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21. 发明授权

US5608773A Mask holding device, and an exposure apparatus and a device manufacturing method using the device 失效
标题翻译：掩模保持装置，以及使用该装置的曝光装置和装置制造方法
公开(公告)号：US5608773A
公开(公告)日：1997-03-04
申请号：US348837
申请日：1994-11-29
申请人： Nobusige Korenaga , Kouichi Hara , Shinichi Hara
发明人： Nobusige Korenaga , Kouichi Hara , Shinichi Hara
IPC分类号： G03F7/20 , G03B11/00
CPC分类号： G03F7/707
摘要： A mask for exposure is supported at three positions on a holding surface of a mask chuck of an X-ray exposure apparatus by means of kinematic mounting. Magnetic units, each comprising an electromagnet, and magnetic rings are provided around supporting points at the three,positions on the mask chuck and on the mask frame, respectively. It is thereby possible to generate a tensile force to magnetically attract the mask frame in the direction of the normal of the holding surface of the mask chuck, and to attract and hold the mask on the mask chuck. Thus, the mask can be chucked on the X-ray exposure apparatus in substantially the same state as that of a mechanical clamp on an electron beam (EB) scanning apparatus while the mask is manufactured, without using a mechanical clamping mechanism.
摘要翻译：用于曝光的掩模通过运动学安装在X射线曝光设备的掩模卡盘的保持表面上的三个位置处被支撑。分别在掩模卡盘和掩模框架上的三个位置处的支撑点周围设置各自包括电磁体和磁环的磁性单元。由此，可以产生拉伸力，以沿着掩模卡盘的保持面的法线方向磁吸引掩模框架，并且将掩模吸引并保持在掩模卡盘上。因此，在不使用机械夹持机构的情况下，可以在制造掩模的同时，以与电子束（EB）扫描装置上的机械夹具基本相同的状态将掩模夹持在X射线曝光装置上。

22. 发明授权

US5413167A Wafer cooling device 失效
标题翻译：晶圆冷却装置
公开(公告)号：US5413167A
公开(公告)日：1995-05-09
申请号：US235146
申请日：1994-04-28
申请人： Shinichi Hara , Ryuichi Ebinuma
发明人： Shinichi Hara , Ryuichi Ebinuma
IPC分类号： G03F7/20 , H01L21/00 , H01L21/027 , H01L21/30 , H01L21/683 , H01L23/34 , H01L23/427 , F28F5/00
CPC分类号： H01L21/67103 , F28D15/0241 , G03F7/707 , G03F7/70875 , H01L21/6838 , H01L23/34 , H01L23/427 , H01L2924/0002
摘要： A wafer cooling device includes a wafer chuck; a heat exchanger having an internal structure for circulation of cooling water therethrough; and a flexible heat pipe for providing heat communication between the wafer chuck and the heat exchanger.
摘要翻译：晶片冷却装置包括晶片卡盘; 具有用于使冷却水循环通过的内部结构的热交换器; 以及用于在晶片卡盘和热交换器之间提供热连通的柔性热管。

23. 发明授权

US4969168A Wafer supporting apparatus 失效
标题翻译：晶圆支撑装置
公开(公告)号：US4969168A
公开(公告)日：1990-11-06
申请号：US401654
申请日：1989-08-31
申请人： Eiji Sakamoto , Shinichi Hara , Isamu Shimoda , Shunichi Uzawa
发明人： Eiji Sakamoto , Shinichi Hara , Isamu Shimoda , Shunichi Uzawa
IPC分类号： G03F7/20 , H01L21/027 , H01L21/30 , H01L21/683
CPC分类号： G03F7/707 , G03F7/70866 , G03F7/70875 , H01L21/6833 , H01L21/6838
摘要： A wafer chuck usable with a semiconductor exposure apparatus wherein a mask and a semiconductor wafer are placed in a vacuum ambience or a pressure-reduced gas ambience, and wherein the wafer is exposed through the mask to radiation energy such as X-rays contained in a synchrotron radiation beam, by which the pattern of the mask is transferred onto the wafer. The wafer is first attracted on the wafer supporting surface of the chuck by vacuum attraction, and thereafter, the wafer is attracted by the electrostatic attraction force. Thereafter, the vacuum attraction is broken by supplying a gas. When the pattern of the mask is transferred onto the wafer, the wafer is retained on the wafer supporting surface by the electrostatic attraction force only. By this, the sheet-like member (wafer) supporting apparatus can correctly contact the wafer supporting surface to the wafer without being influenced by the undulation of the wafer. In addition, the heat produced in the wafer during exposure can be removed efficiently by temperature controlled water supplied to the wafer supporting apparatus.

