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1. 发明申请

WO2005015314A3 AN ILLUMINATION SYSTEM FOR MICROLITHOGRAPHY 审中-公开
标题翻译：用于微结构的照明系统
公开(公告)号：WO2005015314A3
公开(公告)日：2005-11-24
申请号：PCT/EP2004003854
申请日：2004-04-13
申请人： ZEISS CARL SMT AG , SINGER WOLFGANG , WIETZORREK JOACHIM , HAINZ JOACHIM , WEIRAUCH GABRIELE , MAUL MANFRED
发明人： SINGER WOLFGANG , WIETZORREK JOACHIM , HAINZ JOACHIM , WEIRAUCH GABRIELE , MAUL MANFRED
IPC分类号： G02B17/06 , G03F7/20 , G21K1/06
CPC分类号： G03F7/702 , G02B17/0647 , G03F7/70233 , G03F7/70358 , G21K1/06
摘要： The present invention relates to an illumination system for microlithography, especially for wavelengths
摘要翻译：本发明涉及用于微光刻的照明系统，特别是对于<= 193nm的波长，特别优选用于用至少一个光束积分器（3）照射场平面（9）中的场的EUV光刻，由光源发射到具有光强度的多个光通道中，其特征在于，在从光源到场平面（9）的光路中设置有滤光器（23），滤光器包括滤光元件被配置为使得至少一个光通道的光强度在滤光元件之后的光路中减小。

2. 发明申请

WO2004034146A3 LIGHTING SYSTEM COMPRISING A DEVICE FOR ADJUSTING THE LIGHT INTENSITY 审中-公开
标题翻译：带有用于调整光强度的装置的照明系统
公开(公告)号：WO2004034146A3
公开(公告)日：2004-08-05
申请号：PCT/EP0309370
申请日：2003-08-23
申请人： ZEISS CARL SMT AG , SINGER WOLFGANG , ANTONI MARTIN , MELZER FRANK , WANGLER JOHANNES , HAINZ JOACHIM , WIETZORREK JOACHIM , MAUL MANFRED , WEISS MARKUS
发明人： SINGER WOLFGANG , ANTONI MARTIN , MELZER FRANK , WANGLER JOHANNES , HAINZ JOACHIM , WIETZORREK JOACHIM , MAUL MANFRED , WEISS MARKUS
IPC分类号： G03F7/20
CPC分类号： G03F7/70558 , G03F7/7085
摘要： The invention relates to a lighting system for microlithography with wavelengths
摘要翻译：本发明涉及的照明系统用于与波长微光刻<= 157纳米，尤其用于EUV光刻用于照明物平面，其包括辐射源，其提供的光线的光束是可用的，其中光束的束，在所涉及的光路中的照明系统从辐射源到物体平面的方向具有光强度; 第一光学部件，其至少包括具有多个光栅元件的第一光学元件，其中所述第一光学元件布置在所述辐射源与所述物平面之间的所述光束路径中; 其特征在于，提供用于调节<= 157nm波长的光强度的装置，其被设置在从辐射源到辐射源与第一光学元件之间的物平面的光路中。

