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1. 发明申请

WO2012165792A3 VACUUM DEPOSITION APPARATUS 审中-公开
标题翻译：真空沉积装置
公开(公告)号：WO2012165792A3
公开(公告)日：2013-02-07
申请号：PCT/KR2012004025
申请日：2012-05-22
申请人： SNU PRECISION CO LTD , KONG DOO WON , LEE JONG HA , LEE DONG HYUN , JUNG SUNG JEA , PARK SANG HYUN
发明人： KONG DOO WON , LEE JONG HA , LEE DONG HYUN , JUNG SUNG JEA , PARK SANG HYUN
IPC分类号： C23C14/24
CPC分类号： C23C16/4401 , C23C14/50 , C23C14/562 , C23C14/564 , C23C16/4586 , C23C16/545
摘要： The present invention relates to a vacuum deposition apparatus. The vacuum deposition apparatus for depositing a source onto a substrate disposed within a vacuum chamber according to the present invention includes: a substrate transfer part for transferring the substrate; a nozzle disposed to face the substrate transfer part, the nozzle spraying the source onto the substrate disposed on the substrate transfer part; and a temperature control part for controlling a surface temperature of the substrate transfer part to prevent the source from being deposited onto the substrate transfer part. Thus, since the source may be prevented from being particulated and deposited on the substrate transfer part for transferring the substrate, a decrease in productivity may be minimized.
摘要翻译：本发明涉及一种真空沉积设备。根据本发明的用于将源沉积到设置在真空室内的基板上的真空沉积设备包括：用于转移基板的基板转移部分; 设置成面对基板转印部的喷嘴，喷嘴将源喷射到设置在基板转印部上的基板上; 以及用于控制基板转印部件的表面温度以防止源沉积到基板转印部件上的温度控制部件。因此，由于可以防止源极被颗粒化并沉积在用于转移衬底的衬底转移部分上，所以可以使生产率的降低最小化。

2. 发明申请

WO2011081368A2 VAPORIZATION APPARATUS AND METHOD FOR CONTROLLING THE SAME 审中-公开
标题翻译：蒸发装置及其控制方法
公开(公告)号：WO2011081368A2
公开(公告)日：2011-07-07
申请号：PCT/KR2010009316
申请日：2010-12-24
申请人： SNU PRECISION CO LTD , SEO SEUNG CHEOL , GONG DOO WON , LEE JONG HA , LEE KYUNG BUM , JUNG SUNG JAE , CHO WHANG SIN
发明人： SEO SEUNG CHEOL , GONG DOO WON , LEE JONG HA , LEE KYUNG BUM , JUNG SUNG JAE , CHO WHANG SIN
IPC分类号： C23C14/24
CPC分类号： C23C16/4485 , B01D1/0017 , B01D1/0082 , C23C14/24 , C23C14/543 , C23C16/52
摘要： Disclosed are a vaporization apparatus and a control method for the same. The vaporization apparatus includes a vaporization crucible adapted to receive a raw material; a vaporization heating unit adapted to vaporize the raw material by heating the vaporization crucible; a temperature measuring unit adapted to measure temperature of the vaporization crucible; a power measuring unit adapted to measure an applied power of the vaporization heating unit; and a control unit adapted to control a vaporization quantity of the raw material based on any one of a temperature variation value of the temperature measuring unit and a power variation value of the power measuring unit. The vaporization apparatus uses a non-contact/electronic method which measures a vaporization quantity through a temperature variation value and a power variation value during vaporization of a raw material. Therefore, since, differently from a contact method, a vaporization quantity measuring unit does not directly contact a raw material gas, various raw materials can be supplied and large quantity raw material supply or long time raw material supply can be achieved without deterioration of the function. In addition, preciseness of the raw material supply may be enhanced since the electronic method is capable of precise measurement of the vaporization quantity.
摘要翻译：公开了一种蒸发装置及其控制方法。蒸发装置包括适于容纳原料的蒸发坩埚; 蒸发加热单元，其适于通过加热所述蒸发坩埚来蒸发所述原料; 适于测量蒸发坩埚的温度的温度测量单元; 功率测量单元，适于测量蒸发加热单元的施加功率; 以及控制单元，其适于基于所述温度测量单元的温度变化值和所述功率测量单元的功率变化值中的任一个来控制所述原材料的蒸发量。蒸发装置使用在原料蒸发期间通过温度变化值和功率变化值来测量蒸发量的非接触/电子方法。因此，与接触方法不同的是，蒸发量测量单元不直接接触原料气体，可以供给各种原料，并且可以实现大量的原料供给或长时间的原料供应而不会降低功能。此外，由于电子方法能够精确地测量蒸发量，所以可以提高原料供应的精度。

