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1. 发明申请

WO2003079091A1 AN ADRESSING METHOD OF MOVEABLE MICROELEMENTS IN A SPATIAL LIGHT MODULATOR (SLM) FOR PATTERING OF A WORKPIECE 审中-公开
标题翻译：空间光调制器（SLM）中移动微型计算机的工作方法
公开(公告)号：WO2003079091A1
公开(公告)日：2003-09-25
申请号：PCT/SE2003/000428
申请日：2003-03-14
申请人： MICRONIC LASER SYSTEMS AB , FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V. , LJUNGBLAD, Ulric , SANDSTRÖM, Torbjörn , DUERR, Peter
发明人： LJUNGBLAD, Ulric , SANDSTRÖM, Torbjörn , DUERR, Peter
IPC分类号： G02B26/08
CPC分类号： G02B26/0841
摘要： An aspect of the present invention includes a method for modulating at least one pulse of electromagnetic radiation with a spatial light modulator. At least one mechanically movable modulator element is provided. At least one actuating element capable to produce forces on said movable element is provided. A biasing signal is provided to said at least one movable modulator element. An address signal is provided to at least one first electrode belonging to said at least one movable modulator element to move said movable modulator element to a desired modulation state, where said electromagnetic radiation is impinged onto said at least one movable modulator element when being in said desired modulation state. Other aspects of the present invention are reflected in the detailed description, figures and claims.
摘要翻译：本发明的一个方面包括用空间光调制器调制至少一个电磁辐射脉冲的方法。提供至少一个机械可移动的调制器元件。提供能够在所述可移动元件上产生力的至少一个致动元件。偏置信号被提供给所述至少一个可移动调制器元件。地址信号被提供给属于所述至少一个可移动调制器元件的至少一个第一电极，以将所述可移动调制器元件移动到期望的调制状态，其中当所述电磁辐射处于所述调制状态时，所述电磁辐射入射到所述至少一个可移动调制器元件上所需的调制状态。本发明的其它方面在详细描述，附图和权利要求中被体现。

2. 发明申请

WO2002063371A1 A METHOD AND A DEVICE FOR REDUCING HYSTERESIS OR IMPRINTING IN A MOVABLE MICRO-ELEMENT 审中-公开
标题翻译：一种用于减少可移动微型元件中的滞后或凸起的方法和装置
公开(公告)号：WO2002063371A1
公开(公告)日：2002-08-15
申请号：PCT/SE2002/000142
申请日：2002-01-28
申请人： MICRONIC LASER SYSTEMS AB , FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V. , LJUNGBLAD, Ulric , LAKNER, Hubert, Karl , DURR, Peter
发明人： LJUNGBLAD, Ulric , LAKNER, Hubert, Karl , DURR, Peter
IPC分类号： G02B26/08
CPC分类号： G02B26/0841
摘要： The present invention relates to a movable micro element with reduced imprinting or hysteresis effect arranged spaced apart from a surface comprising at least one electrode. At least one restoring element is connected to said movable micro element. An address electrode is arranged on said surface and capable to electrostatically attract said movable micro element. Said address electrode is addressed to a first potential. Said movable micro element is first set to a second potential defining a non addressed state and at a time period Δt before a predetermined pulsed signal is emitted said movable micro element is switched from said second potential to a third potential defining a addressed state. Said movable micro element is kept in said addresed state for a time period of Δt+Δt'. The invention also relates to a Spatial Light Modulator (SLM), an apparatus for patterning a workpiece and a method of reducing an imprinting or hysteresis effect of a movable micro element.
摘要翻译：本发明涉及与包括至少一个电极的表面间隔开的具有减小的压印或滞后效应的可移动微元件。至少一个恢复元件连接到所述可移动微元件。地址电极布置在所述表面上并且能够静电吸引所述可移动微元件。所述寻址电极被寻址到第一电位。所述可移动微元件首先被设置为限定非寻址状态的第二电位，并且在发射预定脉冲信号之前的时间段Dgr，将所述可移动微元件从所述第二电势切换到限定寻址状态的第三电位。所述可移动微元件保持处于所述附加状态，持续时间为＆Dgr; t +＆Dgr; t'。本发明还涉及空间光调制器（SLM），用于图案化工件的装置和减小可移动微元件的压印或滞后效应的方法。