3. 发明申请

WO2005026843A3 ILLUMINATION SYSTEM FOR A MICROLITHOGRAPHY PROJECTION EXPOSURE INSTALLATION 审中-公开
标题翻译：用于微观投影曝光安装的照明系统
公开(公告)号：WO2005026843A3
公开(公告)日：2005-05-26
申请号：PCT/EP2004010188
申请日：2004-09-13
申请人： ZEISS CARL SMT AG , KOEHLER JESS , WANGLER JOHANNES , BROTSACK MARKUS , SINGER WOLFGANG , FIOLKA DAMIAN , MAUL MANFRED
发明人： KOEHLER JESS , WANGLER JOHANNES , BROTSACK MARKUS , SINGER WOLFGANG , FIOLKA DAMIAN , MAUL MANFRED
IPC分类号： G03F7/20
CPC分类号： G03F7/70116 , G03F7/702
摘要： An illumination system for a microlithography projection exposure installation is used to illuminate an illumination field with the light from a primary light source (11). The illumination system has a light distribution device (25) which receives light from the primary light source and, from this light, produces a two-dimensional intensity distribution which can be set variably in a pupil-shaping surface (31) of the illumination system. The light distribution device has at least one optical modulation device (20) having a two-dimensional array of individual elements (21) that can be controlled individually in order to change the angular distribution of the light incident on the optical modulation device. The device permits the variable setting of extremely different illuminating modes without replacing optical components.
摘要翻译：用于微光刻投影曝光装置的照明系统用于利用来自主光源（11）的光照亮照明场。照明系统具有从主光源接收光的光分配装置（25），并且从该光产生二维强度分布，其可以可变地设置在照明系统的瞳孔成形表面（31）中。配光装置具有至少一个光学调制装置（20），其具有能独立控制的各个元件（21）的二维阵列，以便改变入射在光调制装置上的光的角分布。该装置允许在不更换光学部件的情况下可变地设置不同的照明模式。

4. 发明申请

WO2006066638A8 A FILTER DEVICE FOR THE COMPENSATION OF AN ASYMMETRIC PUPIL ILLUMINATION 审中-公开
标题翻译：用于补偿不对称管路照明的过滤装置
公开(公告)号：WO2006066638A8
公开(公告)日：2006-08-24
申请号：PCT/EP2005009165
申请日：2005-08-25
申请人： ZEISS CARL SMT AG , MAUL MANFRED , FIOLKA DAMIAN
发明人： MAUL MANFRED , FIOLKA DAMIAN
IPC分类号： G03F7/20
CPC分类号： G02B26/008 , G01J1/0488 , G02B27/0933 , G02B27/0994 , G03F7/70091 , G03F7/70191
摘要： The invention relates to a filter device (100) for an illumination system, especially for the correction of the illumination of the illuminating pupil, comprising a light source, with the illumination system being passed through by a boudle of illuminating rays from the light source to an object plane, with the bundle of illuminating rays impinging upon the filter device (100), comprising at least one filter element (105) which can be introduced into the beam path of the bundle of illuminating rays, with the filter element comprising an actuating device (113), so that the filter element can be brought with the help of the actuating device into the bundle of illuminating rays.
摘要翻译：本发明涉及一种用于照明系统的滤光器装置（100），特别是用于校正照明光瞳的照明，包括光源，照明系统通过来自光源的照明光线的一束通过，物体平面，其中照射光束束照射在过滤器装置（100）上，包括至少一个过滤元件（105），该过滤元件可以被引入照射光束束的光束路径中，而过滤元件包括致动器装置（113），使得过滤元件可以在致动装置的帮助下被带入照射光束。

5. 发明申请

WO02093257A8 MICROLITHOGRAPHIC PROJECTION ILLUMINATION SYSTEM 审中-公开
标题翻译：微光刻投射曝光系统，
公开(公告)号：WO02093257A8
公开(公告)日：2003-12-31
申请号：PCT/EP0204900
申请日：2002-05-04
申请人： ZEISS CARL SMT AG , BRUNOTTE MARTIN , HARTMAIER JUERGEN , HOLDERER HUBERT , KAISER WINFRIED , KOHL ALEXANDER , KUGLER JENS , MAUL MANFRED , WAGNER CHRISTIAN
发明人： BRUNOTTE MARTIN , HARTMAIER JUERGEN , HOLDERER HUBERT , KAISER WINFRIED , KOHL ALEXANDER , KUGLER JENS , MAUL MANFRED , WAGNER CHRISTIAN
IPC分类号： G02B7/02 , G02B1/02 , G02B5/30 , G03F7/20 , H01L21/027
CPC分类号： G02B1/08 , G02B1/02 , G02B5/3083 , G03F7/70241 , G03F7/70825 , G03F7/70966
摘要： The injection relates to a projection illumination system, especially one with 157 or 193 nm and an image-side NA of 0.8 0.95, comprising fluoride crystal lenses (43, 43), wherein the negative effect of the angle-dependent birefringence thereof is reduced by relative rotation around the optical axis (O) and/or by a correction element (44) close to a plane of the pupil (P).
摘要翻译：在投射曝光设备特别是157或193nm和像侧NA 0.8至0.95，用氟晶透镜（43,43），其角度依赖性的双折射是通过绕光轴（O）和/或相对旋转（通过校正元件 44）的光瞳平面（P）附近的在它们的破坏性效果降低。

