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1. 发明申请

WO2003087867A3 EXTREME ULTRAVIOLET LIGHT SOURCE 审中-公开
公开(公告)号：WO2003087867A3
公开(公告)日：2003-10-23
申请号：PCT/US2003/011139
申请日：2003-04-09
申请人： CYMER, INC. , MELNYCHUK, Stephen, T. , PARTLO, William, N. , FOMENKOV, Igor, V. , OLIVER, I., Roger , NESS, Richard, M. , BOWERING, Norbert , KHODYKIN, Oleh , RETTIG, Curtis, L. , BLUMENSTOCK, Gerry, M. , DYER, Timothy, S. , SIMMONS, Rodney, D. , HOFFMAN, Jerzy, R. , JOHNSON, R., Mark
发明人： MELNYCHUK, Stephen, T. , PARTLO, William, N. , FOMENKOV, Igor, V. , OLIVER, I., Roger , NESS, Richard, M. , BOWERING, Norbert , KHODYKIN, Oleh , RETTIG, Curtis, L. , BLUMENSTOCK, Gerry, M. , DYER, Timothy, S. , SIMMONS, Rodney, D. , HOFFMAN, Jerzy, R. , JOHNSON, R., Mark
IPC分类号： G01J1/00
摘要： A reliable, high-repetition rate, production line compatible high energy photon source wherein hot plasma containing an atomic element having an emission line within a desired extreme ultraviolet (EUV) wavelength range is produced in a vacuum chamber. The EUV light source unit is integrated directly into a lithography unit such as a stepper machine. The integrated parts may include a commentator, and a compression head of a solid-state pulse power unit and a vacuum vessel all as shown at (120). Support equipment is located in a support equipment cabinet (122), and rough vacuum pumps and high-pressure water pumps are located in a third cabinet (124). The pulse power unit provides electrical pulses having sufficient energy and electrical potential sufficient to produce the EUV light at an intermediate focus at rates in excess of 5 Watts on a continuous basis and in excess of 20 Watts on a burst basis.

2. 发明申请

WO0201685A8 EXTREME REPETITION RATE GAS DISCHARGE LASER WITH IMPROVED BLOWER MOTOR 审中-公开
标题翻译：具有改进的鼓风机的极端重复速率排放激光器
公开(公告)号：WO0201685A8
公开(公告)日：2002-04-04
申请号：PCT/US0118691
申请日：2001-06-07
申请人： CYMER INC , OLIVER I ROGER , PARTLO WILLIAM N
发明人： OLIVER I ROGER , PARTLO WILLIAM N
IPC分类号： G03F7/20 , H01S3/036 , H01S3/038 , H01S3/04 , H01S3/041 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/11 , H01S3/134 , H01S3/22 , H01S3/225 , H03K3/57 , H03K17/80
CPC分类号： H01S3/225 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70483 , G03F7/70575 , G03F7/70933 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0404 , H01S3/041 , H01S3/097 , H01S3/09702 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/134 , H01S3/22 , H01S3/2207 , H03K3/57 , H03K17/80
摘要： A gas discharge laser capable of operating at pulse rates in the range of 4,000 Hz to 6,000 Hz at pulse energies in the range of 5 mJ to 10 mJ or greater. Important improvements over the prior art designs include: (1) a squirrel cage type fan (46A) for producing gas velocities in the discharge region of more than 67 m/s, (2) a liquid cooled drive motor having a low loss sealing member separating the motor from the motor starter and protecting the motor from the laser and breach detection device for detecting any breach of the sealing member, (3) a heat exchanger system (58A) capable of removing in excess of 16 kW of heat energy from the laser gas and (4) a pulse power system capable of providing precisely controlled electrical pulses to the electrodes (18A, 20A) to produce laser pulses at the desired pulse energies in the range of 5 mJ to 10 mJ or greater at pulse repetition rates in the range of 4,000 Hz to 6,000 Hz.
摘要翻译：一种气体放电激光器，能够以5mJ至10mJ或更大的脉冲能量在4000Hz至6,000Hz的脉冲频率下工作。与现有技术设计相比，重要的改进包括：（1）用于在放电区域产生大于67m / s的气体速度的鼠笼式风扇（46A），（2）具有低损耗密封件将电动机与电动机起动器分离并保护电动机免受激光破裂，检测装置检测到任何泄漏密封件;（3）热交换器系统（58A）能够从激光气体和（4）能够向电极（18A，20A）提供精确控制的电脉冲以在脉冲重复频率为5mJ至10mJ或更大范围内的期望脉冲能量产生激光脉冲的脉冲电源系统范围4,000 Hz至6,000 Hz。

