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1. 发明授权

US06374508B1 Apparatus and method for aligning a substrate on a support member 失效
标题翻译：用于将衬底对准支撑构件的装置和方法
公开(公告)号：US06374508B1
公开(公告)日：2002-04-23
申请号：US09507571
申请日：2000-02-18
申请人： Joseph Yudovsky , Kenneth Tsai , Ilya Perlov , Eugene Gantvarg
发明人： Joseph Yudovsky , Kenneth Tsai , Ilya Perlov , Eugene Gantvarg
IPC分类号： B65G4907
CPC分类号： C23C16/4583 , H01L21/68 , Y10S269/903 , Y10S414/135
摘要： A method and arrangement for lifting lowering and centering a substrate on a surface employs lift pins have conical tips. A capture range is provided by the conical tips to capture and center misaligned wafers. One or more of the pins are inclined in certain embodiments to enhance the alignment capability of the lift pins. The inclined lift pins, when retracting into a support member at an angle, move a supported substrate horizontally into proper alignment.
摘要翻译：用于提升在基体表面上降低定心的方法和装置采用提升销具有圆锥形尖端。捕获范围由锥形尖端提供，以捕获和对准未对准的晶片。一些或多个销在某些实施例中倾斜以增强提升销的对准能力。倾斜的提升销在以一定角度收回到支撑构件中时，将支撑的基板水平地移动到适当的对准位置。

2. 发明授权

US6146463A Apparatus and method for aligning a substrate on a support member 失效
公开(公告)号：US6146463A
公开(公告)日：2000-11-14
申请号：US97006
申请日：1998-06-12
申请人： Joseph Yudovsky , Kenneth Tsai , Ilya Perlov , Eugene Gantvarg
发明人： Joseph Yudovsky , Kenneth Tsai , Ilya Perlov , Eugene Gantvarg
IPC分类号： C23C16/458 , H01L21/68 , C23C16/00
CPC分类号： C23C16/4583 , H01L21/68 , Y10S269/903 , Y10S414/135
摘要： A method and arrangement for lifting lowering and centering a substrate on a surface employs lift pins have conical tips. A capture range is provided by the conical tips to capture and center misaligned wafers. One or more of the pins are inclined in certain embodiments to enhance the alignment capability of the lift pins. The inclined lift pins, when retracting into a support member at an angle, move a supported substrate horizontally into proper alignment.

3. 发明授权

US08079894B2 Chemical mechanical polishing system having multiple polishing stations and providing relative linear polishing motion 有权
标题翻译：化学机械抛光系统具有多个抛光台并提供相对的线性抛光运动
公开(公告)号：US08079894B2
公开(公告)日：2011-12-20
申请号：US12581049
申请日：2009-10-16
申请人： Robert D. Tolles , Norman Shendon , Sasson Somekh , Ilya Perlov , Eugene Gantvarg , Harry Q. Lee
发明人： Robert D. Tolles , Norman Shendon , Sasson Somekh , Ilya Perlov , Eugene Gantvarg , Harry Q. Lee
IPC分类号： B24B7/22
CPC分类号： H01L21/67057 , B08B1/007 , B24B27/0023 , B24B37/30 , B24B37/345 , B24B41/005 , B24B53/017 , B24B57/02 , H01L21/30625 , H01L21/67051
摘要： A chemical-mechanical polishing apparatus including a table top, a transfer station mounted on the table top, a plurality of polishing stations mounted on the table top, a plurality of washing stations, and a plurality of carrier heads supported by a support member rotatable about an axis. Each washing station is located between a first polishing station and either a second polishing station or the transfer station, and the transfer station and the plurality of polishing stations are arranged at approximately equal angular intervals about the axis.
摘要翻译：一种化学机械抛光装置，包括台面，安装在桌面上的转印站，安装在桌面上的多个抛光站，多个洗涤站以及由可围绕一个轴。每个洗涤站位于第一抛光站和第二抛光站或转移站之间，并且传送站和多个抛光站围绕轴线以大致相等的角度间隔布置。

