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1. 发明申请

WO2021097140A1 WIDELY TUNABLE COMPACT TERAHERTZ GAS LASERS 审中-公开
公开(公告)号：WO2021097140A1
公开(公告)日：2021-05-20
申请号：PCT/US2020/060299
申请日：2020-11-12
申请人： PRESIDENT AND FELLOWS OF HARVARD COLLEGE , MASSACHUSETTS INSTITUTE OF TECHNOLOGY , THE UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF THE ARMY , EVERITT, Henry O.
发明人： CHEVALIER, Paul , AMIRZHAN, Arman , PICCARDO, Marco , WANG, Fan , JOHNSON, Steven , CAPASSO, Federico
IPC分类号： H01S3/0941 , H01S3/14 , H01S3/22 , H01S3/223 , H01S5/00
摘要： Disclosed is a laser system including a first laser and a second laser. The first laser includes a laser cavity, and a gas phase molecular gain medium disposed in the laser cavity, the gain medium having an absorption band. The second laser is a solid state laser configured to be continuously tunable, with respect to an emission wavelength of the second laser, over the absorption band of the gain medium, and the second laser is tuned to pump rotational vibrational transitions in the gain medium to achieve a rotational population inversion.

2. 发明申请

WO2020052744A1 OPTISCHE BAUGRUPPE, INSBESONDERE ZUR POLARISATION EINES LASERSTRAHLS, UND EUV-STRAHLUNGSERZEUGUNGSVORRICHTUNG DAMIT 审中-公开
公开(公告)号：WO2020052744A1
公开(公告)日：2020-03-19
申请号：PCT/EP2018/074547
申请日：2018-09-12
申请人： TRUMPF LASERSYSTEMS FOR SEMICONDUCTOR MANUFACTURING GMBH
发明人： ERICHSON, Oliver
IPC分类号： G02B7/00 , G02B5/30 , G02B27/28 , H01S3/22
摘要： Die Erfindung betrifft eine optische Baugruppe (23), insbesondere zur Polarisation eines Laserstrahls (30), umfassend: eine Mehrzahl von plattenförmigen optischen Elementen (5, 6,...) mit einer Strahleintrittsfläche (5a, 6a,...) und einer Strahlaustrittsfläche (5b, 6b,...) sowie eine Halterung (1) zur gemeinsamen Fixierung der plattenförmigen optischen Elemente (5, 6,...), Zwischen jeweils zwei benachbarten plattenförmigen optischen Elementen (5, 6,...) sind mindestens drei Abstandshalter (11a, 11b,...) angeordnet, die jeweils zur punktförmigen Anlage an einer Strahlaustrittsfläche (5a, 6a,...) eines ersten plattenförmigen optischen Elements (5) und zur punktförmigen Anlage an einer Strahleintrittsfläche (6b, 7b,...) eines zweiten, benachbarten plattenförmigen optischen Elements (6) ausgebildet sind. Die Erfindung betrifft auch eine EUV-Strahlungserzeugungsvorrichtung mit mindestens einer solchen optischen Baugruppe (23).

3. 发明申请

WO2018075246A1 SPECTRAL FEATURE CONTROL APPARATUS 审中-公开
标题翻译：光谱特征控制装置
公开(公告)号：WO2018075246A1
公开(公告)日：2018-04-26
申请号：PCT/US2017/055161
申请日：2017-10-04
申请人： CYMER, LLC
发明人： MASON, Eric Anders
IPC分类号： G02B27/09 , G03F7/20 , H01S3/00 , H01S3/08 , H01S3/125 , H01S3/22
摘要： A spectral feature selection apparatus includes a dispersive optical, element arranged to interact with a pulsed light beam; three or more refractive optical elements arranged in a path of the pulsed light beam between the dispersive optical element and a pulsed optical source; and one or more actuation systems, each actuation system associated with a refractive optical element and configured to rotate the associated refractive optical element to thereby adjust a spectral feature of the pulsed light beam. At least one of the actuation systems is a rapid actuation system that includes a rapid actuator configured to rotate its associated refractive optical element about a rotation axis. The rapid actuator includes a rotary stepper motor having a rotation shaft that rotates about a shaft axis that is parallel with the rotation axis of the associated refractive optical element.
摘要翻译：一种光谱特征选择设备，包括：色散光学元件，被布置为与脉冲光束相互作用; 三个或更多个折射光学元件，布置在色散光学元件和脉冲光源之间的脉冲光束的路径中; 以及一个或多个致动系统，每个致动系统与折射光学元件相关联并且被配置为旋转相关联的折射光学元件，从而调整脉冲光束的光谱特征。致动系统中的至少一个是包括快速致动器的快速致动系统，该快速致动器被配置成围绕旋转轴线旋转其相关联的折射光学元件。快速致动器包括旋转步进电机，该旋转步进电机具有围绕与关联的折射光学元件的旋转轴线平行的轴线旋转的旋转轴。

