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1. 发明授权

US09182592B2 Optical filtering device, defect inspection method and apparatus therefor 有权
标题翻译：光学滤波装置，缺陷检查方法及其装置
公开(公告)号：US09182592B2
公开(公告)日：2015-11-10
申请号：US13983310
申请日：2012-02-03
申请人： Taketo Ueno , Toshihiko Nakata , Yukihiro Shibata , Shun'ichi Matsumoto , Atsushi Taniguchi , Hiroshi Toshiyoshi , Takuya Takahashi , Kentaro Motohara
发明人： Taketo Ueno , Toshihiko Nakata , Yukihiro Shibata , Shun'ichi Matsumoto , Atsushi Taniguchi , Hiroshi Toshiyoshi , Takuya Takahashi , Kentaro Motohara
IPC分类号： G01N21/00 , G02B26/02 , G01N21/956 , G01N21/95
CPC分类号： G02B26/02 , G01N21/9501 , G01N21/956
摘要： An optical filtering device and an optical inspection apparatus for detecting a defect in a high sensitivity using an optical filtering device which includes a shutter array formed in a two-dimensionally on an optically opaque thin film produced on a SOI wafer and the SOI wafer is removed at portions thereof on the lower side of the shutter patterns to form perforation portions while working electrodes are formed at the remaining portion of the SOI wafer, a glass substrate having electrode patterns formed on the surface thereof and having the shutter array mounted thereon, and a power supply section for supplying electric power to the electrode patterns formed on the glass substrate and the working electrodes of the SOI wafer. And the working electrodes is controlled to cause the shutter patterns to carry out opening and closing movements with respect to the perforation portions to carry out optical filtering.
摘要翻译：使用光学滤波装置来检测高灵敏度的缺陷的光学滤波装置和光学检查装置，该光学滤波装置包括在SOI晶片和SOI晶片上制造的光学不透明薄膜上二维地形成的快门阵列在闸板图案的下侧的部分处形成穿孔部分，同时在SOI晶片的剩余部分处形成工作电极，在其表面上形成有安装有快门阵列的电极图案的玻璃基板，以及电源部分，用于向形成在玻璃基板上的电极图案和SOI晶片的工作电极提供电力。并且控制工作电极以使快门图案相对于穿孔部分进行打开和关闭运动以进行光学过滤。

2. 发明授权

US08885037B2 Defect inspection method and apparatus therefor 有权
标题翻译：缺陷检查方法及其设备
公开(公告)号：US08885037B2
公开(公告)日：2014-11-11
申请号：US13375239
申请日：2010-07-01
申请人： Atsushi Taniguchi , Yukihiro Shibata , Taketo Ueno , Toshihiko Nakata
发明人： Atsushi Taniguchi , Yukihiro Shibata , Taketo Ueno , Toshihiko Nakata
IPC分类号： H04N9/47 , G01J4/00 , G01N21/00 , G06K9/00 , G01N37/00 , G01N21/95 , G01N21/956
CPC分类号： G01N21/956 , G01N21/9501
摘要： To effectively utilize the polarization property of an inspection subject for obtaining higher inspection sensitivity, for the polarization of lighting, it is necessary to observe differences in the reflection, diffraction, and scattered light from the inspection subject because of polarization by applying light having the same elevation angle and wavelength in the same direction but different polarization. According to conventional techniques, a plurality of measurements by changing polarizations is required to cause a prolonged inspection time period that is an important specification of inspection apparatuses. In this invention, a plurality of polarization states are modulated in micro areas in the lighting beam cross section, images under a plurality of polarized lighting conditions are collectively acquired by separately and simultaneously forming the scattered light from the individual micro areas in the individual pixels of a sensor, whereby inspection sensitivity and sorting and sizing accuracy are improved without reducing throughput.
摘要翻译：为了有效地利用检查对象的偏振特性以获得更高的检测灵敏度，对于照明的偏振，需要观察来自检查对象的反射，衍射和散射光的差异，因为通过施加具有相同的光的偏振仰角和波长相同但偏振不同。根据常规技术，需要通过改变极化的多个测量来引起作为检查设备的重要规格的延长的检查时间段。在本发明中，在照明光束横截面的微小区域中调制多个偏振状态，通过分别并且同时形成来自各个像素中的各个微区域的散射光，共同地获得多个偏振光照条件下的图像传感器，从而在不降低生产能力的情况下提高检测灵敏度和分选和尺寸精度。

