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21. 发明申请

WO2007112465A8 PARTICLE-BEAM EXPOSURE APPARATUS WITH OVERALL-MODULATION OF A PATTERNED BEAM 审中-公开
标题翻译：具有图案梁的整体调制的粒子束曝光装置
公开(公告)号：WO2007112465A8
公开(公告)日：2007-11-22
申请号：PCT/AT2007000132
申请日：2007-03-16
申请人： IMS NANOFABRICATION AG , PLATZGUMMER ELMAR
发明人： PLATZGUMMER ELMAR
IPC分类号： H01J37/04 , H01J37/317
CPC分类号： H01J37/045 , B82Y10/00 , B82Y40/00 , H01J37/3175 , H01J37/3177 , H01J2237/0435 , H01J2237/1506 , H01J2237/31766 , H01J2237/31774 , H01J2237/31777
摘要： In a charged-particle exposure apparatus (100) for exposure of a target (41) with a beam of electrically charged particles, the illumination system (101) comprises a deflector means (401) adapted to vary the direction of incidence of the illuminating beam upon the pattern definition means, the pattern definition means (20) forms the shape of the illuminating beam into a desired pattern, and the projection optics system (103) projects an image of the beam shape defined in the pattern definition means onto the target (41); the projection optics system comprises a blocking aperture means (204) having an opening and being adapted to block passage of beams traversing outside said opening, namely when the deflector means (401) is activated to tilt the beamlet by a sufficient angle from its non-deflected path, e.g., for blanking out during the process of loading a pattern into the pattern definition means.
摘要翻译：在用带电粒子束曝光目标（41）的带电粒子曝光设备（100）中，照明系统（101）包括偏转器装置（401），其适于改变照明束的入射方向在图案定义装置上，图案定义装置（20）将照明光束的形状形成为期望的图案，并且投影光学系统（103）将图案定义装置中定义的光束形状的图像投影到目标上 41）; 投影光学系统包括具有开口并且适于阻挡穿过在所述开口外部的光束通过的阻挡孔装置（204），即当偏转装置（401）被启动以使小光束从其非透射区域倾斜足够的角度时，偏转路径，例如用于在将图案加载到图案定义装置的过程中消隐。

22. 发明专利

NL2003304A1 Compensation of Dose Inhomogeneity and Image Distortion. 未知
公开(公告)号：NL2003304A1
公开(公告)日：2010-02-09
申请号：NL2003304
申请日：2009-07-29
申请人： IMS NANOFABRICATION AG
发明人： PLATZGUMMER ELMAR , FRAGNER HEINRICH , CERNUSCA STEFAN
IPC分类号： G03F7/20 , H01J37/317

23. 发明专利

DE602007003089D1 未知
公开(公告)号：DE602007003089D1
公开(公告)日：2009-12-17
申请号：DE602007003089
申请日：2007-03-16
申请人： IMS NANOFABRICATION AG
发明人： PLATZGUMMER ELMAR
IPC分类号： H01J37/04 , H01J37/317
摘要： In a charged-particle exposure apparatus for exposure of a target with a beam of electrically charged particles, the illumination system includes a deflector device adapted to vary the direction of incidence of the illuminating beam upon the pattern definition device, the pattern definition device forms the shape of the illuminating beam into a desired pattern, and the projection optics system projects an image of the beam shape defined in the pattern definition device onto the target; the projection optics system includes a blocking aperture device having an opening and being adapted to block passage of beams traversing outside the opening, namely when the deflector device is activated to tilt the beamlet by a sufficient angle from its non-deflected path, e.g., for blanking out during the process of loading a pattern into the pattern definition device.