4. 发明申请

US20050142995A1 Method of controlling carrier head with multiple chambers 审中-公开
公开(公告)号：US20050142995A1
公开(公告)日：2005-06-30
申请号：US11064739
申请日：2005-02-23
申请人： Ilya Perlov , Eugene Gantvarg , Sen-Hou Ko
发明人： Ilya Perlov , Eugene Gantvarg , Sen-Hou Ko
IPC分类号： B24B37/27 , B24B37/04 , B24B37/30 , B24B37/32 , B24B47/10 , B24B47/12 , B24B49/16 , H01L21/304 , B24B1/00
CPC分类号： B24B37/30 , B24B37/32 , B24B47/10 , B24B47/12 , B24B49/16
摘要： A carrier head with a flexible member connected to a base to define a first chamber, a second chamber and a third chamber. A lower surface of the flexible member provides a substrate receiving surface with an inner portion associated with the first chamber, a substantially annular middle portion surrounding the inner portion and associated with the second chamber, and a substantially annular outer portion surrounding the middle portion and associated with the third chamber. The width of the outer portion may be significantly less than the width of the middle portion. The carrier head may also include a flange connected to a drive shaft and a gimbal pivotally connecting the flange to the base.

5. 发明授权

US6086457A Washing transfer station in a system for chemical mechanical polishing 有权
标题翻译：清洗转运站在化学机械抛光系统中
公开(公告)号：US6086457A
公开(公告)日：2000-07-11
申请号：US290042
申请日：1999-04-12
申请人： Ilya Perlov , Eugene Gantvarg
发明人： Ilya Perlov , Eugene Gantvarg
IPC分类号： B24B27/00 , B24B37/30 , B24B37/34 , B24B41/00 , B24B53/007 , B24B53/017 , B24B53/12 , B24B57/02 , H01L21/00 , H01L21/304 , H01L21/306 , B24B1/00
CPC分类号： H01L21/67057 , B08B1/007 , B24B27/0023 , B24B37/30 , B24B37/345 , B24B41/005 , B24B53/017 , B24B53/12 , B24B57/02 , H01L21/67051 , H01L21/30625
摘要： An apparatus and method for polishing semiconductor wafers and other workpieces that includes a polishing pads mounted on respective platens at multiple polishing stations. A transfer and washing station is disposed similarly to the polishing pads. The carousel simultaneously positions one of the heads over the transfer and washing station while the remaining heads are located over polishing stations for wafer polishing so that loading and unloading of wafers and washing of wafers and wafer heads can be performed concurrently with wafer polishing. A robot positioned to the side of the polishing apparatus automatically moves cassettes filled with wafers into a holding tub, and transfers individual wafers vertically held in the cassettes between the holding tub and the transfer and washing station. The transfer and washing station operates to not only transfer the wafers between the robot and the polishing heads, but also to wash the wafer and the polishing heads, for example, by liquid nozzles locate to the side of the station.
摘要翻译：一种用于抛光半导体晶片和其它工件的装置和方法，其包括安装在多个抛光站的相应压板上的抛光垫。传送和洗涤站的布置类似于抛光垫。圆盘传送带同时将其中一个头放置在传送和洗涤台上，而其余的头位于用于晶片抛光的抛光站之上，从而可以与晶片抛光同时进行晶片的加载和卸载以及晶片和晶片头的清洗。位于抛光装置一侧的机器人将自动地将装载有晶片的盒子移动到保持桶中，并且将保持在保持桶和转移和洗涤站之间的盒中的垂直保持的各个晶片传送。转移和洗涤站不仅可以在机器人和抛光头之间传送晶片，而且还可以例如通过液体喷嘴来清洗晶片和抛光头，位于工位的侧面。

