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1. 发明申请

US20130160552A1 INTERNAL DEFECT INSPECTION METHOD AND APPARATUS FOR THE SAME 有权
标题翻译：内部缺陷检查方法及其设备
公开(公告)号：US20130160552A1
公开(公告)日：2013-06-27
申请号：US13819355
申请日：2011-06-01
申请人： Toshihiko Nakata , Tetsuya Matsui , Takehiro Tachizaki , Kazushi Yoshimura , Masahiro Watanabe
发明人： Toshihiko Nakata , Tetsuya Matsui , Takehiro Tachizaki , Kazushi Yoshimura , Masahiro Watanabe
IPC分类号： G01N29/22 , G01N29/04
CPC分类号： G01N29/221 , G01N29/04 , G01N29/043 , G01N29/0654 , G01N29/2418
摘要： It is intended to provide an internal defect inspection method and an apparatus for implementing the method by which an ultrasonic wave is excited in a sample without contact with the sample and accordingly without damaging the sample, and an ultrasonic wave from any internal defect of the sample is detected without being affected by the sample surface, in a non-contact state and with high sensitivity.By the internal defect inspection method, an ultrasonic wave is emitted from an ultrasonic wave transmitter toward a sample, an ultrasonic wave reflected by the sample is detected as an interference signal with an imaging type common-path interferometer, an ultrasonic wave signal is obtained from the interference signal, and any defect within the sample is detected from the ultrasonic wave signal.
摘要翻译：旨在提供一种内部缺陷检查方法和实现这样一种方法的装置，其中超声波在样品中被激发而不与样品接触，因此不损伤样品，并且来自样品的任何内部缺陷的超声波被检测而不受样品表面的影响，处于非接触状态并具有高灵敏度。通过内部缺陷检查方法，从超声波发射器向样品发射超声波，将由样本反射的超声波作为干涉信号与成像式共轨干涉仪进行检测，从超声波信号从超声波信号中检测出干扰信号和样本内的任何缺陷。

2. 发明授权

US09134279B2 Internal defect inspection method and apparatus for the same 有权
标题翻译：内部缺陷检查方法和装置相同
公开(公告)号：US09134279B2
公开(公告)日：2015-09-15
申请号：US13819355
申请日：2011-06-01
申请人： Toshihiko Nakata , Tetsuya Matsui , Takehiro Tachizaki , Kazushi Yoshimura , Masahiro Watanabe
发明人： Toshihiko Nakata , Tetsuya Matsui , Takehiro Tachizaki , Kazushi Yoshimura , Masahiro Watanabe
IPC分类号： G01N29/04 , G01N29/22 , G01N29/24 , G01N29/06
CPC分类号： G01N29/221 , G01N29/04 , G01N29/043 , G01N29/0654 , G01N29/2418
摘要： An internal defect inspection method where an ultrasonic wave is emitted from an ultrasonic wave transmitter toward a sample, the ultrasonic wave reflected by the sample is detected by an imaging type common-path interferometer as an interference signal, an ultrasonic wave signal is obtained from the interference signal, and any defect within the sample is detected from the ultrasonic wave signal. An internal defect inspection apparatus including an ultrasonic wave transmitter, an imaging type common-path interferometer and an ultrasonic wave signal detecting device is also provided.
摘要翻译：从超声波发射器向样品发射超声波的内部缺陷检查方法，由成像型共通干涉仪作为干扰信号检测由样品反射的超声波，从超声波信号获得超声波信号干扰信号，并从超声波信号中检测出样本内的任何缺陷。还提供了包括超声波发射器，成像型共轨干涉仪和超声波信号检测装置的内部缺陷检查装置。