3. 发明申请

WO2005091879A2 EUV LIGHT SOURCE 审中-公开
标题翻译： EUV光源
公开(公告)号：WO2005091879A2
公开(公告)日：2005-10-06
申请号：PCT/US2005005935
申请日：2005-02-24
申请人： CYMER INC , PARTLO WILLIAM N , BOWERING NORBERT R , ERSHOV ALEXANDER I , FOMENKOV IGOR V , OLIVER I ROGER , VIATELLA JOHN , JACQUES ROBERT N
发明人： PARTLO WILLIAM N , BOWERING NORBERT R , ERSHOV ALEXANDER I , FOMENKOV IGOR V , OLIVER I ROGER , VIATELLA JOHN , JACQUES ROBERT N
IPC分类号： G03F7/20 , G21K1/06 , H01J35/20 , H05G2/00
CPC分类号： G03F7/70033 , B82Y10/00 , G03F7/70175 , G03F7/70916 , G21K1/062 , G21K2201/061 , G21K2201/065 , G21K2201/067 , H05G2/003 , H05G2/005 , H05G2/006 , H05G2/008
摘要： An apparatus and method for EUV light production is disclosed which may comprise a laser produced plasma ("LPP") extreme ultraviolet ("EUV") light source control system comprising a target delivery system adapted to deliver moving plasma initiation targets and an EUV light collection optic having a focus defining a desired plasma initiation site, comprising: a target tracking and feedback system comprising: at least one imaging device providing as an output an image of a target stream track, wherein the target stream track results from the imaging speed of the camera being too slow to image individual plasma formation targets forming the target stream imaged as the target stream track; a stream track error detector detecting an error in the position of the target stream track in at least one axis generally perpendicular to the target stream track from a desired stream track intersecting the desired plasma initiation site. At least one target crossing detector may be aimed at the target track and detecting the passage of a plasma formation target through a selected point in the target track. A drive laser triggering mechanism utilizing an output of the target crossing detector to determine the timing of a drive laser trigger in order for a drive laser output pulse to intersect the plasma initiation target at a selected plasma initiation site along the target track at generally its closest approach to the desired plasma initiation site. A plasma initiation detector may be aimed at the target track and detecting the location along the target track of a plasma initiation site for a respective target. An intermediate focus illuminator may illuminate an aperture formed at the intermediate focus to image the aperture in the at least one imaging device. The at least one imaging device may be at least two imaging devices each providing an error signal related to the separation of the target track from the vertical centerline axis of the image of the intermediate focus based upon an analysis of the image in the respective one of the at least two imaging devices. A target delivery feedback and control system may comprise a target delivery unit; a target delivery displacement control mechanism displacing the target delivery mechanism at least in an axis corresponding to a first displacement error signal derived from the analysis of the image in the first imaging device and at least in an axis corresponding to a second displacement error signal derived from the analysis of the image in the second imaging device.
摘要翻译：公开了一种用于EUV光产生的装置和方法，其可以包括激光产生的等离子体（“LPP”）极紫外（“EUV”）光源控制系统，其包括适于递送移动等离子体引发靶的目标传送系统和EUV光收集光学元件具有限定期望的等离子体起始位置的焦点，包括：目标跟踪和反馈系统，包括：至少一个成像装置，其提供目标流轨迹的图像作为输出，其中，所述目标流轨迹来自所述目标流轨迹的成像速度摄像机太慢，不能成像形成被作为目标流轨迹成像的目标流的各个等离子体形成目标; 流轨迹误差检测器，从与期望的等离子体起始位置相交的期望的流轨道检测在大致垂直于目标流轨迹的至少一个轴上的目标流轨迹位置的误差。至少一个目标交叉检测器可以瞄准目标轨道并且检测等离子体形成目标通过目标轨道中的选定点的通过。驱动激光触发机构利用目标交叉检测器的输出来确定驱动激光触发的定时，以便驱动激光输出脉冲在等离子体引发目标处沿着目标轨道在一般最接近的等离子体起始位置处相交接近所需的等离子体引发位点。等离子体起始检测器可以瞄准目标轨道并且检测针对相应目标的等离子体起始位置沿着目标轨迹的位置。中间焦点照明器可以照亮形成在中间焦点处的孔，以对至少一个成像装置中的孔进行成像。所述至少一个成像装置可以是至少两个成像装置，每个成像装置基于对所述中间焦点的图像的图像的分析，提供与所述目标轨道与所述中间焦点的图像的垂直中心线轴线分离相关的误差信号所述至少两个成像装置。目标传送反馈和控制系统可以包括目标传送单元; 目标传送位移控制机构至少在对应于从第一成像装置中的图像的分析导出的第一位移误差信号的轴上移动目标传送机构，并且至少在与由第二位移误差信号对第二成像装置中的图像进行分析。

