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11. 发明授权

US07833060B2 LED bulb assembly 有权
标题翻译： LED灯泡组装
公开(公告)号：US07833060B2
公开(公告)日：2010-11-16
申请号：US12007575
申请日：2008-01-11
申请人： Kenneth Tsai
发明人： Kenneth Tsai
IPC分类号： H01R33/09
CPC分类号： F21V19/0005 , F21W2121/00 , F21Y2115/10
摘要： The LED bulb assembly includes a connector, an LED including two conductive wires, and means for attaching the LED to the connector and preventing the two conductive wires from contacting each other. The means for attaching the LED to the connector and preventing the two conductive wires from contacting each other may include a plate in the connector, and each of the two conductive wires extends along different sides of the plate. Alternatively, the means for attaching the LED to the connector and preventing the two conductive wires from contacting each other may include each of the conductive wires having a thickness such that the two conductive wires supports the LED while maintaining a gap between the two conductive wires.
摘要翻译： LED灯泡组件包括连接器，包括两根导线的LED，以及用于将LED连接到连接器并防止两根导线相互接触的装置。用于将LED连接到连接器并防止两个导线彼此接触的装置可以包括连接器中的板，并且两个导线中的每一个沿板的不同侧延伸。或者，用于将LED连接到连接器并防止两个导线彼此接触的装置可以包括每个导线具有使得两个导线在保持两个导线之间的间隙的同时支撑LED的厚度。

12. 发明申请

US20060024440A1 Reduced oxygen arc spray 审中-公开
标题翻译：减少氧气喷雾
公开(公告)号：US20060024440A1
公开(公告)日：2006-02-02
申请号：US10901319
申请日：2004-07-27
申请人： Kenneth Tsai , Kenny Ngan
发明人： Kenneth Tsai , Kenny Ngan
IPC分类号： C23C16/00 , B05D1/32
CPC分类号： C23C16/4404 , C23C4/131
摘要： A method of forming a coating on a component surface comprises placing a shield about the component surface to define a process zone, controlling the level of oxygen present in the process zone, generating an electric arc in the process zone to form a liquefied material from an electrode, and injecting a carrier gas into the process zone to direct the liquefied material toward the component surface. The level of oxygen present in the process zone is controlled by (i) filling the process zone with a non-oxidizing gas and maintaining a pressure p1 in the process zone higher than a pressure p2 of an ambient environment external to the process zone, and (ii) lining the process zone with an oxygen-absorbing material. Additionally, an arc spray apparatus comprises the shield comprising the oxygen-absorbing material and a consumable electrode extending into the process zone.
摘要翻译：在部件表面上形成涂层的方法包括在组件表面周围放置屏蔽件以限定工艺区域，控制处理区域中存在的氧气水平，在工艺区域中产生电弧，以形成液化材料电极，并且将载气注入到处理区域中以将液化材料引向组件表面。存在于处理区中的氧的水平通过以下步骤来控制：（i）用非氧化性气体填充处理区，并且在高于压力p 1的过程区中保持压力p <1> 2）处理区外部的环境环境，和（ii）用氧吸收材料衬里处理区。另外，电弧喷涂装置包括包含氧吸收材料的屏蔽件和延伸到工艺区域中的可消耗电极。

13. 发明申请

US20060005767A1 Chamber component having knurled surface 审中-公开
标题翻译：腔体部件具有滚花表面
公开(公告)号：US20060005767A1
公开(公告)日：2006-01-12
申请号：US10880235
申请日：2004-06-28
申请人： Kenneth Tsai , Abhijit Desai
发明人： Kenneth Tsai , Abhijit Desai
IPC分类号： C23C16/00
CPC分类号： C23C16/4404 , H01L21/68735 , H01L21/6875
摘要： A substrate retaining clamp for a substrate processing chamber has a ring having an annular portion that surrounds a substrate in the chamber. The ring also has an overhang ledge to cover a periphery of the substrate. The retaining clamp has a knurled exposed surface of the overhang ledge that has spaced apart knurled ridges and furrows. In one version, the knurled ridges and furrows are concentric and radially spaced apart. The knurled exposed surface having the knurled ridges and furrows provides improved performance in the processing of substrates, and especially in high temperature processes.
摘要翻译：用于衬底处理室的衬底保持夹具具有环，该环具有围绕腔室中的衬底的环形部分。该环还具有覆盖基板周边的悬垂凸缘。保持夹具具有凸出的凸出部的滚花暴露表面，其具有间隔开的滚花脊和沟。在一个版本中，滚花的脊和沟是同心的并且径向间隔开。具有滚花脊和沟的滚花暴露表面在基底的加工中特别是在高温工艺中提供了改进的性能。