4. 发明申请

WO2013101374A1 SYSTEM AND METHOD FOR EXTENDING GAS LIFE IN A TWO CHAMBER GAS DISCHARGE LASER SYSTEM 审中-公开
标题翻译：用于在两个气室放气激光系统中延长气体寿命的系统和方法
公开(公告)号：WO2013101374A1
公开(公告)日：2013-07-04
申请号：PCT/US2012/066677
申请日：2012-11-27
申请人： CYMER, INC
发明人： RIGGS, Daniel, J.
IPC分类号： H01S3/22
CPC分类号： H01S3/036 , H01S3/104 , H01S3/225 , H01S3/2308
摘要： A method and system for performing injects of halogen gas into the chambers of a two chamber gas discharge laser such as a MOPA excimer laser for allowing operation of the laser within acceptable parameters and compensating for ageing effects without the necessity of performing refills is described. A parameter reflecting the efficiency of the laser is measured and the change in the parameter with respect to the length of operation of the laser is estimated. The change in the parameter with respect to the pressure in one of the chambers is also measured. At a given time, the total change in the value of the parameter is estimated, and from this the amount of change in pressure that is needed to reverse the change in the value of the parameter is calculated.
摘要翻译：描述了一种用于将卤素气体注入到诸如MOPA准分子激光器的两室气体放电激光器的腔室中的方法和系统，用于允许激光器在可接受的参数内操作并补偿老化效应，而不需要进行再填充。测量反映激光器效率的参数，并且估计参数相对于激光器的操作长度的变化。还测量了相对于一个室中的压力的参数的变化。在给定时间，估计参数值的总体变化，并从此计算反转参数值变化所需的压力变化量。

5. 发明申请

WO2012146874A1 DISPOSITIF D'EXCITATION D'UNE COLONNE DE GAZ ENFERMEE DANS UNE FIBRE OPTIQUE A CŒUR CREUX 审中-公开
标题翻译：用于激活中空光纤的气体柱的装置
公开(公告)号：WO2012146874A1
公开(公告)日：2012-11-01
申请号：PCT/FR2012/050927
申请日：2012-04-26
申请人： UNIVERSITE DE LIMOGES , BENABID, Fetah , BLONDY, Jean-Marc , DEBORD, Benoit , GERÔME, Frédéric , JAMIER, Raphael , LEPRINCE, Philippe
发明人： BENABID, Fetah , BLONDY, Jean-Marc , DEBORD, Benoit , GERÔME, Frédéric , JAMIER, Raphael , LEPRINCE, Philippe
IPC分类号： H01S3/0975 , H01S3/032 , H01S3/22 , H05H1/46 , H01J65/04 , H01S3/067 , G02B6/02
CPC分类号： H01S1/06 , G02B6/02328 , H01J65/042 , H01S3/0323 , H01S3/06741 , H01S3/0975 , H01S3/22 , H05H1/46 , H05H2001/4615
摘要： L'objet de l' invention est un dispositif d'excitation d'un milieu gazeux (10) contenu dans une enveloppe (12), ledit dispositif étant couplé à ladite enveloppe (12) et disposé à l'extérieur de ladite enveloppe (12) et comprenant un applicateur susceptible de générer sur au moins une portion de ladite enveloppe (12) une excitation latérale à l'intérieur de ladite enveloppe (12), caractérisé en ce que l'enveloppe (12) est une structure diélectrique photonique à cœur creux (16) dont le cœur a un diamètre inférieur à 300 μτη et en ce que l'applicateur est de type micro-onde et permet de générer une onde de surface apte à créer et confiner un micro-plasma à partir du milieu gazeux contenu dans l'enveloppe (12).
摘要翻译：本发明涉及一种用于激发包含在壳体（12）中的气体介质（10）的装置，所述装置联接到壳体（12）并且设置在外部并且包括可在壳体内产生横向激励的施加器（12）的至少一部分。该装置的特征在于，壳体（12）是中空光子介质结构（16），其中芯具有小于300μm的直径，并且施加器是微波型的，并且可以用于产生能够从包含在壳体（12）中的气体介质产生和限制微等离子体的表面波。