3. 发明申请

WO2004005998A1 METHOD AND APPARATUS FOR CONTROLLING DEFORMABLE ACTUATORS 审中-公开
标题翻译：用于控制可变致动器的方法和装置
公开(公告)号：WO2004005998A1
公开(公告)日：2004-01-15
申请号：PCT/EP2002/007441
申请日：2002-07-04
申请人： FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V. , MICRONIC LASER SYSTEMS AB , DÜRR, Peter , LJUNGBLAD, Ulric
发明人： DÜRR, Peter , LJUNGBLAD, Ulric
IPC分类号： G02B26/08
CPC分类号： G09G3/346 , G02B26/0841 , G02B26/085 , G02B26/0858
摘要： In order to prevent negative effects of imprinting an the addressing accuracy of deformable actuators, a method for controlling deformable actuators (12a,12b) comprises, during an event period, driving the first and the second deformable actuator (12a,12b) for causing the deformable actuators (12a) to assume a first and a second deformation state, respectively; and, before or after the event period, driving the first and the second deformable actuator (12a,12b) for causing the deformable actuators (12a,12b) to assume deformations states to counteract an imprinting caused during the event period by approximating the loads applied to the deformable actuators (12a, 12b) to each other. According to an embodiment, before or after the event period (22,24), for a period (26,28) substantially as long as the operation period (22,24), the first and the second deformable actuator (12a,12b) are driven such that the first deformable actuator (12a) assumes the second deformation state and the second deformable actuator (12b) assumes the first deformation state.
摘要翻译：为了防止压印可变形致动器的寻址精度的负面影响，用于控制可变形致动器（12a，12b）的方法包括在事件时段期间驱动第一和第二可变形致动器（12a，12b），以使可变形致动器（12a）分别呈现第一和第二变形状态; 并且在事件期间之前或之后，驱动第一和第二可变形致动器（12a，12b），以使可变形致动器（12a，12b）呈现变形状态，以抵消在事件周期期间通过近似施加的载荷而产生的压印相对于可变形致动器（12a，12b）。根据实施例，在事件时段（22,24）之前或之后，与操作周期（22,24）基本上相同的时间段（26,28），第一和第二可变形致动器（12a，12b）被驱动使得第一可变形致动器（12a）呈现第二变形状态，并且第二可变形致动器（12b）呈现第一变形状态。

4. 发明申请

WO2007096175A1 SLM HEIGHT ERROR COMPENSATION METHOD 审中-公开
标题翻译： SLM高度误差补偿方法
公开(公告)号：WO2007096175A1
公开(公告)日：2007-08-30
申请号：PCT/EP2007/001553
申请日：2007-02-22
申请人： MICRONIC LASER SYSTEMS AB , FRAUNHOFER GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWADTEN FORSCHUNG E.V. , SANDSTRÖM, Torbjörn , DUERR, Peter , LJUNGBLAD, Ulric
发明人： SANDSTRÖM, Torbjörn , DUERR, Peter , LJUNGBLAD, Ulric
IPC分类号： G03F7/20
CPC分类号： G03F7/70291 , G03F7/70425
摘要： The present invention relates to a method for at least partly compensating height deviations (due to manufacturing imperfections) from one pixel to an adjoining pixel in at least one spatial light modulator (SLM) comprising a plurality of pixels in the form of tiltable mirrors with analog angle actuation, comprising the actions of determining a reference height for said tiltable mirrors, measuring a height of at least one mirror in said SLM, determining a deviation between said measured height of said mirror and said reference height, compensating the deviation by a height adjustment of at least one mirror.
摘要翻译：本发明涉及一种用于至少部分地补偿至少一个空间光调制器（SLM）中的一个像素到相邻像素的高度偏差（由于制造缺陷）的方法，该空间光调制器包括具有模拟的可倾斜反射镜形式的多个像素角度致动，包括确定所述可倾斜反射镜的参考高度的动作，测量所述SLM中的至少一个反射镜的高度，确定所述镜子的所述测量高度与所述参考高度之间的偏差，通过高度调整补偿偏差的至少一个镜子。

5. 发明申请

WO2002071127A1 A METHOD AND APPARATUS FOR SPATIAL LIGHT MODULATION 审中-公开
标题翻译：一种用于空间光调制的方法和装置
公开(公告)号：WO2002071127A1
公开(公告)日：2002-09-12
申请号：PCT/SE2002/000328
申请日：2002-02-26
申请人： MICRONIC LASER SYSTEMS AB , FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V.
发明人： LJUNGBLAD, Ulric , DURR, Peter , SANDSTRÖM, Torbjörn
IPC分类号： G02B26/08
CPC分类号： G03F7/70291 , G02B26/0841 , H04N5/7458
摘要： The present invention includes a method to use a phase modulating micromirror array to create an intensity only image that has high image fidelity, good stability through focus and good x-y symmetry. The method uses pixels consisting of at least in tilting mirror element and adjacent pixels tilt in different ways, but they are laid-out in a pattern that creates effective averaging between pixels with different tilt. The pattern is such that even if a single pixel creates a reflecting or scattering pattern that is asymmetric relative to the specular direction every neighborhood consists of pixels that together create symmetry. The invention allows the use of single-mirror pixels instead of multi-element pixels, thereby making manufacturing and design easier and also makes a smaller pixel size possible. Particular aspects of the present invention are described in the claims, specification and drawings.
摘要翻译：本发明包括使用相位调制微镜阵列产生具有高图像保真度，通过对焦具有良好稳定性和良好的x-y对称性的仅强度图像的方法。该方法使用至少在倾斜镜像元件和相邻像素中以不同方式倾斜的像素，但它们以不同倾斜的像素之间产生有效平均的图案布置。该图案使得即使单个像素产生相对于镜面方向不对称的反射或散射图案，每个邻域由一起产生对称性的像素组成。本发明允许使用单镜像而不是多元素像素，从而使制造和设计更容易，并且还使得更小的像素尺寸成为可能。在权利要求书，说明书和附图中描述了本发明的特定方面。

