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31. 发明申请

WO2011116792A1 OPTICAL SYSTEM, EXPOSURE APPARATUS, AND WAVERFRONT CORRECTION METHOD 审中-公开
标题翻译：光学系统，曝光装置和水平校正方法
公开(公告)号：WO2011116792A1
公开(公告)日：2011-09-29
申请号：PCT/EP2010/001900
申请日：2010-03-26
申请人： CARL ZEISS SMT GMBH , EXLER, Matthias , LÖRING, Ulrich , GRUNER, Toralf , WALTER, Holger
发明人： EXLER, Matthias , LÖRING, Ulrich , GRUNER, Toralf , WALTER, Holger
IPC分类号： G03F7/20
CPC分类号： G03F7/70891 , G03F7/70266 , G03F7/70341
摘要： An optical system (20) of a microlithographic projection exposure apparatus includes a wavefront correction device (26) which has a plurality of fluid outlet apertures (44). The apertures are arranged such that fluid flows (48, 50) emerging from the outlet apertures (44) enter a space through which projection light propagates during operation of the apparatus (10). A temperature controller (60) sets the temperature of the fluid flows (48, 50) individually for each fluid flow. The temperature distribution is determined such that optical path length differences caused by the temperature distribution correct wavefront deformations.
摘要翻译：微光刻投影曝光装置的光学系统（20）包括具有多个流体出口孔（44）的波前校正装置（26）。这些孔布置成使得从出口孔44出来的流体流动（48,50）进入投影光在装置（10）的操作期间传播的空间。温度控制器（60）针对每个流体流分别设定流体流（48,50）的温度。确定温度分布，使得由温度分布导致的光程长度差校正波前变形。

32. 发明申请

WO2003077011A1 OPTICAL SYSTEM WITH BIREFRINGENT OPTICAL ELEMENTS 审中-公开
标题翻译：具有双重光学元件的光学系统
公开(公告)号：WO2003077011A1
公开(公告)日：2003-09-18
申请号：PCT/EP2002/012446
申请日：2002-11-07
申请人： CARL ZEISS SMT AG , FIOLKA, Damian , DITTMAN, Olaf , TOTZECK, Michael , DIECKMANN, Nils , KÖHLER, Jess , GRUNER, Toralf , KRÄHMER, Daniel
发明人： FIOLKA, Damian , DITTMAN, Olaf , TOTZECK, Michael , DIECKMANN, Nils , KÖHLER, Jess , GRUNER, Toralf , KRÄHMER, Daniel
IPC分类号： G02B27/28
CPC分类号： G02B17/0892 , G02B17/08 , G02B27/286 , G02B27/288 , G03F7/70075 , G03F7/70191 , G03F7/70241 , G03F7/70566 , G03F7/70966
摘要： Optical system (1) : with a first optical subsystem (3) comprising at least a first birefringent optical element (7), with a second optical subsystem (5) comprising at least a second birefringent optical element (9), wherein between the first optical subsystem and the second optical subsystem an optical retarding system (13) with at least a first optical retarding element (15) is arranged, which introduces a ratardation of one-half of a wavelength between two mutually orthogonal states of polarization.
摘要翻译：光学系统（1）：具有包括至少第一双折射光学元件（7）的第一光学子系统（3），其中第二光学子系统（5）包括至少第二双折射光学元件（9），其中在第一光学子系统和第二光学子系统，布置有至少具有第一光学延迟元件（15）的光学延迟系统（13），其引入在两个相互正交的极化状态之间的波长的一半的估计。

33. 发明申请

WO2008119794A1 OPTICAL SYSTEM, IN PARTICULAR ILLUMINATION DEVICE OR PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
标题翻译：光学系统，特别是照明设备或投影微波投影曝光装置的目标
公开(公告)号：WO2008119794A1
公开(公告)日：2008-10-09
申请号：PCT/EP2008/053847
申请日：2008-03-31
申请人： CARL ZEISS SMT AG , TOTZECK, Michael , GRUNER, Toralf , FIOLKA, Damian
发明人： TOTZECK, Michael , GRUNER, Toralf , FIOLKA, Damian
IPC分类号： G03F7/20
CPC分类号： G03F7/70566
摘要： The invention relates to an optical system, in particular an illumination device or a projection objective of a microlithographic projection exposure apparatus, comprising a polarization compensator (100, 200, 300, 400, 800, 900), which has at least one polarization-modifying partial element (110-140, 210-240, 310-340, 410-440, 810-840, 910-940), and a manipulator (150, 250, 722, 851-854, 951a-954a, 951b-954b), by means of which the position of the at least one partial element can be altered, wherein, in the optical system, at least one operating mode (501-504) can be set in which the intensity, over a region which belongs to a plane perpendicular to the optical axis (OA) and which can be illuminated with light from said light source, does not exceed 20% of the maximum intensity in said plane, and wherein the manipulator (150, 250, 722, 851-854, 951a-954a, 951b-954b) is arranged in said region.
摘要翻译：本发明涉及光学系统，特别是微光刻投影曝光装置的照明装置或投影物镜，该光学装置或投影物镜包括极化补偿器（100,200,300,400,800,900），其具有至少一个偏振修正部分元件（110-140,210-240,310-340,410-440,810-840,910-940）和操纵器（150,250,722,851-854,951a-954a，951b-954b），借助于此可以改变至少一个部分元件的位置，其中在光学系统中，可以设置至少一个操作模式（501-504），其中强度在属于垂直于光轴（OA）的并且可以用来自所述光源的光照射的平面不超过所述平面中最大强度的20％，并且其中所述操纵器（150,250,722,851-854,951a -954a，951b-954b）布置在所述区域中。