14. 发明授权

US06603269B1 Resonant chamber applicator for remote plasma source 失效
标题翻译：用于远程等离子体源的谐振室施加器
公开(公告)号：US06603269B1
公开(公告)日：2003-08-05
申请号：US09593586
申请日：2000-06-13
申请人： Be Van Vo , Salvador P. Umotoy , Son N. Trinh , Lawrence Chung-Lai Lei , Sergio Edelstein , Avi Tepman , Chien-Teh Kao , Kenneth Tsai
发明人： Be Van Vo , Salvador P. Umotoy , Son N. Trinh , Lawrence Chung-Lai Lei , Sergio Edelstein , Avi Tepman , Chien-Teh Kao , Kenneth Tsai
IPC分类号： C23C1600
CPC分类号： H01J37/32192
摘要： An improved plasma applicator for remotely generating a plasma for use in semiconductor manufacturing is provided. In one embodiment, a plasma applicator is comprised of a chamber assembly, a removable waveguide adapter and a circular clamp which secures the adapter to the chamber assembly. The chamber assembly includes an aperture plate, a microwave transparent window, a chamber body and a microwave sensor which is mounted on the chamber body. The chamber body has a proximate end opening adapted to admit microwave energy into the cavity and a distal end disposed generally on the opposite side of the cavity from the proximate end opening. The chamber body further has a gas outlet port adapted to permit the flow of an excited gas out of the cavity and a gas inlet port adapted to admit a precursor gas into the cavity. The gas inlet port has a center axis which is disposed between the proximate end opening of the chamber body and the midpoint between the proximate end opening and the distal end of the body.
摘要翻译：提供了用于远程产生用于半导体制造的等离子体的改进的等离子体施加器。在一个实施例中，等离子体施加器由腔室组件，可移除波导适配器和将适配器固定到腔室组件的圆形夹具构成。腔室组件包括孔板，微波透明窗，室主体和安装在腔体上的微波传感器。室主体具有适于将微波能量引入空腔中的近端开口，以及大致位于与近端开口相反的空腔相对侧的远端。腔体还具有气体出口端口，其适于允许将激发气体流出空腔，气体入口端口适于将前体气体引入空腔。气体入口具有中心轴线，该中心轴线设置在腔室主体的近端开口和本体的近端开口和远端之间的中点之间。

15. 发明申请

US20080200074A1 LED bulb assembly 有权
标题翻译： LED灯泡组装
公开(公告)号：US20080200074A1
公开(公告)日：2008-08-21
申请号：US12007575
申请日：2008-01-11
申请人： Kenneth Tsai
发明人： Kenneth Tsai
IPC分类号： H01R13/04
CPC分类号： F21V19/0005 , F21W2121/00 , F21Y2115/10
摘要： The LED bulb assembly includes a connector, an LED including two conductive wires, and means for attaching the LED to the connector and preventing the two conductive wires from contacting each other. The means for attaching the LED to the connector and preventing the two conductive wires from contacting each other may include a plate in the connector, and each of the two conductive wires extends along different sides of the plate. Alternatively, the means for attaching the LED to the connector and preventing the two conductive wires from contacting each other may include each of the conductive wires having a thickness such that the two conductive wires supports the LED while maintaining a gap between the two conductive wires.
摘要翻译： LED灯泡组件包括连接器，包括两根导线的LED，以及用于将LED连接到连接器并防止两根导线相互接触的装置。用于将LED连接到连接器并防止两个导线彼此接触的装置可以包括连接器中的板，并且两个导线中的每一个沿板的不同侧延伸。或者，用于将LED连接到连接器并防止两个导线彼此接触的装置可以包括每个导线具有使得两个导线在保持两个导线之间的间隙的同时支撑LED的厚度。