6. 发明申请

WO2011142849A2 GAS FILLED HOLLOW FIBER LASER 审中-公开
标题翻译：气体填充中空纤维激光
公开(公告)号：WO2011142849A2
公开(公告)日：2011-11-17
申请号：PCT/US2011022080
申请日：2011-01-21
申请人： RUDOLPH WOLFGANG G , RATANAVIS AMARIN , NAMPOOTHIRI VASUDEVAN , CORWIN KRISTAN L , JONES ANDREW M , WASHBURN BRIAN R , KADEL RAJESH , ZAVADA JOHN M
发明人： RUDOLPH WOLFGANG G , RATANAVIS AMARIN , NAMPOOTHIRI VASUDEVAN , CORWIN KRISTAN L , JONES ANDREW M , WASHBURN BRIAN R , KADEL RAJESH , ZAVADA JOHN M
IPC分类号： H01S3/067 , H01S3/097 , H01S3/22
CPC分类号： H01S3/223 , H01S3/06741 , H01S3/094003 , H01S3/0943 , H01S3/2232
摘要： Apparatus, systems, and methods using an optically pumped gas filled hollow fiber laser can be implemented in a variety of applications. In various embodiments, operation of an optically pumped gas filled hollow fiber laser is based on population inversion in the gas. Additional apparatus, systems, and methods are disclosed.
摘要翻译：使用光泵浦气体填充中空纤维激光器的装置，系统和方法可以在各种应用中实现。在各种实施例中，光泵浦气体填充中空纤维激光器的操作基于气体中的群体反转。公开了附加装置，系统和方法。

7. 发明申请

WO2006060361A3 METHOD AND APPARATUS FOR GAS DISCHARGE LASER BANDWIDTH AND CENTER WAVELENGTH CONTROL 审中-公开
标题翻译：气体放电激光带宽和中心波长控制的方法和装置
公开(公告)号：WO2006060361A3
公开(公告)日：2009-04-16
申请号：PCT/US2005043059
申请日：2005-11-28
申请人： CYMER INC , TRINTCHOUK FEDOR B , JACQUES ROBERT N
发明人： TRINTCHOUK FEDOR B , JACQUES ROBERT N
IPC分类号： H01S3/22 , H01S3/223
CPC分类号： H01S3/1055 , B82Y10/00 , G03F7/70033 , G03F7/70041 , H01S3/08072 , H01S3/097 , H01S3/10069 , H01S3/225
摘要： A gas discharge laser system bandwidth control mechanism and method of operation for controlling bandwidth in a laser output light pulse generated in the gas discharge laser system is disclosed which may comprise a bandwidth controller which may comprise an active bandwidth adjustment mechanism; a controller actively controlling the active bandwidth adjustment mechanism utilizing an algorithm implementing bandwidth thermal transient correction based upon a model of the impact of laser system operation on the wavefront of the laser light pulse being generated and line narrowed in the laser system as it is incident on the bandwidth adjustment mechanism. The controller algorithm may comprises a function of the power deposition history in at least a portion of an optical train of the gas discharge laser system, e.g., a linear function, e.g., a combination of a plurality of decay functions each comprising a respective decay time constant and a respective coefficient.
摘要翻译：公开了一种气体放电激光器系统带宽控制机构和用于控制在气体放电激光器系统中产生的激光输出光脉冲中的带宽的操作方法，其可以包括带宽控制器，其可以包括有源带宽调整机构; 控制器主动地控制有源带宽调整机制，利用实现带宽热瞬变校正的算法，该算法基于激光系统操作对激光系统中产生的激光光脉冲的波前的影响的模型，并且在激光系统中入射时产生线窄带宽调整机制。控制器算法可以包括在气体放电激光系统的光学系列的至少一部分中的功率沉积历史的功能，例如线性函数，例如多个衰减函数的组合，每个衰减函数包括相应的衰减时间常数和相应的系数。