6. 发明申请

WO2008095695A3 METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
标题翻译： METHOD AND APPARATUS FOR IN的微光刻投射曝光设备的照明系统的监控多个MIRROR ARRANGEMENTS
公开(公告)号：WO2008095695A3
公开(公告)日：2008-10-30
申请号：PCT/EP2008000920
申请日：2008-02-06
申请人： ZEISS CARL SMT AG , XALTER STEFAN , KWAN YIM-BUN-PATRICK , MAJOR ANDRAS G , MAUL MANFRED , EISENMENGER JOHANNES , FIOLKA DAMIAN , HORN JAN , DEGUENTHER MARKUS , BACH FLORIAN , PATRA MICHAEL , WANGLER JOHANNES , LAYH MICHAEL
发明人： XALTER STEFAN , KWAN YIM-BUN-PATRICK , MAJOR ANDRAS G , MAUL MANFRED , EISENMENGER JOHANNES , FIOLKA DAMIAN , HORN JAN , DEGUENTHER MARKUS , BACH FLORIAN , PATRA MICHAEL , WANGLER JOHANNES , LAYH MICHAEL
IPC分类号： G03F7/20 , G02B26/08
CPC分类号： G03F7/70258 , G01B11/002 , G01B11/272 , G01M11/30 , G01N21/55 , G02B26/0833 , G03F7/70058 , G03F7/70116 , G03F7/70133 , G03F7/702 , G03F7/70291 , G03F7/70516 , G03F7/7085 , G05B13/048 , Y10S359/904
摘要： Disclosed is an illumination system (12) of a microlithographic projection exposure apparatus (10), comprising a pupil surface and a substantially planar arrangement of beam deflecting elements (28) which can preferably be triggered in an individual manner and are used for variably illuminating the pupil surface. Each beam deflecting element (28) allows a projection light beam (32) that is incident thereon to be deflected in accordance with a control signal which is applied to the beam deflecting element (28). A measuring illumination device (54, 56, 58, 60; 88; 90; 98) directs a measuring light beam (36) that is independent from the projection light beams (32) onto a beam deflecting element (28). A detector device detects the measuring light beam (38) after the latter has been deflected on the beam deflecting element (28). An evaluation unit determines the deflection of the projection light beam (32) from the test signals supplied by the detector device.
摘要翻译：微光刻投射曝光设备（10）的照明系统（12）具有用于光瞳表面的可变照明光瞳表面及实质呈平面排列优选单独可控光束偏转元件（28）。通过每个光束偏转元件（28），作为施加到光束偏转元件（28）的控制信号的函数，可实现照射在其上的投影光束（32）的偏转。的测量照明装置（54，56，58，60; 88; 90; 98）从投射光束建立（32）独立的测量光束（36）的光束偏转元件（28）。检测器装置在光束偏转元件（28）处偏转之后检测测量光束（38）。评估单元根据检测器装置提供的测量信号来确定投影光束（32）的偏转。