6. 发明申请

WO2004061488A1 HIGH ENERGY, LOW ENERGY DENSITY, RADIATION-RESISTANT OPTICS USED WITH MICRO-ELECTROMEHANICAL DEVICES 审中-公开
标题翻译：高能量，低能量密度，使用微电子设备的耐辐射光学
公开(公告)号：WO2004061488A1
公开(公告)日：2004-07-22
申请号：PCT/SE2003/002025
申请日：2003-12-19
申请人： MICRONIC LASER SYSTEMS AB , FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V.
发明人： SANDSTRÖM, Torbjörn , GREBINSKI, Thomas, J , DAUDERSTEDT, Ulrike , LJUNGBLAD, Ulric , KUNATH, Christian , EBERHARD, Kurth
IPC分类号： G02B1/10
CPC分类号： G02B1/14 , B81B7/0012 , B81B2201/042 , G02B1/105 , G02B26/0833 , G03F7/70291 , G03F7/70983
摘要： The present invention includes methods and devices that improve the radiation-resistance of a movable micromechanical optical element. In particular, a radiation-resistant layer is added to a movable micro-mechanical optical element, suitable to reduce the surface and bulk material changes to the element that result from exposure to pulsed laser energy less than 100 micro-joules per square centimeter and at wavelengths less than or equal to about 248 nm.
摘要翻译：本发明包括提高可移动微机械光学元件的耐辐射性的方法和装置。特别地，将耐辐射层添加到可移动的微机械光学元件中，适于减少由暴露于小于100微焦/平方厘米的脉冲激光能量引起的元件的表面和体材料变化，波长小于或等于约248nm。

7. 发明申请

WO2006029858A1 PHASE-SHIFTING OPTICAL MASKLESS LITHOGRAPHY ENABLING ASICS AT THE 65 AND 45 NM NODES 审中-公开
标题翻译：在65和45 NM NODES中进行相位移动光学MASKLESS LITHOGRAPHY启用ASICS
公开(公告)号：WO2006029858A1
公开(公告)日：2006-03-23
申请号：PCT/EP2005/009921
申请日：2005-09-15
申请人： MICRONIC LASER SYSTEMS AB , SANDSTRÖM, Torbjörn , LJUNGBLAD, Ulric
发明人： SANDSTRÖM, Torbjörn , LJUNGBLAD, Ulric
IPC分类号： G03F7/20
CPC分类号： G03F7/70383 , G03F7/70291 , G03F7/70475
摘要： Phase stepped and paired piston SLM configurations are described, with attention to rasterization and image stability. In contrast to attenuated phase-shift reticle performance of simple titling mirror SLMs, these configuration have phase shifting capabilities emulating a hard phase shift reticle and beyond. To use a straight-forward rasterization architecture where individual pixels are determined by the local pattern data, the SLM is operated so that the complex amplitude created by a mirror or mirror pair is confined to the real axis. The tilting phase-step mirror SLM gives a new set of rules for lithography: no penalty for phase shift over binary, no penalty for OPC verses non-OPC pattern, seamless pattern decompositions, optimal tones for each pattern, etc. This gives performance and flexibility never seen before.
摘要翻译：描述了阶梯式和成对的活塞SLM配置，注意光栅化和图像稳定性。与简单的称重镜SLM的衰减相移掩模版性能相反，这些配置具有模拟硬相移掩模版及以上的相移能力。为了使用单个像素由局部图案数据确定的直线光栅化架构，SLM被操作，使得由反射镜或反射镜对产生的复振幅被限制在实轴上。倾斜相位镜SLM为光刻提供了一套新的规则：对二进制的相移没有任何惩罚，OPC不考虑非OPC模式，无缝模式分解，每种模式的最佳色调等。这给出了性能和灵活性从未见过。