34. 发明申请

WO2003009021A1 VERZÖGERUNGSELEMENT AUS KUBISCHEM KRISTALL UND OPTISCHE SYSTEME DAMIT 审中-公开
标题翻译：延迟元件立方晶体和光学系统THAT
公开(公告)号：WO2003009021A1
公开(公告)日：2003-01-30
申请号：PCT/DE2002/002392
申请日：2002-06-25
申请人： CARL ZEISS SEMICONDUCTOR MANUFACTURING TECHNOLOGIES AG , HARTMAIER, Jürgen , FIOLKA, Damian , ZENZINGER, Markus , MECKING, Birgit , DITTMANN, Olaf , GRUNER, Toralf , KAMENOV, Vladimir , BRUNOTTE, Martin
发明人： HARTMAIER, Jürgen , FIOLKA, Damian , ZENZINGER, Markus , MECKING, Birgit , DITTMANN, Olaf , GRUNER, Toralf , KAMENOV, Vladimir , BRUNOTTE, Martin
IPC分类号： G02B5/30
CPC分类号： G03F7/70225 , G02B1/02 , G02B5/3091 , G03F7/70308 , G03F7/70966
摘要： Als Verzögerungselemente für das tiefe Ultraviolett werden Zentimeter dicke Platten oder Linsen aus Kalziumfluorid oder Bariumfluorid mit Strahlausbreitung in Richtung der -Kristallrichtung oder einer dazu äquivalenten Hauptachse vorgeschlagen, die spannungslos eingebaut werden. Eignung besonders für die Mikrolithographie bei 157 nm.
摘要翻译：由于延迟元件为深紫外线厘米提出在<110>晶与光束传播方向由氟化钙或氟化钡或与其等同的长轴厚的片材或透镜，其被内置通电。适宜特别是在157nm处微光刻。

35. 发明申请

WO2022023313A1 A PROJECTION OBJECTIVE INCLUDING AN OPTICAL DEVICE 审中-公开
公开(公告)号：WO2022023313A1
公开(公告)日：2022-02-03
申请号：PCT/EP2021/070949
申请日：2021-07-27
申请人： CARL ZEISS SMT GMBH
发明人： HILD, Kerstin , GRUNER, Toralf , LIPPERT, Johannes , STIEPAN, Hans Michael , POLLAK, Thilo , CAVACO, Jeffrey
IPC分类号： G03F7/20 , G02B26/00 , H01L41/08
摘要： The invention relates to a projection exposure apparatus (400, 100) comprising a projection objective (408, 107, 200), the projection objective (408, 107, 200) comprising an optical device (1), the optical device (1) comprising an optical element (2) having an optically effective surface (2a) and at least one electrostrictive actuator (3), which is deformable by a control voltage being applied, wherein the electrostrictive actuator (3) is functionally connected to the optical element (2) in order to influence the surface shape of the optically effective surface (2a). A control device (4) is provided in order to supply the electrostrictive actuator (3) with the control voltage, wherein a measuring device (5) is provided, which is configured, at least at times while the electrostrictive actuator (3) influences the optically effective surface (2a) of the optical element (2), to measure directly and/or to determine indirectly the temperature and/or a temperature change of the electrostrictive actuator (3) and/or the surroundings thereof in order to take account of a temperature-dependent influence during driving of the electrostrictive actuator (3) by the control device (4).

36. 发明申请

WO2021001311A1 STOP, OPTICAL SYSTEM AND LITHOGRAPHY APPARATUS 审中-公开
公开(公告)号：WO2021001311A1
公开(公告)日：2021-01-07
申请号：PCT/EP2020/068239
申请日：2020-06-29
申请人： CARL ZEISS SMT GMBH
发明人： MODESTE, Benjahman Julius , GRUNER, Toralf , GOLDE, Daniel , LOERING, Ulrich , ZWEERING, Ralf , XALTER, Stefan
IPC分类号： G03F7/20 , G02B5/00 , G02B17/08
摘要： A stop (300), in particular numerical aperture stop, obscuration stop or false-light stop, for a lithography apparatus (100A, 100B), comprising a light-transmissive aperture (302) and at least one stop element (306, 308), in which or at which the 5 aperture (302) is provided, wherein the stop element (306, 308) is opaque and fluid- permeable outside the aperture (302).