4. 发明申请

WO2005091879A3 EUV LIGHT SOURCE 审中-公开
公开(公告)号：WO2005091879A3
公开(公告)日：2005-10-06
申请号：PCT/US2005/005935
申请日：2005-02-24
申请人： CYMER, INC. , PARTLO, William, N. , BOWERING, Norbert, R. , ERSHOV, Alexander, I. , FOMENKOV, Igor, V. , OLIVER, I., Roger , VIATELLA, John , JACQUES, Robert, N.
发明人： PARTLO, William, N. , BOWERING, Norbert, R. , ERSHOV, Alexander, I. , FOMENKOV, Igor, V. , OLIVER, I., Roger , VIATELLA, John , JACQUES, Robert, N.
IPC分类号： H01J35/20
摘要： A laser produced plasma extreme ultraviolet light source control system (10) includes a target delivery system (80) for delivering plasma initiation targets (20), an EUV light collection optic (40), a target tracking and feedback system (150), at least one imaging device (60, 62) for providing an image of a target stream track (92); a stream track error detector (120, 122) for detecting an error in the position of the target stream track (92) in at least one axis perpendicular to the target stream track (92).

5. 发明申请

WO2003087867A2 EXTREME ULTRAVIOLET LIGHT SOURCE 审中-公开
标题翻译：极光紫外线光源
公开(公告)号：WO2003087867A2
公开(公告)日：2003-10-23
申请号：PCT/US2003/011139
申请日：2003-04-09
申请人： CYMER, INC. , MELNYCHUK, Stephen, T. , PARTLO, William, N. , FOMENKOV, Igor, V. , OLIVER, I., Roger , NESS, Richard, M. , BOWERING, Norbert , KHODYKIN, Oleh , RETTIG, Curtis, L. , BLUMENSTOCK, Gerry, M. , DYER, Timothy, S. , SIMMONS, Rodney, D. , HOFFMAN, Jerzy, R. , JOHNSON, R., Mark
发明人： MELNYCHUK, Stephen, T. , PARTLO, William, N. , FOMENKOV, Igor, V. , OLIVER, I., Roger , NESS, Richard, M. , BOWERING, Norbert , KHODYKIN, Oleh , RETTIG, Curtis, L. , BLUMENSTOCK, Gerry, M. , DYER, Timothy, S. , SIMMONS, Rodney, D. , HOFFMAN, Jerzy, R. , JOHNSON, R., Mark
IPC分类号： G01S
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70175 , G03F7/70916 , H01S3/005 , H05G2/005 , H05G2/008 , H05H1/06
摘要： The present invention provides a reliable, high-repetition rate, production line compatible high-energy photon source. Very hot plasma containing an active material is produced in vacuum chamber. The active material is an atomic element having an emission line within a desired extreme ultraviolet (EUV) range. A pulse power source comprising a charging capacitor and a magnetic compression circuit comprising a pulse transformer provides electrical pulses having sufficient energy and electrical potential sufficient to produce the EUV light at an intermediate focus at rates in excess of 5 Watts. In preferred embodiments designed by Applicants in-band, EUV light energy at the intermediate focus is 45 Watts extendable to 105.8 Watts.
摘要翻译：在真空室中产生可靠的高重复率生产线相容的高能光子源，其中包含具有期望的极紫外（EUV）波长范围内的发射线的原子元素的热等离子体。 EUV光源单元直接集成到诸如步进机之类的光刻单元中。集成部件可以包括评论者，以及如（120）所示的固态脉冲功率单元和真空容器的压缩头。支撑设备位于支撑设备柜（122）中，粗抽真空泵和高压水泵位于第三柜（124）中。脉冲功率单元提供电脉冲，其具有足够的能量和电势，足以在连续的基础上以超过5瓦的速率在中间焦点产生EUV光，并且在突发的基础上超过20瓦。

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