7. 发明申请

WO2008092653A3 ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
标题翻译：微型投影曝光设备的照明系统
公开(公告)号：WO2008092653A3
公开(公告)日：2008-10-09
申请号：PCT/EP2008000706
申请日：2008-01-30
申请人： ZEISS CARL SMT AG , DIECKMANN NILS , MAUL MANFRED , HETTICH CHRISTIAN , NATT OLIVER
发明人： DIECKMANN NILS , MAUL MANFRED , HETTICH CHRISTIAN , NATT OLIVER
IPC分类号： G03F7/20
CPC分类号： G03F7/70191
摘要： An illumination system of a microlithographic projection exposure apparatus comprises at least one transmission filter (66; 166; 266; 366; 466; 566; 666; 666'; 766, 766'; 866, 866') which has a different transmittance at least at two positions and which is arranged between a pupil plane (42, 60) and a field plane (52, 58). The transmittance distribution is determined such that it has field dependent correcting effects on the ellipticity. In some embodiments the telecentricity and/or the irradiance uniformity is not affected by this correction.
摘要翻译：一种微光刻投影曝光设备的照明系统包括至少一个透射滤光器（66; 166; 266; 366; 466; 566; 666; 666'; 766,766'; 866,866'），其至少具有不同的透射率在两个位置处并且布置在光瞳平面（42,60）和场平面（52,58）之间。透射率分布被确定为使得其具有对椭圆率的与场相关的校正效果。在一些实施例中，远心度和/或辐照度均匀性不受该校正的影响。

8. 发明申请

WO2005078522A3 ILLUMINATION SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
标题翻译：微波投影曝光装置照明系统
公开(公告)号：WO2005078522A3
公开(公告)日：2006-03-02
申请号：PCT/EP2005001501
申请日：2005-02-15
申请人： ZEISS CARL SMT AG , FIOLKA DAMIAN , MAUL MANFRED , SCHOLZ AXEL , DEGUENTHER MARKUS , WANGLER JOHANNES
发明人： FIOLKA DAMIAN , MAUL MANFRED , SCHOLZ AXEL , DEGUENTHER MARKUS , WANGLER JOHANNES
IPC分类号： G03F7/20
CPC分类号： G03F7/7015 , G03B27/54 , G03F7/70075 , G03F7/70108
摘要： An illumination system for a microlithographic projection exposure step-and-scan apparatus has a light source (14), a first optical raster element (62; 62'; 62''; 62''') and a second optical raster element (64; 90; 90''; 100). The first optical raster element extends in a first pupil plane (28) of the illumination system (10) and is designed such that the geometrical optical flux of the system is increased perpendicular to a scan direction of the projection exposure apparatus. The second optical raster element extends in a second pupil plane (28) of the illumination system, which is not necessarily different from the first pupil plane (28), and is designed such that the geometrical optical flux of the system is increased in the scan direction and perpendicular thereto. This allows to improve the irradiance uniformity in a reticle plane (46).
摘要翻译：一种用于微光刻投影曝光步进扫描装置的照明系统具有光源（14），第一光栅元件（62; 62'; 62“，62”'）和第二光栅元件（64 ; 90; 90“; 100）。第一光栅元件在照明系统（10）的第一光瞳平面（28）中延伸，并被设计成使得系统的几何光通量垂直于投影曝光设备的扫描方向增加。第二光栅元件在照明系统的第二光瞳平面（28）中延伸，其不一定与第一光瞳平面（28）不同，并且被设计成使得在扫描中系统的几何光通量增加方向并与其垂直。这允许改进掩模版平面（46）中的辐照度均匀性。

