专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20060082743A1 Apparatus and method for removing contaminant on original, method of manufacturing device, and original 失效
标题翻译：用于去除原始污染物的装置和方法，制造装置的方法和原件
公开(公告)号：US20060082743A1
公开(公告)日：2006-04-20
申请号：US11250072
申请日：2005-10-12
申请人： Masami Yonekawa , Shinichi Hara , Ryo Edo
发明人： Masami Yonekawa , Shinichi Hara , Ryo Edo
IPC分类号： G03B27/52
CPC分类号： G03F7/70925
摘要： At least one exemplary embodiment is directed to an apparatus which includes an original stage, to hold an original, which moves in a scan direction, an illumination optical system configured to illuminate the original held by the original stage with exposure light, a substrate stage configured to hold a substrate and to move in a scan direction, a projection optical system configured to project a pattern of the original onto the substrate with the exposure light, and an irradiation unit configured to irradiate the original held by the original stage. Irradiation by the irradiation unit and movement of the original stage in the scan direction are carried out substantially in parallel with each other so as to remove a contaminant on the original.
摘要翻译：至少一个示例性实施例涉及一种装置，其包括原始台，用于保持沿扫描方向移动的原件，配置成用曝光灯照亮由原始台保持的原件的照明光学系统，衬底台配置保持基板并沿扫描方向移动;投影光学系统，被配置为利用曝光光将原稿的图案投影到基板上;以及照射单元，被配置为照射由原始台保持的原稿。通过照射单元的照射和原始台沿扫描方向的移动基本上彼此平行地进行，以便去除原件上的污染物。

2. 发明授权

US07670754B2 Exposure apparatus having a processing chamber, a vacuum chamber and first and second load lock chambers 失效
标题翻译：具有处理室，真空室和第一和第二负载锁定室的曝光装置
公开(公告)号：US07670754B2
公开(公告)日：2010-03-02
申请号：US11001116
申请日：2004-12-02
申请人： Ryo Edo , Masami Yonekawa , Shinichi Hara
发明人： Ryo Edo , Masami Yonekawa , Shinichi Hara
IPC分类号： H01L21/00 , G03F7/00 , G03B27/42
CPC分类号： H01L21/67173 , G03F7/70741 , G03F7/7075 , G03F7/70808 , G03F7/70841 , G03F7/70916 , G03F7/70925 , H01L21/67028 , H01L21/67051 , H01L21/67225 , Y10S134/902 , Y10S414/14
摘要： An exposure apparatus for executing an exposure of a substrate to light via a mask. The apparatus includes a booth which stores the mask in an atmospheric pressure, a processing chamber in which the exposure is executed in a first vacuum pressure, a vacuum chamber, arranged between the booth and the processing chamber, stores the mask at a second vacuum pressure that is higher than the first vacuum pressure and is between 0.1 Pa and 100 Pa, a first load lock chamber, arranged between the booth and the vacuum chamber, through which the mask is transferred, in which the atmospheric pressure and the second vacuum pressure are replaceable, and a second load lock chamber arranged between the vacuum chamber and the processing chamber, through which the mask is transferred, in which the second vacuum pressure and the first vacuum pressure are replaceable.
摘要翻译：一种曝光装置，用于通过掩模执行基板的曝光。该装置包括将大气压下的面罩存放在展位，在第一真空压力下进行曝光的处理室，布置在展位和处理室之间的真空室，将面罩存储在第二真空压力其高于第一真空压力并且在0.1Pa和100Pa之间，第一负载锁定室，布置在所述展位和所述真空室之间，所述掩模通过所述真空室转移，其中所述大气压力和所述第二真空压力为以及布置在真空室和处理室之间的第二加载锁定室，通过该第二加载锁定腔传送掩模，其中第二真空压力和第一真空压力是可替换的。

3. 发明授权

US07319507B2 Apparatus and method for removing contaminant on original, method of manufacturing device, and original 失效
标题翻译：用于去除原始污染物的装置和方法，制造装置的方法和原件
公开(公告)号：US07319507B2
公开(公告)日：2008-01-15
申请号：US11250072
申请日：2005-10-12
申请人： Masami Yonekawa , Shinichi Hara , Ryo Edo
发明人： Masami Yonekawa , Shinichi Hara , Ryo Edo
IPC分类号： G03B27/42 , G03B27/52
CPC分类号： G03F7/70925
摘要： At least one exemplary embodiment is directed to an apparatus which includes an original stage, to hold an original, which moves in a scan direction, an illumination optical system configured to illuminate the original held by the original stage with exposure light, a substrate stage configured to hold a substrate and to move in a scan direction, a projection optical system configured to project a pattern of the original onto the substrate with the exposure light, and an irradiation unit configured to irradiate the original held by the original stage. Irradiation by the irradiation unit and movement of the original stage in the scan direction are carried out substantially in parallel with each other so as to remove a contaminant on the original.
摘要翻译：至少一个示例性实施例涉及一种装置，其包括原始台，用于保持沿扫描方向移动的原件，配置成用曝光灯照亮由原始台保持的原件的照明光学系统，衬底台配置保持基板并沿扫描方向移动;投影光学系统，被配置为利用曝光光将原稿的图案投影到基板上;以及照射单元，被配置为照射由原始台保持的原稿。通过照射单元的照射和原始台沿扫描方向的移动基本上彼此平行地进行，以便去除原件上的污染物。