6. 发明授权

US6036583A Conditioner head in a substrate polisher and method 失效
标题翻译：基材抛光机中的调节头和方法
公开(公告)号：US6036583A
公开(公告)日：2000-03-14
申请号：US890781
申请日：1997-07-11
申请人： Ilya Perlov , Eugene Gantvarg
发明人： Ilya Perlov , Eugene Gantvarg
IPC分类号： B24B53/017 , B24B37/04 , B24B53/007 , B24B53/02 , H01L21/304 , B24B1/00
CPC分类号： B24B53/017
摘要： In one aspect, an apparatus and a method for use in substrate polishing are described wherein a conditioner head is provided for receiving an end effector for conditioning a polishing pad surface; the conditioner head is supported above the polishing pad surface to be conditioned; and the conditioner head is driven with an actuating force from a position that lies along a line that is substantially normal to the polishing pad surface to be conditioned so that an end effector attached to the conditioner head can condition the surface of the polishing pad. In another aspect, pneumatic pressure is supplied through the conditioner head support arm to apply actuating force to the conditioner head so that an end effector attached to the conditioner head can condition the surface of the polishing pad. In yet another aspect, the conditioner head support arm has a fluid channel extending therein and a fluid port, wherein the fluid channel is constructed to receive rinsing fluid and fluid port is constructed to direct rinsing fluid from the fluid channel toward the polishing pad surface to be conditioned.
摘要翻译：一方面，描述了一种用于衬底抛光的装置和方法，其中设置有用于接收用于调节抛光垫表面的末端执行器的调节头; 调节头被支撑在待调理的抛光垫表面上方; 并且调节头由来自位于基本上垂直于待调理的抛光垫表面的线的位置的致动力驱动，使得附接到调节头的末端执行器可调节抛光垫的表面。另一方面，通过调节器头支撑臂供给气压，以向致动器头施加致动力，使得附接到调节头的末端执行器可调节抛光垫的表面。在另一方面，调节器头支撑臂具有在其中延伸的流体通道和流体端口，其中流体通道被构造成接收冲洗流体，并且流体端口被构造成将冲洗流体从流体通道朝向抛光垫表面引导到被调节。

7. 发明授权

US5964653A Carrier head with a flexible membrane for a chemical mechanical polishing system 失效
标题翻译：带有柔性膜的载体头，用于化学机械抛光系统
公开(公告)号：US5964653A
公开(公告)日：1999-10-12
申请号：US891548
申请日：1997-07-11
申请人： Ilya Perlov , Eugene Gantvarg , Sen-Hou Ko
发明人： Ilya Perlov , Eugene Gantvarg , Sen-Hou Ko
IPC分类号： B24B37/27 , B24B37/04 , B24B37/30 , B24B37/32 , B24B47/10 , B24B47/12 , B24B49/16 , H01L21/304 , B24B5/00 , B24B29/00
CPC分类号： B24B37/30 , B24B37/32 , B24B47/10 , B24B47/12 , B24B49/16
摘要： A carrier head with a flexible member connected to a base to define a first chamber, a second chamber and a third chamber. A lower surface of the flexible member provides a substrate receiving surface with an inner portion associated with the first chamber, a substantially annular middle portion surrounding the inner portion and associated with the second chamber, and a substantially annular outer portion surrounding the middle portion and associated with the third chamber. The width of the outer portion may be significantly less than the width of the middle portion. The carrier head may also include a flange connected to a drive shaft and a gimbal pivotally connecting the flange to the base.
摘要翻译：具有连接到基座以限定第一室，第二室和第三室的柔性构件的承载头。柔性构件的下表面提供了具有与第一腔室相关联的内部部分的基底接收表面，围绕内部部分并与第二腔室相关联的基本上环形的中间部分，以及围绕中间部分和相关联的基本上环形的外部部分与第三个房间。外部部分的宽度可以明显小于中间部分的宽度。承载头还可以包括连接到驱动轴的凸缘和将凸缘枢转地连接到基座的万向架。

