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1. 发明申请

WO2021158576A1 MICRO STIGMATOR ARRAY FOR MULTI-ELECTRON BEAM SYSTEM 审中-公开
公开(公告)号：WO2021158576A1
公开(公告)日：2021-08-12
申请号：PCT/US2021/016271
申请日：2021-02-03
申请人： KLA CORPORATION
发明人： JIANG, Xinrong , SEARS, Christopher
IPC分类号： H01J37/153 , H01J37/06 , H01J37/10 , H01J37/28
摘要： A system is disclosed. In embodiments, the system includes an electron source and a micro-lens array (MLA) configured to receive one or more primary electron beams from the electron source and split the one or more primary electron beams into a plurality of primary electron beamlets. In embodiments, the system further includes a micro-stigmator array (MSA) including a plurality of dodecapole electrostatic stigmators, wherein the MSA is configured to eliminate at least one of fourth-order focusing aberrations or sixth-order focusing aberrations of the plurality of primary electron beamlets. In embodiments, the system further includes projection optics configured to receive the plurality of primary electron beamlets and focus the plurality of primary electron beamlets onto a surface of a sample.

2. 发明申请

WO2021080420A1 MULTI-BEAM CHARGED PARTICLE SOURCE WITH ALIGNMENT MEANS 审中-公开
公开(公告)号：WO2021080420A1
公开(公告)日：2021-04-29
申请号：PCT/NL2020/050645
申请日：2020-10-20
申请人： TECHNISCHE UNIVERSITEIT DELFT , APPLIED MATERIALS ISRAEL, LTD.
发明人： KRUIT, Pieter
IPC分类号： H01J37/10 , H01J37/147
摘要： The invention relates to an apparatus and method for generating a plurality of substantially collimated charged particle beamlets. The apparatus comprises a charged particle source for generating a diverging charged particle beam, a beam splitter for splitting said charged particle beam in an array of charged particle beamlets, a deflector array comprising an array of deflectors comprising one deflector for each charged particle beamlet of said array of charged particle beamlets, wherein the deflector array is configured for substantially collimating the array of diverging charged particle beamlets. The apparatus further comprises a beam manipulation device configured for generating electric and/or magnetic fields at least in an area between the charged particle source and the deflector array. The apparatus comprises a central axis, and the beam manipulation device is configured for generating electric and/or magnetic fields substantially parallel to the central axis and substantially perpendicular to the central axis.

3. 发明申请

WO2018173241A1 荷電粒子線装置、及び荷電粒子線装置の調整方法审中-公开
公开(公告)号：WO2018173241A1
公开(公告)日：2018-09-27
申请号：PCT/JP2017/011907
申请日：2017-03-24
申请人：株式会社日立ハイテクノロジーズ
发明人：長谷川　正樹 , 尾方　智彦 , 兼岡　則幸 , 村越　久弥 , 小貫　勝則
IPC分类号： H01J37/10 , G01N23/203 , G01N23/225 , H01J37/04 , H01J37/21 , H01J37/22 , H01J37/29
摘要：本発明は、ビームの適正な評価に基づく装置調整を行う荷電粒子線装置の提供を目的とする。本発明では上記目的を達成するために、荷電粒子源から放出された荷電粒子ビームを収束するレンズを含む照射光学系と、試料に向かって前記荷電粒子ビームを照射することによって得られる荷電粒子を撮像素子に結像する結像光学系を備えた荷電粒子線装置であって、前記レンズを制御する制御装置を備え、当該制御装置は、前記試料に前記荷電粒子ビームを到達させることによって得られる特定輝度領域のサイズを、前記レンズの条件ごとに評価し、当該サイズ情報が所定の条件を満たすレンズ条件を選択する荷電粒子線装置を提案する。

