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    • 101. 发明申请
    • METHOD OF FORMING A BURIED PLATE BY ION IMPLANTATION
    • 通过离子植入形成板坯的方法
    • US20110201161A1
    • 2011-08-18
    • US12705768
    • 2010-02-15
    • Joseph ErvinGeng Wang
    • Joseph ErvinGeng Wang
    • H01L21/02H01L21/336
    • H01L21/84H01L21/2652H01L27/1087H01L27/1203H01L29/66181H01L29/78H01L29/945
    • A mask layer formed over a semiconductor substrate is lithographically patterned to form an opening therein. Ions are implanted at an angle that is normal to the surface of the semiconductor substrate through the opening and into an upper portion of the semiconductor substrate. Straggle of the implanted ions form a doped region that laterally extends beyond a horizontal cross-sectional area of the opening. A deep trench is formed by performing an anisotropic etch of a semiconductor material underneath the opening to a depth above a deep end of an implanted region. Ion implantation steps and anisotropic etch steps are alternately employed to extend the depth of the doped region and the depth of the deep trench, thereby forming a doped region around a deep trench that has narrow lateral dimensions. The doped region can be employed as a buried plate for a deep trench capacitor.
    • 在半导体衬底上形成的掩模层被光刻图案化以在其中形成开口。 离子以与半导体衬底的表面垂直的角度通过开口注入并进入半导体衬底的上部。 注入离子的束缚形成横向延伸超过开口的水平横截面积的掺杂区域。 通过对开口下方的半导体材料进行向注入区域的深端上方的深度的各向异性蚀刻来形成深沟槽。 交替使用离子注入步骤和各向异性蚀刻步骤来扩展掺杂区域的深度和深沟槽的深度,从而在具有窄横向尺寸的深沟槽周围形成掺杂区域。 掺杂区域可以用作深沟槽电容器的掩埋板。
    • 105. 发明授权
    • Detection of a defective disk of a hard disk drive
    • 检测硬盘驱动器的故障磁盘
    • US07212000B2
    • 2007-05-01
    • US10698866
    • 2003-10-30
    • Geng WangSang Lee
    • Geng WangSang Lee
    • G01B7/00
    • G11B27/36G11B20/1816G11B2220/2516
    • A method and apparatus for detecting a defective disk for a hard disk drive. The method includes placing a disk into a tester so that a first side of the disk is adjacent to a first head of the tester and a second side of the disk is adjacent to a second head. First data is read from the first side of the disk, and second data is read from the second side of the disk. The disk is then flipped so that the second side is adjacent to the first head and the first side is adjacent to the second head. Third data is read from the first side. Fourth data is read from the second side. A first area between a curve generated from the first data and a curve generated from the third data is calculated. Likewise, a second area is calculated between a curve generated from the second data and a curve generated from the fourth data. An average of the first and second areas is then calculated and used to detect a defective disk.
    • 一种用于检测用于硬盘驱动器的有缺陷的盘的方法和装置。 该方法包括将盘放入测试器中,使得盘的第一侧与测试器的第一头相邻,并且盘的第二侧与第二头相邻。 从盘的第一侧读取第一数据,从盘的第二侧读取第二数据。 然后将盘翻转,使得第二侧与第一头相邻,并且第一侧与第二头相邻。 从第一侧读取第三数据。 从第二侧读取第四数据。 计算从第一数据生成的曲线与从第三数据生成的曲线之间的第一区域。 类似地,在从第二数据产生的曲线和从第四数据生成的曲线之间计算第二区域。 然后计算第一和第二区域的平均值,并用于检测有缺陷的盘。
    • 106. 发明申请
    • METHOD OF FORMING A MOSFET WITH DUAL WORK FUNCTION MATERIALS
    • 形成具有双功能功能材料的MOSFET的方法
    • US20070051996A1
    • 2007-03-08
    • US11553072
    • 2006-10-26
    • Xiangdong ChenGeng WangYujun LiQiqing Ouyang
    • Xiangdong ChenGeng WangYujun LiQiqing Ouyang
    • H01L29/94
    • H01L29/66181H01L27/10864
    • A vertical pass transistor used in a DRAM cell for maintaining a low total leakage current and providing adequate drive current is described together with a method of fabricating such a device. The transistor gate is engineered in lieu of the channel. The vertical pass transistor for the DRAM cell incorporates two gate materials having different work functions. The gate material near the storage node is n-type doped polysilicon. The gate material near the bit line diffusion is made of silicide or metal having a higher work function than the n-polysilicon. The novel device structure shows several advantages: the channel doping is reduced while maintaining a high Vt and a low sub-threshold leakage current; the carrier mobility improves with the reduced channel doping; the body effect of the device is reduced which improves the write back current; and the sub-threshold swing is reduced because of the low channel doping.
    • 在DRAM单元中使用的用于保持低总漏电流并提供足够的驱动电流的垂直传输晶体管与制造这种器件的方法一起被描述。 晶体管栅极被设计代替通道。 用于DRAM单元的垂直传输晶体管包括具有不同功函数的两个栅极材料。 存储节点附近的栅极材料为n型掺杂多晶硅。 位线扩散附近的栅极材料由具有比n-多晶硅更高的功函数的硅化物或金属制成。 该新颖的器件结构显示出几个优点:沟道掺杂减少,同时保持高Vt和低的亚阈值漏电流; 载流子迁移率随着沟道掺杂的降低而提高; 减少了器件的体效,提高了回写电流; 并且由于低通道掺杂,子阈值摆幅减小。
    • 108. 发明授权
    • Method of estimating a thermal pole tip protrusion for a head gimbal assembly
    • 估计头部万向节组件的热极尖突起的方法
    • US07089649B2
    • 2006-08-15
    • US10256553
    • 2002-09-26
    • Geng WangHae Jung LeeKeung Youn ChoSang Lee
    • Geng WangHae Jung LeeKeung Youn ChoSang Lee
    • G11B5/127H04R31/00
    • G11B5/3136G11B5/012G11B5/455G11B5/4806G11B5/4833G11B5/484Y10T29/49025Y10T29/49027Y10T29/49028Y10T29/49032Y10T29/49036
    • Thermal pole tip protrusion is caused by materials in and around head slider expanding during write operations till they protrude, leading to contact with the rotating disk surface, altering the flying height and often wearing down part of the disk surface. While well known that read-write heads expand during writing, the inventors who recognized this situation's significance, particularly as flying height decreases and data rates increase, both required for high areal density disk drives. The inventors realized that they could detect the problem at the spin stand level by testing head gimbal assemblies to reliably, and inexpensively, predict the tendency for thermal pole tip protrusion. This leads to selection of head gimbal assemblies, which do not have the thermal pole tip protrusion tendency. The selected head gimbal assemblies have better reliability, as do actuators and disk drives made with the selected head gimbal assemblies.
    • 热敏头尖突起由写入操作期间头部滑块内和周围的材料引起,直到它们突出,导致与旋转盘表面接触,改变飞行高度并经常磨损盘表面的一部分。 虽然众所周知,读写头在写入期间扩展,但是认识到这种情况的重要性的发明人,特别是当高密度磁盘驱动器都需要飞行高度降低和数据速率增加时。 本发明人意识到,它们可以通过测试头万向架组件可靠且廉价地预测热极尖端突起的趋势来检测旋转台水平的问题。 这导致了不具有热极尖突起倾向的头万向节组件的选择。 所选择的头万向架组件具有更好的可靠性,与使用所选择的头万向架组件制造的致动器和磁盘驱动器一样。