3. 发明申请

US20130003038A1 Distance Measuring Device and Distance Measuring Method 有权
标题翻译：距离测量装置和距离测量方法
公开(公告)号：US20130003038A1
公开(公告)日：2013-01-03
申请号：US13518727
申请日：2011-01-28
申请人： Takehiro Tachizaki , Masahiro Watanabe , Tatsuo Hariyama , Yasuhiro Yoshitake , Tetsuya Matsui , Hirokazu Matsumoto , Kiyoshi Takamasu
发明人： Takehiro Tachizaki , Masahiro Watanabe , Tatsuo Hariyama , Yasuhiro Yoshitake , Tetsuya Matsui , Hirokazu Matsumoto , Kiyoshi Takamasu
IPC分类号： G01C3/08
CPC分类号： G01S17/36 , G01B9/02003 , G01B9/02007 , G01B9/02008 , G01B9/0207 , G01S7/4815 , G01S7/4911 , G01S17/42
摘要： Disclosed is a distance measuring device using an optical comb. In order for the absolute distance to an object to be measured which has a surface with low reflection ratio or a scattering surface and is approximately 10 m apart, to be easily measured with accuracy of 0.1 mm or more using an optical and contactless method, the distance measuring device which measures the distance to the object to be measured is configured such that the distance to the object to be measured is measured by comparing the phase of the beat signal between a light source and a plurality of CW lasers which are reflected or scattered by the object with the phase of the beat signal between the light source and a plurality of CW lasers prior to being irradiated onto the object.
摘要翻译：公开了使用光梳的距离测量装置。为了使具有低反射率或散射面的表面的测量对象的绝对距离相差10微米，使用光学和非接触方法可以容易地测量精度为0.1mm以上，测量到被测量物体的距离的距离测量装置被配置为通过比较反射或散射的光源和多个CW激光器之间的拍频信号的相位来测量到被测量物体的距离在被照射到物体上之前，通过光源和多个CW激光器之间的拍频信号的相位的对象。

4. 发明授权

US08982332B2 Distance measuring device and distance measuring method 有权
标题翻译：距离测量装置和距离测量方法
公开(公告)号：US08982332B2
公开(公告)日：2015-03-17
申请号：US13518727
申请日：2011-01-28
申请人： Takehiro Tachizaki , Masahiro Watanabe , Tatsuo Hariyama , Yasuhiro Yoshitake , Tetsuya Matsui , Hirokazu Matsumoto , Kiyoshi Takamasu
发明人： Takehiro Tachizaki , Masahiro Watanabe , Tatsuo Hariyama , Yasuhiro Yoshitake , Tetsuya Matsui , Hirokazu Matsumoto , Kiyoshi Takamasu
IPC分类号： G01C3/08 , G01S17/36
CPC分类号： G01S17/36 , G01B9/02003 , G01B9/02007 , G01B9/02008 , G01B9/0207 , G01S7/4815 , G01S7/4911 , G01S17/42
摘要： Disclosed is a distance measuring device using an optical comb. In order for the absolute distance to an object to be measured which has a surface with low reflection ratio or a scattering surface and is approximately 10 m apart, to be easily measured with accuracy of 0.1 mm or more using an optical and contactless method, the distance measuring device which measures the distance to the object to be measured is configured such that the distance to the object to be measured is measured by comparing the phase of the beat signal between a light source and a plurality of CW lasers which are reflected or scattered by the object with the phase of the beat signal between the light source and a plurality of CW lasers prior to being irradiated onto the object.
摘要翻译：公开了使用光梳的距离测量装置。为了使具有低反射率或散射面的表面的测量对象的绝对距离相差10微米，使用光学和非接触方法可以容易地测量精度为0.1mm以上，测量到被测量物体的距离的距离测量装置被配置为通过比较反射或散射的光源和多个CW激光器之间的拍频信号的相位来测量到被测量物体的距离在被照射到物体上之前，通过光源和多个CW激光器之间的拍频信号的相位的对象。

5. 发明授权

US08621659B2 Cantilever for magnetic force microscope and method of manufacturing the same 失效
标题翻译：悬臂式磁力显微镜及其制造方法
公开(公告)号：US08621659B2
公开(公告)日：2013-12-31
申请号：US13462845
申请日：2012-05-03
申请人： Kaifeng Zhang , Takenori Hirose , Masahiro Watanabe , Tetsuya Matsui , Tsuneo Nakagomi , Teruaki Tokutomi
发明人： Kaifeng Zhang , Takenori Hirose , Masahiro Watanabe , Tetsuya Matsui , Tsuneo Nakagomi , Teruaki Tokutomi
IPC分类号： G01Q60/36 , G01Q60/42 , G01Q60/54 , G01Q70/16
CPC分类号： G01Q60/36 , G01Q60/42 , G01Q60/54 , G01Q60/56 , G01Q70/12 , G01Q70/14 , G01Q70/16
摘要： In a method of manufacturing this cantilever for the magnetic force microscope, a magnetic film is formed on a probe at a tip of the cantilever for the magnetic force microscope. When a non-magnetic rigid protective film is formed around the probe, the film is formed from the front of the probe of the cantilever for the magnetic force microscope at an angle (15° to 45°) and from the back of the probe of the cantilever for the magnetic force microscope in two directions each at an angle in a range of (15° to 30°).
摘要翻译：在用于磁力显微镜的这种悬臂的制造方法中，在用于磁力显微镜的悬臂的尖端处的探针上形成磁性膜。当在探针周围形成非磁性刚性保护膜时，该膜从磁力显微镜的悬臂的探针的前部以15°至45°的角度和从探头背面形成用于磁力显微镜的悬臂在两个方向上各自以（15°至30°）的范围内的角度。

