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1. 发明申请

WO1993022711A1 ADAPTIVE OPTIC WAFER STEPPER ILLUMINATION SYSTEM 审中-公开
标题翻译：自适应光学平移式照明系统
公开(公告)号：WO1993022711A1
公开(公告)日：1993-11-11
申请号：PCT/US1992003998
申请日：1992-05-07
申请人： LITEL INSTRUMENTS
发明人： LITEL INSTRUMENTS , MacDONALD, Bruce, G. , HUNTER, Robert, O., Jr. , SMITH, Adlai, H.
IPC分类号： G03F07/20
CPC分类号： G03F7/70233 , G03F7/70266
摘要： The illumination system for a semiconductor wafer stepper includes reflective elements within the projection optics of a primary mirror (10), a secondary mirror (8), a deformable mirror (6) and a beamsplitter (4). The beamsplitter directs light reflected from the wafer surface (24) back into an interferometer camera to provide depth of focus and aberration information to a computer (16) which activates and selectively deforms the deformable mirror (6). Light, input from a mercury arc lamp or laser source, is projected either with an expanded or scanned beam through a reticle (20) which is printed with the pattern to be transferred to the wafer. An interferometer is included to combine light reflected from the wafer surface with a portion of the incoming light at the beamsplitter. The interference pattern formed by that combination is used by the computer to provide real-time manipulation of focus errors, vibration and aberration by deformation of the deformable mirror. The deformable mirror and interferometer system is also applicable to folded beam refractive optic illumination systems and pure refractive optic systems in which a detour is made within the optical train to access the deformable mirror.
摘要翻译：用于半导体晶片步进器的照明系统包括主镜（10），副镜（8），可变形反射镜（6）和分束器（4）的投影光学器件内的反射元件。分束器将从晶片表面（24）反射的光引导回到干涉仪相机中以向计算机（16）提供焦点深度和像差信息，从而激活并选择性地使可变形反射镜（6）变形。来自水银弧光灯或激光源的光线通过扩展的或扫描的光束投射通过掩模版（20），该掩模版（20）被打印以转印到晶片上。包括干涉仪以将从晶片表面反射的光与分束器处的入射光的一部分组合。由该组合形成的干涉图案由计算机用于通过可变形反射镜的变形来实时地处理聚焦误差，振动和像差。可变形反射镜和干涉仪系统也可用于折叠光束折射光学照明系统和纯折射光学系统，其中在光学系列内形成绕行线以接近可变形反射镜。

2. 发明申请

WO1994001240A1 USE OF FRESNEL ZONE PLATES FOR MATERIAL PROCESSING 审中-公开
标题翻译：用于材料加工的FRESNEL区域板的使用
公开(公告)号：WO1994001240A1
公开(公告)日：1994-01-20
申请号：PCT/US1992005555
申请日：1992-07-01
申请人： LITEL INSTRUMENTS
发明人： LITEL INSTRUMENTS , MacDONALD, Bruce, G. , HUNTER, Robert, O., Jr. , SMITH, Adlai, H. , GUEST, Clark, C.
IPC分类号： B23K26/006
CPC分类号： B23K26/043 , B23K26/04 , B23K26/066 , B23K26/067 , H05K3/0017
摘要： The apparatus for machining and material processing includes an excimer laser and a Fresnel zone plate array (FZP) positioned parallel to the workpiece, with the distance between the FZP and the workpiece being the focal length of the FZP. For each hole to be formed on the workpiece a corresponding Fresnel zone is patterned onto the FZP. Each Fresnel zone may be patterned directly centered over the desired hole location or in high density patterns it may be located off-center from the hole with deflection being accomplished by the formation of finer circular arcs on the side of the Fresnel zone opposite the desired direction of deflection. A beam scanner is included to provide a more uniform illumination of the FZP by the laser beam. The scanning eliminates non-uniformity of intensity. The alignment mechanism uses a helium-neon laser, the beam from which is projected onto a surface relief grating on the workpiece. The reflected light from the surface relief grating is filtered to create interference fringes which, when aligned, provide maximum light intensity projected through a transmission grating on the Fresnel zone plate.
摘要翻译：用于加工和材料加工的装置包括准分子激光器和平行于工件定位的菲涅耳带状平板阵列（FZP），FZP和工件之间的距离是FZP的焦距。对于要在工件上形成的每个孔，将相应的菲涅尔区域图案化到FZP上。每个菲涅尔区域可以直接以所需孔位置为中心图案，或以高密度图案形成图案，其可以位于离开孔的偏心处，偏转通过在菲涅尔区域的与期望方向相反的一侧上形成更细圆弧来实现的偏转。包括光束扫描器以通过激光束提供更均匀的FZP照明。扫描消除了强度的不均匀性。对准机构使用氦氖激光器，其中的光束投影到工件上的表面起伏光栅上。来自表面起伏光栅的反射光被过滤以产生干涉条纹，当对准时，其提供通过菲涅耳带板上的透射光栅投射的最大光强度。

