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1. 发明授权

US5608773A Mask holding device, and an exposure apparatus and a device manufacturing method using the device 失效
标题翻译：掩模保持装置，以及使用该装置的曝光装置和装置制造方法
公开(公告)号：US5608773A
公开(公告)日：1997-03-04
申请号：US348837
申请日：1994-11-29
申请人： Nobusige Korenaga , Kouichi Hara , Shinichi Hara
发明人： Nobusige Korenaga , Kouichi Hara , Shinichi Hara
IPC分类号： G03F7/20 , G03B11/00
CPC分类号： G03F7/707
摘要： A mask for exposure is supported at three positions on a holding surface of a mask chuck of an X-ray exposure apparatus by means of kinematic mounting. Magnetic units, each comprising an electromagnet, and magnetic rings are provided around supporting points at the three,positions on the mask chuck and on the mask frame, respectively. It is thereby possible to generate a tensile force to magnetically attract the mask frame in the direction of the normal of the holding surface of the mask chuck, and to attract and hold the mask on the mask chuck. Thus, the mask can be chucked on the X-ray exposure apparatus in substantially the same state as that of a mechanical clamp on an electron beam (EB) scanning apparatus while the mask is manufactured, without using a mechanical clamping mechanism.
摘要翻译：用于曝光的掩模通过运动学安装在X射线曝光设备的掩模卡盘的保持表面上的三个位置处被支撑。分别在掩模卡盘和掩模框架上的三个位置处的支撑点周围设置各自包括电磁体和磁环的磁性单元。由此，可以产生拉伸力，以沿着掩模卡盘的保持面的法线方向磁吸引掩模框架，并且将掩模吸引并保持在掩模卡盘上。因此，在不使用机械夹持机构的情况下，可以在制造掩模的同时，以与电子束（EB）扫描装置上的机械夹具基本相同的状态将掩模夹持在X射线曝光装置上。

2. 发明申请

US20070024861A1 LASER TRACKING INTERFEROMETER 有权
标题翻译：激光跟踪干涉仪
公开(公告)号：US20070024861A1
公开(公告)日：2007-02-01
申请号：US11458533
申请日：2006-07-19
申请人： Shinichirou Yanaka , Makoto Abe , Shinichi Hara , Naoyuki Taketomi
发明人： Shinichirou Yanaka , Makoto Abe , Shinichi Hara , Naoyuki Taketomi
IPC分类号： G01B11/02
CPC分类号： G01S17/36 , G01B11/03 , G01S7/4812 , G01S7/497 , G01S17/42 , G01S17/66
摘要： A laser tracking interferometer; a carriage rotatable about a center of the reference sphere; a laser interferometer that provides a retroreflector displacement signal, and a displacement gage that provides a displacement signal. A data processing apparatus computes displacement of the retroreflector with respect to the reference sphere. A position sensitive detector provides a position signal corresponding to the amount of deviation of a laser beam when the laser beam is reflected off the retroreflector back into the laser interferometer and deviated in a direction orthogonal to its optical axis. A controller controls rotation of the carriage based on the position signal from the position detector so that the amount of deviation becomes zero.
摘要翻译：激光跟踪干涉仪; 可围绕参考球的中心旋转的托架; 提供后向反射器位移信号的激光干涉仪和提供位移信号的位移计。数据处理装置计算回射器相对于参考球的位移。当激光束从后向反射器反射回激光干涉仪并偏离与其光轴正交的方向时，位置敏感检测器提供对应于激光束偏离量的位置信号。控制器基于来自位置检测器的位置信号控制滑架的旋转，使得偏差量变为零。

3. 发明授权

US07158209B2 Holding mechanism in exposure apparatus, and device manufacturing method 有权
标题翻译：曝光装置中的保持机构和装置制造方法
公开(公告)号：US07158209B2
公开(公告)日：2007-01-02
申请号：US11360496
申请日：2006-02-24
申请人： Shinichi Hara
发明人： Shinichi Hara
IPC分类号： G03B27/52 , G03B27/42 , G02B7/02
CPC分类号： G03F7/70825 , G03B27/42 , G03F7/70891
摘要： Disclosed is a holding system and an exposure apparatus having the same, wherein deformation of an optical member resulting from its thermal expansion and causing degradation of imaging performance can be reduced to assure desired imaging performance. The holding system for holding an optical member includes a barrel for at least partially surrounding the optical member and/or a heat source, an average of radiation coefficient of an inside surface of the barrel is not less than 0.8.
摘要翻译：公开了一种保持系统和具有该保持系统的曝光设备，其中可以减少由其热膨胀引起的光学部件的变形并导致成像性能的降低，以确保期望的成像性能。用于保持光学构件的保持系统包括用于至少部分地围绕光学构件和/或热源的筒，筒的内表面的辐射系数的平均值不小于0.8。

