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1. 发明申请

WO2012177890A3 HIGH VOLTAGE ISOLATION OF AN INDUCTIVELY COUPLED PLASMA ION SOURCE WITH A LIQUID THAT IS NOT ACTIVELY PUMPED 审中-公开
标题翻译：使用液体的电感耦合等离子体离子源的高电压隔离，不被有源泵浦
公开(公告)号：WO2012177890A3
公开(公告)日：2013-05-02
申请号：PCT/US2012043563
申请日：2012-06-21
申请人： FEI CO , KELLOGG SEAN , WELLS ANDREW B , MCGINN JAMES B , PARKER N WILLIAM , UTLAUT MARK W
发明人： KELLOGG SEAN , WELLS ANDREW B , MCGINN JAMES B , PARKER N WILLIAM , UTLAUT MARK W
IPC分类号： H01J37/22 , H01J37/08 , H01J37/10
CPC分类号： H05H1/24 , H01J27/16 , H01J37/08 , H01J37/321 , H01J2237/002 , H01J2237/061 , H01J2237/0817 , H01J2237/31749 , H05H1/46 , H05H2001/4652
摘要： An inductively-coupled plasma source for a focused charged particle beam system includes a plasma chamber and a fluid that is not actively pumped surrounding the plasma chamber for providing high voltage isolation between the plasma chamber and nearby parts which are at ground potential, such as a conductive shield. One or more cooling devices cool the plasma chamber by using evaporative cooling and heat pipes to dissipate the heat from the plasma chamber into a surrounding environment.
摘要翻译：用于聚焦带电粒子束系统的电感耦合等离子体源包括等离子体室和流体，该流体并未主动地泵送到等离子体室周围，用于在等离子体室和处于地电位的附近部分之间提供高电压隔离，例如导电屏蔽。一个或多个冷却装置通过使用蒸发冷却和热管来冷却等离子体腔室以将来自等离子体腔室的热量散发到周围环境中。

2. 发明申请

WO2012177890A2 HIGH VOLTAGE ISOLATION OF AN INDUCTIVELY COUPLED PLASMA ION SOURCE WITH A LIQUID THAT IS NOT ACTIVELY PUMPED 审中-公开
标题翻译：感应耦合等离子体源的高电压隔离与液体不是有效泵送
公开(公告)号：WO2012177890A2
公开(公告)日：2012-12-27
申请号：PCT/US2012043563
申请日：2012-06-21
申请人： FEI CO , KELLOGG SEAN , WELLS ANDREW B , MCGINN JAMES B , PARKER N WILLIAM , UTLAUT MARK W
发明人： KELLOGG SEAN , WELLS ANDREW B , MCGINN JAMES B , PARKER N WILLIAM , UTLAUT MARK W
IPC分类号： H01J37/22 , H01J37/08 , H01J37/10
CPC分类号： H05H1/24 , H01J27/16 , H01J37/08 , H01J37/321 , H01J2237/002 , H01J2237/061 , H01J2237/0817 , H01J2237/31749 , H05H1/46 , H05H2001/4652
摘要： An inductively-coupled plasma source for a focused charged particle beam system includes a plasma chamber and a fluid that is not actively pumped surrounding the plasma chamber for providing high voltage isolation between the plasma chamber and nearby parts which are at ground potential, such as a conductive shield. One or more cooling devices cool the plasma chamber by using evaporative cooling and heat pipes to dissipate the heat from the plasma chamber into a surrounding environment.
摘要翻译：用于聚焦带电粒子束系统的电感耦合等离子体源包括等离子体腔室和不被主动地泵送在等离子体室周围的流体，以在等离子体室和处于地电位的附近部件之间提供高电压隔离，例如导电屏蔽。一个或多个冷却装置通过使用蒸发冷却和热管将等离子体室的热量散发到周围环境中来冷却等离子体室。