37. 发明申请

WO2017174366A1 ATTENUATION FILTER FOR PROJECTION LENS, PROJECTION LENS HAVING ATTENUATION FILTER FOR PROJECTION EXPOSURE APPARATUS, AND PROJECTION EXPOSURE APPARATUS HAVING PROJECTION LENS 审中-公开
标题翻译：用于投影透镜的衰减滤光器，具有用于投影曝光装置的衰减滤光器的投影透镜以及具有投射透镜的投影曝光装置
公开(公告)号：WO2017174366A1
公开(公告)日：2017-10-12
申请号：PCT/EP2017/056909
申请日：2017-03-23
申请人： CARL ZEISS SMT GMBH
发明人： GRUNER, Toralf , SCHÖMER, Ricarda
IPC分类号： G03F7/20 , G02B27/00
摘要： An attenuation filter (AF, AF', AF1, AF2, AF3) is configured for the defined attenuation of the intensity of ultraviolet radiation (LR1I, LR2I) with a specified working wavelength from a wave-length range of 150 nm to 370 nm according to a specifiable local distribution in a projection lens (PO, PO') of a microlithographic projection exposure apparatus (WSC). The attenuation filter has a substrate (SU, SU') and an absorption layer (AL). The substrate is sufficiently transparent at the working wavelength. The absorption layer is arranged on the substrate and absorbs incident ultraviolet radiation of the working wavelength according to the specifiable local distribution at different locations (Z1, Z2) of a used area (UA) to varying degrees. The attenuation filter is designed for reducing or avoiding a thermally induced wavefront variation error in the ultraviolet radiation (LR1O, LR2O) which has passed through the attenuation filter owing to locally varying heating of the substrate, which is caused by the absorption of the ultraviolet radiation that varies locally over the substrate. A thickness (TS) of the substrate (SU) is less than 100 µm.
摘要翻译：衰减滤波器（AF，AF'，AF1，AF2，AF3）被配置用于从波长中规定的工作波长的紫外线辐射强度（LR1I，LR2I）根据微光刻投影曝光设备（WSC）的投影透镜（PO，PO'）中的可指定的局部分布，在150nm至370nm的范围内。衰减滤波器具有衬底（SU，SU'）和吸收层（AL）。衬底在工作波长处足够透明。吸收层设置在基板上，并根据使用区域（UA）的不同位置（Z1，Z2）处的可指定的局部分布不同程度地吸收工作波长的入射紫外线辐射。衰减滤波器被设计用于减少或避免由于紫外辐射的吸收而引起的衬底的局部变化的加热，已经通过衰减滤波器的紫外辐射（LR1O，LR2O）中的热引起的波前变化误差在衬底上局部变化。衬底（SU）的厚度（TS）小于100微米

38. 发明申请

WO2015007298A1 MICROLITHOGRAPHIC APPARATUS AND METHOD OF VARYING A LIGHT IRRADIANCE DISTRIBUTION 审中-公开
标题翻译：微光学设备和改变光线辐射分布的方法
公开(公告)号：WO2015007298A1
公开(公告)日：2015-01-22
申请号：PCT/EP2013/002114
申请日：2013-07-17
申请人： CARL ZEISS SMT GMBH
发明人： KAMENOV, Vladimir , GRUNER, Toralf
IPC分类号： G03F7/20 , G02B5/20
CPC分类号： G03F7/70308 , G02B5/1838 , G02B5/208 , G03F7/70091 , G03F7/70258 , G03F7/70316
摘要： A microlithographic apparatus comprises a light source producing projection light having a center wavelength λ and a projection objective having an optical axis and a transmission filter system. The latter comprises a first and a second diffractive optical element (44, 46). A drive (48) is configured to change the relative position between the first and the second diffractive optical element between an active position, in which the combination of the two diffractive optical elements diffracts more projection light on a light absorbing element than in a neutral position. The axial distance Δz between the two diffractive optical elements (44, 46) fulfils the condition 0 ≤Δz ≤ 3λ.
摘要翻译：微光刻设备包括产生具有中心波长λ的投影光的光源和具有光轴的投影物镜和透射滤光镜系统。后者包括第一和第二衍射光学元件（44,46）。驱动器（48）构造成在第一和第二衍射光学元件之间的相对位置之间改变，其中两个衍射光学元件的组合将光吸收元件上的更多的投影光衍射到在中性位置。两个衍射光学元件（44,46）之间的轴向距离＆Dgr; z满足条件0≤＆Dgr;z≤3λ。