16. 发明申请

US20060021870A1 Profile detection and refurbishment of deposition targets 审中-公开
标题翻译：剖面检测和翻新沉积目标
公开(公告)号：US20060021870A1
公开(公告)日：2006-02-02
申请号：US10900532
申请日：2004-07-27
申请人： Kenneth Tsai , Kenny King-Tai Ngan , Trung Doan
发明人： Kenneth Tsai , Kenny King-Tai Ngan , Trung Doan
IPC分类号： C23C14/00 , C25B13/00
CPC分类号： C23C14/3414 , C23C4/01 , C23C4/18
摘要： A method of refurbishing a deposition target having a surface with an eroded region involves measuring a depth profile of the eroded region. A target material is then provided to the eroded region in relation to the measured depth profile to refurbish the target by filling the eroded region with the target material. The process provides improved refurbishment of eroded target surfaces with higher refurbishing precision and less waste of valuable target material.
摘要翻译：对具有具有侵蚀区域的表面的沉积靶进行翻新的方法涉及测量侵蚀区域的深度轮廓。然后将目标材料相对于测量的深度分布提供给侵蚀区域，以通过用目标材料填充侵蚀区域来翻新目标物。该过程提供了更好的翻新目标表面的翻新，更高的翻新精度和更少的有价值的目标材料的浪费。

17. 发明授权

US06374508B1 Apparatus and method for aligning a substrate on a support member 失效
标题翻译：用于将衬底对准支撑构件的装置和方法
公开(公告)号：US06374508B1
公开(公告)日：2002-04-23
申请号：US09507571
申请日：2000-02-18
申请人： Joseph Yudovsky , Kenneth Tsai , Ilya Perlov , Eugene Gantvarg
发明人： Joseph Yudovsky , Kenneth Tsai , Ilya Perlov , Eugene Gantvarg
IPC分类号： B65G4907
CPC分类号： C23C16/4583 , H01L21/68 , Y10S269/903 , Y10S414/135
摘要： A method and arrangement for lifting lowering and centering a substrate on a surface employs lift pins have conical tips. A capture range is provided by the conical tips to capture and center misaligned wafers. One or more of the pins are inclined in certain embodiments to enhance the alignment capability of the lift pins. The inclined lift pins, when retracting into a support member at an angle, move a supported substrate horizontally into proper alignment.
摘要翻译：用于提升在基体表面上降低定心的方法和装置采用提升销具有圆锥形尖端。捕获范围由锥形尖端提供，以捕获和对准未对准的晶片。一些或多个销在某些实施例中倾斜以增强提升销的对准能力。倾斜的提升销在以一定角度收回到支撑构件中时，将支撑的基板水平地移动到适当的对准位置。

18. 发明授权

US06328808B1 Apparatus and method for aligning and controlling edge deposition on a substrate 失效
标题翻译：用于对准和控制衬底上的边缘沉积的装置和方法
公开(公告)号：US06328808B1
公开(公告)日：2001-12-11
申请号：US09543393
申请日：2000-04-05
申请人： Kenneth Tsai , Joseph Yudovsky , Steve Ghanayem , Ken K. Lai , Patricia Liu , Toshiyuki Nakagawa , Maitreyee Mahajani
发明人： Kenneth Tsai , Joseph Yudovsky , Steve Ghanayem , Ken K. Lai , Patricia Liu , Toshiyuki Nakagawa , Maitreyee Mahajani
IPC分类号： C23C1600
CPC分类号： C23C16/45521 , C23C16/4585
摘要： An alignment mechanism for aligning a substrate on a support member in a process chamber includes a set of guide pins extending from the upper surface of the support member equally spaced about the periphery thereof and spaced to receive a substrate therebetween and align a shadow ring thereover. The inner surfaces of the guide pins are slanted outwardly to form an inverted funnel for receiving and aligning the substrate on the support member. An annular gas groove in the upper surface of the support member provides communication for a supply of purge gas and directs the gas about the peripheral edge of the substrate. The guide pins which extend partially over the gas groove include slots therein that provide fluid communication through the guide pins from the gas groove to the peripheral edge of the substrate. The guide pins also mate with alignment bores formed in the shadow ring so that, as the support member moves into the processing position, the inner surfaces of the guide pins abut abutment surfaces in the alignment bores and align the shadow ring on the support member and over the substrate. A hanger member supports and aligns the shadow ring between processing of each substrate.
摘要翻译：用于使处理室中的支撑构件上的基板对准的对准机构包括一组引导销，其从支撑构件的上表面延伸，围绕其周边等间隔开并间隔开，以在其间对准阴影环。引导销的内表面向外倾斜以形成用于接收和对准支撑构件上的基板的倒置漏斗。在支撑构件的上表面中的环形气体沟槽提供用于供应吹扫气体的连通并且引导围绕衬底的周边边缘的气体。在气槽上部分延伸的引导销包括其中的槽，其通过引导销从气槽到衬底的周缘提供流体连通。引导销还与形成在阴影环中的对准孔配合，使得当支撑构件移动到处理位置时，引导销的内表面邻接对准孔中的邻接表面并将阴影环对准支撑构件和在基板上。衣架构件在每个基底的处理之间支撑和对准阴影环。

