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    • 6. 发明申请
    • SEMICONDUCTOR DEVICE
    • 半导体器件
    • WO2006068265A1
    • 2006-06-29
    • PCT/JP2005/023699
    • 2005-12-19
    • RICOH COMPANY, LTD.YOSHIDA, Masaaki
    • YOSHIDA, Masaaki
    • H01L27/088H01L27/115H01L29/788
    • G11C16/30G11C16/0433H01L21/823462H01L27/115H01L27/11521H01L27/11524
    • A semiconductor device is disclosed that includes a nonvolatile memory cell having a memory transistor and a selection transistor, and a peripheral circuit transistor. The memory transistor includes a memory gate oxide film that is arranged on a semiconductor substrate, and a floating gate made of polysilicon that is arranged on the memory gate oxide film. The selection transistor is serially connected to the memory transistor and includes a selection gate oxide film that is arranged on the semiconductor substrate, and a selection gate made of polysilicon that is arranged on the selection gate oxide film. The peripheral circuit transistor includes a peripheral circuit gate oxide film that is arranged on the semiconductor substrate, and a peripheral circuit gate made of polysilicon that is arranged on the peripheral circuit gate oxide film. The memory gate oxide film is arranged to be thinner than the peripheral circuit gate oxide film.
    • 公开了一种半导体器件,其包括具有存储晶体管和选择晶体管的非易失性存储单元和外围电路晶体管。 存储晶体管包括布置在半导体衬底上的存储栅极氧化膜和布置在存储栅极氧化膜上的由多晶硅制成的浮置栅极。 选择晶体管串联连接到存储晶体管,并且包括布置在半导体衬底上的选择栅极氧化膜以及布置在选择栅氧化膜上的由多晶硅制成的选择栅极。 外围电路晶体管包括布置在半导体衬底上的外围电路栅极氧化膜,以及设置在外围电路栅氧化膜上的由多晶硅制成的外围电路栅极。 存储栅氧化膜被布置成比外围电路栅极氧化膜薄。