24. 发明授权

US4791719A Method of manufacturing a thin-film magnetic head 失效
标题翻译：制造薄膜磁头的方法
公开(公告)号：US4791719A
公开(公告)日：1988-12-20
申请号：US1440
申请日：1987-01-08
申请人： Tetsuo Kobayashi , Yukihisa Tsukada , Shinji Narishige , Shinichi Hara
发明人： Tetsuo Kobayashi , Yukihisa Tsukada , Shinji Narishige , Shinichi Hara
IPC分类号： G11B5/31 , G11B5/127
CPC分类号： G11B5/3163 , Y10T29/49044 , Y10T29/49046 , Y10T29/49062
摘要： A first magnetic layer is formed upon a non-magnetic substrate, a gap layer is formed upon the first magnetic layer, a conductor coil covered with an insulation layer is formed upon the gap layer, a second magnetic layer is formed upon the gap layer and the insulation layer, a magnetic gap being formed between the first and second magnetic layers at a front portion facing a recording medium, and the second magnetic layer being connected to the first magnetic layer at a back portion. After forming a mask made of metal oxide upon the second magnetic layer, the second magnetic layer, the gap layer, and the first magnetic layer are formed into a predetermined shape respectively at the tip portion by dry etching. Thus, a high performance thin-film magnetic head having the same widths for the first and second magnetic layers is obtained.
摘要翻译：在非磁性基板上形成第一磁性层，在第一磁性层上形成间隙层，在间隙层上形成被绝缘层覆盖的导体线圈，在间隙层上形成第二磁性层，所述绝缘层在形成在所述第一和第二磁性层之间的面向记录介质的前部处形成磁隙，所述第二磁性层在后部连接到所述第一磁性层。在第二磁性层上形成由金属氧化物制成的掩模之后，通过干蚀刻将第二磁性层，间隙层和第一磁性层分别形成为尖端部分的预定形状。因此，获得了对于第一和第二磁性层具有相同宽度的高性能薄膜磁头。

25. 发明授权

US08931712B2 Fragrance device for vehicle and sealing component used therein 有权
标题翻译：用于其中的车辆和密封部件的香料装置
公开(公告)号：US08931712B2
公开(公告)日：2015-01-13
申请号：US13148258
申请日：2010-01-29
申请人： Hideki Nagano , Hisayoshi Yoshizaki , Toshio Tsubakida , Shinichi Hara , Yoshie Mizuno , Naoto Hayashi
发明人： Hideki Nagano , Hisayoshi Yoshizaki , Toshio Tsubakida , Shinichi Hara , Yoshie Mizuno , Naoto Hayashi
IPC分类号： A61L9/04 , A62C13/62 , A62C13/66 , A62C35/58 , B60H3/00 , A61L9/12
CPC分类号： B60H3/0007 , A61L9/12 , A61L9/122 , A61L9/125 , A61L2209/16
摘要： The present invention provides a fragrance device for a vehicle capable of supplying plural fragrant ingredients to the inside of the vehicle as being contained in air flow of a vehicle-use air-conditioning device with a simple structure. The fragrance device for a vehicle according to the present invention includes a main body 10 having a fragrance retention container 5, an inlet passage 6, an outlet passage 7, an inlet passage opening/closing door 8 and an outlet passage opening/closing door 9, an actuator 11 fixed to the main body 10, and a cam 14 which rotationally drives a rotary shaft 12 of the inlet passage opening/closing door and a rotary shaft 12 of the outlet passage opening/closing door.
摘要翻译：本发明提供了一种用于车辆的香味装置，其能够将具有简单结构的车用空调装置的空气流中所含有的多种芳香成分供给到车辆内部。根据本发明的用于车辆的香味装置包括具有香料保持容器5的主体10，入口通道6，出口通道7，入口通道打开/关闭门8和出口通道打开/关闭门9 ，固定在主体10上的致动器11和旋转地驱动入口通道打开/关闭门的旋转轴12的凸轮14和出口通道打开/关闭门的旋转轴12。