3. 发明授权

US08804112B2 Method of defect inspection and device of defect inspection 有权
标题翻译：缺陷检查方法和缺陷检查装置
公开(公告)号：US08804112B2
公开(公告)日：2014-08-12
申请号：US13265935
申请日：2010-04-22
申请人： Yukihiro Shibata , Toshihiko Nakata , Taketo Ueno , Atsushi Taniguchi , Toshifumi Honda
发明人： Yukihiro Shibata , Toshihiko Nakata , Taketo Ueno , Atsushi Taniguchi , Toshifumi Honda
IPC分类号： G01N21/00
CPC分类号： G01N21/95623 , G01N21/95607 , G01N2021/8822 , G01N2201/062 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： A method of inspecting defects and a device inspecting defects of detecting defects at high sensitivity and high capture efficiency even on various patterns existing on a wafer. In the device of inspecting defects, an illumination optical system is formed of two systems of a coherent illumination of a laser 5 and an incoherent illumination of LEDs 6a, 6b, 6c and 6d, and light paths are divided in a detecting system corresponding to respective illumination light, spatial modulation elements 55a and 55b are arranged to detecting light paths, respectively, scattered light inhibiting sensitivity is shielded by the spatial modulating elements 55a and 55b, scattered light transmitted through the spatial modulation elements 55a and 55b is detected by image sensors 90a and 90b arranged to respective light paths, and images detected by these two image sensors 90a and 90b are subjected to a comparison processing, thereby determining a defect candidate.
摘要翻译：一种检测缺陷的方法，以及即使在晶片上存在的各种图案，也可以检测高灵敏度和高捕获效率的缺陷检测缺陷。在检查缺陷的装置中，照明光学系统由激光器5的相干照明和LED 6a，6b，6c和6d的非相干照明的两个系统形成，并且光路被分成对应于相应的照明光，空间调制元件55a和55b分别被布置成检测光路，散射光抑制灵敏度被空间调制元件55a和55b屏蔽，传播通过空间调制元件55a和55b的散射光被图像传感器90a检测和90b，并且由这两个图像传感器90a和90b检测到的图像进行比较处理，从而确定缺陷候选。

4. 发明授权

US08681328B2 Dark-field defect inspecting method, dark-field defect inspecting apparatus, aberration analyzing method, and aberration analyzing apparatus 有权
标题翻译：暗场缺陷检查方法，暗场缺陷检查装置，像差分析方法和像差分析装置
公开(公告)号：US08681328B2
公开(公告)日：2014-03-25
申请号：US13142328
申请日：2010-01-20
申请人： Atsushi Taniguchi , Taketo Ueno , Yukihiro Shibata , Shunji Maeda , Tetsuya Matsui
发明人： Atsushi Taniguchi , Taketo Ueno , Yukihiro Shibata , Shunji Maeda , Tetsuya Matsui
IPC分类号： G01N21/00
CPC分类号： G01N21/9501 , G01N21/21 , G01N21/47 , G01N21/4788 , G01N21/93 , G01N21/94 , G01N21/956 , G01N2021/8822
摘要： By including an illumination system and a detection system, an information collecting function of monitoring an environment, such as temperature and atmospheric pressure, and an apparatus state managing function having a feedback function of comparing the monitoring result and a design value, a theoretical calculation value or an ideal value derived from simulation results and calibrating an apparatus so that the monitoring result is brought close to the ideal value, a unit for keeping the apparatus state and apparatus sensitivity constant is provided. A control unit 800 is configured to include a recording unit 801, a comparing unit 802, a sensitivity predicting unit 803, and a feedback control unit 804. In the comparing unit 802, the monitoring result transmitted from the recording unit 801 and an ideal value stored in a database 805 are compared with each other. When a difference between the ideal value and the monitoring result exceeds a predetermined threshold, the feedback control unit 804 corrects the illumination system and the detection system.
摘要翻译：通过包括照明系统和检测系统，监视诸如温度和大气压力之类的环境的信息收集功能，以及具有比较监视结果和设计值的反馈功能的设备状态管理功能，理论计算值或者从模拟结果导出的理想值，并且对设备进行校准，使得监视结果接近理想值，提供用于保持设备状态和设备灵敏度恒定的单元。控制单元800被配置为包括记录单元801，比较单元802，灵敏度预测单元803和反馈控制单元804.在比较单元802中，从记录单元801发送的监视结果和理想值存储在数据库805中进行比较。当理想值与监视结果之间的差异超过预定阈值时，反馈控制单元804校正照明系统和检测系统。