8. 发明申请

US20070238399A1 CHEMICAL MECHANICAL POLISHING SYSTEM HAVING MULTIPLE POLISHING STATIONS AND PROVIDING RELATIVE LINEAR POLISHING MOTION 失效
标题翻译：具有多个抛光站和提供相对线性抛光运动的化学机械抛光系统
公开(公告)号：US20070238399A1
公开(公告)日：2007-10-11
申请号：US11759770
申请日：2007-06-07
申请人： Robert Tolles , Norm Shendon , Sasson Somekh , Ilya Perlov , Eugene Gantvarg , Harry Lee
发明人： Robert Tolles , Norm Shendon , Sasson Somekh , Ilya Perlov , Eugene Gantvarg , Harry Lee
IPC分类号： B24B7/04 , B24B41/06 , B24B9/00 , B24B7/00
CPC分类号： H01L21/67057 , B08B1/007 , B24B27/0023 , B24B37/30 , B24B37/345 , B24B41/005 , B24B53/017 , B24B57/02 , H01L21/30625 , H01L21/67051
摘要： A chemical-mechanical polishing apparatus including a table top, a transfer station mounted on the table top, a plurality of polishing stations mounted on the table top, a plurality of washing stations, and a plurality of carrier heads supported by a support member rotatable about an axis. Each washing station is located between a first polishing station and either a second polishing station or the transfer station, and the transfer station and the plurality of polishing stations are arranged at approximately equal angular intervals about the axis.
摘要翻译：一种化学机械抛光装置，包括台面，安装在桌面上的转印站，安装在桌面上的多个抛光站，多个洗涤站以及由可围绕一个轴。每个洗涤站位于第一抛光站和第二抛光站或转移站之间，并且传送站和多个抛光站围绕轴线以大致相等的角度间隔布置。

9. 发明授权

US06277010B1 Carrier head with a flexible membrane for a chemical mechanical polishing system 有权
标题翻译：带有柔性膜的载体头，用于化学机械抛光系统
公开(公告)号：US06277010B1
公开(公告)日：2001-08-21
申请号：US09611246
申请日：2000-07-07
申请人： Ilya Perlov , Eugene Gantvarg , Sen-Hou Ko
发明人： Ilya Perlov , Eugene Gantvarg , Sen-Hou Ko
IPC分类号： B24B2900
CPC分类号： B24B37/30 , B24B37/32 , B24B47/10 , B24B47/12 , B24B49/16
摘要： A carrier head with a flexible member connected to a base to define a first chamber, a second chamber and a third chamber. A lower surface of the flexible member provides a substrate receiving surface with an inner portion associated with the first chamber, a substantially annular middle portion surrounding the inner portion and associated with the second chamber, and a substantially annular outer portion surrounding the middle portion and associated with the third chamber. The width of the outer portion may be significantly less than the width of the middle portion. The carrier head may also include a flange connected to a drive shaft and a gimbal pivotally connecting the flange to the base.
摘要翻译：具有连接到基座以限定第一室，第二室和第三室的柔性构件的承载头。柔性构件的下表面提供了具有与第一腔室相关联的内部部分的基底接收表面，围绕内部部分并与第二腔室相关联的基本上环形的中间部分，以及围绕中间部分和相关联的基本上环形的外部部分与第三个房间。外部部分的宽度可以明显小于中间部分的宽度。承载头还可以包括连接到驱动轴的凸缘和将凸缘枢转地连接到基座的万向架。

10. 发明授权

US6143127A Carrier head with a retaining ring for a chemical mechanical polishing system 失效
标题翻译：具有用于化学机械抛光系统的固定环的承载头
公开(公告)号：US6143127A
公开(公告)日：2000-11-07
申请号：US79009
申请日：1998-05-14
申请人： Ilya Perlov , Eugene Gantvarg
发明人： Ilya Perlov , Eugene Gantvarg
IPC分类号： B24B37/32 , H01L21/304 , B24B5/00 , B24B29/00
CPC分类号： B24B37/32
摘要： A carrier head for chemical mechanical polishing with a retaining ring having an inclined inner surface. The force of the edge of the substrate against the inclined surface causes a reactive force having a vertical component on the edge of the substrate. This vertical force can reduce the edge effect.
摘要翻译：用于具有倾斜内表面的保持环的化学机械抛光的载体头。衬底的边缘对倾斜表面的力导致在衬底的边缘上具有垂直分量的反作用力。这种垂直力可以减少边缘效应。

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