26. 发明授权

US08199330B2 Tracking-type laser interferometer 有权
标题翻译：跟踪式激光干涉仪
公开(公告)号：US08199330B2
公开(公告)日：2012-06-12
申请号：US12707255
申请日：2010-02-17
申请人： Shinichi Hara
发明人： Shinichi Hara
IPC分类号： G01B11/02 , G01C3/08
CPC分类号： G01S7/4811 , G01B11/002 , G01S17/66
摘要： A tracking-type laser interferometer in which a pattern emission control unit controls a changing mechanism such that light is emitted along a predetermined pattern when judged by a first judgment unit that at least one of received-light amounts at first and second light reception units is not greater than a first threshold value. A tracking control unit causes the changing mechanism to keep track of a retro reflector when judged by a second judgment unit that both of the received-light amounts at the first and second light reception units are greater than second threshold values during a time period in which the pattern emission control unit controls the changing mechanism for the emission of light along the pattern. The interferometer emits light along the pattern to search for the retro reflector upon losing sight thereof. Upon detection, the interferometer can keep track of the reflector again and resume measurement.
摘要翻译：一种跟踪型激光干涉仪，其中图案发射控制单元控制改变机构，使得当由第一判断单元判断时沿着预定图案发射光，第一和第二光接收单元的接收光量中的至少一个为不大于第一阈值。跟踪控制单元使第一和第二光接收单元的接收光量在第二判断单元判定时大于第二阈值时，使变化机构跟踪回光反射器，在此期间，图案发射控制单元控制沿着图案发光的改变机构。干涉仪沿着图案发光，以便在看不见时搜索复古反射器。检测后，干涉仪可以重新跟踪反射镜并恢复测量。

27. 发明授权

US07670754B2 Exposure apparatus having a processing chamber, a vacuum chamber and first and second load lock chambers 失效
标题翻译：具有处理室，真空室和第一和第二负载锁定室的曝光装置
公开(公告)号：US07670754B2
公开(公告)日：2010-03-02
申请号：US11001116
申请日：2004-12-02
申请人： Ryo Edo , Masami Yonekawa , Shinichi Hara
发明人： Ryo Edo , Masami Yonekawa , Shinichi Hara
IPC分类号： H01L21/00 , G03F7/00 , G03B27/42
CPC分类号： H01L21/67173 , G03F7/70741 , G03F7/7075 , G03F7/70808 , G03F7/70841 , G03F7/70916 , G03F7/70925 , H01L21/67028 , H01L21/67051 , H01L21/67225 , Y10S134/902 , Y10S414/14
摘要： An exposure apparatus for executing an exposure of a substrate to light via a mask. The apparatus includes a booth which stores the mask in an atmospheric pressure, a processing chamber in which the exposure is executed in a first vacuum pressure, a vacuum chamber, arranged between the booth and the processing chamber, stores the mask at a second vacuum pressure that is higher than the first vacuum pressure and is between 0.1 Pa and 100 Pa, a first load lock chamber, arranged between the booth and the vacuum chamber, through which the mask is transferred, in which the atmospheric pressure and the second vacuum pressure are replaceable, and a second load lock chamber arranged between the vacuum chamber and the processing chamber, through which the mask is transferred, in which the second vacuum pressure and the first vacuum pressure are replaceable.
摘要翻译：一种曝光装置，用于通过掩模执行基板的曝光。该装置包括将大气压下的面罩存放在展位，在第一真空压力下进行曝光的处理室，布置在展位和处理室之间的真空室，将面罩存储在第二真空压力其高于第一真空压力并且在0.1Pa和100Pa之间，第一负载锁定室，布置在所述展位和所述真空室之间，所述掩模通过所述真空室转移，其中所述大气压力和所述第二真空压力为以及布置在真空室和处理室之间的第二加载锁定室，通过该第二加载锁定腔传送掩模，其中第二真空压力和第一真空压力是可替换的。

