会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 4. 发明申请
    • INTERSPINOUS IMPLANTS AND METHODS
    • INTERSPINOUS植入物和方法
    • WO2011019756A3
    • 2011-06-16
    • PCT/US2010045079
    • 2010-08-10
    • LANX INCTABER JUSTINMADDUX JOSEPHLAMBOURNE ANDREWFULTON MICHAEL
    • TABER JUSTINMADDUX JOSEPHLAMBOURNE ANDREWFULTON MICHAEL
    • A61F2/44A61B17/70A61B17/82
    • A61B17/7068A61B17/7053A61B17/7061
    • The present invention provides spinous process implant and associated methods. In one aspect of the invention the implant limits the maximum spacing between the spinous processes. In another aspect of the invention, a spacer has at least one transverse opening to facilitate tissue in-growth. In another aspect of the invention, an implant includes a spacer and separate extensions engageable with the spacer. The spacer is provided in a variety of lengths and superior to inferior surface spacings. In another aspect of the invention, an implant includes a spacer and a cerclage element offset from the midline of the spacer in use so that the spacer defines a fulcrum and the cerclage element is operative to impart a moment to the vertebrae about the spacer. In another aspect of the invention, instrumentation for inserting the implant is provided. In other aspects of the invention, methods for treating spine disease are provided.
    • 本发明提供棘突植入物和相关方法。 在本发明的一个方面,植入物限制棘突之间的最大间距。 在本发明的另一方面,间隔物具有至少一个横向开口以促进组织生长。 在本发明的另一方面,植入物包括间隔物和可与间隔物接合的分开的延伸部分。 间隔件以各种长度提供,并且优于下表面间隔。 在本发明的另一方面,植入物包括间隔物和在使用中偏离间隔物的中线的结扎元件,使得间隔件限定支点,并且结扎元件可操作以在椎间盘周围施加间隔。 在本发明的另一方面,提供了用于插入植入物的装置。 在本发明的其他方面,提供了治疗脊柱疾病的方法。
    • 9. 发明申请
    • SPINOUS PROCESS IMPLANTS AND ASSOCIATED METHODS
    • 旋转过程植入物和相关方法
    • WO2008088613A2
    • 2008-07-24
    • PCT/US2007/084856
    • 2007-11-15
    • LANX, LLCLAMBORNE, AndrewFULTON, MichaelTHRAMANN, Jeff
    • LAMBORNE, AndrewFULTON, MichaelTHRAMANN, Jeff
    • A61F2/44A61B17/58
    • A61B17/7068A61B17/7061A61B17/842A61B2017/00477
    • Spinous process implants and associated methods are provided. In one aspect of the invention the implant limits the maximum spacing between the spinous processes. In another aspect of the invention, a spacer has at least one transverse opening to facilitate tissue in-growth. In another aspect of the invention, an implant includes a spacer and separate extensions engageable with the spacer. The spacer is provided in a variety of lengths and superior to inferior surface spacings. In another aspect of the invention, an implant includes a spacer and a cerclage element offset from the midline of the spacer in use so that the spacer defines a fulcrum and the cerclage element is operative to impart a moment to the vertebrae about the spacer. In another aspect of the invention, instrumentation for inserting the implant is provided. In other aspects of the invention, methods for treating spine disease are provided.
    • 提供了丰富的过程植入物和相关方法。 在本发明的一个方面,植入物限制棘突之间的最大间距。 在本发明的另一方面,间隔物具有至少一个横向开口以促进组织生长。 在本发明的另一方面,植入物包括间隔物和可与间隔物接合的分开的延伸部分。 间隔件以各种长度提供,并且优于下表面间隔。 在本发明的另一方面,植入物包括间隔物和在使用中偏离间隔物的中线的结扎元件,使得间隔件限定支点,并且结扎元件可操作以在椎间盘周围施加间隔。 在本发明的另一方面,提供了用于插入植入物的装置。 在本发明的其他方面,提供了治疗脊柱疾病的方法。