8. 发明申请

WO2008105988A2 LASER GAS INJECTION SYSTEM 审中-公开
标题翻译：激光喷射系统
公开(公告)号：WO2008105988A2
公开(公告)日：2008-09-04
申请号：PCT/US2008001348
申请日：2008-02-01
申请人： CYMER INC , DUNSTAN WAYNE J , O'BRIEN KEVIN M , JACQUES ROBERT N , BESAUCELE HERVE A , RIGGS DANIEL J , RATNAM ARAVIND
发明人： DUNSTAN WAYNE J , O'BRIEN KEVIN M , JACQUES ROBERT N , BESAUCELE HERVE A , RIGGS DANIEL J , RATNAM ARAVIND
IPC分类号： H01S3/22
CPC分类号： H01S3/036 , G03F7/70025 , G03F7/70525 , G03F7/70975 , H01S3/0014 , H01S3/1305 , H01S3/1306 , H01S3/134 , H01S3/2251 , H01S3/2256
摘要： A method and apparatus are disclosed which may comprise predicting the gas lifetime for a gas discharge laser light source for a photolithography process, the light source comprising a halogen contaim'ng lasing gas may comprise: utilizing at least one of a plurality of laser operating input and/or output parameters; utilizing a set of at least one parameter of utilization in the photolithography process to determine a gas use model in relation to the respective input or output parameter; predicting the end of gas life based upon the model and a measurement of the respective input or output parameter. The parameter may comprise a pulse utilization pattern. The method and apparatus may comprise performing gas management for a gas discharge laser light source for a photolithography process, the light source comprising a halogen containing lasing gas comprising: utilizing periodic and frequent partial gas refills comprising an inject comprising a mixture of halogen gas and bulk gas in generally the same ration as the premix ratio provided to the laser in a full gas refill, and in an amount less than two percent of the total gas pressure prior to the injection.
摘要翻译：公开了一种可以包括预测用于光刻工艺的气体放电激光源的气体寿命的方法和装置，包括卤素阻挡激光气体的光源可以包括：利用多个激光操作输入中的至少一个和/或输出参数; 在光刻工艺中利用一组至少一个利用参数来确定相对于相应的输入或输出参数的气体使用模型; 根据模型和相应的输入或输出参数的测量来预测气体寿命的结束。该参数可以包括脉冲利用模式。该方法和装置可以包括对用于光刻工艺的气体放电激光光源执行气体管理，该光源包括含卤素的激光气体，其包括：利用周期性和频繁的部分气体再填充，其包括含有卤素气体和体积的混合物气体通常与在全气体再填充中提供给激光器的预混合比率相同，并且其量小于注射前总气体压力的2％。