28. 发明授权

US07325404B2 Exposure apparatus 有权
标题翻译：曝光装置
公开(公告)号：US07325404B2
公开(公告)日：2008-02-05
申请号：US10819796
申请日：2004-04-07
申请人： Shinichi Hara
发明人： Shinichi Hara
IPC分类号： F25B21/02 , F25D23/12
CPC分类号： H01L21/67248 , F25B21/02 , G03B27/42 , G03F7/70708 , G03F7/70875 , H01L21/67109 , H01L35/00
摘要： An exposure apparatus includes an optical system for guiding light to an object, a holding member for holding the object, a first refrigerator located near a holding side of the holding member without contacting the holding side, and a second refrigerator located near a backside of the holding member without contacting the backside.
摘要翻译：曝光装置包括用于将光引导到物体的光学系统，用于保持物体的保持构件，位于保持构件的保持侧附近而不与保持侧接触的第一冰箱，以及位于保持构件的背面附近的第二冰箱保持成员没有接触到背面。

29. 发明授权

US07319507B2 Apparatus and method for removing contaminant on original, method of manufacturing device, and original 失效
标题翻译：用于去除原始污染物的装置和方法，制造装置的方法和原件
公开(公告)号：US07319507B2
公开(公告)日：2008-01-15
申请号：US11250072
申请日：2005-10-12
申请人： Masami Yonekawa , Shinichi Hara , Ryo Edo
发明人： Masami Yonekawa , Shinichi Hara , Ryo Edo
IPC分类号： G03B27/42 , G03B27/52
CPC分类号： G03F7/70925
摘要： At least one exemplary embodiment is directed to an apparatus which includes an original stage, to hold an original, which moves in a scan direction, an illumination optical system configured to illuminate the original held by the original stage with exposure light, a substrate stage configured to hold a substrate and to move in a scan direction, a projection optical system configured to project a pattern of the original onto the substrate with the exposure light, and an irradiation unit configured to irradiate the original held by the original stage. Irradiation by the irradiation unit and movement of the original stage in the scan direction are carried out substantially in parallel with each other so as to remove a contaminant on the original.
摘要翻译：至少一个示例性实施例涉及一种装置，其包括原始台，用于保持沿扫描方向移动的原件，配置成用曝光灯照亮由原始台保持的原件的照明光学系统，衬底台配置保持基板并沿扫描方向移动;投影光学系统，被配置为利用曝光光将原稿的图案投影到基板上;以及照射单元，被配置为照射由原始台保持的原稿。通过照射单元的照射和原始台沿扫描方向的移动基本上彼此平行地进行，以便去除原件上的污染物。

30. 发明授权

US07212274B2 Cooling system, exposure apparatus having the same, and device manufacturing method 有权
标题翻译：冷却系统，具有该冷却系统的曝光装置和装置制造方法
公开(公告)号：US07212274B2
公开(公告)日：2007-05-01
申请号：US10953205
申请日：2004-09-29
申请人： Shinichi Hara , Hideo Yokota
发明人： Shinichi Hara , Hideo Yokota
IPC分类号： G03B27/52
CPC分类号： G03F7/70891 , G05D23/1919
摘要： Disclosed is cooling technology in one aspect of which is a cooling system for cooling an optical member including a material having a linear expansion coefficient that becomes equal to zero at a predetermined temperature, the cooling system including a temperature detecting unit for detecting a temperature of a detection-subject portion of the optical member, a cooling unit for cooling a cooling-subject portion of the optical member, and a control unit for controlling the cooling unit on the basis of the detection by the temperature detecting unit.
摘要翻译：公开了一种冷却技术，其一个方面是用于冷却包括在预定温度下变为等于零的线性膨胀系数的材料的光学构件的冷却系统，该冷却系统包括用于检测温度的温度的温度检测单元光学构件的检测对象部分，用于冷却光学构件的冷却对象部分的冷却单元，以及用于基于温度检测单元的检测来控制冷却单元的控制单元。

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