞳孔上的激光光源发射的激光束的环状扫描，将扫描的激光束通过物镜照射到其上形成有涂覆有光学透明薄膜的图案，获取照射样品的光学图像，以及处理所获取的图像以发现图案中的缺陷。基于光学透明薄膜的厚度确定激光束的环形扫描直径。

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