6. 发明申请

US20120291161A1 CANTILEVER FOR MAGNETIC FORCE MICROSCOPE AND METHOD OF MANUFACTURING THE SAME 失效
标题翻译：用于磁力显微镜的电容器及其制造方法
公开(公告)号：US20120291161A1
公开(公告)日：2012-11-15
申请号：US13462845
申请日：2012-05-03
申请人： Kaifeng ZHANG , Takenori Hirose , Masahiro Watanabe , Tetsuya Matsui , Tsuneo Nakagomi , Teruaki Tokutomi
发明人： Kaifeng ZHANG , Takenori Hirose , Masahiro Watanabe , Tetsuya Matsui , Tsuneo Nakagomi , Teruaki Tokutomi
IPC分类号： G01Q70/08 , G01Q70/16
CPC分类号： G01Q60/36 , G01Q60/42 , G01Q60/54 , G01Q60/56 , G01Q70/12 , G01Q70/14 , G01Q70/16
摘要： In a method of manufacturing this cantilever for the magnetic force microscope, a magnetic film is formed on a probe at a tip of the cantilever for the magnetic force microscope. When a non-magnetic rigid protective film is formed around the probe, the film is formed from the front of the probe of the cantilever for the magnetic force microscope at an angle (15° to 45°) and from the back of the probe of the cantilever for the magnetic force microscope in two directions each at an angle in a range of (15° to 30°).
摘要翻译：在用于磁力显微镜的这种悬臂的制造方法中，在用于磁力显微镜的悬臂的尖端处的探针上形成磁性膜。当在探针周围形成非磁性刚性保护膜时，该膜从磁力显微镜的悬臂的探针的前部以15°至45°的角度和从探头背面形成用于磁力显微镜的悬臂在两个方向上各自以（15°至30°）的范围内的角度。

7. 发明授权

US07772840B2 Eddy current testing method 有权
标题翻译：涡流检测方法
公开(公告)号：US07772840B2
公开(公告)日：2010-08-10
申请号：US12634156
申请日：2009-12-09
申请人： Yutaka Suzuki , Masahiro Koike , Tetsuya Matsui , Kojirou Kodaira , Katsumi Isaka , Mitsuru Odakura , Kenji Tayama , Kazuhiro Suzuki , Kenji Kumasaka , Yuuji Adachi
发明人： Yutaka Suzuki , Masahiro Koike , Tetsuya Matsui , Kojirou Kodaira , Katsumi Isaka , Mitsuru Odakura , Kenji Tayama , Kazuhiro Suzuki , Kenji Kumasaka , Yuuji Adachi
IPC分类号： G01N27/87 , G01N27/90 , G01R33/00
CPC分类号： G01N27/902
摘要： The eddy current testing apparatus includes a probe having an eddy current testing sensor including a pair of eddy current testing coils. The apparatus also includes an eddy current testing flaw detector inputting detection signals from the eddy current testing sensor. The diameter of a magnetic core used in each of the pair of eddy current testing coils is within the range of 0.1 mm to 0.5 mm.
摘要翻译：涡流检测装置包括具有包括一对涡流检测线圈的涡流检测传感器的探头。该设备还包括涡流测试探伤仪输入来自涡流测试传感器的检测信号。在一对涡流测试线圈中使用的磁芯的直径在0.1mm至0.5mm的范围内。