5. 发明申请

US20130293880A1 DEFECT TESTING METHOD AND DEVICE FOR DEFECT TESTING 审中-公开
标题翻译：缺陷测试方法和缺陷测试装置
公开(公告)号：US20130293880A1
公开(公告)日：2013-11-07
申请号：US13882547
申请日：2011-11-01
申请人： Toshifumi Honda , Yuta Urano , Yukihiro Shibata
发明人： Toshifumi Honda , Yuta Urano , Yukihiro Shibata
IPC分类号： G01N21/95
CPC分类号： G01N21/9501
摘要： In a defect inspection method and an apparatus of the same, for enabling to conduct an inspection of fine defects without applying thermal damages on a sample, the following steps are conducted: mounting a sample on a rotatable table to rotate; irradiating a pulse laser emitting from a laser light source upon the sample rotating; detecting a reflected light from the sample, upon which the pulse laser is irradiated; detecting the reflected light from the sample detected; and detecting a defect on the sample through processing of a signal obtained through the detection, wherein irradiation of the pulse laser emitting from the laser light source upon the sample rotating is conducted by dividing the one pulse emitted from the laser light source into plural numbers of pulses, and irradiating each of the divided pulse lasers upon each of separate positions on the sample, respectively.
摘要翻译：在缺陷检查方法及其装置中，为了能够在对样品施加热损伤的情况下进行细小缺陷的检查，进行以下步骤：将样品安装在旋转台上旋转; 照射从激光光源发射的脉冲激光器对样品旋转; 检测来自所述脉冲激光器的样品的反射光; 检测检测到的样品的反射光; 并且通过处理通过检测获得的信号来检测样本上的缺陷，其中通过将从激光光源发射的一个脉冲除以多个数量来进行从样品旋转时从激光源发射的脉冲激光的照射脉冲，并且分别在样品上的每个分离位置上照射每个分割的脉冲激光器。