4. 发明授权

US07072438B2 Reflection type mask 失效
标题翻译：反射型面具
公开(公告)号：US07072438B2
公开(公告)日：2006-07-04
申请号：US10736693
申请日：2003-12-17
申请人： Keiko Chiba , Masami Tsukamoto , Yutaka Watanabe , Shinichi Hara , Hiroshi Maehara
发明人： Keiko Chiba , Masami Tsukamoto , Yutaka Watanabe , Shinichi Hara , Hiroshi Maehara
IPC分类号： G21K3/00
CPC分类号： G03F1/62 , B82Y10/00 , B82Y40/00 , G03F1/24
摘要： A reflection type mask includes a substrate on which a multi-layered film for reflecting X-rays is provided, a mask pattern which is formed on the multi-layered film for absorbing the X-rays, and a cover for protecting the mask pattern. The cover is detachably attached to the substrate.
摘要翻译：反射型掩模包括其上设置有用于反射X射线的多层膜的基板，形成在用于吸收X射线的多层膜上的掩模图案，以及用于保护掩模图案的盖。盖可拆卸地附接到基板。

5. 发明申请

US20060082743A1 Apparatus and method for removing contaminant on original, method of manufacturing device, and original 失效
标题翻译：用于去除原始污染物的装置和方法，制造装置的方法和原件
公开(公告)号：US20060082743A1
公开(公告)日：2006-04-20
申请号：US11250072
申请日：2005-10-12
申请人： Masami Yonekawa , Shinichi Hara , Ryo Edo
发明人： Masami Yonekawa , Shinichi Hara , Ryo Edo
IPC分类号： G03B27/52
CPC分类号： G03F7/70925
摘要： At least one exemplary embodiment is directed to an apparatus which includes an original stage, to hold an original, which moves in a scan direction, an illumination optical system configured to illuminate the original held by the original stage with exposure light, a substrate stage configured to hold a substrate and to move in a scan direction, a projection optical system configured to project a pattern of the original onto the substrate with the exposure light, and an irradiation unit configured to irradiate the original held by the original stage. Irradiation by the irradiation unit and movement of the original stage in the scan direction are carried out substantially in parallel with each other so as to remove a contaminant on the original.
摘要翻译：至少一个示例性实施例涉及一种装置，其包括原始台，用于保持沿扫描方向移动的原件，配置成用曝光灯照亮由原始台保持的原件的照明光学系统，衬底台配置保持基板并沿扫描方向移动;投影光学系统，被配置为利用曝光光将原稿的图案投影到基板上;以及照射单元，被配置为照射由原始台保持的原稿。通过照射单元的照射和原始台沿扫描方向的移动基本上彼此平行地进行，以便去除原件上的污染物。

6. 发明授权

US06843471B2 Jetting apparatus for mixed flow of gas and liquid 有权
标题翻译：用于混合气体和液体的喷射装置
公开(公告)号：US06843471B2
公开(公告)日：2005-01-18
申请号：US10077930
申请日：2002-02-20
申请人： Shinichi Hara
发明人： Shinichi Hara
IPC分类号： B05B1/04 , B01F3/04 , B01F5/04 , B01F5/06 , B05B7/04 , B05B7/08
CPC分类号： B01F5/0426 , B01F3/04099 , B01F5/0415 , B01F5/0646 , B01F2005/0446 , B01F2215/004 , B05B7/0475 , B05B7/0846 , B05B7/0884
摘要： A jetting apparatus for mixing at least liquid and gas to create the mixed flow of the gas and the liquid to thereby jet the mixed flow is provided. The jetting apparatus has a passage of the mixed flow of the gas and the liquid, the passage including at least one partition and a plurality of sub-passages divided by the partition, and liquid injection ports being provided in correspondence with the divided sub-passages. Mass flow per sectional area of the mixed flow of the gas and the liquid passing through the respective sub-passages is substantially equal.
摘要翻译：提供一种用于混合至少液体和气体以产生气体和液体的混合流从而喷射混合流的喷射装置。喷射装置具有气体和液体的混合流动的通道，通道包括至少一个分隔件和由分隔件分隔的多个子通道，并且液体注入口与分开的子通道相对应地设置。气体和通过各个子通道的液体的混合流的每个截面面积的质量流量基本相等。

7. 发明授权

US06836531B2 X-ray projection exposure apparatus and a device manufacturing method 失效
标题翻译： X射线投影曝光装置和装置制造方法
公开(公告)号：US06836531B2
公开(公告)日：2004-12-28
申请号：US10679278
申请日：2003-10-07
申请人： Shinichi Hara , Masami Tsukamoto
发明人： Shinichi Hara , Masami Tsukamoto
IPC分类号： G21K500
CPC分类号： G03F7/70708 , G03F7/70875 , G21K5/10
摘要： An exposure apparatus includes a chuck for holding an object and an optical system for directing light from a light source to the object held by the chuck. The optical system includes a multilayer film mirror which has a concave reflecting surface, wherein an area of contacting portions of the chuck is set so that the contact portions area of the chuck is at most 10% of an area of the object held by the chuck.
摘要翻译：曝光装置包括用于保持物体的卡盘和用于将来自光源的光引导到由卡盘保持的物体的光学系统。该光学系统包括具有凹面反射面的多层膜反射镜，其中卡盘的接触部分的面积被设定为使得卡盘的接触部分面积达到由卡盘保持的物体的面积的至多10％。