3. 发明申请

WO2010110615A3 SOURCE SUPPLYING UNIT, METHOD FOR SUPPLYING SOURCE, AND THIN FILM DEPOSITING APPARATUS 审中-公开
标题翻译：源供应单元，供应源的方法和薄膜沉积设备
公开(公告)号：WO2010110615A3
公开(公告)日：2010-12-09
申请号：PCT/KR2010001849
申请日：2010-03-26
申请人： SNU PRECISION CO LTD , BAE KYUNG BIN , RHO JUN SEO , CHO WHANG SIN , KWON JIN HAON , LEE JONG HA , KIM YOU HYUN , YOON HYUNG SEOK
发明人： BAE KYUNG BIN , RHO JUN SEO , CHO WHANG SIN , KWON JIN HAON , LEE JONG HA , KIM YOU HYUN , YOON HYUNG SEOK
IPC分类号： H01L21/203
CPC分类号： H01L21/67115 , C23C14/243 , C23C14/26 , H01L21/67109
摘要： Provided are a source supplying unit and a method for supplying a source. The source supplying unit includes a pot configured to store a source material, an injector communicating with the pot to inject the source material evaporated from the pot, a high frequency coil part surrounding an outside of the pot, and a resistance-type heating part disposed at an outside of the injector. Since a high frequency induction heating method and a resistance-type heating method are combined to evaporate a source material to be supplied, a large amount of source material can be used, and the thickness and quality of a thin film can be easily controlled.
摘要翻译：提供了一种源供应单元和一种用于供应源的方法。所述源供应单元包括：罐，其被配置为存储源材料;喷射器，其与所述罐连通以喷射从所述罐蒸发的所述源材料;围绕所述罐的外部的高频线圈部分;以及布置的电阻型加热部分在注射器的外部。由于高频感应加热法和电阻式加热法相结合以蒸发待供给的源材料，所以可以使用大量的源材料，并且可以容易地控制薄膜的厚度和质量。

4. 发明申请

WO2011083973A3 METHOD AND SYSTEM OF PROCESSING MULTI-ENERGY X-RAY IMAGES 审中-公开
标题翻译：处理多能量X射线图像的方法和系统
公开(公告)号：WO2011083973A3
公开(公告)日：2011-12-01
申请号：PCT/KR2011000063
申请日：2011-01-06
申请人： SAMSUNG ELECTRONICS CO LTD , JANG KWANG EUN , KANG DONG GOO , SUNG YOUNG HUN , LEE JONG HA , KIM SUNG SU , HAN SEOK MIN
发明人： JANG KWANG EUN , KANG DONG GOO , SUNG YOUNG HUN , LEE JONG HA , KIM SUNG SU , HAN SEOK MIN
IPC分类号： A61B6/00
CPC分类号： G06T7/0016 , A61B6/481 , A61B6/482 , A61B6/486 , A61B6/5205 , G06T7/254 , G06T2207/10116 , G06T2207/30004 , G06T2207/30101
摘要： Provided is a method and system of processing a multi-energy X-ray image. Through the method and system, a plurality of target images may be acquired using an X-ray detector enabling an energy separation to be performed in a predetermined time interval, with respect to a target where a contrast agent is applied, and a signal processing may be performed on the acquired target images, thereby detecting and reading benign/malignant lesions or masses.
摘要翻译：提供了一种处理多能X射线图像的方法和系统。通过该方法和系统，可以使用X射线检测器来获取多个目标图像，该X射线检测器能够相对于施加造影剂的目标在预定时间间隔内执行能量分离，并且信号处理可以对所获取的目标图像进行，从而检测和读取良性/恶性病变或肿块。

5. 发明申请

WO2011037344A2 MULTI-ENERGY X-RAY SYSTEM, IMAGE PROCESSING APPARATUS FOR DISCRIMINATING MULTI-ENERGY X-RAY MATERIAL, AND IMAGE PROCESSING METHOD FOR MATERIAL DISCRIMINATION OF MULTI-ENERGY X-RAY SYSTEM 审中-公开
标题翻译：多能X射线系统，用于区分多能X射线材料的图像处理装置和用于多能X射线系统的材料判别的图像处理方法
公开(公告)号：WO2011037344A2
公开(公告)日：2011-03-31
申请号：PCT/KR2010006197
申请日：2010-09-13
申请人： SAMSUNG ELECTRONICS CO LTD , JANG KWANG EUN , SUNG YOUNG HUN , LEE JONG HA , KIM SUNG SU , HAN SEOK MIN , KANG DONG-GOO
发明人： JANG KWANG EUN , SUNG YOUNG HUN , LEE JONG HA , KIM SUNG SU , HAN SEOK MIN , KANG DONG-GOO
IPC分类号： A61B6/00
CPC分类号： A61B6/00 , A61B6/03 , A61B6/4007 , A61B6/4241 , A61B6/482
摘要： Disclosed are a multi-energy X-ray system, an image processing apparatus for discriminating a multi-energy X-ray material, and an image processing method for material discrimination of a multi-energy X-ray system. The image processing apparatus for discriminating a multi-energy X-ray material according to one aspect of the present invention comprises: a table for recording attenuation information and multi-energy X-ray spectrum information which correspond to one or more materials; an initial image estimating portion for estimating an initial image of each of the materials with respect to a projection image of each of the energy bands generated when a multi-energy X-ray spectrum passes through a detecting target formed with one or more materials; and an image update portion for updating the initial image as the material discrimination image using the estimated initial image and the spectrum information recorded in the table and the attenuation information recorded in the table.
摘要翻译：公开了一种多能量X射线系统，用于区分多能量X射线材料的图像处理装置以及用于多能X射线系统的材料区分的图像处理方法。根据本发明的一个方面的用于区分多能X射线材料的图像处理设备包括：用于记录对应于一种或多种材料的衰减信息和多能X射线谱信息的表格; 初始图像估计部分，用于相对于当多能量X射线光谱穿过由一种或多种材料形成的检测目标时产生的每个能带的投影图像，估计每种材料的初始图像; 以及图像更新部分，用于使用估计的初始图像和记录在表格中的光谱信息和记录在表格中的衰减信息来更新作为材料辨别图像的初始图像。

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