4. 发明申请

US20050121144A1 Processing system and exposure apparatus using the same 失效
标题翻译：处理系统和使用其的曝光装置
公开(公告)号：US20050121144A1
公开(公告)日：2005-06-09
申请号：US11001116
申请日：2004-12-02
申请人： Ryo Edo , Masami Yonekawa , Shinichi Hara
发明人： Ryo Edo , Masami Yonekawa , Shinichi Hara
IPC分类号： B08B7/00 , G03F7/20 , H01L21/00 , H01L21/027 , H01L21/677 , C23F1/00
CPC分类号： H01L21/67173 , G03F7/70741 , G03F7/7075 , G03F7/70808 , G03F7/70841 , G03F7/70916 , G03F7/70925 , H01L21/67028 , H01L21/67051 , H01L21/67225 , Y10S134/902 , Y10S414/14
摘要： A processing system includes a supplying part for storing an object to be fed and for being maintained at an atmospheric pressure a processing chamber for being maintained at a reduced pressure or vacuum atmosphere and for executing a predetermined processing to the object, the object being fed between the supplying part and the processing chamber, a vacuum chamber, arranged between the supplying part and the processing chamber, for storing the object at a pressure of 100 Pa or less, the vacuum chamber having a replaceable atmosphere, and a first load lock chamber, arranged between the supplying part and said vacuum chamber, for receiving and supplying the object between the supplying part and said vacuum chamber, the first load lock chamber having a replaceable atmosphere.
摘要翻译：一种处理系统，包括：供给部件，用于储存待进料的物体，并保持在大气压下的处理室，用于保持在减压或真空气氛中，并对所述物体执行预定的处理，所述物体在供给部和处理室，设置在供给部和处理室之间的真空室，用于在100Pa以下的压力下存储物体，具有可更换气氛的真空室和第一负载锁定室，布置在供应部分和所述真空室之间，用于在供应部分和所述真空室之间接收和供应物体，第一负载锁定室具有可更换的气氛。

5. 发明申请

US20070024861A1 LASER TRACKING INTERFEROMETER 有权
标题翻译：激光跟踪干涉仪
公开(公告)号：US20070024861A1
公开(公告)日：2007-02-01
申请号：US11458533
申请日：2006-07-19
申请人： Shinichirou Yanaka , Makoto Abe , Shinichi Hara , Naoyuki Taketomi
发明人： Shinichirou Yanaka , Makoto Abe , Shinichi Hara , Naoyuki Taketomi
IPC分类号： G01B11/02
CPC分类号： G01S17/36 , G01B11/03 , G01S7/4812 , G01S7/497 , G01S17/42 , G01S17/66
摘要： A laser tracking interferometer; a carriage rotatable about a center of the reference sphere; a laser interferometer that provides a retroreflector displacement signal, and a displacement gage that provides a displacement signal. A data processing apparatus computes displacement of the retroreflector with respect to the reference sphere. A position sensitive detector provides a position signal corresponding to the amount of deviation of a laser beam when the laser beam is reflected off the retroreflector back into the laser interferometer and deviated in a direction orthogonal to its optical axis. A controller controls rotation of the carriage based on the position signal from the position detector so that the amount of deviation becomes zero.
摘要翻译：激光跟踪干涉仪; 可围绕参考球的中心旋转的托架; 提供后向反射器位移信号的激光干涉仪和提供位移信号的位移计。数据处理装置计算回射器相对于参考球的位移。当激光束从后向反射器反射回激光干涉仪并偏离与其光轴正交的方向时，位置敏感检测器提供对应于激光束偏离量的位置信号。控制器基于来自位置检测器的位置信号控制滑架的旋转，使得偏差量变为零。

6. 发明授权

US07158209B2 Holding mechanism in exposure apparatus, and device manufacturing method 有权
标题翻译：曝光装置中的保持机构和装置制造方法
公开(公告)号：US07158209B2
公开(公告)日：2007-01-02
申请号：US11360496
申请日：2006-02-24
申请人： Shinichi Hara
发明人： Shinichi Hara
IPC分类号： G03B27/52 , G03B27/42 , G02B7/02
CPC分类号： G03F7/70825 , G03B27/42 , G03F7/70891
摘要： Disclosed is a holding system and an exposure apparatus having the same, wherein deformation of an optical member resulting from its thermal expansion and causing degradation of imaging performance can be reduced to assure desired imaging performance. The holding system for holding an optical member includes a barrel for at least partially surrounding the optical member and/or a heat source, an average of radiation coefficient of an inside surface of the barrel is not less than 0.8.
摘要翻译：公开了一种保持系统和具有该保持系统的曝光设备，其中可以减少由其热膨胀引起的光学部件的变形并导致成像性能的降低，以确保期望的成像性能。用于保持光学构件的保持系统包括用于至少部分地围绕光学构件和/或热源的筒，筒的内表面的辐射系数的平均值不小于0.8。