3. 发明申请

WO2012177876A3 ENCAPSULATION OF ELECTRODES IN SOLID MEDIA FOR USE IN CONJUNCTION WITH FLUID HIGH VOLTAGE ISOLATION 审中-公开
标题翻译：固体介质中电极的附着与流体高压隔离相结合
公开(公告)号：WO2012177876A3
公开(公告)日：2013-02-28
申请号：PCT/US2012043548
申请日：2012-06-21
申请人： FEI CO , KELLOGG SEAN , GRAUPERA ANTHONY , PARKER N WILLIAM , UTLAUT MARK W , WELLS ANDREW B , MCGINN JAMES B
发明人： KELLOGG SEAN , GRAUPERA ANTHONY , PARKER N WILLIAM , UTLAUT MARK W , WELLS ANDREW B , MCGINN JAMES B
IPC分类号： H05H1/00
CPC分类号： H01J27/16 , H01J37/08 , H01J37/321 , H01J2237/002 , H01J2237/061 , H01J2237/0817 , H01J2237/31749 , H05H1/28 , H05H1/30 , H05H1/46 , H05H2001/4652 , H05H2001/4682
摘要： An inductively-coupled plasma source for a focused charged particle beam system includes a conductive shield that provides improved electrical isolation and reduced capacitive RF coupling and a dielectric fluid that insulates and cools the plasma chamber. The conductive shield may be enclosed in a solid dielectric media. The dielectric fluid may be circulated by a pump or not circulated by a pump. A heat tube can be used to cool the dielectric fluid.
摘要翻译：用于聚焦带电粒子束系统的电感耦合等离子体源包括提供改进的电隔离和减小的电容RF耦合的导电屏蔽以及绝缘和冷却等离子体室的介电流体。导电屏蔽件可以封闭在固体介电介质中。电介质流体可以由泵循环或不被泵循环。可以使用热管来冷却介电流体。

4. 发明申请

WO2012177876A2 ENCAPSULATION OF ELECTRODES IN SOLID MEDIA FOR USE IN CONJUNCTION WITH FLUID HIGH VOLTAGE ISOLATION 审中-公开
标题翻译：固体介质中电极的附着与流体高压隔离相结合
公开(公告)号：WO2012177876A2
公开(公告)日：2012-12-27
申请号：PCT/US2012043548
申请日：2012-06-21
申请人： FEI CO , KELLOGG SEAN , GRAUPERA ANTHONY , PARKER N WILLIAM , UTLAUT MARK W , WELLS ANDREW B , MCGINN JAMES B
发明人： KELLOGG SEAN , GRAUPERA ANTHONY , PARKER N WILLIAM , UTLAUT MARK W , WELLS ANDREW B , MCGINN JAMES B
IPC分类号： H05H1/00
CPC分类号： H01J27/16 , H01J37/08 , H01J37/321 , H01J2237/002 , H01J2237/061 , H01J2237/0817 , H01J2237/31749 , H05H1/28 , H05H1/30 , H05H1/46 , H05H2001/4652 , H05H2001/4682
摘要： An inductively-coupled plasma source for a focused charged particle beam system includes a conductive shield that provides improved electrical isolation and reduced capacitive RF coupling and a dielectric fluid that insulates and cools the plasma chamber. The conductive shield may be enclosed in a solid dielectric media. The dielectric fluid may be circulated by a pump or not circulated by a pump. A heat tube can be used to cool the dielectric fluid.
摘要翻译：用于聚焦带电粒子束系统的电感耦合等离子体源包括提供改进的电隔离和减小的电容RF耦合的导电屏蔽以及绝缘和冷却等离子体室的介电流体。导电屏蔽件可以封闭在固体介电介质中。电介质流体可以由泵循环或不被泵循环。可以使用热管来冷却介电流体。