9. 发明申请

WO2006039157A3 MULTI-CHAMBERED EXCIMER OR MOLECULAR FLUORINE GAS DISCHARGE LASER FLUORINE INJECTION CONTROL 审中-公开
标题翻译：多层离子注射器或分子荧光体排放激光器氟注射控制
公开(公告)号：WO2006039157A3
公开(公告)日：2008-02-07
申请号：PCT/US2005033754
申请日：2005-09-19
申请人： CYMER INC , BESAUCELE HERVE A , DUNSTAN WAYNE J , ISHIHARA TOSHIHIKO , JACQUES ROBERT N , TRINTCHOUK FEDOR B
发明人： BESAUCELE HERVE A , DUNSTAN WAYNE J , ISHIHARA TOSHIHIKO , JACQUES ROBERT N , TRINTCHOUK FEDOR B
IPC分类号： H01S3/22 , H01S3/036 , H01S3/223 , H01S3/225 , H01S3/23
CPC分类号： H01S3/036 , H01S3/225 , H01S3/2316 , H01S3/2366
摘要： A multi-chambered excimer or molecular halogen gas discharge laser system comprising at least one oscillator chamber and at least one amplifier chamber producing oscillator output laser light pulses that are amplified in the at least one power chamber, having a fluorine injection control system and a method of using same is disclosed, which may comprise: a halogen gas consumption estimator: estimating the amount of halogen gas that has been consumed in one of the at least one oscillator chamber based upon at least a first operating parameter of one of the least one oscillator chamber and the at least one amplifier chamber, and the difference between a second operating parameter of the at least one oscillator chamber and the at least one amplifier chamber, and estimating the amount of halogen gas that has been consumed in the other of the at least one oscillator chamber and the at least one amplifier chamber based upon at least a third operating parameter of the other of the at least one oscillator chamber and the at least one amplifier chamber, and producing an output representative of an estimated halogen gas consumption in the at least one oscillator chamber and of the halogen gas consumption in the at least one amplifier chamber, and a halogen gas injection controller determining the amount of halogen gas injection for the at least one oscillator chamber and the at least one amplifier chamber based upon the estimated fluorine consumption outputs from the fluorine consumption estimator and a cost function comprising a plurality of weighted injection decision determinations.
摘要翻译：一种多室准分子或分子卤素气体放电激光系统，包括至少一个振荡器室和至少一个产生振荡器的放大器室输出在至少一个功率室中放大的激光脉冲，具有氟注入控制系统和方法公开了它们，其可以包括：卤素气体消耗估计器：基于至少一个振荡器之一的至少一个振荡器中的至少一个的至少一个振荡器的至少第一操作参数来估计在至少一个振荡器室中的一个中消耗的卤素气体的量室和所述至少一个放大器室，以及所述至少一个振荡器室和所述至少一个放大器室的第二操作参数之间的差异，以及估计至少在另一个中消耗的卤素气体的量基于所述至少一个的另一个的至少第三操作参数，一个振荡器室和所述至少一个放大器室 e振荡器室和所述至少一个放大器室，并且产生代表所述至少一个振荡器室中的估计的卤素气体消耗的值和在所述至少一个放大器室中的卤素气体消耗的输出，以及卤素气体注入控制器确定基于来自氟消耗估计器的估计的氟消耗量输出和包括多个加权喷射判定确定的成本函数，至少一个振荡室和至少一个放大器室的卤素气体注入量。

10. 发明申请

WO2007005512A3 GAS DISCHARGE LASER LINE NARROWING MODULE 审中-公开
标题翻译：气体放电激光线路延迟模块
公开(公告)号：WO2007005512A3
公开(公告)日：2007-11-22
申请号：PCT/US2006025350
申请日：2006-06-28
申请人： CYMER INC , CYBULSKI RAYMOND F , BERGSTEDT ROBERT A , PARTLO WILLIAM N , SANDSTROM RICHARD L , WANG GON
发明人： CYBULSKI RAYMOND F , BERGSTEDT ROBERT A , PARTLO WILLIAM N , SANDSTROM RICHARD L , WANG GON
IPC分类号： H01S3/22 , H01S3/03
CPC分类号： H01S3/03 , H01S3/034 , H01S3/036 , H01S3/1055 , H01S3/225
摘要： A line narrowed gas discharge laser system and method of operating same is disclosed which may comprise a dispersive center wavelength selective element; a beam expander comprising a plurality of refractive elements; a refractive element positioning mechanism positioning at least one of the refractive elements to modify an angle of incidence of a laser light beam on the dispersive center wavelength selection element; each of the dispersive center wavelength selection element and the beam expander being aligned with each other and with a housing containing at least the dispersive center wavelength selection element; a housing positioning mechanism positioning the housing with respect to an optical axis of the gas discharge laser system. The dispersive element may comprise a grating and the beam expander may comprise a plurality of prisms. The housing may contain the dispersive center wavelength selective element and the beam expander. The housing positioning element may comprise a position locking mechanism.
摘要翻译：公开了一种窄气体放电激光系统及其操作方法，其可以包括分散中心波长选择元件; 包括多个折射元件的光束扩展器; 折射元件定位机构，其定位折射元件中的至少一个，以改变激光束在分散中心波长选择元件上的入射角; 分散中心波长选择元件和扩束器中的每一个彼此对准并且至少包含分散中心波长选择元件的壳体; 壳体定位机构相对于气体放电激光系统的光轴定位壳体。色散元件可以包括光栅，并且光束扩展器可以包括多个棱镜。壳体可以包含分散中心波长选择元件和扩束器。壳体定位元件可以包括位置锁定机构。

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