6. 发明授权

US08236161B2 Apparatus for electrolyzing sulfuric acid, method of performing electrolysis, and apparatus for processing a substrate 有权
标题翻译：硫酸电解装置，电解方法以及基板处理装置
公开(公告)号：US08236161B2
公开(公告)日：2012-08-07
申请号：US12274681
申请日：2008-11-20
申请人： Nobuo Kobayashi , Yukihiro Shibata , Naoya Hayamizu , Masaaki Kato
发明人： Nobuo Kobayashi , Yukihiro Shibata , Naoya Hayamizu , Masaaki Kato
IPC分类号： C25B1/28 , C23G1/00
CPC分类号： C25B1/285 , H01L21/67051
摘要： An apparatus for electrolyzing sulfuric acid, the apparatus comprising an electrolytic cell comprising a cathode chamber having a cathode and an anode chamber having an anode, the cathode chamber and the anode chamber being separated by a diaphragm, a sulfuric acid tank configured to store the sulfuric acid, a supply pipe connecting the sulfuric acid tank to an inlet port of the anode chamber, a connection pipe connecting an outlet port of the cathode chamber to the inlet port of the anode chamber, a first supply pump provided on the supply pipe and configured to supply the sulfuric acid from the sulfuric acid tank to the cathode chamber through the supply pipe, and a drain pipe connected to an outlet port of the anode chamber and configured to supply to a solution tank a solution containing an oxidizing agent generated by electrolysis in the anode chamber.
摘要翻译：一种用于电解硫酸的设备，该设备包括电解池，该电解池包括具有阴极的阴极室和具有阳极的阳极室，阴极室和阳极室由隔膜隔开;硫酸罐，其构造成储存硫酸酸，将硫酸罐连接到阳极室的入口的供给管，将阴极室的出口与阳极室的入口连接的连接管，设置在供给管上的第一供给泵，通过供给管将硫酸从硫酸罐供给到阴极室，以及排水管，其连接到阳极室的出口，并配置成向溶液罐供给含有通过电解产生的氧化剂的溶液阳极室。

7. 发明申请

US20120128230A1 DEFECT INSPECTION METHOD AND APPARATUS 审中-公开
标题翻译：缺陷检查方法和装置
公开(公告)号：US20120128230A1
公开(公告)日：2012-05-24
申请号：US13362151
申请日：2012-01-31
申请人： Shunji Maeda , Kenji Oka , Yukihiro Shibata , Minoru Yoshida , Chie Shishido , Yuji Takagi , Atsushi Yoshida , Kazuo Yamaguchi
发明人： Shunji Maeda , Kenji Oka , Yukihiro Shibata , Minoru Yoshida , Chie Shishido , Yuji Takagi , Atsushi Yoshida , Kazuo Yamaguchi
IPC分类号： G06K9/00
CPC分类号： G06T7/001 , G01N21/9501 , G01N21/95607 , G06T7/0004 , G06T2207/30148
摘要： An inspection method, including: illuminating a light on a wafer on which plural chips having identical patterns are formed; imaging corresponding areas of two chips formed on the wafer to obtain inspection images and reference images with an image sensor; and processing the obtained inspection image and the reference image to produce a difference image which indicates a difference between the inspection image and the reference image and detect a defect by comparing the difference image with a threshold, wherein a threshold applied to a difference image which is produced by comparing the inspection image and the reference image obtained by imaging peripheral portion of the wafer is different from a threshold applied to a difference image which is produced by comparing the inspection image and the reference image obtained by imaging central portion of the wafer.
摘要翻译：一种检查方法，包括：在其上形成有多个具有相同图案的芯片的晶片上照射光; 对形成在晶片上的两个芯片的对应区域进行成像，以获得具有图像传感器的检查图像和参考图像; 并且处理所获得的检查图像和参考图像以产生指示检查图像和参考图像之间的差异的差异图像，并且通过将差异图像与阈值进行比较来检测缺陷，其中应用于差分图像的阈值是通过比较检查图像和通过对晶片的周边部分进行成像获得的参考图像而产生的参考图像与通过比较检查图像和通过对晶片的中心部分进行成像而获得的参考图像而产生的差分图像的阈值不同。