4. 发明申请

WO2017094721A1 荷電粒子線装置及び走査電子顕微鏡审中-公开
标题翻译：带电粒子束仪和扫描电子显微镜
公开(公告)号：WO2017094721A1
公开(公告)日：2017-06-08
申请号：PCT/JP2016/085406
申请日：2016-11-29
申请人：松定プレシジョン株式会社
发明人：熊本　和哉 , 松田　定好
IPC分类号： H01J37/244 , H01J37/10 , H01J37/22 , H01J37/28
CPC分类号： H01J37/10 , H01J37/22 , H01J37/244 , H01J37/28
摘要：荷電粒子線装置は、荷電粒子線（１２）を放出する荷電粒子源と、荷電粒子源に接続され、荷電粒子線（１２）を加速する加速電源と、荷電粒子線（１２）を試料（２３）に集束させる第２の対物レンズ（２６）と、第２の検出器（１１０）とを有する。第２の対物レンズ（２６）は、試料（２３）に対して荷電粒子線（１２）が入射する側の反対側に設置されている。第２の検出器（１１０）には、荷電粒子線（１２）の入射に伴い試料（２３）から放出された電磁波及び試料（２３）で反射された電磁波のうち少なくとも１つが入射する。第２の検出器（１１０）は、入射した電磁波を検出する。
摘要翻译：带电粒子束装置包括发射带电粒子束（12）的带电粒子源，连接到带电粒子源并加速带电粒子束（12）的加速电源，带电粒子束用于将线（12）聚焦到样品（23）上的第二物镜（26），以及第二检测器（110）。第二物镜（26）相对于样品（23）安装在带电粒子束（12）入射侧的相反侧。随着带电粒子束（12）入射，从样本（23）发射的电磁波和由样本（23）反射的电磁波中的至少一个入射到第二检测器（110）。第二检测器（110）检测入射的电磁波。

5. 发明申请

WO2022194482A1 FLOOD COLUMN AND CHARGED PARTICLEAPPARATUS 审中-公开
公开(公告)号：WO2022194482A1
公开(公告)日：2022-09-22
申请号：PCT/EP2022/053966
申请日：2022-02-17
申请人： ASML NETHERLANDS B.V.
发明人： OTTEN, Christiaan , TEUNISSEN, Christan , SCHEEPERS, Paul, Hendricus , MEIJER, Joseph, Reinier
IPC分类号： H01J37/02 , H01J37/10 , H01J37/28
摘要： Disclosed herein is a flood column for projecting a charged particle flooding beam along a beam path towards a sample to flood the sample with charged particles prior to assessment of the flooded sample using an assessment column, the flood column comprising: an anchor body arranged along the beam path; a lens arrangement arranged in a down-beam part of the flood column; and a lens support arranged between the anchor body and the lens arrangement; wherein the lens support is configured to position the lens arrangement and the anchor body relative to each other; the lens support comprises an electrical insulator; and the lens support is in the direct line of sight of at least a portion of the beam path in the down-beam part.

6. 发明申请

WO2022058253A2 CHARGED PARTICLE ASSESSMENT TOOL, INSPECTION METHOD 审中-公开
公开(公告)号：WO2022058253A2
公开(公告)日：2022-03-24
申请号：PCT/EP2021/075019
申请日：2021-09-10
申请人： ASML NETHERLANDS B.V.
发明人： WIELAND, Marco, Jan-Jaco
IPC分类号： H01J37/04 , H01J37/10 , H01J37/28 , H01J2237/04756 , H01J2237/0492 , H01J2237/1205
摘要： A multi-beam electron-optical system for a charged-particle assessment tool, the system comprising: a plurality of control lenses, a plurality of objective lenses and a controller. The plurality of control lenses are configured to control a parameter of a respective sub-beam. The plurality of objective lenses are configured to project one of the plurality of charged-particle beams onto a sample. The controller controls the control lenses and the objective lenses so that the charged particles are incident on the sample with a desired landing energy, demagnification and/or beam opening angle.

