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    • 4. 发明申请
    • APPARATUS FOR THERMAL TREATMENT OF AN INNER SURFACE OF A TUBULAR OR OTHER ENCLOSED STRUCTURE
    • 用于热处理管状内表面或其他结构结构的装置
    • WO2014190433A1
    • 2014-12-04
    • PCT/CA2014/050494
    • 2014-05-26
    • APPLIED LIGHT TECHNOLOGIES INC.
    • BUMBULOVIC, Mladen
    • B01J19/08H05B7/12H05B7/18
    • H05B3/0061B23K35/0244B23K35/025B23K35/383C21D1/34C21D9/08H05B3/06
    • A heat treatment apparatus for heat treating an interior surface of a longitudinally extending cavity of a target structure has a processing head which comprises a longitudinally extending central support member and distal and proximal end caps protruding laterally from the central support member. Each end cap has a plurality of apertures configured to respectively receive distal and proximal ends of elongated plasma arc lamps and position the plasma arc lamps to extend longitudinally along and laterally around the central support member such that radiation emitted collectively by the plasma arc lamps is directed generally radially outwards from the processing head. The processing head also comprises a coolant pathway having heat exchange zones in thermal communication with the plasma arc lamps and coolant supply and return conduits in fluid communication with the heat exchange zones.
    • 用于热处理目标结构的纵向延伸空腔的内表面的热处理设备具有处理头,该处理头包括纵向延伸的中心支撑构件和从中心支撑构件横向突出的远端和近端盖。 每个端盖具有多个孔,其被配置为分别容纳细长等离子弧灯的远端和近端,并且使等离子弧灯沿着中心支撑构件沿着和横向延伸地延伸,使得由等离子体电弧灯集体发射的辐射被引导 通常从处理头径向向外。 处理头还包括具有与等离子体电弧灯热连通的热交换区和与热交换区流体连通的冷却剂供应和返回管道的冷却剂通道。
    • 5. 发明申请
    • MANUALLY CONTROLLED IRRADIATION DEVICE AND THERMAL TREATMENT METHOD
    • 手持设备和辐射热工过程
    • WO02033335A1
    • 2002-04-25
    • PCT/EP2001/011651
    • 2001-10-09
    • F26B3/30H05B3/00
    • F26B3/30H05B3/0061H05B2203/032
    • The invention relates to a manually controlled irradiation device (100) for manually implementing a thermal treatment method. Said device comprises at least one electromagnetic radiation source, the main active component thereof being in the near-infrared range, especially in the wavelength range between 0.8 mu m and 1.5 mu m. The inventive device especially comprises at least one elongated halogen lamp, one power supply and control device for the beam source, one reflector (113A, 113B) adapted to the form and number of radiation sources, and one active cooling device (115) for cooling the reflector and optionally the radiation source, all of which are in a housing (107) comprising a handle (101) and a switching and or control element (103-105).
    • 手持式辐射装置(100),用于在所述波长范围内的热加工方法的手动执行的,与电磁辐射,其基本在近红外区域的活性组分至少一个辐射源,特别是在0.8微米和1.5微米,特别地,至少一个细长 卤素灯,电源和驱动装置,用于在辐射源,一个在Strahlungsqelle的形状和数量(一个或多个),其适于在反射器的冷却反射器(113A,113B)和主动冷却装置(115)和在壳体中任选的辐射源(107) 具有手柄(101)和开关和/或控制元件(103-105)。