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1. 发明授权

US4791719A Method of manufacturing a thin-film magnetic head 失效
标题翻译：制造薄膜磁头的方法
公开(公告)号：US4791719A
公开(公告)日：1988-12-20
申请号：US1440
申请日：1987-01-08
申请人： Tetsuo Kobayashi , Yukihisa Tsukada , Shinji Narishige , Shinichi Hara
发明人： Tetsuo Kobayashi , Yukihisa Tsukada , Shinji Narishige , Shinichi Hara
IPC分类号： G11B5/31 , G11B5/127
CPC分类号： G11B5/3163 , Y10T29/49044 , Y10T29/49046 , Y10T29/49062
摘要： A first magnetic layer is formed upon a non-magnetic substrate, a gap layer is formed upon the first magnetic layer, a conductor coil covered with an insulation layer is formed upon the gap layer, a second magnetic layer is formed upon the gap layer and the insulation layer, a magnetic gap being formed between the first and second magnetic layers at a front portion facing a recording medium, and the second magnetic layer being connected to the first magnetic layer at a back portion. After forming a mask made of metal oxide upon the second magnetic layer, the second magnetic layer, the gap layer, and the first magnetic layer are formed into a predetermined shape respectively at the tip portion by dry etching. Thus, a high performance thin-film magnetic head having the same widths for the first and second magnetic layers is obtained.
摘要翻译：在非磁性基板上形成第一磁性层，在第一磁性层上形成间隙层，在间隙层上形成被绝缘层覆盖的导体线圈，在间隙层上形成第二磁性层，所述绝缘层在形成在所述第一和第二磁性层之间的面向记录介质的前部处形成磁隙，所述第二磁性层在后部连接到所述第一磁性层。在第二磁性层上形成由金属氧化物制成的掩模之后，通过干蚀刻将第二磁性层，间隙层和第一磁性层分别形成为尖端部分的预定形状。因此，获得了对于第一和第二磁性层具有相同宽度的高性能薄膜磁头。

2. 发明授权

US4462881A Method of forming a multilayer thin film 失效
标题翻译：形成多层薄膜的方法
公开(公告)号：US4462881A
公开(公告)日：1984-07-31
申请号：US322697
申请日：1981-11-18
申请人： Hiroshi Yamamoto , Noboru Shimizu , Masahide Suenaga , Yukihisa Tsukada , Tooru Takeura
发明人： Hiroshi Yamamoto , Noboru Shimizu , Masahide Suenaga , Yukihisa Tsukada , Tooru Takeura
IPC分类号： G11B5/31 , G11B5/39 , H01F41/34 , C23C15/00
CPC分类号： G11B5/3903 , H01F41/34
摘要： A method of forming a multilayer thin film is disclosed in which a second thin conductive film is deposited on a first thin conductive film uninterruptedly after the first thin film has been deposited on a substrate, the first and second films thus formed are processed so as to form a predetermined pattern, the surface of the second thin film is cleaned by ion etching and a third thin conductive film is deposited on the whole surface of the substrate, and then the second and third thin films are processed so as to have a pattern different from the above-mentioned predetermined pattern. In the case where two thin conductive films different in material and pattern from each other are piled on a substrate, the above method can form a perfect interconnection between the two films and can make very small the contact resistance between the two films. Accordingly, the method is fit to form, for example, a barber pole type magnetoresistive element.
摘要翻译：公开了一种形成多层薄膜的方法，其中在第一薄膜沉积在基底上之后，第二薄导电膜不间断地沉积在第一薄导电膜上，这样形成的第一和第二薄膜被加工成形成预定图案，通过离子蚀刻来清洁第二薄膜的表面，并且在基板的整个表面上沉积第三薄导电膜，然后处理第二和第三薄膜以具有不同的图案从上述预定图案。在材料和图案彼此不同的两个薄导电膜堆叠在基板上的情况下，上述方法可以形成两个膜之间的完美互连，并且可以使两个膜之间的接触电阻非常小。因此，该方法适合于形成例如理发杆型磁阻元件。

