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1. 发明申请

WO2005078522A3 ILLUMINATION SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
标题翻译：微波投影曝光装置照明系统
公开(公告)号：WO2005078522A3
公开(公告)日：2006-03-02
申请号：PCT/EP2005001501
申请日：2005-02-15
申请人： ZEISS CARL SMT AG , FIOLKA DAMIAN , MAUL MANFRED , SCHOLZ AXEL , DEGUENTHER MARKUS , WANGLER JOHANNES
发明人： FIOLKA DAMIAN , MAUL MANFRED , SCHOLZ AXEL , DEGUENTHER MARKUS , WANGLER JOHANNES
IPC分类号： G03F7/20
CPC分类号： G03F7/7015 , G03B27/54 , G03F7/70075 , G03F7/70108
摘要： An illumination system for a microlithographic projection exposure step-and-scan apparatus has a light source (14), a first optical raster element (62; 62'; 62''; 62''') and a second optical raster element (64; 90; 90''; 100). The first optical raster element extends in a first pupil plane (28) of the illumination system (10) and is designed such that the geometrical optical flux of the system is increased perpendicular to a scan direction of the projection exposure apparatus. The second optical raster element extends in a second pupil plane (28) of the illumination system, which is not necessarily different from the first pupil plane (28), and is designed such that the geometrical optical flux of the system is increased in the scan direction and perpendicular thereto. This allows to improve the irradiance uniformity in a reticle plane (46).
摘要翻译：一种用于微光刻投影曝光步进扫描装置的照明系统具有光源（14），第一光栅元件（62; 62'; 62“，62”'）和第二光栅元件（64 ; 90; 90“; 100）。第一光栅元件在照明系统（10）的第一光瞳平面（28）中延伸，并被设计成使得系统的几何光通量垂直于投影曝光设备的扫描方向增加。第二光栅元件在照明系统的第二光瞳平面（28）中延伸，其不一定与第一光瞳平面（28）不同，并且被设计成使得在扫描中系统的几何光通量增加方向并与其垂直。这允许改进掩模版平面（46）中的辐照度均匀性。

2. 发明申请

WO2005017620A3 ILLUMINATION DEVICE AND POLARISER FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE INSTALLATION 审中-公开
标题翻译：照明装置和偏振器一种用于微光刻投影曝光装置
公开(公告)号：WO2005017620A3
公开(公告)日：2005-07-28
申请号：PCT/EP2004008892
申请日：2004-08-09
申请人： ZEISS CARL SMT AG , FIOLKA DAMIAN , SCHOLZ AXEL , MAUL MANFRED
发明人： FIOLKA DAMIAN , SCHOLZ AXEL , MAUL MANFRED
IPC分类号： G03F7/20
CPC分类号： G03F7/70058 , G03F7/70566
摘要： The invention relates to an illumination device for a microlithographic projection exposure installation, said device comprising a light source (1) for generating projection light, a masking device (5) for masking a reticle (R), and a masking objective (6) for imaging the masking device (5) onto the reticle (R). A polariser (10) for generating linearly polarised light is also arranged in the masking objective (6). Said polariser (10) can, for example, be provided with polarisation-selective beam splitter layers (54, 56; 154, 156; 292, 294) that are arranged at an angle to each other, are light-permeable in a first polarisation state (68), and are light-reflective in a second polarisation state (70) different to the first polarisation state (68). In this way, the polariser (10) generally has a very flat structural form.
摘要翻译：用于微光刻投影曝光设备的照明装置包括：光源（1），用于生成投影光，掩蔽装置（5），用于掩蔽掩模版（R）和掩蔽透镜（6），用于在光罩（R）成像掩蔽装置（5）。另外，在透镜罩（6），用于产生线性偏振光的偏振片（10）布置。它们是透明的光在第一偏振态（68）和用于光在（第一偏振状态68的偏振器（10），例如一角度布置成彼此偏振选择性分束层（292，294 54，56; 154，156））不同的第二偏振状态（70）是反射的。这导致偏振器（10）的整体非常平坦的设计。

3. 发明申请

WO2005085955A3 TRANSMISSION FILTER DEVICE 审中-公开
标题翻译：变速箱过滤装置
公开(公告)号：WO2005085955A3
公开(公告)日：2005-11-10
申请号：PCT/EP2005002148
申请日：2005-03-01
申请人： ZEISS CARL SMT AG , FIOLKA DAMIAN , SCHOLZ AXEL
发明人： FIOLKA DAMIAN , SCHOLZ AXEL
IPC分类号： G02B5/20 , G02B5/30 , G02F1/03 , G03F7/20
CPC分类号： G03F7/70191 , G02B5/3066 , G02F1/0305 , G02F1/0316 , G02F2201/20 , G02F2203/12 , G03F7/70566
摘要： The invention relates to a transmission filter device for position/dependent intensity filtering of an incident light distribution, comprising at least one delay device (23) which can be operated during transmission and which is used to produce a position dependent delay effect on the light of the incident light distribution. The delay device (23) can be controlled for the production of a temporal, variable, position/dependent delay effect. The inventive transmission filter device also comprises at least one polarisation filter arrangement (24) which is arranged in the light path behind the delay device. Said transmission filter device (22) is particularly suitable for use in illuminating systems of microlithographic projection arrangements such that the transmission filter effect can be adjusted in a temporally variable manner and can be synchronised according to the variations of the illumination settings of the illuminating system. A substrate illuminating method can be carried out in an advantageous manner according to the inventive illuminating system.
摘要翻译：过滤入射光分布依赖于位置的强度A发送滤波器装置包括至少一个可操作以传输延迟装置（23），用于对入射的光分布的光，其中，所述延迟装置（23）是可控制的，以产生一个随时间变化的，空间相关延迟效应产生依赖于位置的延迟效应，和至少一个在光路后面延迟装置设置偏振滤光器组件（24）。发送滤波器装置（22）是特别适合于在微光刻投射曝光设备的照明系统中使用，因为发送滤波器效果是在时间上可调，并且因此可调节到的照明系统的照明设置的变化。可以有利地利用根据本发明的照明系统来执行基板的曝光方法。

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