24. 发明专利

DE602008005948D1 Musterdefinitionsvorrichtung mit eigenständiger Gegenelektroden-Anordnungsplatte 未知
公开(公告)号：DE602008005948D1
公开(公告)日：2011-05-19
申请号：DE602008005948
申请日：2008-05-13
申请人： IMS NANOFABRICATION AG
发明人： PLATZGUMMER ELMAR
IPC分类号： H01J37/04 , H01J37/147

25. 发明专利

NL2004846C WERKWIJZE VOOR MASKERLOZE DEELTJESBUNDELBELICHTING. 未知
公开(公告)号：NL2004846C
公开(公告)日：2010-12-07
申请号：NL2004846
申请日：2010-06-08
申请人： IMS NANOFABRICATION AG
发明人： PLATZGUMMER ELMAR
IPC分类号： H01J37/317
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/302 , H01J2237/30483

26. 发明专利

NL2003304C COMPENSATION OF DOSE INHOMOGENEITY AND IMAGE DISTORTION. 未知
公开(公告)号：NL2003304C
公开(公告)日：2010-09-14
申请号：NL2003304
申请日：2009-07-29
申请人： IMS NANOFABRICATION AG
发明人： PLATZGUMMER ELMAR , FRAGNER HEINRICH , CERNUSCA STEFAN
IPC分类号： G03F1/16 , G03F7/20 , H01J37/317
CPC分类号： B82Y40/00 , B82Y10/00 , G03F1/20 , G03F7/70433 , H01J37/3174

27. 发明专利

NL2001369A1 Werkwijze voor maskerloze deeltjesbundelbelichting. 未知
公开(公告)号：NL2001369A1
公开(公告)日：2008-09-30
申请号：NL2001369
申请日：2008-03-13
申请人： IMS NANOFABRICATION AG
发明人： FRAGNER HEINRICH , PLATZGUMMER ELMAR
IPC分类号： H01J37/04 , H01J37/317

28. 发明专利

DE102008010123A1 未知
公开(公告)号：DE102008010123A1
公开(公告)日：2008-09-04
申请号：DE102008010123
申请日：2008-02-20
申请人： IMS NANOFABRICATION AG , STUTTGART MIKROELEKTRONIK
发明人： PLATZGUMMER ELMAR , LOESCHNER HANS , KVASNICA SAMUEL , SPRINGER REINHARD , IRMSCHER MATTHIAS , LETZKUS FLORIAN , BUTSCHKE JOERG
IPC分类号： H01J37/30 , G03F7/20

29. 发明专利

NL1035095C2 MULTI-BUNDEL AFBUIGER-ARRAY-INRICHTING VOOR MASKERLOZE DEELTJESBUNDEL VERWERKING. 未知
公开(公告)号：NL1035095C2
公开(公告)日：2010-06-15
申请号：NL1035095
申请日：2008-02-27
申请人： IMS NANOFABRICATION AG , STUTTGART MIKROELEKTRONIK
发明人： PLATZGUMMER ELMAR , LOESCHNER HANS , KVASNICA SAMUEL , SPRINGER REINHARD , IRMSCHER MATHIAS , LETZKUS FLORIAN , BUTSCHKE JOERG
IPC分类号： H01J37/04 , H01J37/317

30. 发明专利

GB2414111B Advanced pattern definition for particle-beam processing 未知
公开(公告)号：GB2414111B
公开(公告)日：2010-01-27
申请号：GB0508659
申请日：2005-04-28
申请人： IMS NANOFABRICATION GMBH , IMS NANOFABRICATION AG
发明人： PLATZGUMMER ELMAR , CERNUSCA STEFAN
IPC分类号： G03F7/20 , H01J37/04 , G21K1/04 , G21K1/08 , G21K5/04 , G21K5/10 , H01J37/08 , H01J37/30 , H01J37/305 , H01J37/317 , H01L21/027
摘要： In a pattern definition device for use in a particle-beam processing apparatus a plurality of apertures ( 21 ) are arranged within a pattern definition field (pf) wherein the positions of the apertures ( 21 ) in the pattern definition field (pf) taken with respect to a direction (X, Y) perpendicular, or parallel, to the scanning direction are offset to each other by not only multiple integers of the effective width (w) of an aperture taken along said direction, but also multiple integers of an integer fraction of said effective width. The pattern definition field (pf) may be segmented into several domains (D) composed of a many staggered lines (pl) of apertures; along the direction perpendicular to the scanning direction, the apertures of a domain are offset to each other by multiple integers of the effective width (w), whereas the offsets of apertures of different domains are integer fractions of that width.

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