7. 发明申请

WO2017193061A1 MINIATURE ELECTRON BEAM LENS ARRAY USE AS COMMON PLATFORM EBEAM WAFER METROLOGY, IMAGING AND MATERIAL ANALYSIS SYSTEM 审中-公开
标题翻译：微型电子束透镜阵列用作普通平台EBEAM WAFER计量，成像和材料分析系统
公开(公告)号：WO2017193061A1
公开(公告)日：2017-11-09
申请号：PCT/US2017/031391
申请日：2017-05-05
申请人： XU, Weiwei
发明人： XU, Weiwei
IPC分类号： H01J37/147 , G21K1/093 , H01J37/10 , H01J37/21 , H01J37/26
CPC分类号： H01J37/26 , H01J37/10 , H01J37/147 , H01J37/153 , H01J37/21
摘要： An apparatus includes at least one electron beam column, with an electron emitter source, a gun lens focusing electrons from the electron emitter source into an electron beam, and a final beam forming aperture. Each electron beam column includes one or more of a double Wein filter disposed along a trajectory of the electron beam between the gun lens and the final beam forming aperture, and a dispersion corrector disposed along a trajectory of the electron beam after the final beam forming aperture.
摘要翻译：一种装置包括至少一个电子束柱，其具有电子发射源，将来自电子发射源的电子聚焦成电子束的枪透镜，以及最终的束形成孔。每个电子束柱包括一个或多个双Wein滤波器，该双Wein滤波器沿着电子束在喷枪透镜和最终的波束形成孔之间的轨迹布置，以及色散校正器，沿着电子束的轨道布置，在最后的波束形成孔之后

8. 发明申请

WO2012177890A2 HIGH VOLTAGE ISOLATION OF AN INDUCTIVELY COUPLED PLASMA ION SOURCE WITH A LIQUID THAT IS NOT ACTIVELY PUMPED 审中-公开
标题翻译：感应耦合等离子体源的高电压隔离与液体不是有效泵送
公开(公告)号：WO2012177890A2
公开(公告)日：2012-12-27
申请号：PCT/US2012043563
申请日：2012-06-21
申请人： FEI CO , KELLOGG SEAN , WELLS ANDREW B , MCGINN JAMES B , PARKER N WILLIAM , UTLAUT MARK W
发明人： KELLOGG SEAN , WELLS ANDREW B , MCGINN JAMES B , PARKER N WILLIAM , UTLAUT MARK W
IPC分类号： H01J37/22 , H01J37/08 , H01J37/10
CPC分类号： H05H1/24 , H01J27/16 , H01J37/08 , H01J37/321 , H01J2237/002 , H01J2237/061 , H01J2237/0817 , H01J2237/31749 , H05H1/46 , H05H2001/4652
摘要： An inductively-coupled plasma source for a focused charged particle beam system includes a plasma chamber and a fluid that is not actively pumped surrounding the plasma chamber for providing high voltage isolation between the plasma chamber and nearby parts which are at ground potential, such as a conductive shield. One or more cooling devices cool the plasma chamber by using evaporative cooling and heat pipes to dissipate the heat from the plasma chamber into a surrounding environment.
摘要翻译：用于聚焦带电粒子束系统的电感耦合等离子体源包括等离子体腔室和不被主动地泵送在等离子体室周围的流体，以在等离子体室和处于地电位的附近部件之间提供高电压隔离，例如导电屏蔽。一个或多个冷却装置通过使用蒸发冷却和热管将等离子体室的热量散发到周围环境中来冷却等离子体室。

9. 发明申请

WO2008101713A3 HIGH THROUGHPUT SEM TOOL 审中-公开
公开(公告)号：WO2008101713A3
公开(公告)日：2008-08-28
申请号：PCT/EP2008/001413
申请日：2008-02-22
申请人： APPLIED MATERIALS ISRAEL LTD. , ALMOGY, Gilad , BARTOV, Avishai , FROSIEN, Jürgen , ADAMEC, Pavel , BANZHOF, Helmut
发明人： ALMOGY, Gilad , BARTOV, Avishai , FROSIEN, Jürgen , ADAMEC, Pavel , BANZHOF, Helmut
IPC分类号： H01J37/05 , H01J37/147 , H01J37/28 , H01L21/66 , H01J37/10
摘要： A multi-beam scanning electron beam device (100) is described. The multi-bea scanning electron beam device having a column, includes a multi-beam emitter (110) for emitting a plurality of electron beams (12,13,14), at least one common electron beam optical element (130) having a common opening for at least two of the plurality of electron beams and being adapted for commonly influencing at least two of the plurality of electron beams, at least one individual electron beam optical element (140) for individually influencing the plurality of electron beams, a common objective lens assembly (150) for focusing the plurality of electrons beams having a common excitation for focusing at least two of the plurality of electron beams, and adapted for focusing the plurality of electron beams onto a specimen (20) for generation of a plurality of signal beams (121, 131,141), and a detection assembly (170) for individually detecting each signal beam on a corresponding detection element.