39. 发明申请

WO2013152951A1 ILLUMINATION INTENSITY CORRECTION DEVICE FOR PREDEFINING AN ILLUMINATION INTENSITY OVER AN ILLUMINATION FIELD OF A LITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
标题翻译：用于在照明下预测照明强度的照明强度校正装置光刻投影曝光装置
公开(公告)号：WO2013152951A1
公开(公告)日：2013-10-17
申请号：PCT/EP2013/056456
申请日：2013-03-27
申请人： CARL ZEISS SMT GMBH
发明人： ENDRES, Martin , GRUNER, Toralf
IPC分类号： G03F7/20
CPC分类号： G03F7/70191 , G03F7/70066 , G03F7/70083 , G03F7/70091 , G03F7/70141 , G03F7/7015
摘要： An illumination intensity correction device (24) serves for predefining an illumination intensity over an illumination field (18) of a lithographic projection exposure apparatus. The correction device (24) has a plurality of bar-shaped individual stops (27) arranged alongside one another and having bar axes (28) arranged parallel to one another, which are arranged in a manner lined up alongside one another transversely with respect to the bar axes. The individual stops (27) are displaceable into a predefined intensity correction displacement position at least along their respective bar axis (28) with the aid of a displacement drive (29) individually for the purpose of predefining an intensity correction of an illumination of the illumination field (18). At least some of the individual stops (27 FB ) are embodied as field delimiting individual stops such that they are displaceable along their bar axis (28) between a completely extended extension position and a completely retracted retraction position by more than a field extent (18 y ) of the illumination field (18) which the latter has along the bar axis (28). This results in an illumination intensity correction device having an improved correction accuracy in comparison with the prior art.
摘要翻译：照明强度校正装置（24）用于预定光刻投影曝光装置的照明场（18）上的照明强度。校正装置（24）具有彼此并排设置的多个条形单独的止挡件（27），并且具有彼此平行布置的杆轴线（28），它们以相对于杆轴。至少借助于位移驱动器（29），各个停止件（27）可以至少沿其相应的杆轴线（28）移动到预定的强度校正位移位置中，以便预先定义照明的照明的强度校正字段（18）。各个止动件（27FB）中的至少一些被实施为场限定各个止挡件，使得它们可以沿着它们的杆轴线（28）在完全延伸的延伸位置和完全缩回的缩回位置之间移位多于一个场范围（18y）的照明场（18），后者沿着杆轴线（28）。这导致与现有技术相比具有改进的校正精度的照明强度校正装置。

40. 发明申请

WO2013113480A1 PROJECTION EXPOSURE APPARATUS COMPRISING A MEASURING SYSTEM FOR MEASURING AN OPTICAL ELEMENT 审中-公开
标题翻译：包含用于测量光学元件的测量系统的投影曝光装置
公开(公告)号：WO2013113480A1
公开(公告)日：2013-08-08
申请号：PCT/EP2013/000200
申请日：2013-01-23
申请人： CARL ZEISS SMT GMBH
发明人： BLEIDISTEL, Sascha , HARTJES, Joachim , GRUNER, Toralf
IPC分类号： G02B27/00 , G01N21/41 , G03F7/20
CPC分类号： G03F7/706 , G01K11/00 , G01M11/0242 , G01M11/0271 , G03F7/70141 , G03F7/70258 , G03F7/7085 , G03F7/70891
摘要： A projection exposure apparatus (10) for microlithography comprises a measuring system (50) for measuring an optical element of the projection exposure apparatus. The measuring system (50) comprises: an irradiation device (54), which is configured to radiate measuring radiation (62) in different directions (64) onto the optical element (20), such that the measuring radiation (62) covers a respective optical path length (68) within the optical element (20) for the different directions (64) of incidence, a detection device (56), which is configured to measure, for the respective direction (64) of incidence, the corresponding optical path length covered by the measuring radiation (62) in the optical element (20), and an evaluation device, which is configured to determine a spatially resolved distribution of the refractive index in the optical element (20) by computed-tomographic back projection of the measured path lengths taking account of the respective direction of incidence.
摘要翻译：用于微光刻的投影曝光装置（10）包括用于测量投影曝光装置的光学元件的测量系统（50）。测量系统（50）包括：照射装置（54），其配置成将不同方向（64）上的测量辐射（62）辐射到光学元件（20）上，使得测量辐射（62）覆盖相应的用于不同方向（64）入射的光学元件（20）内的光路长度（68）;检测装置（56），被配置为针对相应的入射方向（64）测量相应的光路由所述光学元件（20）中的所述测量辐射（62）覆盖的长度以及评估装置，其被配置为通过所述光学元件（20）的计算机断层摄影反投影来确定所述光学元件（20）中的折射率的空间分辨分布测量的路径长度考虑到相应的入射方向。

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