19. 发明授权

US6146463A Apparatus and method for aligning a substrate on a support member 失效
公开(公告)号：US6146463A
公开(公告)日：2000-11-14
申请号：US97006
申请日：1998-06-12
申请人： Joseph Yudovsky , Kenneth Tsai , Ilya Perlov , Eugene Gantvarg
发明人： Joseph Yudovsky , Kenneth Tsai , Ilya Perlov , Eugene Gantvarg
IPC分类号： C23C16/458 , H01L21/68 , C23C16/00
CPC分类号： C23C16/4583 , H01L21/68 , Y10S269/903 , Y10S414/135
摘要： A method and arrangement for lifting lowering and centering a substrate on a surface employs lift pins have conical tips. A capture range is provided by the conical tips to capture and center misaligned wafers. One or more of the pins are inclined in certain embodiments to enhance the alignment capability of the lift pins. The inclined lift pins, when retracting into a support member at an angle, move a supported substrate horizontally into proper alignment.

20. 发明授权

US6026762A Apparatus for improved remote microwave plasma source for use with substrate processing systems 失效
标题翻译：用于改进用于衬底处理系统的远程微波等离子体源的装置
公开(公告)号：US6026762A
公开(公告)日：2000-02-22
申请号：US839111
申请日：1997-04-23
申请人： Chien-Teh Kao , Kenneth Tsai , Quyen Pham , Ronald L. Rose , Calvin R. Augason , Joseph Yudovsky
发明人： Chien-Teh Kao , Kenneth Tsai , Quyen Pham , Ronald L. Rose , Calvin R. Augason , Joseph Yudovsky
IPC分类号： C23C16/44 , C23C16/452 , C23C16/50 , C23C16/511 , C23C16/52 , H01J37/32 , H01L21/00 , H01L21/205 , H01L21/285 , H01L21/302 , H01L21/3065 , H01L21/31 , C23C16/00
CPC分类号： C23C16/52 , C23C16/4405 , C23C16/452 , H01J37/32192 , H01J37/32357 , H01J37/32862 , H01L21/67028
摘要： An apparatus and methods for an upgraded CVD system providing a remote plasma for efficiently cleaning a chamber, according to a specific embodiment. Etching or depositing a layer onto a substrate also may be achieved using the upgraded CVD system of the present invention. In a specific embodiment, the present invention provides apparatus for an easily removable, conveniently handled, and relatively inexpensive, robust microwave plasma source as a retrofit for or a removable addition to existing CVD apparatus. The present invention provides an improved CVD apparatus or retrofit of existing CVD apparatus capable of producing a remote plasma for efficiently cleaning the chamber.
摘要翻译：根据具体实施例的用于提供用于有效清洁腔室的远程等离子体的升级CVD系统的装置和方法。使用本发明的升级的CVD系统也可以实现在基板上的蚀刻或沉积层。在具体实施例中，本发明提供了一种用于易于移除，方便处理且相对便宜的鲁棒微波等离子体源的装置，作为对现有CVD设备的改进或可移除的添加。本发明提供了一种改进的CVD装置或改进现有CVD装置，其能够产生用于有效清洁腔室的远程等离子体。

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