10. 发明申请

WO03015121A2 SLIT LENS ARRANGEMENT FOR PARTICLE BEAMS 审中-公开
标题翻译：用于粒子射线的切片线布置
公开(公告)号：WO03015121A2
公开(公告)日：2003-02-20
申请号：PCT/DE0202722
申请日：2002-07-24
申请人： CEOS GMBH , ZEISS CARL SMT AG , MUELLER HEIKO
发明人： MUELLER HEIKO
IPC分类号： G03F7/20 , H01J37/10 , H01J37/153 , H01J37/317 , H01L21/027 , H01J37/00
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/10 , H01J37/153 , H01J37/3174
摘要： A slit lens arrangement for particle beams, in particular for the projection of a mask onto a workpiece, is disclosed, comprising a combined lens, made up of a cylinder lens and a quadrupole lens, the optical axes of which run parallel to each other, whereby the optical axis of the quadrupole lens may be displaced in a parallel manner and which have a gap-like opening between the pole shoes or in the electrodes with the same spatial relationship to each other. Both lenses are thus so arranged relative to each other, that the focussing of the quadrupole lens occurs in that plane in which the cylinder lens is not focussed, and the defocusing of the quadrupole lens occurs in that plane in which the cylinder lens focuses. According to the invention, two combined lenses are provided with functionally identical elements arranged such that the optical axes of the both lenses lie coaxial to each other, define the mid-axis of the total system and whereby the beam path is telescopic throughout the total system. The optical axis of the image is thus given by the optical axis of the quadrupole. Further, the diffraction plane (aperture plane) for the total system lies between both named combined lenses and fixes a point on the on the mid-axis, relative to which the combined lenses are arranged such that the above are anti-symmetric to each other and simultaneously fill the condition that the separation of the first and the second combined lenses from the diffraction plane (aperture plane) and the assembly and/or and the fields of functionally identical elements in the combined lenses is in a ratio which corresponds to the image scale, preferably reduction ratio. Furthermore, the shifts of the optical axes of the quadrupole lenses of both combined lenses occur in diametrically opposed directions such that the size of the shifts are in a ratio to each other which corresponds to the image scale, preferably reduction ratio.
摘要翻译：公开了一种用于粒子束的狭缝透镜装置，特别是用于掩膜的投影到工件上，包括组合的透镜，它由一个柱面透镜和一个四极透镜的，延伸彼此平行，其中，所述四极透镜的光轴是平行移位它们的光轴，并且之间极靴或电极中的每一个都具有槽形开口，这些开口彼此具有相同的空间取向。在这种情况下，两个透镜彼此对准，该四极透镜的聚焦发生在其中气缸镜头未聚焦的部分的地方，并且被进行，在其中柱面透镜聚焦部分中的四极透镜的散焦。根据本发明，安排与功能相似的元件，使得两个透镜的光轴同轴彼此两个组合透镜，并通过整个系统定义了整个系统和光束路径的中心轴线是可伸缩的。图像的光轴由四极的光轴给出。提议是衍射平面的整个系统的（开口面）之间，所述两个组合透镜躺下并将其发送给一个点的中心轴线固定，其中将合并的透镜被布置成使得相对于它们反对称彼此说谎，并在同一时间满足条件，即距离衍射平面（开口面）和结构和/或彼此组合的透镜的功能相同的元件的字段的第一和第二组合透镜各自在对应于成像比例，优选缩小比例的比率。此外，还提出，在直径上相对的两个方向上组合透镜的四极透镜的光轴，其特征在于，彼此的在每种情况下的变化的大小是在对应于成像比例，优选缩小比例的比例的位移。

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