8. 发明申请

US20100208249A1 Apparatus For Inspecting Defects 有权
标题翻译：检查缺陷的仪器
公开(公告)号：US20100208249A1
公开(公告)日：2010-08-19
申请号：US12771216
申请日：2010-04-30
申请人： Yukihiro Shibata , Shunji Maeda
发明人： Yukihiro Shibata , Shunji Maeda
IPC分类号： G01N21/62
CPC分类号： G01N21/94 , G01N21/21 , G01N21/4788 , G01N21/9501 , G01N21/95623 , G01N2021/8822 , G01N2021/9513
摘要： A defect inspection apparatus and method includes a darkfield illumination optical system which conducts darkfield illumination upon the surface of a sample with irradiation light having at least one of wavelength band, a darkfield detection optical system which includes a reflecting objective lens for converging the light scattered from the surface of the sample that has been darkfield-illuminated with the irradiation light having the at least one wavelength band, and imaging optics for imaging onto a light-receiving surface of an image sensor the scattered light that the reflecting objective lens has converged, and an image processor which, in accordance with an image signal obtained from the image sensor of the darkfield detection optical system, discriminates defects or defect candidates present on the surface of the sample.
摘要翻译：缺陷检查装置和方法包括：暗场照明光学系统，其使用具有波长带中的至少一个的照射光对样品的表面进行暗场照明，暗视场检测光学系统包括用于会聚来自已经用具有至少一个波长带的照射光进行暗场照射的样品的表面，以及用于在图像传感器的光接收表面上成像以用于反射物镜会聚的散射光的成像光学器件;以及根据从暗场检测光学系统的图像传感器获得的图像信号，鉴别存在于样品表面上的缺陷或缺陷候选物的图像处理器。

9. 发明申请

US20090279079A1 METHOD AND APPARATUS FOR INSPECTING DEFECTS 有权
标题翻译：检查缺陷的方法和装置
公开(公告)号：US20090279079A1
公开(公告)日：2009-11-12
申请号：US12423902
申请日：2009-04-15
申请人： Yukihiro Shibata , Yasuhiro Yoshitake
发明人： Yukihiro Shibata , Yasuhiro Yoshitake
IPC分类号： G01N21/88
CPC分类号： G01N21/95623 , G01N2021/9563 , G03F7/7065
摘要： To provide a defect inspection apparatus for inspecting defects of a specimen without lowering resolution of a lens, without depending on a polarization characteristic of a defect scattered light, and with high detection sensitivity that is realized by the following. A detection optical path is branched by at least one of spectral splitting and polarization splitting, a spatial filter in the form of a two-dimensional array is disposed after the branch, and only diffracted light is shielded by the spatial filter in the form of a two-dimensional array.
摘要翻译：提供一种用于检查样本缺陷的缺陷检查装置，而不会降低透镜的分辨率，而不依赖于缺陷散射光的偏振特性，并且具有通过以下实现的高检测灵敏度。通过光谱分离和偏振分割中的至少一个来分支检测光路，在分支之后设置二维阵列形式的空间滤波器，只有衍射光被空间滤波器屏蔽二维数组。

10. 发明申请

US20090257647A1 Method and Apparatus for Inspecting Defects 有权
标题翻译：检查缺陷的方法和装置
公开(公告)号：US20090257647A1
公开(公告)日：2009-10-15
申请号：US12420932
申请日：2009-04-09
申请人： Yasuhiro Yoshitake , Hiroyuki Nakano , Yukihiro Shibata
发明人： Yasuhiro Yoshitake , Hiroyuki Nakano , Yukihiro Shibata
IPC分类号： G06K9/00 , H04N5/335
CPC分类号： G06K9/00 , G01N21/9501 , G06T7/0004 , G06T2207/30148 , H04N5/341 , H04N5/3743 , H04N5/378
摘要： A two-dimensional sensor is installed inclining at a predetermined angle to a moving direction of a stage on which an object to be inspected is mounted and, in synchronism with the movement of the stage, a picked up image is rearranged so that there can be obtained an image in high-density sampling with a picture-element size or less of the two-dimensional sensor with respect to a wafer. Thus, interpolation calculation during position alignment becomes unnecessary, and size calculation and classification of a defect can be performed with high accuracy.
摘要翻译：将二维传感器安装成倾斜预定角度，使其与安装被检查物体的平台的移动方向倾斜，并且与舞台的移动同步，拾取图像被重新排列，使得可以以相对于晶片的二维传感器的像素大小或更小的高密度采样获得图像。因此，位置对准中的插补计算变得不必要，可以高精度地执行缺陷的尺寸计算和分类。

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