5. 发明申请

WO2011127327A3 COMBINATION LASER AND CHARGED PARTICLE BEAM SYSTEM 审中-公开
标题翻译：组合激光和充电粒子束系统
公开(公告)号：WO2011127327A3
公开(公告)日：2012-02-02
申请号：PCT/US2011031644
申请日：2011-04-07
申请人： FEI CO , STRAW MARCUS , UTLAUT MARK W , PARKER N WILLIAM
发明人： STRAW MARCUS , UTLAUT MARK W , PARKER N WILLIAM
IPC分类号： H01J37/08 , H01J37/06 , H01J37/244
CPC分类号： H01J37/28 , H01J37/226 , H01J37/244 , H01J37/3056 , H01J2237/2815 , H01J2237/2855 , H01J2237/3174 , H01J2237/31749
摘要： A combined laser and charged particle beam system. A pulsed laser enables milling of a sample at material removal rates several orders of magnitude larger than possible for a focused ion beam. In some embodiments, a scanning electron microscope enables high resolution imaging of the sample during laser processing. In some embodiments, a focused ion beam enables more precise milling of the sample. A method and structure for deactivating the imaging detectors during laser milling enables the removal of imaging artifacts arising from saturation of the detector due to a plasma plume generated by the laser beam. In some embodiments, two types of detectors are employed: type-1 detectors provide high gain imaging during scanning of the sample with an electron or ion beam, while type-2 detectors enable lower gain imaging and endpoint detection during laser milling.
摘要翻译：组合激光和带电粒子束系统。脉冲激光器可以以比聚焦离子束可能的数个数量级的材料去除速率对样品进行铣削。在一些实施例中，扫描电子显微镜能够在激光加工期间对样品进行高分辨率成像。在一些实施例中，聚焦离子束使得能够更精确地研磨样品。用于在激光研磨期间去激活成像检测器的方法和结构使得能够消除由激光束产生的等离子体羽流引起的由检测器的饱和引起的成像伪影。在一些实施例中，采用两种类型的检测器：第一类检测器在用电子或离子束扫描样品期间提供高增益成像，而类型2检测器在激光研磨期间能够进行较低增益成像和端点检测。

6. 发明申请

WO2008039943A3 WAFER PROCESSING SYSTEM WITH DUAL WAFER ROBOTS CAPABLE OF ASYNCHRONOUS MOTION 审中-公开
标题翻译：具有能够异步运动的双晶片机器人的晶圆加工系统
公开(公告)号：WO2008039943A3
公开(公告)日：2008-06-19
申请号：PCT/US2007079773
申请日：2007-09-27
申请人： VSERV TECH , CHIDAMBARAM MAHENDRAN , TRUONG QUOC , SCHOCK JERRY , PARKER N WILLIAM
发明人： CHIDAMBARAM MAHENDRAN , TRUONG QUOC , SCHOCK JERRY , PARKER N WILLIAM
IPC分类号： B66C23/00
CPC分类号： H01L21/6719 , B25J9/107 , B25J18/025 , H01L21/67184 , H01L21/67196 , H01L21/67742 , Y10T74/20305
摘要： A robot assembly for transferring substrates includes a central tube assembly oriented along a central axis, perpendicular to a substrate transfer plane, and having an inner surface that forms part of a first enclosure at a first pressure, and an outer surface that forms part of a second enclosure at a second, different pressure. The robot assembly further includes a transfer robot which itself includes multiple rotor assemblies, each configured to rotate parallel to the substrate transfer plane. The various rotor assemblies are organized in pairs, each pair having one rotor fitted with a telescoping support arm/end effector arrangement to support substrates thereon, and the other rotor fitted with inner and outer actuator arms that cooperate to effect radial movement of the corresponding end effector of the paired rotor assembly. Each rotor is controlled to effect the transfer of substrates within a wafer processing system asynchronously and at differing heights.
摘要翻译：一种用于传送基板的机器人组件包括中心管组件，该中心管组件沿着垂直于基板传送平面的中心轴定向并且具有形成第一压力下的第一外壳的一部分的内表面和形成第二个外壳处于第二个不同的压力下。机器人组件还包括传送机器人，传送机器人本身包括多个转子组件，每个转子组件均被构造成平行于基板传送平面旋转。各种转子组件成对组装，每一对具有一个转子，该转子装配有伸缩式支撑臂/端部执行器装置以在其上支撑基板，而另一个转子装配有内部和外部致动器臂，这些致动器配合以实现相应端部的径向移动成对转子组件的效应器。控制每个转子以异步地且在不同的高度实现晶片处理系统内的衬底的传送。

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