3. 发明授权

US4860140A Magnetic head closure having ferrite substrate and closure and conductive thin film coil deposited in recess of substantially same shape in ferrite substrate 失效
标题翻译：具有铁氧体衬底的磁头封盖和在铁氧体衬底中沉积在基本相同形状的凹陷中的闭合和导电薄膜线圈
公开(公告)号：US4860140A
公开(公告)日：1989-08-22
申请号：US183338
申请日：1988-04-07
申请人： Kazuhiro Momata , Kousaku Chida , Tooru Takeura , Yukihisa Tsukada
发明人： Kazuhiro Momata , Kousaku Chida , Tooru Takeura , Yukihisa Tsukada
IPC分类号： G11B5/133 , G11B5/17 , G11B5/187 , G11B5/193
CPC分类号： G11B5/193 , G11B5/1335 , G11B5/17 , G11B5/1871
摘要： The magnetic head according to the present invention has a ferrite substrate and closure. The ferrite substrate has formed therein a first recess in which a conductive coil is to be deposited, while the ferrite closure has formed therein a second recess enclosing a portion of the conductive coil that is contributed to at least signal transducing. The end of the second recess is disposed in a position related with the depth of the tranducing gap. Since the first recess in which the conductive coil is deposited has no influence on the magnetic transducing efficiency, it can be much freely formed by photolithography or reactive ion etching. Also since the second recess having an influence on the magnetic transducing efficiency can be formed by precision machining, no advanced process control is needed.
摘要翻译：根据本发明的磁头具有铁氧体衬底和封闭件。铁氧体衬底在其中形成有要沉积导电线圈的第一凹部，而铁氧体封闭件在其中形成有封闭导电线圈的至少有助于至少信号传导的部分的第二凹部。第二凹部的端部设置在与调节间隙的深度相关的位置。由于其中沉积导电线圈的第一凹槽对磁转换效率没有影响，所以可以通过光刻或反应离子蚀刻来自由地形成。此外，由于可以通过精密加工形成对磁转换效率有影响的第二凹部，因此不需要先进的工艺控制。

4. 发明授权

US4443294A Process for forming magnetic film pattern 失效
标题翻译：磁膜图案形成工艺
公开(公告)号：US4443294A
公开(公告)日：1984-04-17
申请号：US386578
申请日：1982-06-09
申请人： Masahide Suenaga , Yukihisa Tsukada , Hiroshi Yamamoto
发明人： Masahide Suenaga , Yukihisa Tsukada , Hiroshi Yamamoto
IPC分类号： C23F1/00 , C23F1/28 , G11B5/31 , G11B5/39 , H01F41/14 , H01F41/34 , C23F17/00 , H05K3/06
CPC分类号： G11B5/3903 , C23F1/28 , G11B5/3163 , H01F41/34 , G11B5/3116 , Y10T29/49044 , Y10T29/49046
摘要： In forming a magnetic film pattern of permalloy by photoetching, the permalloy magnetic film formed on a substrate is etched in an etching solution containing ferric chloride, hydrochloric acid and phosphoric acid, thereby gradually reducing the thickness of the film pattern at the side edges in a tapered state. The permalloy magnetic film can be easily taper-etched without any deterioration of magnetic properties of permalloy magnetic film and substrate surface, but with a greatly improved yield of magnetic film head production and a greatly improved reliability.
摘要翻译：在通过光刻法形成坡莫合金的磁性膜图案中，在含有氯化铁，盐酸和磷酸的蚀刻溶液中蚀刻形成在基板上的坡莫合金磁膜，从而逐渐减小侧视图中的膜图案的厚度锥形状态。坡莫合金磁膜可以容易地锥形蚀刻，而不会使坡莫合金磁性膜和基板表面的磁性能下降，但磁性膜头的生产成本大大提高，可靠性大大提高。

5. 发明授权

US4411757A Formation of electrodes for magnetoresistive sensor 失效
标题翻译：磁阻传感器电极的形成
公开(公告)号：US4411757A
公开(公告)日：1983-10-25
申请号：US386302
申请日：1982-06-08
申请人： Masahiro Kitada , Masahide Suenaga , Yukihisa Tsukada , Noboru Shimizu , Hiroshi Yamamoto
发明人： Masahiro Kitada , Masahide Suenaga , Yukihisa Tsukada , Noboru Shimizu , Hiroshi Yamamoto
IPC分类号： H01F41/14 , H01L21/28 , H01L43/02 , H01L43/12 , C23C15/00
CPC分类号： H01L43/02 , H01L43/12
摘要： Electrodes for a magnetoresistive sensor can be formed easily by a method wherein a double-layer structure of Mo and Al on a film of a magnetoresistive material such as permalloy is formed to have a predetermined pattern, firstly by exposing an Al layer to a chemical etching solution or subjecting the Al layer to the ion-milling treatment to give said Al layer said pattern and then subjecting a Mo layer to the plasma etching or reactive sputter etching treatment to give said Mo layer said pattern.
摘要翻译：可以通过以下方法容易地形成用于磁阻传感器的电极：首先通过将Al层暴露于化学蚀刻来形成具有预定图案的诸如坡莫合金的磁阻材料的膜上的Mo和Al的双层结构溶液或使Al层进行离子碾磨处理，得到所述Al层的所述图案，然后对Mo层进行等离子蚀刻或反应溅射蚀刻处理，得到所述Mo层所述图案。

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