3. 发明申请

WO1993025938A1 IMAGING AND ILLUMINATION SYSTEM WITH ASPHERIZATION AND ABERRATION CORRECTION BY PHASE STEPS 审中-公开
标题翻译：成像和照明系统通过相位步骤进行修正和解除校正
公开(公告)号：WO1993025938A1
公开(公告)日：1993-12-23
申请号：PCT/US1992005155
申请日：1992-06-18
申请人： LITEL INSTRUMENTS
发明人： LITEL INSTRUMENTS , MacDONALD, Bruce, G. , HUNTER, Robert, O., Jr. , SMITH, Adlai, H.
IPC分类号： G03F07/20
CPC分类号： G03F7/70233 , G02B27/0025 , G03F7/70258 , G03F7/70308
摘要： The imaging and illumination system with aspherization and aberration correction by phase steps includes two transparent phase plates (6, 8) within the optical train of a stepper illumination system. The first plate (6) places each ray at the corrected position on the axial stigmatism plate (8) to satisfy the sine condition. The second plate (8), which is the axial stigmatism plate, ensures that each ray of light focuses at the focal point. The aberration corrected light is reflected by a deformable mirror (10) toward a secondary mirror (14), a primary mirror (12) and finally onto a wafer (20) to project a single field of large dimension. The secondary and primary mirrors provide aspherization by forming phase steps in the surfaces of the mirrors. The deformable mirror, to permit realtime correction of aberrations and manipulation of the beam for each field imaged by the system. A set of two-dimensional scanning mirrors (16, 18) is placed between the laser light source (2) and a reticle (4) containing the pattern which is to be transferred to the wafer. These mirrors step a beam across the reticle a single subfield (40) of the pattern at a time. Such individual stepping permits the deformable mirror to correct for each sub-field thereby allowing a very large field of view for the image transferred to the wafer.
摘要翻译：具有非均匀化和相位步进的像差校正的成像和照明系统包括在步进照明系统的光学系列内的两个透明相位板（6,8）。第一板（6）将每根光线放置在轴向刻字板（8）上的校正位置以满足正弦条件。作为轴向刻字板的第二板（8）确保每个光线在焦点处聚焦。像差校正光被可变形反射镜（10）反射到次级反射镜（14），初级反射镜（12），最后反射到晶片（20）上以投射大尺寸的单个场。次级和初级反射镜通过在反射镜的表面中形成相位步骤来提供非均匀化。可变形反射镜，允许对系统成像的每个场的像差的实时校正和光束的操纵。一组二维扫描镜（16,18）被放置在激光光源（2）和包含要转印到晶片的图案的掩模版（4）之间。这些反射镜一次将光束跨过光罩跨过图案的单个子场（40）。这种单独的步骤允许可变形反射镜校正每个子场，从而允许传输到晶片的图像的非常大的视场。

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