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    • 1. 发明申请
    • ELECTROMECHANICAL SYSTEMS VARIABLE CAPACITANCE ASSEMBLY
    • 电力系统可变电容组件
    • WO2013106145A2
    • 2013-07-18
    • PCT/US2012/068401
    • 2012-12-07
    • QUALCOMM MEMS TECHNOLOGIES, INC.
    • LAN, Je-HsiungGOUSEV, Evgeni PetrovichPARK, Sang-JuneZHANG, Wenyue
    • H01G5/38B05D5/12
    • G02B26/0841G09G3/3466H01G5/38
    • This disclosure provides systems, methods and apparatus for a variable capacitance apparatus. In one aspect, an apparatus includes a plurality of electromechanical systems varactors connected in parallel. Each of the plurality of electromechanical systems varactors includes a first, a second, and a third metal layer. The first metal layer includes a first bias electrode. The second metal layer is spaced apart from the first metal layer to define a first air gap, and includes a first radio frequency electrode. A third metal layer is spaced apart from the second metal layer to define a second air gap, and includes a second radio frequency electrode and a second bias electrode. The second bias electrode of each of the plurality of electromechanical systems varactors has a different projected area perpendicular to a surface of the second metal layer and onto the surface of the second metal layer.
    • 本公开提供了用于可变电容装置的系统,方法和装置。 一方面,一种装置包括并联连接的多个机电系统变容二极管。 多个机电系统中的每一个可变电抗器包括第一,第二和第三金属层。 第一金属层包括第一偏置电极。 第二金属层与第一金属层间隔开以限定第一气隙,并且包括第一射频电极。 第三金属层与第二金属层间隔开以限定第二气隙,并且包括第二射频电极和第二偏置电极。 多个机电系统中的每一个可变电抗器的第二偏置电极具有垂直于第二金属层的表面和第二金属层的表面的不同的投影面积。
    • 3. 发明申请
    • METHOD OF FABRICATION AND RESULTANT ENCAPSULATED ELECTROMECHANICAL DEVICE
    • 制造方法和结果封装的电化学装置
    • WO2012087942A2
    • 2012-06-28
    • PCT/US2011/065864
    • 2011-12-19
    • QUALCOMM MEMS TECHNOLOGIES, INC.HE, RihuiYAN, XiaomingLAN, Je-Hsiung
    • HE, RihuiYAN, XiaomingLAN, Je-Hsiung
    • B81C1/00
    • B81C1/00333B81C2203/0136B81C2203/0145
    • This disclosure provides systems, methods, and apparatus for encapsulated electromechanical systems. In one aspect, a release path includes a release hole through an encapsulation layer. The release path exposes a portion of a first sacrificial layer that extends beyond a second sacrificial layer in a horizontal direction. This allows the first sacrificial layer and the second sacrificial layer to later be etched through the release path. The corresponding electromechanical system device includes a shell layer encapsulating a mechanical layer. A conformal layer seals a release hole that extends through a shell layer. A portion of the conformal layer blocks the opening of the release passage within the release hole. The release passage has substantially the same vertical height as a gap that defines the spacing between the mechanical layer and a substrate.
    • 本公开提供了用于封装的机电系统的系统,方法和装置。 一方面,释放路径包括通过封装层的释放孔。 释放路径暴露在水平方向上延伸超过第二牺牲层的第一牺牲层的一部分。 这允许第一牺牲层和第二牺牲层随后通过释放路径被蚀刻。 相应的机电系统装置包括封装机械层的外壳层。 保形层密封延伸穿过壳层的释放孔。 共形层的一部分阻挡释放孔内的释放通道的开口。 释放通道具有与限定机械层和基底之间的间隔的间隙大致相同的垂直高度。
    • 7. 发明申请
    • ELECTROMECHANICAL SYSTEMS VARIABLE CAPACITANCE DEVICE
    • 电动系统可变电容装置
    • WO2013059580A1
    • 2013-04-25
    • PCT/US2012/061005
    • 2012-10-19
    • QUALCOMM MEMS TECHNOLOGIES, INC.
    • FELNHOFER, DanielZHANG, WenyueLAN, Je-Hsiung
    • G02B26/08H01G5/16
    • H01G5/16G02B26/001
    • This disclosure provides systems, methods and apparatus for electromechanical systems variable capacitance devices. In one aspect, an electromechanical systems variable capacitance device includes a substrate with a first metal layer including a first bias electrode overlying the substrate. A member suspended above the first metal layer includes a dielectric beam and a second metal layer including a first radio frequency electrode and a ground electrode. The member and the first metal layer define a first air gap. A third metal layer over the member includes a second bias electrode, and the third metal layer and the member define a second air gap. The member includes a plane of symmetry substantially parallel a plane containing the first bias electrode.
    • 本公开提供了用于机电系统可变电容器件的系统,方法和装置。 一方面,机电系统可变静电电容器件包括具有第一金属层的衬底,第一金属层包括覆盖衬底的第一偏置电极。 悬挂在第一金属层上方的构件包括电介质束和包括第一射频电极和接地电极的第二金属层。 构件和第一金属层限定第一气隙。 该构件上的第三金属层包括第二偏置电极,并且第三金属层和构件限定第二气隙。 该构件包括基本平行于包含第一偏置电极的平面的对称平面。