7. 发明授权

US07072438B2 Reflection type mask 失效
标题翻译：反射型面具
公开(公告)号：US07072438B2
公开(公告)日：2006-07-04
申请号：US10736693
申请日：2003-12-17
申请人： Keiko Chiba , Masami Tsukamoto , Yutaka Watanabe , Shinichi Hara , Hiroshi Maehara
发明人： Keiko Chiba , Masami Tsukamoto , Yutaka Watanabe , Shinichi Hara , Hiroshi Maehara
IPC分类号： G21K3/00
CPC分类号： G03F1/62 , B82Y10/00 , B82Y40/00 , G03F1/24
摘要： A reflection type mask includes a substrate on which a multi-layered film for reflecting X-rays is provided, a mask pattern which is formed on the multi-layered film for absorbing the X-rays, and a cover for protecting the mask pattern. The cover is detachably attached to the substrate.
摘要翻译：反射型掩模包括其上设置有用于反射X射线的多层膜的基板，形成在用于吸收X射线的多层膜上的掩模图案，以及用于保护掩模图案的盖。盖可拆卸地附接到基板。

8. 发明授权

US06843471B2 Jetting apparatus for mixed flow of gas and liquid 有权
标题翻译：用于混合气体和液体的喷射装置
公开(公告)号：US06843471B2
公开(公告)日：2005-01-18
申请号：US10077930
申请日：2002-02-20
申请人： Shinichi Hara
发明人： Shinichi Hara
IPC分类号： B05B1/04 , B01F3/04 , B01F5/04 , B01F5/06 , B05B7/04 , B05B7/08
CPC分类号： B01F5/0426 , B01F3/04099 , B01F5/0415 , B01F5/0646 , B01F2005/0446 , B01F2215/004 , B05B7/0475 , B05B7/0846 , B05B7/0884
摘要： A jetting apparatus for mixing at least liquid and gas to create the mixed flow of the gas and the liquid to thereby jet the mixed flow is provided. The jetting apparatus has a passage of the mixed flow of the gas and the liquid, the passage including at least one partition and a plurality of sub-passages divided by the partition, and liquid injection ports being provided in correspondence with the divided sub-passages. Mass flow per sectional area of the mixed flow of the gas and the liquid passing through the respective sub-passages is substantially equal.
摘要翻译：提供一种用于混合至少液体和气体以产生气体和液体的混合流从而喷射混合流的喷射装置。喷射装置具有气体和液体的混合流动的通道，通道包括至少一个分隔件和由分隔件分隔的多个子通道，并且液体注入口与分开的子通道相对应地设置。气体和通过各个子通道的液体的混合流的每个截面面积的质量流量基本相等。

9. 发明授权

US06836531B2 X-ray projection exposure apparatus and a device manufacturing method 失效
标题翻译： X射线投影曝光装置和装置制造方法
公开(公告)号：US06836531B2
公开(公告)日：2004-12-28
申请号：US10679278
申请日：2003-10-07
申请人： Shinichi Hara , Masami Tsukamoto
发明人： Shinichi Hara , Masami Tsukamoto
IPC分类号： G21K500
CPC分类号： G03F7/70708 , G03F7/70875 , G21K5/10
摘要： An exposure apparatus includes a chuck for holding an object and an optical system for directing light from a light source to the object held by the chuck. The optical system includes a multilayer film mirror which has a concave reflecting surface, wherein an area of contacting portions of the chuck is set so that the contact portions area of the chuck is at most 10% of an area of the object held by the chuck.
摘要翻译：曝光装置包括用于保持物体的卡盘和用于将来自光源的光引导到由卡盘保持的物体的光学系统。该光学系统包括具有凹面反射面的多层膜反射镜，其中卡盘的接触部分的面积被设定为使得卡盘的接触部分面积达到由卡盘保持的物体的面积的至多10％。

10. 发明授权

US06668037B2 X-ray projection exposure apparatus and a device manufacturing method 失效
公开(公告)号：US06668037B2
公开(公告)日：2003-12-23
申请号：US09948041
申请日：2001-09-07
申请人： Shinichi Hara , Masami Tsukamoto
发明人： Shinichi Hara , Masami Tsukamoto
IPC分类号： G21K500
CPC分类号： G03F7/70708 , G03F7/70875 , G21K5/10
摘要： An X-ray projection exposure apparatus includes a mask chuck, a wafer chuck, an X-ray illuminating system, and an X-ray projection system. The masks chuck holds a reflection X-ray mask having a mask pattern thereon. The wafer chuck holds a wafer onto which the mask pattern is transferred. The X-ray illuminating system illuminates the reflection X-ray mask, held by the mask chuck, with X-rays. The X-ray projection optical system projects the mask pattern of the reflection X-ray mask onto the wafer held by the wafer chuck with a predetermined magnification. The mask chuck includes a mechanism for generating static electricity for attracting and holding the reflection X-ray mask by an electrostatic force. The invention also includes a device manufacturing method using such an X-ray projection exposure apparatus to transfer a mask pattern onto the wafer using the X-ray projection exposure apparatus.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式