8. 发明申请

US20080123079A1 RESIDUAL STRESS MEASURING METHOD AND SYSTEM 有权
标题翻译：残余应力测量方法和系统
公开(公告)号：US20080123079A1
公开(公告)日：2008-05-29
申请号：US11935673
申请日：2007-11-06
申请人： Shohei NUMATA , Atsushi Baba , Tetsuya Matsui
发明人： Shohei NUMATA , Atsushi Baba , Tetsuya Matsui
IPC分类号： G01L1/24
CPC分类号： G01L5/0047 , G01L1/241
摘要： A residual stress measuring method capable of measuring residual stress of the surface of an object to be inspected rapidly in a non-destructive non-contact manner, as well as a residual stress measuring system having such characteristics and being high in portability, are provided. The residual stress measuring system comprises a heating laser for heating an inspection area of an object to be inspected, a laser interferometer for irradiating the inspection area interferometric with laser light and measuring a deformation quantity within an elastic deformation range upon stress relief by heating in accordance with a laser interferometric method, and a data processor for measuring residual stress from the deformation quantity within the elastic deformation range upon stress relief of the object to be inspected.
摘要翻译：提供了能够以非破坏性的非接触方式快速地测量待检查物体的表面的残余应力的残余应力测量方法，以及具有这种特性并且携带性高的残余应力测量系统。残余应力测量系统包括用于加热被检查物体的检查区域的加热激光器，用于用激光照射干涉检查区域的激光干涉仪，并且根据按照加热的应力消除来测量弹性变形范围内的变形量采用激光干涉测量方法，以及数据处理器，用于根据待检测物体的应力释放来测量弹性变形范围内的变形量的残余应力。

9. 发明申请

US20080015732A1 Chemical substance total management system, storage medium storing chemical substance management program and chemical substance total management method 有权
公开(公告)号：US20080015732A1
公开(公告)日：2008-01-17
申请号：US11898742
申请日：2007-09-14
申请人： Yoshiaki Ichikawa , Takako Oono , Akira Sekine , Tetsuya Matsui , Kiyomi Funabashi
发明人： Yoshiaki Ichikawa , Takako Oono , Akira Sekine , Tetsuya Matsui , Kiyomi Funabashi
IPC分类号： G06F7/00
CPC分类号： G06Q10/06 , G05B15/02 , G06Q10/00 , G06Q10/087
摘要： A chemical substance total management system aids for reduction of release and transferring amount of managing substances in business entities. The system retrieves releasing and transferring amount record relating to predetermined managing substance on the basis of total tabulation link information with correlation between the tabulation result record managing releasing and transferring amount of managing substance per releasing and transferring destination and releasing and transferring amount record to be a source generating tabulation result record.

10. 发明授权

US06774638B2 Charged particle measuring device and measuring method thereof 有权
标题翻译：带电粒子测量装置及其测量方法
公开(公告)号：US06774638B2
公开(公告)日：2004-08-10
申请号：US10382929
申请日：2003-03-07
申请人： Nobuyoshi Kogawa , Hiroshi Kitaguchi , Tetsuya Matsui , Akihisa Kaihara , Junichi Arita
发明人： Nobuyoshi Kogawa , Hiroshi Kitaguchi , Tetsuya Matsui , Akihisa Kaihara , Junichi Arita
IPC分类号： G01N2762
CPC分类号： G01T1/24
摘要： A highly sensitive charged particle measuring device capable of measuring low-level alpha rays comprises in a measurement chamber 7 provided with a sealable door 15, a test sample 2 and a semiconductor detector 1, a radiation measuring circuit 30 including a preamplifier 30c connected to the semiconductor detector 1, a linear amplifier 30d, and a pulse height analyzer 30e, a charged particle emission amount arithmetic unit 40 for performing the quantitative analysis of charged particles from its measurement, a display unit for displaying its analysis result, and further has an evacuation pipe line and a pure gas supply pipe line for performing supply and replacement of the pure gas in the measuring chamber 7.
摘要翻译：能够测量低水平α射线的高灵敏度带电粒子测量装置包括设置有可密封门15的测量室7，测试样品2和半导体检测器1，辐射测量电路30，包括连接到半导体检测器1，线性放大器30d和脉冲高度分析器30e，用于从其测量执行带电粒子的定量分析的带电粒子发射量运算单元40，用于显示其分析结果的显示单元，并且进一步具有撤离管线和纯气体供给管线，用于在测量室7中进行纯气体的供给和更换。

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