8. 发明申请

WO2006114127A1 MEMS DEVICE WITH MUTUALLY PERPENDICULAR DEFLECTABLE REFLECTIVE AND ELECTRODE SURFACES 审中-公开
标题翻译：具有不可预测的反射和电极表面的MEMS器件
公开(公告)号：WO2006114127A1
公开(公告)日：2006-11-02
申请号：PCT/EP2005/010500
申请日：2005-09-28
申请人： MICRONIC LASER SYSTEMS AB , LJUNGBLAD, Ulric , ENOKSSON, Peter , BRING, Martin
发明人： LJUNGBLAD, Ulric , ENOKSSON, Peter , BRING, Martin
IPC分类号： G02B26/08
CPC分类号： G02B26/0841
摘要： The present invention relates to a MEMS device including at least one pixel element (132); said pixel element (132) including, a support structure (134), at least one deflectable reflective surface (135) supported by said support structure (134), at least one deflectable electrode surface (146, 148), which electrode surface (146, 148) is essentially perpendicular to said deflectable reflective surface (135), said electrode surface (146, 148) is electrostatically attractable by a standing bar (160, 170) arranged in between pixel elements (132), wherein said standing bar is attracting a greater portion of said electrode surface (146, 148) on a first side of the tilting axis of said pixel element (132) compared to a second side of the tilting axis of said pixel element (132).The invention also relates to a method for operating a MEMS device.
摘要翻译：本发明涉及一种包括至少一个像素元件（132）的MEMS器件; 所述像素元件（132）包括支撑结构（134），由所述支撑结构（134）支撑的至少一个可偏转反射表面（135），至少一个可偏转电极表面（146,148），所述电极表面，148）基本上垂直于所述可偏转反射表面（135），所述电极表面（146,148）通过布置在像素元件（132）之间的立杆（160,170）静电吸引，其中所述立杆吸引与所述像素元件（132）的倾斜轴的第二侧相比，在所述像素元件（132）的倾斜轴线的第一侧上的所述电极表面（146,148）的较大部分。本发明还涉及用于操作MEMS器件的方法。

9. 发明申请

WO2005103776A1 IMPROVED ADDRESSING OF AN SLM 审中-公开
标题翻译：改进解决SLM问题
公开(公告)号：WO2005103776A1
公开(公告)日：2005-11-03
申请号：PCT/SE2005/000570
申请日：2005-04-20
申请人： MICRONIC LASER SYSTEMS AB , LJUNGBLAD, Ulric , DÜRR, Peter
发明人： LJUNGBLAD, Ulric , DÜRR, Peter
IPC分类号： G02B6/12
CPC分类号： G02B26/0841
摘要： The present invention relates to a method to reduce charging effects affecting a degree of movement of at least one movable micro mirror in a spatial light modulator, said at least one movable micro mirror is electrostatically attractable to at least one electrode, including the action of attracting electrostatically said at least one micro mirror in a sequence of reversed electrical field between said micro mirror and said at least one electrode.
摘要翻译：本发明涉及一种减少影响空间光调制器中的至少一个可移动微镜的运动程度的充电效应的方法，所述至少一个可移动微镜可静电吸引至至少一个电极，包括吸引静电地在所述微反射镜和所述至少一个电极之间以反向电场的顺序示出至少一个微镜。

10. 发明申请

WO2007131769A1 BACKSIDE IMMERSION LITHOGRAPHY 审中-公开
标题翻译：后置倾斜图
公开(公告)号：WO2007131769A1
公开(公告)日：2007-11-22
申请号：PCT/EP2007/004304
申请日：2007-05-15
申请人： MICRONIC LASER SYSTEMS AB , LJUNGBLAD, Ulric , GUSTAFSSON, Per-Erik
发明人： LJUNGBLAD, Ulric , GUSTAFSSON, Per-Erik
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03F1/54 , G03F1/76
摘要： The present disclosure relates to formation of latent images in a radiation sensitive layer applied to a substrate (210) that is transparent to or transmissive of radiation at the exposing wavelength. In particular, it relates to so-called backside lithography, in which the final lens (101) of an exposing system is positioned to project electromagnetic radiation through a first side of the transparent substrate (110) and expose a radiation sensitive layer (214) that overlays a second side of the transparent substrate that is opposite the first side. Five alternative embodiments for further treatment to form a radiation opaque layer corresponding to the latent image (the image or its inverse) are described. These methods and corresponding devices are useful for producing masks (sometimes called reticles), for producing latent images in semiconductor devices and for forming features of semiconductor devices using masks.
摘要翻译：本公开涉及在施加到对曝光波长的透射透射或透射的衬底（210）的辐射敏感层中的潜像的形成。特别地，本发明涉及所谓的背面光刻技术，其中曝光系统的最终透镜（101）定位成将电磁辐射投影穿过透明基板（110）的第一侧并暴露辐射敏感层（214）覆盖透明基板的与第一侧相对的第二面。描述了用于进一步处理以形成对应于潜像（辐射不透明层）的替代实施例（图像或其倒数）。这些方法和相应的装置可用于制造掩模（有时称为掩模版），用于在半导体器件中产生潜像并使用掩模形成半导体器件的特征。

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