9. 发明申请

WO2005076078A3 MASK FOR USE IN A MICROLITHOGRAPHIC PROJECTION EXPOSURE SYSTEM 审中-公开
标题翻译： MASK FOR USE IN的微光刻投射曝光设备
公开(公告)号：WO2005076078A3
公开(公告)日：2008-12-11
申请号：PCT/EP2005000640
申请日：2005-01-24
申请人： ZEISS CARL SMT AG , TOTZECK MICHAEL , MAUL MANFRED
发明人： TOTZECK MICHAEL , MAUL MANFRED
IPC分类号： G03F1/00
CPC分类号： G03F1/50 , G03F1/54
摘要： The invention relates to a mask for use in a microlithographic projection exposure system (10), comprising a support (40), to which a pattern of opaque structures (44) is applied. To reduce the dependence of the transmission capability on the polarisation, the structures (44) contain a material with a refractive index, whose imaginary part is greater than 1.8 and preferably greater than 2.2. Silicon, for example, can constitute a material of this type. Alternatively, or in addition, a dielectric material (54) can be provided in a gap (48) between two structures (442), whereby said material does not come into contact with the structures (44). The dependence of the absorption capability on the polarisation is also reduced by the dielectric coating (60) of the structures (44).
摘要翻译：一种用于在微光刻投射曝光设备（10）使用掩模包括在其上施加不透明结构（44）的图案的支撑件（40）。为了减少结构（44）的透射率的偏振依赖性包括具有折射率虚部大于1.8和优选大于2.2的材料。在这样的材料例如可以是硅。或者或另外，可以是在两个结构（442）之间的中间空间（48）是介电材料（54）不影响结构（44）。在吸收能力的偏振波依赖性的降低也由结构（44）的电介质涂层（60）来实现的。

10. 发明申请

WO2008061681A2 ILLUMINATION LENS SYSTEM FOR PROJECTION MICROLITHOGRAPHY, AND MEASURING AND MONITORING METHOD FOR SUCH AN ILLUMINATION LENS SYSTEM 审中-公开
标题翻译：投影显微照明的照明光学和这种照明光学的测量和监测方法
公开(公告)号：WO2008061681A2
公开(公告)日：2008-05-29
申请号：PCT/EP2007009971
申请日：2007-11-19
申请人： ZEISS CARL SMT AG , PATRA MICHAEL , DEGUENTHER MARKUS , LAYH MICHAEL , WANGLER JOHANNES , MAUL MANFRED
发明人： PATRA MICHAEL , DEGUENTHER MARKUS , LAYH MICHAEL , WANGLER JOHANNES , MAUL MANFRED
IPC分类号： G03F7/20
CPC分类号： G03F7/7085 , G03F7/70116
摘要： Disclosed is a microlithographic projection exposure system (1) comprising an illumination system (4) with an illumination lens system (5) for illuminating an illumination field on a reticle level (6). The illumination lens system is equipped with a light distribution device (12a) encompassing a light deflection array (12) made up of individual elements, and an optical subassembly (21, 23 to 26) which converts the light intensity distribution predefined on a first level (19) of the illumination lens system (5) into an illumination angle distribution on the reticle level (6). Extracted illumination light (31) is applied to a spatially and time-resolved detection device (30) downstream of an extraction device (17) located between the light deflection array (12) and the reticle plane (6) within the light path in such a way that the detection device (30) detects a light intensity distribution corresponding to the light intensity distribution on the first level (19). The detection device (30) allows the influence of individual elements or groups of individual elements on the light intensity distribution on the first level (19) to be determined, especially by varying said individual elements or groups thereof over time. The light deflection array of the disclosed illumination lens system functions during normal operation.
摘要翻译：微光刻投射曝光设备（1）具有照明系统（4），照明系统（4）具有用于照射标线板平面（6）中的照明场的照明光学器件（5）。一种光分配装置（12A），其包括单个元件的光的偏转阵列（12），和光分布的装置（12a）的在照明光学部件的第一平面（19）的光学组件（21，23〜26）（5）在标线片平面（6）中的照明角度分布中给定的光强度分布也属于照明光学器件（5）。甲空间和时间分辨检测装置（30）被加载位于光偏转阵列（12）之间的光路之后并且在掩模母版平面（6）去耦合元件（17）被连接到耦合输出的照明光（31），该检测装置（30）是一个第一个平面（19）的光强分布对应的光强分布检测到。利用检测装置（30），尤其是具有单个元件或单个元件组的时间变化，可以确定它们对第一平面（19）中的光强度分布的影响。其结果是照明光学系统，其中在正常操作期间发生光偏转阵列的功能。

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