8. 发明授权

US06668037B2 X-ray projection exposure apparatus and a device manufacturing method 失效
公开(公告)号：US06668037B2
公开(公告)日：2003-12-23
申请号：US09948041
申请日：2001-09-07
申请人： Shinichi Hara , Masami Tsukamoto
发明人： Shinichi Hara , Masami Tsukamoto
IPC分类号： G21K500
CPC分类号： G03F7/70708 , G03F7/70875 , G21K5/10
摘要： An X-ray projection exposure apparatus includes a mask chuck, a wafer chuck, an X-ray illuminating system, and an X-ray projection system. The masks chuck holds a reflection X-ray mask having a mask pattern thereon. The wafer chuck holds a wafer onto which the mask pattern is transferred. The X-ray illuminating system illuminates the reflection X-ray mask, held by the mask chuck, with X-rays. The X-ray projection optical system projects the mask pattern of the reflection X-ray mask onto the wafer held by the wafer chuck with a predetermined magnification. The mask chuck includes a mechanism for generating static electricity for attracting and holding the reflection X-ray mask by an electrostatic force. The invention also includes a device manufacturing method using such an X-ray projection exposure apparatus to transfer a mask pattern onto the wafer using the X-ray projection exposure apparatus.

9. 发明授权

US06532182B2 Semiconductor memory production system and semiconductor memory production method 失效
标题翻译：半导体存储器生产系统和半导体存储器生产方法
公开(公告)号：US06532182B2
公开(公告)日：2003-03-11
申请号：US09811529
申请日：2001-03-20
申请人： Sumio Ogawa , Shinichi Hara
发明人： Sumio Ogawa , Shinichi Hara
IPC分类号： G11C700
CPC分类号： H01L22/22 , H01L22/20 , H01L2924/0002 , Y02P90/10 , Y02P90/14 , H01L2924/00
摘要： A semiconductor memory production system is provided, capable of holding the data necessary for process analysis for each lot in chronological order using a small amount of information, and which enables production management based on data that has been stored previously without performing new measurements. The semiconductor memory production system comprises: an LSI tester 1 that tests semiconductor memory and outputs the addresses of memory cells for each chip and a pass/fail bitmap corresponding to these addresses, and a process defect estimating device 34 that extracts the bit addresses of fail bits from the bitmap, and determines replacement addresses of word lines and bit lines to be replaced by redundant word lines and redundant bit lines in the redundant memory section, and estimates process defects from statistical analysis of the distribution condition of each chip on each wafer. Through this estimated result, feedback to the manufacturing line/process step prevents from producing defects frequently.
摘要翻译：提供一种半导体存储器制造系统，其能够使用少量的信息按照时间顺序保存每个批次的处理分析所必需的数据，并且其能够基于先前已经存储的数据进行生产管理而不执行新的测量。半导体存储器制造系统包括：LSI测试器1，其测试半导体存储器并输出每个芯片的存储单元的地址以及对应于这些地址的通过/失败位图;以及处理缺陷估计器34，其提取失败的位地址并且确定要由冗余存储器部分中的冗余字线和冗余位线替换的字线和位线的替换地址，并且从每个晶片上每个芯片的分布条件的统计分析来估计处理缺陷。通过这个估计结果，反馈到生产线/加工步骤防止频繁地产生缺陷。

10. 发明授权

US06317479B1 X-ray mask, and exposure method and apparatus using the same 失效
标题翻译： X射线掩模和使用其的曝光方法和装置
公开(公告)号：US06317479B1
公开(公告)日：2001-11-13
申请号：US08857466
申请日：1997-05-16
申请人： Keiko Chiba , Masami Tsukamoto , Yutaka Watanabe , Shinichi Hara , Hiroshi Maehara
发明人： Keiko Chiba , Masami Tsukamoto , Yutaka Watanabe , Shinichi Hara , Hiroshi Maehara
IPC分类号： H01L2700
CPC分类号： G03F1/62 , B82Y10/00 , B82Y40/00 , G03F1/24
摘要： An X-ray mask includes a mask pattern formed on a surface, a detachable protection cover attached on the surface for forming a dust-proof space for protecting the mask pattern, the protection cover being detached when the mask pattern is exposed with X-rays, and a hole for ventilating between the dust-proof space and an outer atmosphere.
摘要翻译： X射线掩模包括形成在表面上的掩模图案，安装在表面上用于形成用于保护掩模图案的防尘空间的可拆卸保护盖，当掩模图案用X射线暴露时，保护盖被分离，以及用于在防尘空间和外部空气之间通风的孔。

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